JP4473670B2 - 半導体ウェハ収納容器用ブレスフィルタ - Google Patents
半導体ウェハ収納容器用ブレスフィルタ Download PDFInfo
- Publication number
- JP4473670B2 JP4473670B2 JP2004222963A JP2004222963A JP4473670B2 JP 4473670 B2 JP4473670 B2 JP 4473670B2 JP 2004222963 A JP2004222963 A JP 2004222963A JP 2004222963 A JP2004222963 A JP 2004222963A JP 4473670 B2 JP4473670 B2 JP 4473670B2
- Authority
- JP
- Japan
- Prior art keywords
- filter
- storage container
- semiconductor wafer
- wafer storage
- breath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000003860 storage Methods 0.000 title claims description 70
- 239000004065 semiconductor Substances 0.000 title claims description 68
- 238000009423 ventilation Methods 0.000 claims description 16
- 238000003780 insertion Methods 0.000 claims description 9
- 230000037431 insertion Effects 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 238000005452 bending Methods 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 69
- 239000000126 substance Substances 0.000 description 23
- 230000002093 peripheral effect Effects 0.000 description 22
- 239000000428 dust Substances 0.000 description 16
- 230000029058 respiratory gaseous exchange Effects 0.000 description 11
- 238000001914 filtration Methods 0.000 description 9
- 238000007789 sealing Methods 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 6
- 238000004891 communication Methods 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004887 air purification Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Landscapes
- Packages (AREA)
- Packaging Frangible Articles (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
1 ブレスフィルタ
2 半導体ウェハ収納容器
4 シート状濾材
7 円筒状フィルタ
9 外枠
11 固定リング
19 装入凹溝
19a シール樹脂
22 装入逆凹溝
22a シール樹脂
33 環状の通気空間
Claims (1)
- 半導体ウェハ収納容器に1個または複数個設置されるブレスフィルタであって、該ブレスフィルタは、シート状濾材を波形状に折曲して形成された円筒状フィルタの一方側端縁部を外枠の装入凹溝に装入してシール樹脂を充填して密に固定し、更に、前記円筒状フィルタの他方側端縁部を、蓋部材の装入逆凹溝に装入してシール樹脂を充填して密に固定する一方、前記円筒状フィルタと外枠間に、環状の通気空間を備えて形成され、且つ該ブレスフィルタは、固定リングにより半導体ウェハ収納容器に通気可能に密に連結固定することを特徴とする半導体ウェハ収納容器用ブレスフィルタ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004222963A JP4473670B2 (ja) | 2004-07-30 | 2004-07-30 | 半導体ウェハ収納容器用ブレスフィルタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004222963A JP4473670B2 (ja) | 2004-07-30 | 2004-07-30 | 半導体ウェハ収納容器用ブレスフィルタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006035180A JP2006035180A (ja) | 2006-02-09 |
JP4473670B2 true JP4473670B2 (ja) | 2010-06-02 |
Family
ID=35900738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004222963A Expired - Fee Related JP4473670B2 (ja) | 2004-07-30 | 2004-07-30 | 半導体ウェハ収納容器用ブレスフィルタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4473670B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007227619A (ja) * | 2006-02-23 | 2007-09-06 | Kondo Kogyo Kk | 半導体ウエハ収納容器内へのドライエアまたは窒素ガス充填装置並びに該装置を用いたウエハ静電除去装置 |
WO2016145338A1 (en) * | 2015-03-11 | 2016-09-15 | Entegris, Inc. | Wafer carrier with replaceable getters |
TWI655025B (zh) * | 2018-01-24 | 2019-04-01 | 淳靖股份有限公司 | 濾芯框、濾芯及濾芯的上膠方法 |
CN112216635A (zh) * | 2020-10-22 | 2021-01-12 | 常永青 | 一种用于芯片晶圆的智能储存装置 |
CN116280713B (zh) * | 2022-12-05 | 2023-12-01 | 江苏晨达半导体科技有限公司 | 半导体通风存放设备 |
-
2004
- 2004-07-30 JP JP2004222963A patent/JP4473670B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2006035180A (ja) | 2006-02-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7108004B2 (ja) | 基板収納容器の弁アセンブリ | |
JP4558594B2 (ja) | シャッター付きブレスフィルター装置および該装置に使用するシャッター押上げロッド並びにシャッター押上げロッド付きノズル | |
JP5213440B2 (ja) | 基板容器及び基板容器用の作動サブアッセンブリ | |
JP4204302B2 (ja) | 収納容器 | |
JP2007005599A5 (ja) | ||
TW201625347A (zh) | 氣體淨化用過濾器 | |
JP4895222B2 (ja) | 基板収納容器 | |
JP2005311361A (ja) | 制御雰囲気下で基板を輸送するための装置 | |
JP2009277687A (ja) | バルブ機構及び基板収納容器 | |
JP4473670B2 (ja) | 半導体ウェハ収納容器用ブレスフィルタ | |
TW200540922A (en) | Air-purifying equipment in a semiconductor wafer container | |
JP4417781B2 (ja) | 半導体ウェハ収納容器内空気清浄装置 | |
JP2004116987A (ja) | 空気清浄装置及び処理装置 | |
KR20070105461A (ko) | 케미컬 필터 및 이를 포함하는 공기정화장치 | |
TW563175B (en) | Semiconductor manufacturing apparatus of minienvironment system | |
JP2007317909A (ja) | シャッター付きブレスフィルター装置 | |
JP4123824B2 (ja) | ウエハポッドの清浄化システム、ウエハポッド | |
JP3519513B2 (ja) | 装置本体部取付け型空調装置 | |
CN1968872A (zh) | 具有流体密封流路的基板容器 | |
JP2002176097A (ja) | 基板搬送容器およびその使用方法 | |
JP2006292251A (ja) | 換気装置 | |
JP2006288938A (ja) | 化学フィルター及び化学フィルターを有するファンフィルターユニット | |
JP7190291B2 (ja) | フィルタユニット、液処理システム及び液処理方法 | |
JP3372125B2 (ja) | エアコンプレッサ・エア用ラインフィルタの構造 | |
WO2004023046A1 (ja) | 半導体処理システム用の気体清浄化装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070406 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080919 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100223 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100305 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130312 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4473670 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140312 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |