JP4644187B2 - 内部放射線遮蔽部を有するx線管 - Google Patents
内部放射線遮蔽部を有するx線管 Download PDFInfo
- Publication number
- JP4644187B2 JP4644187B2 JP2006509817A JP2006509817A JP4644187B2 JP 4644187 B2 JP4644187 B2 JP 4644187B2 JP 2006509817 A JP2006509817 A JP 2006509817A JP 2006509817 A JP2006509817 A JP 2006509817A JP 4644187 B2 JP4644187 B2 JP 4644187B2
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- Prior art keywords
- ray tube
- rays
- ray
- anode
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 230000005855 radiation Effects 0.000 title claims description 35
- 239000000463 material Substances 0.000 claims description 23
- 229910052721 tungsten Inorganic materials 0.000 claims description 16
- 239000010937 tungsten Substances 0.000 claims description 16
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 230000000717 retained effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 11
- 238000011109 contamination Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 238000004846 x-ray emission Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- OWUGOENUEKACGV-UHFFFAOYSA-N [Fe].[Ni].[W] Chemical compound [Fe].[Ni].[W] OWUGOENUEKACGV-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000001959 radiotherapy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000004154 testing of material Methods 0.000 description 1
- HHIQWSQEUZDONT-UHFFFAOYSA-N tungsten Chemical compound [W].[W].[W] HHIQWSQEUZDONT-UHFFFAOYSA-N 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/16—Vessels
- H01J2235/165—Shielding arrangements
- H01J2235/166—Shielding arrangements against electromagnetic radiation
Landscapes
- X-Ray Techniques (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
Claims (14)
- 排気されるエンクロージャを有するX線管であって、
前記エンクロージャが、
電子を生成することができる電子源を有するカソード組立体を含み、電子が通過する開口が形成された第一の部分と、
該第一の部分に直接に密着した第二の部分であって、電子源により生成された電子を受け入れるように位置するターゲット表面を有するアノードを含む、ところの第二の部分と、
前記第一の部分に形成された前記開口内に少なくとも部分的に保持される第一の放射線遮蔽部と、
を含む、X線管。 - 前記第一の放射線遮蔽部が、前記排気されるエンクロージャを含む外側ハウジングに形成されるポートでのX線の衝突を防止し、前記ポートは、前記カソード組立体に電気的に接続された高電圧ケーブルを受け入れるものである、請求項1に記載のX線管。
- 前記第一の放射線遮蔽部は衝突するX線を吸収する高Z材料からなる、請求項1に記載のX線管。
- 前記第一の部分がステンレススチール製である、請求項1に記載のX線管。
- 前記第一の放射線遮蔽部に、電子が前記電子源から前記アノードに通過する開口部が形成される、請求項1に記載のX線管。
- 前記第二の部分が銅製である、請求項1に記載のX線管。
- さらに、前記第一の部分内の前記電子源の近傍に配置される第二の放射線遮蔽部を有する、請求項1に記載のX線管。
- 前記第一の放射線遮蔽部がタングステン製である、請求項1に記載のX線管。
- 前記第一の放射線遮蔽部がディスク状である、請求項1に記載のX線管。
- 前記アノードが固定アノードである、請求項1に記載のX線管。
- 前記第一の放射線遮蔽部が、ディスク状であり、タングステン製であり、その厚さが約1/8インチ(0.32cm)である、請求項1に記載のX線管。
- 前記第二部分の端部が前記第一の部分に直接密着し、前記第二の部分の前記端部の近傍に第一の放射線遮蔽部が配置される、請求項1に記載のX線管。
- 前記第一の放射線遮蔽部が、前記第二の部分の前記端部と、電子が通過するように前記第一の部分内に配置されたプレートとの間に位置する、請求項12に記載のX線管。
- 前記プレートが銅製である、請求項13に記載のX線管。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/409,854 US7466799B2 (en) | 2003-04-09 | 2003-04-09 | X-ray tube having an internal radiation shield |
PCT/US2004/010848 WO2004093117A2 (en) | 2003-04-09 | 2004-04-08 | X-ray tube having an internal radiation shield |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006523005A JP2006523005A (ja) | 2006-10-05 |
JP4644187B2 true JP4644187B2 (ja) | 2011-03-02 |
Family
ID=33130665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006509817A Expired - Lifetime JP4644187B2 (ja) | 2003-04-09 | 2004-04-08 | 内部放射線遮蔽部を有するx線管 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7466799B2 (ja) |
EP (1) | EP1611590B1 (ja) |
JP (1) | JP4644187B2 (ja) |
WO (1) | WO2004093117A2 (ja) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8094784B2 (en) | 2003-04-25 | 2012-01-10 | Rapiscan Systems, Inc. | X-ray sources |
US8331535B2 (en) * | 2003-04-25 | 2012-12-11 | Rapiscan Systems, Inc. | Graphite backscattered electron shield for use in an X-ray tube |
US9208988B2 (en) * | 2005-10-25 | 2015-12-08 | Rapiscan Systems, Inc. | Graphite backscattered electron shield for use in an X-ray tube |
US10483077B2 (en) | 2003-04-25 | 2019-11-19 | Rapiscan Systems, Inc. | X-ray sources having reduced electron scattering |
US8243876B2 (en) | 2003-04-25 | 2012-08-14 | Rapiscan Systems, Inc. | X-ray scanners |
GB0525593D0 (en) | 2005-12-16 | 2006-01-25 | Cxr Ltd | X-ray tomography inspection systems |
GB0812864D0 (en) | 2008-07-15 | 2008-08-20 | Cxr Ltd | Coolign anode |
US7068749B2 (en) * | 2003-05-19 | 2006-06-27 | General Electric Company | Stationary computed tomography system with compact x ray source assembly |
JP4954525B2 (ja) * | 2005-10-07 | 2012-06-20 | 浜松ホトニクス株式会社 | X線管 |
US9046465B2 (en) | 2011-02-24 | 2015-06-02 | Rapiscan Systems, Inc. | Optimization of the source firing pattern for X-ray scanning systems |
US20070121776A1 (en) * | 2005-11-30 | 2007-05-31 | General Electric Company | System and method for multiple usage tooling for pressurized water reactor |
US7661445B2 (en) * | 2005-12-19 | 2010-02-16 | Varian Medical Systems, Inc. | Shielded cathode assembly |
JP4878311B2 (ja) * | 2006-03-03 | 2012-02-15 | キヤノン株式会社 | マルチx線発生装置 |
US7881436B2 (en) * | 2008-05-12 | 2011-02-01 | General Electric Company | Method and apparatus of differential pumping in an x-ray tube |
US7965818B2 (en) * | 2008-07-01 | 2011-06-21 | Minnesota Medical Physics Llc | Field emission X-ray apparatus, methods, and systems |
GB0816823D0 (en) | 2008-09-13 | 2008-10-22 | Cxr Ltd | X-ray tubes |
GB0901338D0 (en) | 2009-01-28 | 2009-03-11 | Cxr Ltd | X-Ray tube electron sources |
KR101151859B1 (ko) * | 2010-03-26 | 2012-05-31 | 주식회사엑스엘 | 비확산 게터가 장착된 엑스선관 |
JP6068461B2 (ja) * | 2011-07-04 | 2017-01-25 | テトラ・ラヴァル・ホールディングス・アンド・ファイナンス・ソシエテ・アノニムTetra Laval Holdings & Finance S.A. | 電子ビーム装置 |
JP5871528B2 (ja) | 2011-08-31 | 2016-03-01 | キヤノン株式会社 | 透過型x線発生装置及びそれを用いたx線撮影装置 |
US9324536B2 (en) * | 2011-09-30 | 2016-04-26 | Varian Medical Systems, Inc. | Dual-energy X-ray tubes |
WO2013051594A1 (ja) * | 2011-10-04 | 2013-04-11 | 株式会社ニコン | X線装置、x線照射方法、及び構造物の製造方法 |
CN102595754B (zh) * | 2012-01-06 | 2015-05-13 | 同方威视技术股份有限公司 | 辐射器件安装箱、油冷循环***以及x射线发生器 |
JP5916106B2 (ja) * | 2012-03-27 | 2016-05-11 | 株式会社リガク | 排気機器を備えたx線発生装置 |
JP2013239317A (ja) * | 2012-05-15 | 2013-11-28 | Canon Inc | 放射線発生ターゲット、放射線発生装置および放射線撮影システム |
US20130322602A1 (en) * | 2012-05-31 | 2013-12-05 | General Electric Company | Internal shielding x-ray tube |
JP5763032B2 (ja) * | 2012-10-02 | 2015-08-12 | 双葉電子工業株式会社 | X線管 |
US9728370B2 (en) * | 2015-01-30 | 2017-08-08 | Varex Imaging Corporation | Focusing structures with non-rectilinear focusing apertures |
DE102015213810B4 (de) * | 2015-07-22 | 2021-11-25 | Siemens Healthcare Gmbh | Hochspannungszuführung für einen Röntgenstrahler |
US10556129B2 (en) * | 2015-10-02 | 2020-02-11 | Varian Medical Systems, Inc. | Systems and methods for treating a skin condition using radiation |
JP2019501493A (ja) * | 2015-12-03 | 2019-01-17 | ヴァレックス イメージング コーポレイション | X線アセンブリ |
US10512146B2 (en) * | 2017-06-22 | 2019-12-17 | General Electric Company | X-ray tube casing |
US10806014B2 (en) | 2017-06-22 | 2020-10-13 | GE Precision Healthcare LLC | X-ray tube casing with integral heat exchanger |
DE102017127372A1 (de) | 2017-11-21 | 2019-05-23 | Smiths Heimann Gmbh | Anodenkopf für Röntgenstrahlenerzeuger |
JP2019179713A (ja) | 2018-03-30 | 2019-10-17 | 富士フイルム株式会社 | X線管 |
US10916401B2 (en) | 2018-03-30 | 2021-02-09 | Fujifilm Corporation | X-ray tube |
JP7048396B2 (ja) | 2018-04-12 | 2022-04-05 | 浜松ホトニクス株式会社 | X線管 |
US10910190B2 (en) * | 2019-01-10 | 2021-02-02 | Electronics And Telecommunications Research Institute | X-ray tube |
US11164713B2 (en) * | 2020-03-31 | 2021-11-02 | Energetiq Technology, Inc. | X-ray generation apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62121773U (ja) * | 1986-12-17 | 1987-08-01 | ||
JP2003007237A (ja) * | 2001-06-25 | 2003-01-10 | Shimadzu Corp | X線発生装置 |
JP2004514120A (ja) * | 2000-11-09 | 2004-05-13 | ステリス インコーポレイテッド | 製品用x線ターゲット |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE108682C (ja) * | ||||
DE473930C (de) * | 1925-10-26 | 1929-03-27 | Siemens Reiniger Veifa Ges Fue | Roentgenroehre mit einem nahe um den Brennfleck herum angeordneten Blendenkoerper |
US3679927A (en) * | 1970-08-17 | 1972-07-25 | Machlett Lab Inc | High power x-ray tube |
CA1089909A (en) * | 1977-02-25 | 1980-11-18 | Magnaflux Corporation | Internally shielded x-ray tube |
US4184097A (en) | 1977-02-25 | 1980-01-15 | Magnaflux Corporation | Internally shielded X-ray tube |
JPS5725660A (en) * | 1980-07-21 | 1982-02-10 | Toshiba Corp | X-ray tube |
JPS605501Y2 (ja) * | 1981-11-27 | 1985-02-20 | 株式会社 東芝 | X線管 |
DE3222511C2 (de) * | 1982-06-16 | 1985-08-29 | Feinfocus Röntgensysteme GmbH, 3050 Wunstorf | Feinfokus-Röntgenröhre |
US4679219A (en) * | 1984-06-15 | 1987-07-07 | Kabushiki Kaisha Toshiba | X-ray tube |
US4588493A (en) * | 1984-09-17 | 1986-05-13 | Blumenthal Robert N | Hot gas measuring probe |
DE3688946T2 (de) * | 1985-04-30 | 1994-01-13 | Nippon Telegraph & Telephone | Röntgenstrahlungsquelle. |
US4736379A (en) * | 1985-12-06 | 1988-04-05 | Coherent, Inc. | Conduction cooled ion laser |
FR2650703B1 (fr) * | 1989-08-07 | 1991-10-11 | Gen Electric Cgr | Cathode de tube a rayons x et tube ainsi obtenu |
JP2713860B2 (ja) * | 1994-04-26 | 1998-02-16 | 浜松ホトニクス株式会社 | X線管装置 |
DE4430622C2 (de) * | 1994-08-29 | 1998-07-02 | Siemens Ag | Kathodensystem für eine Röntgenröhre |
US5780164A (en) * | 1994-12-12 | 1998-07-14 | The Dow Chemical Company | Computer disk substrate, the process for making same, and the material made therefrom |
DE19509516C1 (de) * | 1995-03-20 | 1996-09-26 | Medixtec Gmbh Medizinische Ger | Mikrofokus-Röntgeneinrichtung |
US5680433A (en) * | 1995-04-28 | 1997-10-21 | Varian Associates, Inc. | High output stationary X-ray target with flexible support structure |
US5751784A (en) * | 1996-09-27 | 1998-05-12 | Kevex X-Ray | X-ray tube |
US6030681A (en) * | 1997-07-10 | 2000-02-29 | Raychem Corporation | Magnetic disk comprising a substrate with a cermet layer on a porcelain |
US6115454A (en) * | 1997-08-06 | 2000-09-05 | Varian Medical Systems, Inc. | High-performance X-ray generating apparatus with improved cooling system |
JP4015256B2 (ja) * | 1998-02-06 | 2007-11-28 | 浜松ホトニクス株式会社 | X線管 |
JP3653992B2 (ja) * | 1998-06-26 | 2005-06-02 | 株式会社日立製作所 | コンピュータ断層撮影装置及びコンピュータ断層撮影方法 |
EP1096543B1 (en) * | 1998-07-09 | 2009-03-25 | Hamamatsu Photonics K.K. | X-ray tube |
JP4334639B2 (ja) * | 1998-07-30 | 2009-09-30 | 浜松ホトニクス株式会社 | X線管 |
US6229876B1 (en) * | 1999-07-29 | 2001-05-08 | Kevex X-Ray, Inc. | X-ray tube |
US6282262B1 (en) * | 1999-11-10 | 2001-08-28 | Varian Medical Systems, Inc. | X-ray tube and method of manufacture |
US6830827B2 (en) * | 2000-03-07 | 2004-12-14 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
US6674838B1 (en) * | 2001-11-08 | 2004-01-06 | Varian Medical Systems, Inc. | X-ray tube having a unitary vacuum enclosure and housing |
-
2003
- 2003-04-09 US US10/409,854 patent/US7466799B2/en not_active Expired - Lifetime
-
2004
- 2004-04-08 WO PCT/US2004/010848 patent/WO2004093117A2/en active Application Filing
- 2004-04-08 JP JP2006509817A patent/JP4644187B2/ja not_active Expired - Lifetime
- 2004-04-08 EP EP04749885.2A patent/EP1611590B1/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62121773U (ja) * | 1986-12-17 | 1987-08-01 | ||
JP2004514120A (ja) * | 2000-11-09 | 2004-05-13 | ステリス インコーポレイテッド | 製品用x線ターゲット |
JP2003007237A (ja) * | 2001-06-25 | 2003-01-10 | Shimadzu Corp | X線発生装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2004093117A2 (en) | 2004-10-28 |
EP1611590A2 (en) | 2006-01-04 |
JP2006523005A (ja) | 2006-10-05 |
WO2004093117A3 (en) | 2005-09-01 |
US7466799B2 (en) | 2008-12-16 |
EP1611590A4 (en) | 2009-11-11 |
US20040202282A1 (en) | 2004-10-14 |
EP1611590B1 (en) | 2014-06-11 |
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