JP4599334B2 - 物品支持部材を製造する方法 - Google Patents
物品支持部材を製造する方法 Download PDFInfo
- Publication number
- JP4599334B2 JP4599334B2 JP2006290478A JP2006290478A JP4599334B2 JP 4599334 B2 JP4599334 B2 JP 4599334B2 JP 2006290478 A JP2006290478 A JP 2006290478A JP 2006290478 A JP2006290478 A JP 2006290478A JP 4599334 B2 JP4599334 B2 JP 4599334B2
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- Prior art keywords
- plate
- hump
- substrate
- base plate
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/16—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay
- C04B35/18—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay rich in aluminium oxide
- C04B35/195—Alkaline earth aluminosilicates, e.g. cordierite or anorthite
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3201—Alkali metal oxides or oxide-forming salts thereof
- C04B2235/3203—Lithium oxide or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3244—Zirconium oxides, zirconates, hafnium oxides, hafnates, or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3251—Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
- C04B2235/3255—Niobates or tantalates, e.g. silver niobate
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Ceramic Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
‐リソグラフィ投影技術を用いてデバイスを製造する際に処理されるべき基板、または、
‐リソグラフィ投影装置、マスク検査もしくは洗浄装置等のマスク取扱装置、またはマスク製造装置におけるリソグラフィ投影マスクまたはマスクブランク(mask blank)、あるいは、放射線システムの光路中に固定されたその他任意の物品あるいは光学素子のような用語のうち任意のものとすることができる。
‐放射ビームB(例えばUV放射線またはEUV放射線)を調節するように構成されている照明システム(イルミネータ)ILと、
‐パターニングデバイス(例えばマスク)MAを支持するように構成されているとともに、一定のパラメータに従ってパターニングデバイスを正確に位置決めするように構成された第1位置決め装置PMに結合されている支持構造体(例えばマスクテーブル)MTと、
‐基板(例えばレジストコートされたウェーハ)Wを保持するように構成されているとともに、一定のパラメータに従って基板を正確に位置決めするように構成された第2位置決め装置PWに結合されている基板テーブル(例えばウェーハテーブル)WTと、
‐パターニングデバイスMAにより放射ビームBに伝えられるパターンを基板Wのターゲット部分C(例えば1つ以上のダイを含むもの)へ投影するように構成されている投影システム(例えば屈折投影レンズ系)PSとを含む。
Claims (8)
- 物品支持部材を製造する方法であって、
平坦面を有するベースプレートを提供するステップと、
平坦な上面をもたらすよう形成された複数のこぶ部を有するプレートを含むこぶ部プレートを提供するステップと、
こぶ部プレートの平坦な上面をベースプレートに接着するステップと、
こぶ部プレートのプレートを除去し、したがってこぶ部プレートのこぶ部をベースプレートに接着させておくステップとを含む方法。 - プレートを除去するステップが接着するステップと実質的に同温度で行われる、請求項1記載の方法。
- 接着するステップがガラスフリットにより提供される、請求項1又は2記載の方法。
- 接着するステップが、接着層としてのベースプレート上の金属コーティングを用いてこぶ部プレートをスポット溶接することにより提供される、請求項1又は2記載の方法。
- スポット溶接がこぶ部に電流を与えることにより行われる、請求項4記載の方法。
- 接着層が、こぶ部をスポット溶接した後に除去される、請求項4又は5記載の方法。
- ベースプレートがコージエライトを含んでおり、
コージエライトをLiNbO3とZrO2のうち少なくとも一方でドープするステップをさらに含む、請求項1乃至6の何れか一項記載の方法。 - ドープするステップは、LiNbO3とZrO2のうち少なくとも一方の体積分率が少なくとも2%でドープする、請求項7記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73088505P | 2005-10-28 | 2005-10-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007158309A JP2007158309A (ja) | 2007-06-21 |
JP4599334B2 true JP4599334B2 (ja) | 2010-12-15 |
Family
ID=37897232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006290478A Expired - Fee Related JP4599334B2 (ja) | 2005-10-28 | 2006-10-25 | 物品支持部材を製造する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070097346A1 (ja) |
EP (1) | EP1780601A3 (ja) |
JP (1) | JP4599334B2 (ja) |
KR (2) | KR100801952B1 (ja) |
CN (1) | CN101030041A (ja) |
SG (1) | SG131887A1 (ja) |
TW (1) | TW200720863A (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7678458B2 (en) * | 2007-01-24 | 2010-03-16 | Asml Holding N.V. | Bonding silicon silicon carbide to glass ceramics |
US7940511B2 (en) * | 2007-09-21 | 2011-05-10 | Asml Netherlands B.V. | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
JP5449358B2 (ja) * | 2008-08-21 | 2014-03-19 | エーエスエムエル ホールディング エヌ.ブイ. | レチクル、リソグラフィ装置、およびレチクルを生成する方法 |
NL2007452A (en) | 2010-12-08 | 2012-06-11 | Asml Holding Nv | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp. |
CN109254501A (zh) | 2012-02-03 | 2019-01-22 | Asml荷兰有限公司 | 衬底支架、光刻装置、器件制造方法和制造衬底保持器的方法 |
US9658542B2 (en) * | 2013-10-14 | 2017-05-23 | Carl Zeiss Smt Gmbh | Optical element |
US10768534B2 (en) | 2018-08-14 | 2020-09-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photolithography apparatus and method and method for handling wafer |
US11874607B2 (en) | 2019-04-30 | 2024-01-16 | Asml Netherlands B.V. | Method for providing a wear-resistant material on a body, and composite body |
TWI738304B (zh) * | 2020-04-23 | 2021-09-01 | 台灣積體電路製造股份有限公司 | 半導體晶圓加工方法及清潔刷頭 |
JP2024521551A (ja) * | 2021-05-19 | 2024-06-03 | エーエスエムエル ホールディング エヌ.ブイ. | モジュール式ウェーハテーブル及びその製造方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0521584A (ja) * | 1991-07-16 | 1993-01-29 | Nikon Corp | 保持装置 |
JP2001237303A (ja) * | 2000-02-22 | 2001-08-31 | Sumitomo Metal Ind Ltd | ウェハ用真空チャックおよびその製造方法 |
JP2001332609A (ja) * | 2000-03-13 | 2001-11-30 | Nikon Corp | 基板保持装置及び露光装置 |
JP2002167268A (ja) * | 2000-11-29 | 2002-06-11 | Kyocera Corp | コージェライト質焼結体とその製造方法 |
JP2002179459A (ja) * | 2000-09-20 | 2002-06-26 | Sumitomo Metal Ind Ltd | 低熱膨張セラミックスおよび露光装置用部材 |
JP2004079861A (ja) * | 2002-08-21 | 2004-03-11 | Taiheiyo Cement Corp | 静電チャック |
WO2004026791A1 (ja) * | 2002-09-18 | 2004-04-01 | Mitsui Mining & Smelting Co., Ltd. | 電子部品焼成用治具 |
JP2006054289A (ja) * | 2004-08-11 | 2006-02-23 | Nikon Corp | 基板保持装置、ステージ装置、露光装置、及びデバイスの製造方法 |
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US2751951A (en) * | 1953-12-31 | 1956-06-26 | Strathaus John | Roast board |
US4403017A (en) * | 1981-11-30 | 1983-09-06 | The Perkin-Elmer Corporation | Low thermal expansion modified cordierites |
US4468018A (en) * | 1982-07-28 | 1984-08-28 | Glanfield Lawrence (Concessions) Ltd. | Device for holding logs for sawing |
US4989846A (en) * | 1990-05-08 | 1991-02-05 | Lucinda Quinn | Covered dish carrier |
US5326086A (en) * | 1993-06-14 | 1994-07-05 | Frank Radencic | Cutting rack |
JPH08118175A (ja) * | 1994-10-21 | 1996-05-14 | Imao Corp:Kk | 取付用ベース部材及びそのベース部材に取り付けられる取付具 |
US5755029A (en) * | 1994-11-14 | 1998-05-26 | Learned; Kerry D. | Double overhead camshaft alignment method |
JP2001244177A (ja) * | 2000-02-28 | 2001-09-07 | Nikon Corp | ステージ装置とホルダ、および走査型露光装置並びに露光装置 |
EP1136887A3 (en) * | 2000-03-16 | 2003-06-18 | ASML Netherlands B.V. | Substrate holder for lithographic apparatus |
US6711796B2 (en) * | 2001-10-11 | 2004-03-30 | Anderson Industrial Corp. | Circuit board stripper |
US20030125184A1 (en) * | 2001-12-21 | 2003-07-03 | Schott Glas | Glass ceramic product with variably adjustable zero crossing of the CTE-T curve |
KR100488049B1 (ko) * | 2003-01-16 | 2005-05-06 | 엘지전자 주식회사 | 나노 임프린트 제조 방법 |
KR100609167B1 (ko) * | 2003-10-21 | 2006-08-02 | 엘지전자 주식회사 | 선격자 편광판 제조 방법 |
TWM321831U (en) * | 2007-01-17 | 2007-11-11 | Yung-Tsai Shen | Vacuum absorbing device for a workbench |
-
2006
- 2006-10-16 US US11/581,059 patent/US20070097346A1/en not_active Abandoned
- 2006-10-18 TW TW095138459A patent/TW200720863A/zh unknown
- 2006-10-20 SG SG200607254-0A patent/SG131887A1/en unknown
- 2006-10-25 JP JP2006290478A patent/JP4599334B2/ja not_active Expired - Fee Related
- 2006-10-26 KR KR1020060104318A patent/KR100801952B1/ko not_active IP Right Cessation
- 2006-10-27 EP EP06076942A patent/EP1780601A3/en not_active Withdrawn
- 2006-10-27 CN CNA2006100642441A patent/CN101030041A/zh active Pending
-
2007
- 2007-10-26 KR KR1020070108140A patent/KR20070115822A/ko not_active Application Discontinuation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0521584A (ja) * | 1991-07-16 | 1993-01-29 | Nikon Corp | 保持装置 |
JP2001237303A (ja) * | 2000-02-22 | 2001-08-31 | Sumitomo Metal Ind Ltd | ウェハ用真空チャックおよびその製造方法 |
JP2001332609A (ja) * | 2000-03-13 | 2001-11-30 | Nikon Corp | 基板保持装置及び露光装置 |
JP2002179459A (ja) * | 2000-09-20 | 2002-06-26 | Sumitomo Metal Ind Ltd | 低熱膨張セラミックスおよび露光装置用部材 |
JP2002167268A (ja) * | 2000-11-29 | 2002-06-11 | Kyocera Corp | コージェライト質焼結体とその製造方法 |
JP2004079861A (ja) * | 2002-08-21 | 2004-03-11 | Taiheiyo Cement Corp | 静電チャック |
WO2004026791A1 (ja) * | 2002-09-18 | 2004-04-01 | Mitsui Mining & Smelting Co., Ltd. | 電子部品焼成用治具 |
JP2006054289A (ja) * | 2004-08-11 | 2006-02-23 | Nikon Corp | 基板保持装置、ステージ装置、露光装置、及びデバイスの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070097346A1 (en) | 2007-05-03 |
EP1780601A3 (en) | 2007-06-13 |
KR100801952B1 (ko) | 2008-02-12 |
KR20070115822A (ko) | 2007-12-06 |
CN101030041A (zh) | 2007-09-05 |
EP1780601A2 (en) | 2007-05-02 |
JP2007158309A (ja) | 2007-06-21 |
KR20070045942A (ko) | 2007-05-02 |
SG131887A1 (en) | 2007-05-28 |
TW200720863A (en) | 2007-06-01 |
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