JP3868671B2 - Metal foil powder and its production method - Google Patents
Metal foil powder and its production method Download PDFInfo
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- JP3868671B2 JP3868671B2 JP20237399A JP20237399A JP3868671B2 JP 3868671 B2 JP3868671 B2 JP 3868671B2 JP 20237399 A JP20237399 A JP 20237399A JP 20237399 A JP20237399 A JP 20237399A JP 3868671 B2 JP3868671 B2 JP 3868671B2
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Description
【0001】
【発明の属する技術分野】
本発明は、少なくとも金属薄膜層と透明無機薄膜塗布層との積層体の破砕非定型偏平片である金属箔粉に関するものであり、該金属箔粉を使用した、インク、塗料などによって対象物に表出された印字や描画に金属光沢等を付与し得る金属箔粉とその製法に関する。
【0002】
【従来の技術】
金属箔粉として、▲1▼古くから知られている貴金属等の微粉、即ち展延により得られた展延箔の破砕片、▲2▼近年の蒸着時の凝集微細片、また▲3▼金属箔の破砕片である金属箔粉、▲4▼特公平5−77643号公報に記載のフイルム上の蒸着金属からの裁断グリッター、また▲5▼特公昭53−35135号公報に記載の片面または両面が樹脂で被覆された金属蒸着箔の破砕小片である金属粉等が知られている。
【0003】
【発明が解決しようとする課題】
前記従来の金属箔または金属粉は、▲1▼古くから知られている貴金属等の微粉、即ち展延により得られた展延箔の破砕片は、その貴金属の耐腐食性、美麗さ、微細であることから多用されてはいるが、その製法から高コストであり、大量に生産できない、比重が大きすぎて分散媒体中で沈殿しやすいなどの課題を有している。
▲2▼近年の蒸着時の凝集微細片は、その微細さにおいて魅力のあるものだが、高コスト、微細過ぎて、金属光輝性の美麗さを得にくい、取り扱いにも難点を有しているなどの課題を有している。
【0004】
▲3▼金属箔の破砕片である金属箔粉は、比較的低コストで入手でき、光輝性においてもある程度の性能を有しており多用されているが、その大きさが数十μm〜数百μmのものがほとんどであり、塗布面の平滑さや高光輝性を、より要求される場合には対応し得ない等の課題位を有している。
▲4▼特公平5−77643号公報に記載のフイルム上の蒸着金属からの裁断グリッターは、特定の用途においてはその低コストから使用されるが、大きさはmmの大きさであり、用途が限定される。
▲5▼特公昭53−35135号公報に記載の片面または両面が樹脂で被覆された金属蒸着箔の破砕小片である金属粉は、その大きさ、比較的低コストから、その高い光輝性により多用されているが、樹脂で被覆されているため、耐熱性において限界がある。
本発明は、前記従来の金属箔粉の抱える課題を解決せんとするものであり、厚さが3μm以下で、大きさも数μm〜数十μm程度の、光輝性に優れ、耐熱性に優れた箔粉を提供せんとするものである。
【0005】
【課題を解決するための手段】
すなわち本発明は、少なくとも▲1▼厚さが0.01μm〜0.2μmの金属薄膜層と、▲2▼厚さが0.05μm〜2.0μmの透明無機薄膜塗布層とを有する積層体の破砕非定型偏平片であることを特徴とする金属箔粉であり、金属薄膜層がアルミニウム、銀、金、ニッケル、クロム、錫、亜鉛、インジウム、チタン、の単体金属又はこれらの合金およびそれらの混合物の少なくとも一種である前記の金属箔粉であり、破砕非定型偏平片の最大厚さが3μm以下である前記の金属箔粉であり、透明無機薄膜塗布層がケイ素−酸素結合含有塗布層である前記の金属箔粉であり、さらに、離型性フイルムに、少なくとも、▲1▼厚さが0.01μm〜0.2μmの金属薄膜層と、▲2▼厚さが0.05μm〜2.0μmの透明無機薄膜塗布層とを形成したフイルム上の積層体を得て、離型性フイルムを剥離し、離型性フイルム以外の積層体を、粉砕する工程を少なくとも含むことを特徴とする金属箔粉の製法であります。
【0006】
【発明の実施の形態】
本発明における、厚さが0.01μm〜0.2μmの金属薄膜層とは、金属としては、金属光沢を有する等の機能を有するものであれば特に限定されるものではないが、アルミニウム、銀、金、ニッケル、クロム、錫、亜鉛、インジウム等が使用され、これらの単体金属又はこれらの合金および単体窒化物又はそれら混合物の少なくとも一種が使用される。また、前記例示のものの中から一種または二種以上を適宜選定し一層または二層以上にして使用すればよい。これらの金属薄膜層の厚さは、0.01μm〜0.2μmの範囲が好ましく、0.01μmに満たないときは、光輝性においてまた機能性においてその性能は乏しく、0.2μmを超えるときは、これ以上厚さを大きくしても反射性、光輝性等の増大に影響が少ない上に経済的にも得策ではない。
【0007】
本発明において、上記金属薄膜層を含む積層体の非定型偏平片を得るためには、例えば離型性フイルムに透明無機薄膜塗布層を形成し、該透明無機薄膜塗布層上に金属薄膜層を形成し、離型性フイルムを剥離し、少なくとも金属薄膜層と透明無機薄膜塗布層とを有する積層体(複合膜)を粉砕する製法が好ましく採用される。
金属薄膜層の剥離性フイルム上の透明無機薄膜塗布層上への形成は、その方法において特に限定されるものではなく、蒸着、スパッタリング、イオンプレーテイングなど乾式薄膜形成法が好ましい。この金属薄膜層形成後、該層上に、必要に応じてさらに前記の透明無機薄膜塗布層を形成してもよく、また他の樹脂性保護層を形成してもよい。
この金属薄膜層の剥離性フイルム上(又は透明無機薄膜塗布層上)への形成は目的とする金属薄膜層を一層設けてもよく、二層以上設けてもよく、二層以上設けるに際しては、層間に水性樹脂層等を介在させてもよく、介在なしに直接層を積層してもよい。この多層形成の場合においては、剥離性フイルムからの剥離が容易となり好適となる場合が多い。
【0008】
剥離性フイルム上に形成され剥離性フイルムを剥離した、積層体として得られた非定型偏平片を粉砕して本発明の非定型偏平片を得るが、粉砕方法としては、特に限定されないが、ジェットミル、ボールミル、リングロールミル、ハンマーミル、チューブミル等が挙げられる。この粉砕を水中で行ってもよくその際、アルコール等の粘度調節材、乾燥促進材、沈降安定剤、界面活性剤等を同時に使用して粉砕してもよい。さらに特に粉砕を積極的に実施しなくても、剥離性フイルムから剥離することだけで、積層体が微細な非定型偏平片となる場合もある。
【0009】
本発明における厚さが0.05μm〜2.0μmの透明無機薄膜塗布層は、剥離性フイルム上に形成されるか、形成された金属薄膜層上に形成されるもので、金属薄膜層の耐汚染性等の保護、剥離性フイルムからの金属薄膜層の剥離性向上等の目的に必要なものであり、その厚さは0.05μm〜2.0μmが好ましく、0.05μmに満たないときはその保護、剥離性向上に充分でなく、2.0μmを超えるときは、その効果の更なる向上は見られず経済的にも得策でなく、塗料等に使用されたときの金属箔粉として厚くなりすぎ平滑な塗装面が得られなくなる場合が多い。
厚さが0.05μm〜2.0μmの透明無機薄膜塗布層の材料としては、ケイ素−酸素結合含有無機物を形成するケイ素アルコキシド、チタンアルコキシド、ジルコニウムアルコキシド、等の金属アルコキシド、水ガラス、ポリシラザン、ポリフォスファゼン等、触媒作用、加熱、紫外線照射などによって透明無機薄膜層を形成するものであれば特に限定されないが、塗布後、透明無機薄膜層としての透明性、金属薄膜層の保護性から、ケイ素−酸素結合含有無機物を形成するもの、アルミニウム−酸素結合含有無機物を形成するもの、ジルコニウム−酸素結合含有無機物を形成するもの、チタン−酸素結合含有無機物を形成するものが好ましい。これらの透明無機薄膜層を形成するアルコキシドなどを水やアルコールに溶解または分散して塗布し、触媒作用、加熱、紫外線照射などによって透明無機薄膜層を形成する際、金属酸化物の微細粉体、例えばシリカ、酸化チタン、酸化アルミニウム、酸化ジルコニウム、酸化錫、酸化インジウム、酸化マグネシウムを添加含有せしめてもよく、これらの金属−酸素結合を形成するアルコキシド等と金属酸化物の微細粉体との金属が同一でもよく異種でもよく、また2種以上の金属から選ばれたものであってもよい。
さらに、透明無機薄膜層を形成するアルコキシドなどを水やアルコールに溶解または分散して塗布し、触媒作用、加熱、紫外線照射などによって透明無機薄膜層を形成する際に、本発明の目的、即ち透明性、耐熱性、剥離性を損なわない限りにおいて、有機ポリマーなどのバインダー、色素や染料、レベリング剤、等を含有せしめてもよく、かかる色素や染料などを該透明無機薄膜層に含有せしめることは蒸着などの乾式製膜法においては困難であり、塗布によって初めて達成でき、金属光輝性への耐熱性種々色相の付与が可能となる。
【0010】
本発明において、適宜使用される水性樹脂は、非定型偏平片が媒体に分散される時に分散剤としてまた沈降を防ぐ安定剤としても作用する。水性樹脂としては製膜性があり、かつ水溶解性、ないしは易水分散性のものが好ましく、エチレン・ビニルアルコール共重合体、酢酸ビニル部分加水分解物、ポリビニルアルコール、ポリエチレングリコール等のエチレンオキサイド付加物、アラビヤゴム、CMC(カルボキシメチルセルローズ)等のセルローズ誘導体等が挙げられるが、なかでもポリエチレングリコール等のエチレンオキサイド付加物が好ましく使用できる。該樹脂層の厚さは、0.3−2μm程度のものが好ましい。
【0011】
本発明で使用される離型性フイルムとしては、ポリテトラフルオロエチレン、ポリエチレン、ポリプロピレン、ポリエチレンテレフタレート,ポリエチレンナフタレート等のポリエステルフイルム、66ナイロン、6ナイロン等のポリアミドフイルム、ポリカーボネートフイルム、トリアセテートフイルム、ポリイミドフイルム等が挙げられるが特に限定されるものではない。
これらのフイルムの厚さは4μmから40μmであり、4μmに満たないものは、工程等で取り扱い性に問題が多く、40μmを超えると、柔軟性に乏しくなり、剥離等に問題が多くなる。
本発明においては、▲1▼厚さが0.01μm〜0.2μmの金属薄膜層と、▲2▼厚さが0.05μm〜2.0μmの透明無機薄膜塗布層とを有する積層体の破砕非定型偏平片である金属箔粉であるが、該金属箔粉の厚さが3μm以下の金属薄膜層と透明無機薄膜塗布層との積層体の非定型偏平片がより好ましく、更に好ましくは2μm以下である。
【0012】
【実施例】
**実施例1
厚さ20ミクロンの未延伸ポリプロピレンフイルムに、粒子径10nmのシリカを30%(重量、以下同)含むイソプロピルアルコール主体のオルガノゾルを塗布し乾燥し、ポストキュアして厚さ0.8μmのシリカ層の透明無機薄膜塗布層を形成した。該シリカ層上に、真空蒸着機においてクロムを0.04μmの厚さになるように、金属薄膜層として蒸着形成した。得られたこのクロム金属薄膜層上に、トップコート層としてオルガノゾルを塗布し乾燥し、ポストキュアして厚さ0.3μmのシリカ層の透明無機薄膜塗布層を形成した。
こうして得た特殊光輝性の積層体を、透明無機薄膜塗布層・クロム金属薄膜層・トップコート層からなる積層体のみをフイルムから剥離し集積した。得られた積層体を水中で粉砕し厚さ1.2μmの特殊光輝性の美麗な非定型偏平片を得た。
【0013】
**実施例2
厚さ20ミクロンの未延伸ポリプロピレンフイルムに、珪酸ナトリウムを0.1%ポリビニルアルコール溶解水に5%濃度に溶かした液をグラビヤ方式で塗布・乾燥し、3%硝酸液にて処理し、乾燥して厚さ1.0μmの透明無機薄膜塗布層を形成した。該透明無機薄膜塗布層上に、真空蒸着機においてアルミニウムを0.05μmの厚さになるように、金属薄膜層として蒸着形成した。得られたこのアルミニウム金属薄膜層上に、トップコート層として前記の透明無機薄膜塗布層を同様にして0.5μmの厚さに形成した。
こうして得たフイルム上の積層体を、透明無機薄膜塗布層・クロム金属薄膜層・トップコート層からなる積層体をフイルムから剥離し集積した。
得られた積層体を粉砕し、篩い分け、アルミニウム金属薄膜層の最長片長さで12.0μm、厚さ1.5μmの特殊光輝性の美麗な非定型偏平片を得た。
【0014】
【発明の効果】
本発明により、極めて薄い金属薄膜層を有し、しかも無機透明保護層を有した非定型偏平片は、その優れた隠蔽力により、少量で金属光沢を印字や描画に付与し得る耐熱性が優れた、極めて塗装面の平滑性に優れた塗料等が得られる。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a metal foil powder that is a crushed atypical flat piece of a laminate of at least a metal thin film layer and a transparent inorganic thin film coating layer, and the object is applied to an object by ink, paint, etc. using the metal foil powder. The present invention relates to a metal foil powder capable of imparting a metallic luster or the like to an exposed print or drawing and a method for producing the same.
[0002]
[Prior art]
As metal foil powders, (1) fine powders of precious metals, etc. that have been known for a long time, that is, crushed pieces of spread foil obtained by spreading, (2) agglomerated fine pieces during recent deposition, and (3) metal Metal foil powder that is a crushed piece of foil, (4) Cutting glitter from deposited metal on a film described in JP-B-5-77743, and (5) Single-sided or double-sided described in JP-B-53-35135 A metal powder or the like, which is a crushed piece of a metal-deposited foil coated with a resin, is known.
[0003]
[Problems to be solved by the invention]
The conventional metal foil or metal powder is as follows: (1) fine powder of precious metal, etc. that has been known for a long time, that is, the crushed pieces of the spread foil obtained by spreading are the corrosion resistance, beauty and fineness of the precious metal. Therefore, it is frequently used, but it is expensive due to its production method, cannot be produced in large quantities, and has a specific gravity that is too large to easily precipitate in a dispersion medium.
(2) Agglomerated fine pieces at the time of vapor deposition are attractive in their fineness, but they are expensive, too fine, difficult to obtain the beauty of metallic radiance, and have difficulty in handling, etc. Have the following issues.
[0004]
(3) Metal foil powder, which is a crushed piece of metal foil, is available at a relatively low cost and has a certain level of performance in terms of brightness, but its size is several tens of μm to several Most of them have a thickness of 100 μm, and have problems such as being unable to cope with the smoothness and high glossiness of the coated surface when more demanded.
(4) The cutting glitter from the deposited metal on the film described in Japanese Patent Publication No. 5-77643 is used because of its low cost in a specific application, but the size is a size of mm. Limited.
(5) Metal powder, which is a crushed piece of metal-deposited foil coated with resin on one or both sides as described in JP-B-53-35135, is widely used because of its high brightness due to its size and relatively low cost. However, since it is coated with a resin, there is a limit in heat resistance.
The present invention is intended to solve the problems of the conventional metal foil powder, having a thickness of 3 μm or less, a size of about several μm to several tens of μm, excellent glitter, and excellent heat resistance. It is intended to provide foil powder.
[0005]
[Means for Solving the Problems]
That is, the present invention provides a laminate comprising at least (1) a metal thin film layer having a thickness of 0.01 μm to 0.2 μm and (2) a transparent inorganic thin film coating layer having a thickness of 0.05 μm to 2.0 μm. It is a metal foil powder characterized in that it is a crushed atypical flat piece, and the metal thin film layer is a single metal of aluminum, silver, gold, nickel, chromium, tin, zinc, indium, titanium, or an alloy thereof and their alloys The metal foil powder that is at least one kind of the mixture, the metal foil powder that has a maximum thickness of crushed atypical flat pieces of 3 μm or less, and the transparent inorganic thin film coating layer is a silicon-oxygen bond-containing coating layer The metal foil powder is further provided with a release film having at least (1) a metal thin film layer having a thickness of 0.01 μm to 0.2 μm and (2) a thickness of 0.05 μm to 2. Formed with 0 μm transparent inorganic thin film coating layer To obtain a laminate on the film, peeling off the releasing property film, a laminate of non-releasability film, there in preparation of the metal foil powder which comprises at least a step of pulverizing.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
In the present invention, the metal thin film layer having a thickness of 0.01 μm to 0.2 μm is not particularly limited as long as the metal has a function such as having a metallic luster, but aluminum, silver Gold, nickel, chromium, tin, zinc, indium, etc. are used, and at least one of these simple metals or alloys thereof and simple nitrides or mixtures thereof is used. In addition, one or two or more types may be appropriately selected from the above examples, and one layer or two or more layers may be used. The thickness of these metal thin film layers is preferably in the range of 0.01 μm to 0.2 μm. When the thickness is less than 0.01 μm, the performance is poor in brightness and functionality, and when it exceeds 0.2 μm Even if the thickness is increased further, there is little influence on the increase in reflectivity, glitter, etc., and it is not economically advantageous.
[0007]
In the present invention, in order to obtain an atypical flat piece of a laminate including the metal thin film layer, for example, a transparent inorganic thin film coating layer is formed on a releasable film, and the metal thin film layer is formed on the transparent inorganic thin film coating layer. A production method is preferably employed in which the formed film is peeled off and the laminate (composite film) having at least the metal thin film layer and the transparent inorganic thin film coating layer is pulverized.
The formation of the metal thin film layer on the peelable film on the transparent inorganic thin film coating layer is not particularly limited in the method, and dry thin film forming methods such as vapor deposition, sputtering, and ion plating are preferable. After the formation of the metal thin film layer, the transparent inorganic thin film coating layer may be further formed on the layer as required, or another resinous protective layer may be formed.
The formation of the metal thin film layer on the peelable film (or the transparent inorganic thin film coating layer) may be provided with a single metal thin film layer, two or more layers, and two or more layers. An aqueous resin layer or the like may be interposed between the layers, or the layers may be laminated directly without interposition. In the case of this multilayer formation, peeling from the peelable film is easy and often suitable.
[0008]
An atypical flat piece of the present invention is obtained by pulverizing an atypical flat piece obtained as a laminate, which is formed on a peelable film and from which the peelable film has been peeled, but the crushing method is not particularly limited, Examples thereof include a mill, a ball mill, a ring roll mill, a hammer mill, and a tube mill. This pulverization may be carried out in water, and at that time, it may be pulverized by simultaneously using a viscosity modifier such as alcohol, a drying accelerator, a sedimentation stabilizer, a surfactant and the like. Furthermore, even if the pulverization is not actively carried out, the laminate may become a fine atypical flat piece simply by peeling from the peelable film.
[0009]
The transparent inorganic thin film coating layer having a thickness of 0.05 μm to 2.0 μm in the present invention is formed on the peelable film or formed on the formed metal thin film layer. It is necessary for the purpose of protecting the contamination and improving the peelability of the metal thin film layer from the peelable film. The thickness is preferably 0.05 μm to 2.0 μm, and less than 0.05 μm. When it exceeds 2.0 μm, it is not sufficient for its protection and releasability improvement, and further improvement of its effect is not seen and it is not economically advantageous, and it is thick as a metal foil powder when used in paints etc. In many cases, it becomes too smooth to obtain a smooth painted surface.
Materials for the transparent inorganic thin film coating layer having a thickness of 0.05 μm to 2.0 μm include silicon alkoxide, titanium alkoxide, zirconium alkoxide, and other metal alkoxides that form silicon-oxygen bond-containing inorganic substances, water glass, polysilazane, polyphosphorus. It is not particularly limited as long as it forms a transparent inorganic thin film layer by sphazene, catalysis, heating, ultraviolet irradiation, etc., but after coating, silicon as a transparent inorganic thin film layer and a protective property of the metal thin film layer -What forms an oxygen bond containing inorganic substance, What forms an aluminum- oxygen bond containing inorganic substance, What forms a zirconium- oxygen bond containing inorganic substance, What forms a titanium- oxygen bond containing inorganic substance is preferable. When the transparent inorganic thin film layer is formed by applying an alkoxide or the like forming the transparent inorganic thin film layer dissolved or dispersed in water or alcohol, and forming the transparent inorganic thin film layer by catalytic action, heating, ultraviolet irradiation, etc., For example, silica, titanium oxide, aluminum oxide, zirconium oxide, tin oxide, indium oxide, magnesium oxide may be added, and the metal of these metal-oxygen bond alkoxides and the metal oxide fine powder May be the same or different, and may be selected from two or more metals.
Furthermore, when the transparent inorganic thin film layer is formed by applying an alkoxide or the like that forms the transparent inorganic thin film layer dissolved or dispersed in water or alcohol and forming the transparent inorganic thin film layer by catalytic action, heating, ultraviolet irradiation, or the like, As long as the properties, heat resistance, and peelability are not impaired, binders such as organic polymers, pigments and dyes, leveling agents, etc. may be included, and such pigments and dyes may be included in the transparent inorganic thin film layer. It is difficult in a dry film-forming method such as vapor deposition, and can be achieved only by coating, and it is possible to impart various heat resistant colors to the metallic glitter.
[0010]
In the present invention, the water-based resin used as appropriate acts as a dispersant when the atypical flat piece is dispersed in the medium and also as a stabilizer that prevents sedimentation. The water-based resin preferably has a film-forming property and is water-soluble or easily water-dispersible. Addition of ethylene oxide such as ethylene / vinyl alcohol copolymer, vinyl acetate partial hydrolyzate, polyvinyl alcohol, polyethylene glycol, etc. Products, arabic rubber, cellulose derivatives such as CMC (carboxymethylcellulose), and the like. Among these, ethylene oxide adducts such as polyethylene glycol are preferably used. The thickness of the resin layer is preferably about 0.3-2 μm.
[0011]
Examples of the releasable film used in the present invention include polyester films such as polytetrafluoroethylene, polyethylene, polypropylene, polyethylene terephthalate and polyethylene naphthalate, polyamide films such as 66 nylon and 6 nylon, polycarbonate films, triacetate films, and polyimides. Although a film etc. are mentioned, it is not specifically limited.
The thickness of these films is 4 μm to 40 μm. If the thickness is less than 4 μm, there are many problems in handling in the process and the like, and if it exceeds 40 μm, the flexibility becomes poor and the problems in peeling and the like increase.
In the present invention, (1) crushing of a laminate having a metal thin film layer having a thickness of 0.01 μm to 0.2 μm and (2) a transparent inorganic thin film coating layer having a thickness of 0.05 μm to 2.0 μm. Although it is a metal foil powder which is an atypical flat piece, the atypical flat piece of the laminated body of the metal thin film layer whose thickness is 3 micrometers or less and a transparent inorganic thin film application layer is more preferable, More preferably, it is 2 micrometers. It is as follows.
[0012]
【Example】
** Example 1
An unstretched polypropylene film with a thickness of 20 microns was coated with an isopropyl alcohol-based organosol containing 30% silica (weight: 10%) and dried, post-cured, and a silica layer with a thickness of 0.8 μm was formed. A transparent inorganic thin film coating layer was formed. On the silica layer, chromium was vapor-deposited as a metal thin film layer so as to have a thickness of 0.04 μm in a vacuum vapor deposition machine. On the obtained chromium metal thin film layer, an organosol was applied as a top coat layer, dried, and post-cured to form a transparent inorganic thin film coating layer of a silica layer having a thickness of 0.3 μm.
Only the laminate composed of the transparent inorganic thin film coating layer, the chromium metal thin film layer, and the top coat layer was peeled off from the film and accumulated in the special glitter laminate thus obtained. The obtained laminate was pulverized in water to obtain a beautiful non-standard flat piece having a special brightness of 1.2 μm.
[0013]
** Example 2
A 20-micron-thick unstretched polypropylene film, a solution of sodium silicate dissolved in 0.1% polyvinyl alcohol-dissolved water at a concentration of 5%, is applied and dried by gravure method, treated with 3% nitric acid solution, and dried. Thus, a transparent inorganic thin film coating layer having a thickness of 1.0 μm was formed. On the transparent inorganic thin film coating layer, aluminum was vapor-deposited as a metal thin film layer so as to have a thickness of 0.05 μm in a vacuum vapor deposition machine. On the obtained aluminum metal thin film layer, the transparent inorganic thin film coating layer was similarly formed as a top coat layer to a thickness of 0.5 μm.
The laminate on the film thus obtained was peeled and accumulated from the film, and the laminate comprising the transparent inorganic thin film coating layer, the chromium metal thin film layer, and the top coat layer was peeled off.
The obtained laminate was pulverized and sieved to obtain a beautiful atypical flat piece having a special glitter with a longest piece length of the aluminum metal thin film layer of 12.0 μm and a thickness of 1.5 μm.
[0014]
【The invention's effect】
According to the present invention, an atypical flat piece having an extremely thin metal thin film layer and having an inorganic transparent protective layer has excellent heat resistance capable of imparting a metallic luster to printing or drawing with a small amount due to its excellent hiding power. In addition, it is possible to obtain a paint having an extremely excellent smoothness on the painted surface.
Claims (4)
前記積層体を前記離型性フィルムから剥離する第2工程と、
前記第2工程において剥離された前記積層体を粉砕して非定型偏平片を得る第3工程と、
よりなり、
前記第1工程が、
厚さが0.05μm以上2.0μm以下の透明無機薄膜塗布層を前記離型性フィルムの表面に積層する工程と、
前記透明無機薄膜塗布層積層後、その表面に、乾式薄膜形成法によって、厚さが0.01μm以上0.2μm以下の金属薄膜層を積層する工程と、
よりなるものであり、
前記離型性フィルムが、ポリエステルフィルム、ポリアミドフィルム、ポリカーボネートフィルム、トリアセテートフィルム、ポリイミドフィルム、のいずれかであり、かつその厚みが4μm以上40μm以下であり、
前記透明無機薄膜塗布層が、珪素アルコキシド、金属アルコキシド、水ガラス、ポリシラザン、ポリフォスファゼン、のいずれかによるものであり、かつその厚さが0.05μm以上2.0μm以下であり、
前記非定型偏平片の最大厚さが3.0μm以下であること、
を特徴とする、金属箔粉の製造方法。A first step in which a laminate in which at least a transparent inorganic thin film coating layer and a metal thin film layer are laminated in this order is laminated on the surface of the release film;
A second step of peeling the laminate from the release film;
A third step of crushing the laminate peeled in the second step to obtain an atypical flat piece;
More
The first step includes
Laminating a transparent inorganic thin film coating layer having a thickness of 0.05 μm or more and 2.0 μm or less on the surface of the releasable film;
After the transparent inorganic thin film coating layer is laminated, a step of laminating a metal thin film layer having a thickness of 0.01 μm or more and 0.2 μm or less on the surface by a dry thin film forming method;
It consists of
The releasable film is any one of a polyester film, a polyamide film, a polycarbonate film, a triacetate film, and a polyimide film, and the thickness is 4 μm or more and 40 μm or less,
The transparent inorganic thin film coating layer is made of any of silicon alkoxide, metal alkoxide, water glass, polysilazane, and polyphosphazene, and has a thickness of 0.05 μm or more and 2.0 μm or less,
The maximum thickness of the atypical flat piece is 3.0 μm or less;
A method for producing a metal foil powder.
前記金属薄膜層が、アルミニウム、銀、金、ニッケル、クロム、錫、亜鉛、インジウム、チタンの一群より選ばれる、いずれかの単体、又は複数を選択して組合わせることにより得られる合金、又はいずれかの単体による窒化物、又はそれらの混合物、のいずれかによるものであり、かつその厚さが0.05μm以上0.2μm以下であること、
を特徴とする、金属箔粉の製造方法。In the manufacturing method of the metal foil powder of Claim 1,
The metal thin film layer is selected from the group consisting of aluminum, silver, gold, nickel, chromium, tin, zinc, indium, and titanium, any single element, or an alloy obtained by selecting and combining a plurality, The nitride of any of these, or a mixture thereof, and the thickness is 0.05 μm or more and 0.2 μm or less,
A method for producing a metal foil powder.
前記第1工程において、前記透明無機薄膜塗布層の表面に前記金属薄膜層を積層した後に、さらに前記透明無機薄膜塗布層と同一の成分、又は異なる成分による透明無機薄膜塗布層を前記金属薄膜層の表面に積層してなること、
を特徴とする、金属箔粉の製造方法。In the manufacturing method of the metal foil powder of Claim 1 or Claim 2,
In the first step, after the metal thin film layer is laminated on the surface of the transparent inorganic thin film coating layer, a transparent inorganic thin film coating layer having the same or different component as the transparent inorganic thin film coating layer is further formed on the metal thin film layer. Layered on the surface of
A method for producing a metal foil powder.
を特徴とする、金属箔粉。Obtained by the method for producing a metal foil powder according to any one of claims 1 to 3,
Metal foil powder characterized by
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JP4507528B2 (en) * | 2003-08-21 | 2010-07-21 | セイコーエプソン株式会社 | Compound pigment base and compound pigment |
US7303619B2 (en) | 2003-08-21 | 2007-12-04 | Seiko Epson Corporation | Composite pigment original, composite pigment, process for producing ink composition, and ink composition |
JP4507529B2 (en) * | 2003-08-21 | 2010-07-21 | セイコーエプソン株式会社 | Compound pigment base and compound pigment |
JP4613362B2 (en) * | 2005-01-31 | 2011-01-19 | Dowaエレクトロニクス株式会社 | Metal powder for conductive paste and conductive paste |
EP2530128A2 (en) | 2006-12-19 | 2012-12-05 | Seiko Epson Corporation | Pigment dispersion, ink compostion, inkset, and recording device |
EP2332676A1 (en) | 2006-12-19 | 2011-06-15 | Seiko Epson Corporation | Inkjet recording method and recorded matter |
KR20100024295A (en) * | 2008-08-25 | 2010-03-05 | 주식회사 잉크테크 | Preparation method of metal flake |
JP2011132483A (en) | 2009-04-07 | 2011-07-07 | Seiko Epson Corp | Water-resistant aluminum pigment dispersion, aqueous ink composition containing the same, and method for producing water-resistant aluminum pigment dispersion |
JP2010241976A (en) | 2009-04-07 | 2010-10-28 | Seiko Epson Corp | Method for producing water-repellent treated aluminum pigment dispersion, water-repellent treated aluminum pigment, and aqueous ink composition containing the same |
JP2011032313A (en) * | 2009-07-30 | 2011-02-17 | Reiko Co Ltd | Heat-resistant glitter and bright resin pellet obtained by use of the same |
JP2015098522A (en) * | 2013-11-19 | 2015-05-28 | 株式会社ロンビック | Bright resin molded body |
US10131790B2 (en) | 2014-07-10 | 2018-11-20 | Nippon Paint Holdings Co., Ltd. | Infrared-reflective pigment and infrared-reflective coating composition |
CN110802961A (en) * | 2019-11-12 | 2020-02-18 | 苏州美盈森环保科技有限公司 | Mirror-surface-imitated printing method |
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