JP4562691B2 - 小型改質器およびその製造方法 - Google Patents
小型改質器およびその製造方法 Download PDFInfo
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- JP4562691B2 JP4562691B2 JP2006161239A JP2006161239A JP4562691B2 JP 4562691 B2 JP4562691 B2 JP 4562691B2 JP 2006161239 A JP2006161239 A JP 2006161239A JP 2006161239 A JP2006161239 A JP 2006161239A JP 4562691 B2 JP4562691 B2 JP 4562691B2
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- C—CHEMISTRY; METALLURGY
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/32—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air
- C01B3/34—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air by reaction of hydrocarbons with gasifying agents
- C01B3/38—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air by reaction of hydrocarbons with gasifying agents using catalysts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/22—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds
- C01B3/24—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds of hydrocarbons
- C01B3/26—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds of hydrocarbons using catalysts
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/32—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air
- C01B3/323—Catalytic reaction of gaseous or liquid organic compounds other than hydrocarbons with gasifying agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00783—Laminate assemblies, i.e. the reactor comprising a stack of plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00835—Comprising catalytically active material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00873—Heat exchange
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/02—Processes for making hydrogen or synthesis gas
- C01B2203/0205—Processes for making hydrogen or synthesis gas containing a reforming step
- C01B2203/0227—Processes for making hydrogen or synthesis gas containing a reforming step containing a catalytic reforming step
- C01B2203/0233—Processes for making hydrogen or synthesis gas containing a reforming step containing a catalytic reforming step the reforming step being a steam reforming step
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/02—Processes for making hydrogen or synthesis gas
- C01B2203/0283—Processes for making hydrogen or synthesis gas containing a CO-shift step, i.e. a water gas shift step
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/06—Integration with other chemical processes
- C01B2203/066—Integration with other chemical processes with fuel cells
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/08—Methods of heating or cooling
- C01B2203/0805—Methods of heating the process for making hydrogen or synthesis gas
- C01B2203/085—Methods of heating the process for making hydrogen or synthesis gas by electric heating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/10—Catalysts for performing the hydrogen forming reactions
- C01B2203/1005—Arrangement or shape of catalyst
- C01B2203/1035—Catalyst coated on equipment surfaces, e.g. reactor walls
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/10—Catalysts for performing the hydrogen forming reactions
- C01B2203/1041—Composition of the catalyst
- C01B2203/1047—Group VIII metal catalysts
- C01B2203/1064—Platinum group metal catalysts
- C01B2203/107—Platinum catalysts
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/10—Catalysts for performing the hydrogen forming reactions
- C01B2203/1041—Composition of the catalyst
- C01B2203/1076—Copper or zinc-based catalysts
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/12—Feeding the process for making hydrogen or synthesis gas
- C01B2203/1205—Composition of the feed
- C01B2203/1211—Organic compounds or organic mixtures used in the process for making hydrogen or synthesis gas
- C01B2203/1217—Alcohols
- C01B2203/1223—Methanol
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49345—Catalytic device making
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Inorganic Chemistry (AREA)
- Fuel Cell (AREA)
- Hydrogen, Water And Hydrids (AREA)
Description
10 改質部、
30 一酸化炭素除去部、
40、342、362 第1基板、
40a、60a Siウェハ、
42、62、362a 凹溝、
44、68、324、344b、362b 触媒層、
46 燃料注入口、
48 水素排出口、
60、344、364 第2基板、
66 加熱手段、
66a 電源パッド、
70 マイクロチャンネル、
100、130、150 段階、
102、132、152、158 SiO2、
104、134、154、156、160 フォトレジスト、
140 PDMS層、
310 触媒膜、
322 流路、
326 ヒータ、
328 基板、
344a 流路溝、
346 第3基板、
346a 鏡面、
346b 断熱空洞、
348、366 膜ヒータ
Claims (10)
- 液体燃料から水素ガスを製造する小型改質器であって、
触媒層が形成された凹溝を一方の端面に形成された第1基板と、
前記第1基板の凹溝に比べその幅が狭く、両側に加熱手段が配され、触媒層が形成された凹溝を一方の端面の前記第1基板の凹溝に対応する位置に形成された第2基板と、を含み、
前記第1基板に形成された凹溝と前記第2基板に形成された凹溝が向かい合わされて、内部に前記加熱手段が配されたマイクロチャンネルが形成され、
前記マイクロチャンネルの一端に燃料注入口が形成され、他端に水素排出口が形成され、
前記マイクロチャンネルは、前記燃料注入口に隣接して配された改質部と、前記改質部の後流側に配された一酸化炭素除去部とを有し、
前記加熱手段は、ヒータを含む
小型改質器。 - 前記加熱手段は、第2基板に支持される下面を除く表面が前記マイクロチャンネルの内部空間に露出されている請求項1に記載の小型改質器。
- 前記加熱手段は、前記マイクロチャンネル内の前記改質部および一酸化炭素除去部のそれぞれの内部に配され、互いに異なる加熱温度が設定される電気抵抗式熱線を有する請求項1または請求項2に記載の小型改質器。
- 前記加熱手段は電気抵抗式熱線を有し、前記電気抵抗式熱線を外部の電源に結合する電源パッドを、前記改質部および一酸化炭素除去部にそれぞれ有する請求項1から請求項3までのいずれかに記載の小型改質器。
- 前記第1基板は、シリコンウェハまたはPDMS(Poly−dimethysiloxane)により形成される請求項1から請求項4までのいずれか1項に記載の小型改質器。
- 液体燃料から水素ガスを製造する小型改質器の製造方法であって、
触媒層が形成された凹溝を、第1基板の一方の端面に形成して前記第1基板を提供する段階と、
前記第1基板の凹溝に比べその幅が狭く、両側に加熱手段が配され、触媒層が形成された凹溝および加熱手段を、第2基板の一方の端面において、前記第1基板の前記凹溝に対応する位置に形成して前記第2基板を提供する段階と、
前記凹溝が相互に向い合うように前記第1基板および前記第2基板を接着してひとつのマイクロチャンネルを形成し、前記マイクロチャンネルの一端に燃料注入口を、前記燃料注入口に隣接して改質部を、前記改質部の後流側に一酸化炭素除去部を、前記マイクロチャンネルの他端に水素排出口をそれぞれ形成する段階と
を含む小型改質器の製造方法。 - 前記第2基板を提供する段階は、前記第2基板の前記一方の端面において前記凹溝の外側の両方の部分に露出されたSiO2の表面に、電気抵抗式熱線の材料を付着させて加熱手段を形成する段階を含む請求項6に記載の製造方法。
- 前記第2基板を提供する段階は、前記加熱手段の表面および前記凹溝の内面にSiO2層を蒸着する段階を含む請求項7に記載の製造方法。
- 前記第1基板は、シリコンウェハまたはPDMS(Poly−dimethysiloxane)により形成される請求項6から請求項8までのいずれか1項に記載の製造方法。
- 前記第1基板を提供する段階は、
熱酸化方式(thermal oxidation)によりシリコンウェハの一方の端面にSiO2を形成し、
前記SiO2の表面にフォトレジスト(PR)を塗布した後、フォトリソグラフィー(Photolithography)により前記凹溝に該当する部分を残して前記フォトレジストを除去し、
前記シリコンウェハの前記端面にPDMSを流し込んで硬化させてPDMS層を形成させた後、前記PDMS層を前記シリコンウェハから分離し、さらに
前記PDMS層に形成された凹溝を表面処理した後、前記凹溝の内部に触媒層をコーティングする段階を含む請求項6から請求項9までのいずれかに記載の製造方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050049176A KR100616685B1 (ko) | 2005-06-09 | 2005-06-09 | 소형 개질 기 와 그 제조 방법 |
Publications (2)
Publication Number | Publication Date |
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JP2006342053A JP2006342053A (ja) | 2006-12-21 |
JP4562691B2 true JP4562691B2 (ja) | 2010-10-13 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2006161239A Expired - Fee Related JP4562691B2 (ja) | 2005-06-09 | 2006-06-09 | 小型改質器およびその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20060280661A1 (ja) |
JP (1) | JP4562691B2 (ja) |
KR (1) | KR100616685B1 (ja) |
CN (1) | CN100438181C (ja) |
DE (1) | DE102006024986A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI512261B (zh) * | 2012-06-22 | 2015-12-11 | Panasonic Corp | 微流體元件 |
JP6341190B2 (ja) * | 2015-02-16 | 2018-06-13 | 株式会社デンソー | 半導体装置の製造方法 |
CN107261998A (zh) * | 2017-08-07 | 2017-10-20 | 衢州市膜力环保科技有限公司 | 一种微通道反应器 |
CN110115965B (zh) * | 2019-06-06 | 2021-06-01 | 福建齐衡科技有限公司 | 一种插片式微通道连续反应器 |
CN111554644B (zh) * | 2020-06-12 | 2022-04-01 | 厦门通富微电子有限公司 | 一种芯片、芯片封装体及晶圆 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002085961A (ja) * | 2000-09-13 | 2002-03-26 | Inst Of Physical & Chemical Res | リアクタおよびその製造方法 |
JP2003168685A (ja) * | 2001-11-30 | 2003-06-13 | Casio Comput Co Ltd | 配線電極構造及びその製造方法 |
JP2004063131A (ja) * | 2002-07-25 | 2004-02-26 | Casio Comput Co Ltd | 化学反応装置及び燃料電池システム並びにその製造方法 |
JP2004066113A (ja) * | 2002-08-07 | 2004-03-04 | Casio Comput Co Ltd | 小型化学反応装置 |
JP2004141794A (ja) * | 2002-10-25 | 2004-05-20 | Casio Comput Co Ltd | 小型化学反応装置 |
JP2005103398A (ja) * | 2003-09-29 | 2005-04-21 | Casio Comput Co Ltd | 反応器及びその製造方法 |
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DE19720294C1 (de) * | 1997-05-15 | 1998-12-10 | Dbb Fuel Cell Engines Gmbh | Reformierungsreaktor und Betriebsverfahren hierfür |
US6541676B1 (en) * | 1998-12-02 | 2003-04-01 | Massachusetts Institute Of Technology | Integrated palladium-based micromembranes for hydrogen separation and hydrogenation/dehydrogenation reactions |
US7316718B2 (en) * | 2001-07-11 | 2008-01-08 | Millennium Cell, Inc. | Differential pressure-driven borohydride based generator |
JP4682476B2 (ja) * | 2001-08-01 | 2011-05-11 | カシオ計算機株式会社 | 加熱装置、改質装置及び燃料電池システム |
JP4400012B2 (ja) | 2001-08-01 | 2010-01-20 | カシオ計算機株式会社 | 蒸発装置、改質装置及び燃料電池システム |
JP3891131B2 (ja) | 2002-03-29 | 2007-03-14 | カシオ計算機株式会社 | 化学反応装置及び電源システム |
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JP4147803B2 (ja) * | 2002-04-05 | 2008-09-10 | カシオ計算機株式会社 | 化学反応装置及び電源システム |
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JP4587016B2 (ja) | 2003-05-30 | 2010-11-24 | ソニー株式会社 | 反応装置とその製造方法、改質装置、電源供給システム |
KR101030045B1 (ko) * | 2004-06-29 | 2011-04-20 | 삼성에스디아이 주식회사 | 연료전지용 개질기 및 이를 포함하는 연료 전지 시스템 |
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-
2005
- 2005-06-09 KR KR1020050049176A patent/KR100616685B1/ko not_active IP Right Cessation
-
2006
- 2006-05-30 DE DE102006024986A patent/DE102006024986A1/de not_active Withdrawn
- 2006-06-07 CN CNB2006100879137A patent/CN100438181C/zh not_active Expired - Fee Related
- 2006-06-08 US US11/448,833 patent/US20060280661A1/en not_active Abandoned
- 2006-06-09 JP JP2006161239A patent/JP4562691B2/ja not_active Expired - Fee Related
-
2010
- 2010-02-01 US US12/697,833 patent/US20100132195A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002085961A (ja) * | 2000-09-13 | 2002-03-26 | Inst Of Physical & Chemical Res | リアクタおよびその製造方法 |
JP2003168685A (ja) * | 2001-11-30 | 2003-06-13 | Casio Comput Co Ltd | 配線電極構造及びその製造方法 |
JP2004063131A (ja) * | 2002-07-25 | 2004-02-26 | Casio Comput Co Ltd | 化学反応装置及び燃料電池システム並びにその製造方法 |
JP2004066113A (ja) * | 2002-08-07 | 2004-03-04 | Casio Comput Co Ltd | 小型化学反応装置 |
JP2004141794A (ja) * | 2002-10-25 | 2004-05-20 | Casio Comput Co Ltd | 小型化学反応装置 |
JP2005103398A (ja) * | 2003-09-29 | 2005-04-21 | Casio Comput Co Ltd | 反応器及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20100132195A1 (en) | 2010-06-03 |
KR100616685B1 (ko) | 2006-08-28 |
US20060280661A1 (en) | 2006-12-14 |
CN1877894A (zh) | 2006-12-13 |
DE102006024986A1 (de) | 2006-12-28 |
JP2006342053A (ja) | 2006-12-21 |
CN100438181C (zh) | 2008-11-26 |
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