JP4592683B2 - 金属表面を電気化学的に研磨するための電解質 - Google Patents
金属表面を電気化学的に研磨するための電解質 Download PDFInfo
- Publication number
- JP4592683B2 JP4592683B2 JP2006505339A JP2006505339A JP4592683B2 JP 4592683 B2 JP4592683 B2 JP 4592683B2 JP 2006505339 A JP2006505339 A JP 2006505339A JP 2006505339 A JP2006505339 A JP 2006505339A JP 4592683 B2 JP4592683 B2 JP 4592683B2
- Authority
- JP
- Japan
- Prior art keywords
- titanium
- niobium
- acid
- alloy
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 15
- 239000003792 electrolyte Substances 0.000 title abstract description 28
- 229910052751 metal Inorganic materials 0.000 title description 8
- 239000002184 metal Substances 0.000 title description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 20
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 12
- 239000010936 titanium Substances 0.000 claims abstract description 12
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 10
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 8
- 239000010955 niobium Substances 0.000 claims abstract description 8
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910001257 Nb alloy Inorganic materials 0.000 claims abstract description 7
- 229910001362 Ta alloys Inorganic materials 0.000 claims abstract description 7
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910001000 nickel titanium Inorganic materials 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 8
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 claims description 6
- HLXZNVUGXRDIFK-UHFFFAOYSA-N nickel titanium Chemical group [Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni] HLXZNVUGXRDIFK-UHFFFAOYSA-N 0.000 claims description 6
- 229910001093 Zr alloy Inorganic materials 0.000 claims description 4
- GFUGMBIZUXZOAF-UHFFFAOYSA-N niobium zirconium Chemical compound [Zr].[Nb] GFUGMBIZUXZOAF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims 1
- 150000001261 hydroxy acids Chemical class 0.000 claims 1
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 abstract 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 17
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ALRHLSYJTWAHJZ-UHFFFAOYSA-N 3-hydroxypropionic acid Chemical compound OCCC(O)=O ALRHLSYJTWAHJZ-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- -1 for example Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
グリコール酸(70%) : 20体積%
硫酸(96%) : 80体積%
フッ化水素アンモニウム: 75g/l
から成る電解質内で、1A/dm2の電流密度で、20分の処理時間で電解研磨した。結果は、良好に平坦化した微少な粗さを有する非常に輝いている表面を示した。
グリコール酸(70%) : 60体積%
硫酸(96%) : 40体積%
フッ化水素アンモニウム: 50g/l
から成る電解質内で、20℃〜30℃の温度、1.5〜5A/dm2の電流密度で電解研磨した。全体で30分に渡る電解研磨時間が経過した後、総ての材料が、非常に輝いている表面と、良好な平滑性を示した。
Claims (13)
- チタン、チタン合金、ニオブ、ニオブ合金、タンタルまたはタンタル合金からなるワークピースの電気化学的な研磨剤であって、硫酸、フッ化水素アンモニウムおよび少なくとも1種のヒドロキシカルボン酸を含有することを特徴とする研磨剤。
- 使用するヒドロキシカルボン酸はグリコール酸またはヒドロキシプロピオン酸であることを特徴とする請求項1に記載の研磨剤。
- ヒドロキシカルボン酸が10〜80容量%の濃度で含有されることを特徴とする請求項1または2に記載の研磨剤。
- ヒドロキシカルボン酸が20〜60容量%の濃度で含有されることを特徴とする請求項3に記載の研磨剤。
- 硫酸(96%)が90〜20容量%の濃度で含有されることを特徴とする請求項1〜4のいずれか1項に記載の研磨剤。
- 硫酸(96%)が80〜40容量%の濃度で含有されることを特徴とする請求項5に記載の研磨剤。
- フッ化水素アンモニウムが10〜150g毎リットルの濃度で含有されることを特徴とする請求項1〜6のいずれか1項に記載の研磨剤。
- フッ化水素アンモニウムが40〜85g毎リットルの濃度で含有されることを特徴とする請求項7に記載の研磨剤。
- 請求項1〜8項のいずれか1項に記載の研磨剤を使用することを特徴とする、チタン、チタン合金、ニオブ、ニオブ合金、タンタルまたはタンタル合金からなるワークピースを電気化学的に研磨するための方法。
- ニッケル−チタン合金またはニオブ−ジルコニウム合金を使用することを特徴とする請求項9に記載の方法。
- ニッケル−チタン合金がニチノールであることを特徴とする請求項10記載の方法。
- ワークピースと接触する接触材料としてアルミニウムを使用することを特徴とする請求項9〜11のいずれか1項に記載の方法。
- 0℃〜40℃の温度、10V〜35VのDC電圧および0.5〜10A/dm 2 の電流密度で実施されることを特徴とする請求項9〜12のいずれか1項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10320909A DE10320909A1 (de) | 2003-05-09 | 2003-05-09 | Elektrolyt zum elektrochemischen Polieren von Metalloberflächen |
PCT/EP2004/004600 WO2004100283A2 (de) | 2003-05-09 | 2004-04-30 | Elektrolyt zum elektrochemischen polieren von metalloberflächen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006526071A JP2006526071A (ja) | 2006-11-16 |
JP4592683B2 true JP4592683B2 (ja) | 2010-12-01 |
Family
ID=33305203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006505339A Expired - Fee Related JP4592683B2 (ja) | 2003-05-09 | 2004-04-30 | 金属表面を電気化学的に研磨するための電解質 |
Country Status (10)
Country | Link |
---|---|
US (1) | US7807039B2 (ja) |
EP (1) | EP1625246B1 (ja) |
JP (1) | JP4592683B2 (ja) |
AT (1) | ATE339534T1 (ja) |
CA (1) | CA2525138A1 (ja) |
DE (2) | DE10320909A1 (ja) |
DK (1) | DK1625246T3 (ja) |
ES (1) | ES2271882T3 (ja) |
PL (1) | PL1625246T3 (ja) |
WO (1) | WO2004100283A2 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006047713B3 (de) * | 2006-10-09 | 2008-03-27 | Poligrat Gmbh | Elektropolierverfahren für Niob und Tantal und Elektrolyt |
DE102007011632B3 (de) * | 2007-03-09 | 2008-06-26 | Poligrat Gmbh | Elektropolierverfahren für Titan |
US20100213078A1 (en) * | 2009-02-25 | 2010-08-26 | Ryszard Rokicki | Electrolyte composition for electropolishing niobium and tantalum and method for using same |
US20110017608A1 (en) * | 2009-07-27 | 2011-01-27 | Faraday Technology, Inc. | Electrochemical etching and polishing of conductive substrates |
US8357287B2 (en) * | 2009-11-23 | 2013-01-22 | MetCon LLC | Electrolyte solution and electropolishing methods |
US20110303553A1 (en) * | 2010-06-11 | 2011-12-15 | Inman Maria E | Electrochemical system and method for machining strongly passivating metals |
US8580103B2 (en) | 2010-11-22 | 2013-11-12 | Metcon, Llc | Electrolyte solution and electrochemical surface modification methods |
CN102225504B (zh) * | 2011-04-06 | 2013-12-25 | 宝鸡鑫泽钛镍有限公司 | 高精度钛及钛合金板制备工艺 |
CN102677142B (zh) * | 2012-05-16 | 2015-07-08 | 安徽华东光电技术研究所 | 一种用于行波管螺旋线的电化学抛光方法 |
KR101600428B1 (ko) * | 2014-07-15 | 2016-03-07 | 한국화학연구원 | 중이온 가속관의 나이오븀 식각방법 |
EP3109348B1 (en) * | 2015-06-24 | 2020-06-03 | Airbus Defence and Space GmbH | Electrolyte and process for the electrolytic polishing of a metallic substrate |
DK3551786T3 (da) * | 2016-12-09 | 2021-06-28 | Rena Tech Austria Gmbh | Elektropoleringsfremgangsmåde og elektrolyt hertil |
CN107937977A (zh) * | 2017-12-20 | 2018-04-20 | 西安泰金工业电化学技术有限公司 | 一种阴极辊电解抛光液及抛光方法 |
JP6671763B2 (ja) * | 2018-02-28 | 2020-03-25 | 三愛プラント工業株式会社 | 電解研磨液及び電解研磨方法 |
JP7313664B2 (ja) * | 2019-06-17 | 2023-07-25 | マルイ鍍金工業株式会社 | 電解研磨方法 |
DE102020200815A1 (de) | 2020-01-23 | 2021-07-29 | Mahle International Gmbh | Zusammensetzung als Elektrolyt zum Auflösen und/oder Abscheiden von Metallen, Metalloxiden und/oder Metalllegierungen sowie Verwendungen dieser Zusammensetzung |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE547173A (ja) | 1955-05-09 | |||
DK574274A (ja) * | 1973-12-06 | 1975-07-28 | Ciba Geigy Ag | |
DE3461202D1 (en) * | 1983-08-23 | 1986-12-11 | Bbc Brown Boveri & Cie | Process for electrolytically polishing a work piece made of a nickel, cobalt or iron based alloy |
JPH02310400A (ja) * | 1989-05-22 | 1990-12-26 | Nec Corp | マグネシウム上のめっき皮膜を剥離する方法 |
JPH0394100A (ja) * | 1989-09-04 | 1991-04-18 | Canon Inc | 電解研磨液及び電解研磨方法 |
JP3291512B2 (ja) * | 1995-03-16 | 2002-06-10 | 日本パーオキサイド株式会社 | 過酸化水素、フッ化水素アンモニウム、及び硫酸を含有する酸性溶液の安定剤、及びこれを用いた鉄−ニッケル合金の化学的溶解処理液 |
US5861535A (en) * | 1997-09-23 | 1999-01-19 | Eastman Kodak Company | Reductive alkylation process to prepare tertiary aminoaryl compounds |
US6447664B1 (en) | 1999-01-08 | 2002-09-10 | Scimed Life Systems, Inc. | Methods for coating metallic articles |
JP3318656B2 (ja) * | 1999-04-08 | 2002-08-26 | 独立行政法人産業技術総合研究所 | チタン複合材料 |
FR2795433B1 (fr) | 1999-06-25 | 2001-08-31 | Org Europeene De Rech | Composition de bain pour le polissage electrolytique du titane, et son procede d'utilisation |
US6352636B1 (en) * | 1999-10-18 | 2002-03-05 | General Electric Company | Electrochemical system and process for stripping metallic coatings |
KR100400030B1 (ko) * | 2000-06-05 | 2003-09-29 | 삼성전자주식회사 | 금속막의 화학 및 기계적 연마용 슬러리 및 그 제조방법과상기 슬러리를 이용한 반도체 소자의 금속 배선 형성 방법 |
US7128825B2 (en) * | 2001-03-14 | 2006-10-31 | Applied Materials, Inc. | Method and composition for polishing a substrate |
JP3484525B2 (ja) * | 2001-07-06 | 2004-01-06 | 株式会社ケミカル山本 | ステンレス鋼表面の清浄、不動態化処理方法 |
US7357854B1 (en) * | 2002-08-19 | 2008-04-15 | Advanced Cardiovascular Systems, Inc. | Process for electropolishing a device made from cobalt-chromium |
-
2003
- 2003-05-09 DE DE10320909A patent/DE10320909A1/de not_active Withdrawn
-
2004
- 2004-04-30 US US10/556,291 patent/US7807039B2/en not_active Expired - Fee Related
- 2004-04-30 PL PL04730514T patent/PL1625246T3/pl unknown
- 2004-04-30 DK DK04730514T patent/DK1625246T3/da active
- 2004-04-30 JP JP2006505339A patent/JP4592683B2/ja not_active Expired - Fee Related
- 2004-04-30 CA CA002525138A patent/CA2525138A1/en not_active Abandoned
- 2004-04-30 EP EP04730514A patent/EP1625246B1/de not_active Expired - Lifetime
- 2004-04-30 AT AT04730514T patent/ATE339534T1/de active
- 2004-04-30 DE DE502004001497T patent/DE502004001497D1/de not_active Expired - Lifetime
- 2004-04-30 WO PCT/EP2004/004600 patent/WO2004100283A2/de active Application Filing
- 2004-04-30 ES ES04730514T patent/ES2271882T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE10320909A1 (de) | 2004-11-18 |
WO2004100283A2 (de) | 2004-11-18 |
EP1625246A2 (de) | 2006-02-15 |
CA2525138A1 (en) | 2004-11-18 |
EP1625246B1 (de) | 2006-09-13 |
DK1625246T3 (da) | 2006-11-13 |
US20070029209A1 (en) | 2007-02-08 |
ES2271882T3 (es) | 2007-04-16 |
DE502004001497D1 (de) | 2006-10-26 |
JP2006526071A (ja) | 2006-11-16 |
PL1625246T3 (pl) | 2006-12-29 |
WO2004100283A3 (de) | 2004-12-09 |
US7807039B2 (en) | 2010-10-05 |
ATE339534T1 (de) | 2006-10-15 |
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