JP3354878B2 - Residual chlorine concentration measurement device - Google Patents
Residual chlorine concentration measurement deviceInfo
- Publication number
- JP3354878B2 JP3354878B2 JP25758098A JP25758098A JP3354878B2 JP 3354878 B2 JP3354878 B2 JP 3354878B2 JP 25758098 A JP25758098 A JP 25758098A JP 25758098 A JP25758098 A JP 25758098A JP 3354878 B2 JP3354878 B2 JP 3354878B2
- Authority
- JP
- Japan
- Prior art keywords
- residual chlorine
- concentration
- water
- chlorine concentration
- positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、浴場、プール、浄
水場、その他の貯水槽に貯水され、或いは貯水されるこ
となく使用される水、湯或いはその他の水溶液に含まれ
る残留塩素の濃度を測定するための残留塩素濃度測定装
置に関する。The present invention relates to a method for measuring the concentration of residual chlorine contained in water, hot water or other aqueous solutions that are stored in a bath, a pool, a water purification plant, or other water storage tanks or used without being stored. The present invention relates to a residual chlorine concentration measuring device for measuring.
【０００２】[0002]
【従来の技術】例えばプールにおいては、病原菌等の繁
殖を防止するために、塩素を適当に投入する等して殺菌
処理が行われている。また最近においては、業務用の比
較的大きな浴槽設備等においても、多数の人が使用する
ことから、浴槽水に雑菌が繁殖しないように塩素処理を
施すことが行われつつある。そして上記プールや浴槽等
においては、雑菌の繁殖に対して残留塩素が経時的に消
費されてゆくことから、水や温水の残留塩素濃度が一定
濃度を下回って消毒・滅菌効果が損なわれないようにす
るため、また一方で、必要以上に濃い残留塩素濃度とな
って好ましくない影響を及ぼさないようにするために、
上記水や湯の残留塩素の濃度を、適当な時間タイミング
で検出する等してチェックし、残留塩素が不足している
場合には次亜塩素酸ナトリウム等による塩素分の補給を
行い、また残留塩素濃度が過多とならないようにして、
浴場やプールを衛生的に且つ健全なものに保持できるよ
うにした滅菌システムが採用される傾向が高まってい
る。2. Description of the Related Art In a pool, for example, in order to prevent propagation of pathogenic bacteria and the like, sterilization treatment is performed by, for example, appropriately feeding chlorine. In recent years, even in relatively large bathtub facilities for business use, since many people use the bathtub, chlorination is being carried out so that various bacteria do not propagate in the bathtub water. In the above-mentioned pools and bathtubs, since residual chlorine is consumed over time for the propagation of various bacteria, the residual chlorine concentration of water or hot water does not fall below a certain concentration, so that the disinfecting / sterilizing effect is not impaired. And, on the other hand, in order to prevent undesired effects due to unnecessarily high residual chlorine concentration,
Check the concentration of residual chlorine in the water or hot water by detecting it at an appropriate time, etc., and if the residual chlorine is insufficient, replenish the chlorine content with sodium hypochlorite, etc. So that the chlorine concentration is not too high,
There is an increasing tendency to employ sterilization systems that allow baths and pools to be kept sanitary and healthy.
【０００３】ところで、上記塩素の投入は、例えば次亜
塩素酸ナトリウムを投入して行うが、この次亜塩素酸ナ
トリウムの投入により、水中において次亜塩素酸（ＨＣ
ｌＯ）が生じ、更にこの次亜塩素酸は次亜塩素酸イオン
（ＣｌＯ- ）と平衡する。そしてこの次亜塩素酸と次亜
塩素酸イオンとが遊離残留塩素を構成して、雑菌の殺菌
に寄与している。一方、前記浴槽やプール等を人が使用
すると、水にアンモニアやアンモニア誘導体等が存在す
ることになるが、これによって前記次亜塩素酸（次亜塩
素酸イオン）が前記アンモニアやアンモニア誘導体と反
応し、ｐＨ値に応じてモノクロラミン（ＮＨ2 Ｃｌ）、
ジクロラミン（ＮＨＣｌ2 ）、トリクロラミン（ＮＣｌ
3）を生じる。これらのモノクロラミン、ジクロラミ
ン、トリクロラミンは結合残留塩素として、やはり雑菌
の殺菌に寄与する。残留塩素は前記遊離残留塩素と結合
残留塩素とからなり、それらが残留塩素として水に繁殖
しようとする雑菌の殺菌の役割をになうのである。By the way, the above-mentioned addition of chlorine is carried out, for example, by adding sodium hypochlorite. By adding this sodium hypochlorite, hypochlorous acid (HC) is added in water.
10O), and this hypochlorous acid equilibrates with hypochlorite ion (ClO − ). The hypochlorous acid and the hypochlorite ion constitute free residual chlorine, which contributes to sterilization of various bacteria. On the other hand, when a person uses the bathtub or pool, ammonia or an ammonia derivative or the like is present in the water, whereby the hypochlorous acid (hypochlorite ion) reacts with the ammonia or ammonia derivative. And monochloramine (NH 2 Cl) according to the pH value,
Dichloramine (NHCl 2 ), Trichloramine (NCl
3 ) occurs. These monochloramine, dichloramine and trichloramine also contribute to sterilization of various bacteria as bound residual chlorine. Residual chlorine is composed of the above-mentioned free residual chlorine and combined residual chlorine, and they play a role in disinfecting various germs trying to propagate in water as residual chlorine.
【０００４】従って、水に存在する残留塩素の濃度を測
定することは、その水が雑菌の殺菌に関して好ましい状
態にあるか否かを判定するために非常に重要であり、こ
れによって不足分の補充も正確に行うことが可能とな
る。[0004] Measuring the concentration of residual chlorine present in the water is therefore very important for determining whether the water is in a favorable condition for the sterilization of various germs, thereby replenishing the deficiency. Can be performed accurately.
【０００５】[0005]
【発明が解決しようとする課題】ところが、上記残留塩
素を構成する遊離残留塩素と結合残留塩素とでは、その
殺菌能力において、遊離残留塩素の方が大きく、結合残
留塩素は前記遊離残留塩素よりも１桁程度その殺菌効果
が落ちることから、遊離残留塩素と結合残留塩素との和
としての残留塩素の濃度を単純に測定した場合において
は、同じ残留塩素濃度であっても、結合残留塩素が大半
であるような場合には、殺菌能力があまり期待できない
という問題があった。また結合残留塩素濃度の大小に左
右されて、同じ残留塩素濃度であっても殺菌能力が変動
するという問題があった。従来における残留塩素濃度の
測定においては、上記結合残留塩素濃度の大小がそのま
ま残留塩素濃度の大小に反映されたかたちで残留塩素濃
度を測定することとなっていたため、水に含まれる残留
塩素による殺菌能力の実際の程度が、結合残留塩素濃度
の程度に左右される結果、十分には把握できないものと
なっていた。However, in the free residual chlorine and the combined residual chlorine constituting the residual chlorine, the free residual chlorine is larger in the sterilizing ability, and the combined residual chlorine is larger than the free residual chlorine. Since the bactericidal effect is reduced by about one order of magnitude, when simply measuring the concentration of residual chlorine as the sum of free residual chlorine and combined residual chlorine, even if the residual chlorine concentration is the same, most of the residual chlorine is the same. In such a case, there is a problem that sterilization ability cannot be expected so much. In addition, there is a problem that the sterilizing ability fluctuates depending on the magnitude of the combined residual chlorine concentration even if the residual chlorine concentration is the same. In the conventional measurement of the residual chlorine concentration, the residual chlorine concentration was measured in such a manner that the magnitude of the combined residual chlorine concentration was directly reflected in the magnitude of the residual chlorine concentration. The actual degree of capacity was not fully understood as a result of being dependent on the degree of bound residual chlorine concentration.
【０００６】そこで、本発明は、上記従来の残留塩素濃
度測定装置における問題点を解消し、残留塩素濃度の測
定において、結合残留塩素の濃度の影響を減じ、遊離残
留塩素の濃度をより密接に反映した状態での残留塩素濃
度を測定することができ、これによってその水が保有す
る殺菌効果の程度をより正確に反映した状態での残留塩
素の濃度を測定することができる残留塩素濃度測定装置
の提供を課題としている。Therefore, the present invention solves the above-mentioned problems in the conventional residual chlorine concentration measuring apparatus, reduces the influence of the concentration of combined residual chlorine in measuring the residual chlorine concentration, and makes the concentration of free residual chlorine more closely. Residual chlorine concentration measuring device that can measure the residual chlorine concentration in the reflected state, thereby measuring the residual chlorine concentration in a state that more accurately reflects the degree of sterilization effect of the water The challenge is to provide
【０００７】[0007]
【課題を解決するための手段】上記課題を達成するた
め、本発明の残留塩素濃度測定装置は、少なくとも一対
の正負電極を有し、正負電極間に電圧を印加することで
検水を電気分解した際に流れる電流値を検出し、この電
流値から検水に含まれる残留塩素の濃度を測定する装置
であって、前記一対の正負電極間に加える印加電圧を８
８３mV以上９０３mV以下の範囲にある一定電圧に構成し
ていることを特徴としている。In order to achieve the above object, a residual chlorine concentration measuring apparatus according to the present invention has at least a pair of positive and negative electrodes, and applies a voltage between the positive and negative electrodes to electrolyze a water sample. An apparatus for detecting a value of a current flowing at the time of measurement and measuring a concentration of residual chlorine contained in the test water from the value of the current.
It is characterized by a constant voltage in the range from 83 mV to 903 mV.
【０００８】本発明の上記特徴によれば、検水中に配置
された残留塩素濃度測定装置の正負電極間に加える一定
の印加電圧を８８３mV以上９０３mV以下の範囲の電圧と
することで、検水中における遊離残留塩素濃度を密接に
反映した濃度として残留塩素濃度を測定することができ
る。即ち、例え結合残留塩素の濃度が増加した場合で
も、その結合残留塩素濃度の増加を増加として検出する
ことなく、一方、結合残留塩素に対して殺菌能力が大き
い遊離残留塩素の濃度の変化を十分に反映したかたちで
残留塩素濃度が測定せられる。従って、水が現に保有す
る殺菌能力の程度をより正確に知ることができ、よって
必要な塩素分を適切に補充等しすることが可能となり、
浴槽やプール等の水を適切な殺菌能力を保有した、安定
した状態に管理することが可能となる。印加電圧が８８
３mV未満、或いは９０３mVを越えると、結合残留塩素濃
度等が測定濃度に反映されやすくなり、遊離残留塩素濃
度を密接に反映した測定値を得ることができなくなる。According to the above feature of the present invention, the constant applied voltage applied between the positive and negative electrodes of the residual chlorine concentration measuring device arranged in the test water is set to a voltage in the range of 883 mV to 903 mV, thereby enabling The residual chlorine concentration can be measured as a concentration that closely reflects the free residual chlorine concentration. That is, even if the concentration of the residual chlorine is increased, the increase in the concentration of the residual chlorine is not detected as an increase. The residual chlorine concentration is measured in the form reflected in the above. Therefore, it is possible to more accurately know the degree of sterilization ability that the water actually has, and it is possible to appropriately replenish the necessary chlorine content, etc.
It is possible to manage the water in the bathtub, pool, and the like in a stable state with appropriate sterilization ability. The applied voltage is 88
If it is less than 3 mV or exceeds 903 mV, the concentration of bound residual chlorine and the like are likely to be reflected in the measured concentration, and it is not possible to obtain a measured value that closely reflects the concentration of free residual chlorine.
【０００９】[0009]
【発明の実施の形態】以下、本発明の実施の形態による
残留塩素濃度測定装置について、図面を参照して説明す
る。図１は本発明の実施の形態例に係る残留塩素濃度測
定装置を浴槽設備に適用した例を示すシステム構成図、
図２は図１に示す残留塩素濃度測定装置の全体構成図、
図３は残留塩素濃度測定装置の要部を示す構成図、図４
は残留塩素濃度測定装置の一対の正負電極間に８９３mV
の印加電圧を加えた場合における、実際の遊離残留塩素
濃度と実際の結合残留塩素濃度と本発明の装置で測定し
た残留塩素濃度との関係を示す図、図５は残留塩素濃度
測定装置の一対の正負電極間に８９３mVの印加電圧を加
えた場合における、ｐＨの変動と検出遊離残留塩素測定
値との関係を示す図、図６は残留塩素濃度測定装置の一
対の正負電極間に８９３mVの印加電圧を加えた場合にお
ける、導電率の変動と検出遊離残留塩素測定値との関係
を示す図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A residual chlorine concentration measuring device according to an embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a system configuration diagram showing an example in which a residual chlorine concentration measurement device according to an embodiment of the present invention is applied to bathtub equipment.
FIG. 2 is an overall configuration diagram of the residual chlorine concentration measuring device shown in FIG. 1,
FIG. 3 is a configuration diagram showing a main part of the residual chlorine concentration measuring device, and FIG.
Is 893 mV between the pair of positive and negative electrodes of the residual chlorine concentration measurement device
FIG. 5 shows the relationship between the actual free residual chlorine concentration, the actual combined residual chlorine concentration, and the residual chlorine concentration measured by the apparatus of the present invention when the applied voltage is applied. Fig. 6 is a diagram showing the relationship between the fluctuation of pH and the measured value of detected free residual chlorine when an applied voltage of 893mV is applied between the positive and negative electrodes of Fig. 6; Fig. 6 shows the application of 893mV between a pair of positive and negative electrodes of the residual chlorine concentration measuring device; It is a figure which shows the relationship between the fluctuation | variation of the electrical conductivity at the time of applying a voltage, and the detected free residual chlorine measurement value.
【００１０】まず図１について説明すると、浴槽２０か
らの水（湯）は主循環路Ａを通って、一旦バランシング
タンク２１内に貯留された後、ヘアーキャッチャー２２
で毛髪等の異物が取り除かれ、オゾナイザー２３でオゾ
ン処理され、循環ポンプ２４で濾過器２５内に送り込ま
れる。不純物等が濾過された水は熱交換器２６で加熱さ
れた後、再び浴槽２０内へリサイクルされる。濾過器２
５からの一部の水はサンプリング用、即ち検水として検
出用循環路Ｂ側に取り出され、残留塩素濃度測定装置１
によって電気分解され、電流値として検出される。検出
された電流値は、検出信号としてコントローラ４０に入
力され、残留塩素濃度として換算される。コントローラ
４０は、検出した残留塩素濃度が一定の基準濃度を下回
っていれば、次亜塩素酸ナトリウムタンク２７から所定
量の薬剤を注入ポンプ２８によって主循環路Ａに注入さ
せ、適当な残留塩素濃度になるように濃度補正するよう
制御する。このように上記残留塩素濃度測定装置１は、
いわゆるインライン方式による検水の残留塩素の濃度測
定が行えるので、節水効果がある。Referring first to FIG. 1, water (hot water) from a bathtub 20 passes through a main circulation path A, is temporarily stored in a balancing tank 21, and is then stored in a hair catcher 22.
Then, the foreign matter such as hair is removed, ozonized by an ozonizer 23, and sent into a filter 25 by a circulation pump 24. The water from which impurities and the like have been filtered is heated in the heat exchanger 26 and then recycled into the bath 20 again. Filter 2
5 is taken out to the detection circuit B side for sampling, that is, as a test water, and the residual chlorine concentration measuring device 1
And is detected as a current value. The detected current value is input to the controller 40 as a detection signal, and is converted as a residual chlorine concentration. If the detected residual chlorine concentration is lower than the predetermined reference concentration, the controller 40 injects a predetermined amount of the chemical from the sodium hypochlorite tank 27 into the main circuit A by the injection pump 28, and sets an appropriate residual chlorine concentration. Is controlled so that the density is corrected. As described above, the residual chlorine concentration measuring device 1
Since the concentration of residual chlorine in the test water can be measured by the so-called in-line method, there is a water saving effect.
【００１１】図２を参照して、残留塩素濃度測定装置１
は、濃度検出室２、電極部３、不要水逃がし路４、検水
導入手段５、合流室６等からなる。前記濃度検出室２内
には、洗浄用の多数のガラス製等からなる小さなビーズ
７が保有せられている。該濃度検出室２内に導入せられ
た水が検水として電気分解され、残留塩素濃度が測定さ
れる。前記電極部３は、図３も参照して、ホルダ３１の
先端に正電極３２と負電極３３とからなる一対の電気分
解用電極が、その表面を前記ホルダ３１の先端面に対し
て面一状態となるように構成されている。前記一対の電
極３２、３３は、例えば白金電極として構成され、ガラ
ス体３４、３４に埋め込まれて前記ホルダ３１に取り付
けられている。３５はＯリングである。前記一対の正負
電極３２、３３に対してはリード線３６が接続され、こ
れが電源３７及び電流計３８に接続されている。前記電
源３７は前記一対の正負電極３２、３３に対して一定の
直流印加電圧を加えるためのものである。また前記電流
計３８は電気分解電流を検出するためのものである。前
記検水導入手段５は、水受け入れ口５ａと、該水受け入
れ口５ａから分岐され、取り入れた水の一部を検水用と
して導き入れるための分岐通路５ｂと、該分岐通路５ｂ
からの水を濃度検出室２に導入する導入口５ｃを有す
る。水受け入れ口５ａから入った水のうち不要な水は不
要水逃がし路４に流れ、合流室６で前記濃度検出室２か
らの排水と合流して、下流に流れ、検出用循環路Ｂに戻
り、更に主循環路Ａに戻る。前記合流室６にはネット体
６ａが設けられており、前記濃度検出室２内のビーズ７
が下流方向に流出するのを予防している。またネット体
６ａは不要水逃がし路４から合流室６に流入する水の流
れを整流し、これにより合流室６での流入水の乱れによ
って前記濃度検出室２で検出される残留塩素濃度の精度
に悪影響がでるのを防止している。Referring to FIG. 2, residual chlorine concentration measuring device 1
Is composed of a concentration detection chamber 2, an electrode unit 3, an unnecessary water release path 4, a water sample introduction unit 5, a junction chamber 6, and the like. A large number of small beads 7 made of glass or the like for cleaning are held in the concentration detection chamber 2. The water introduced into the concentration detection chamber 2 is electrolyzed as a sample to measure the residual chlorine concentration. Referring to FIG. 3 as well, the electrode section 3 is provided with a pair of electrolysis electrodes including a positive electrode 32 and a negative electrode 33 at the tip of the holder 31 so that the surfaces thereof are flush with the tip of the holder 31. It is configured to be in a state. The pair of electrodes 32 and 33 are configured as, for example, platinum electrodes, and are embedded in glass bodies 34 and 34 and attached to the holder 31. 35 is an O-ring. A lead wire 36 is connected to the pair of positive and negative electrodes 32 and 33, and this is connected to a power supply 37 and an ammeter 38. The power source 37 is for applying a constant DC applied voltage to the pair of positive and negative electrodes 32 and 33. The ammeter 38 is for detecting an electrolysis current. The water sample introduction means 5 includes a water receiving port 5a, a branch path 5b branched from the water receiving port 5a, and for introducing a part of the taken-in water for water testing, and a branch path 5b.
Has an inlet 5c for introducing water from the water into the concentration detection chamber 2. Unnecessary water out of the water that has entered through the water receiving port 5a flows into the unnecessary water release path 4, merges with the wastewater from the concentration detection chamber 2 in the merger chamber 6, flows downstream, and returns to the detection circulation path B. Then, return to the main circuit A. A net body 6 a is provided in the merging chamber 6, and beads 7 in the concentration detecting chamber 2 are provided.
Is prevented from flowing downstream. In addition, the net body 6a rectifies the flow of water flowing into the junction chamber 6 from the unnecessary water release path 4, whereby the accuracy of the residual chlorine concentration detected by the concentration detection chamber 2 due to the disturbance of the inflow water in the junction chamber 6. To prevent negative effects.
【００１２】前記分岐通路５ｂの導入口５ｃは、前記濃
度検出室２を構成する短筒体の筒部２ａに接続開口させ
ており、しかも導入口５ｃから濃度検出室２内に導入さ
れる検水の流れが、前記正負電極３２、３３の電極面に
対して、斜め方向（例えば３０度）で、且つ筒部２ａに
対しては、略接線方向になるように構成している。An inlet 5c of the branch passage 5b is connected to an opening of the cylindrical portion 2a of the short cylinder constituting the concentration detecting chamber 2, and the inlet 5c is introduced into the concentration detecting chamber 2 through the inlet 5c. The flow of water is configured to be oblique (for example, 30 degrees) with respect to the electrode surfaces of the positive and negative electrodes 32 and 33 and to be substantially tangential to the cylindrical portion 2a.
【００１３】しかして、水受け入れ口５ａからの水の一
部が検水用として分岐通路５ｂから導入口５ｃを介して
濃度検出室２内に導入せられ、旋回流を構成しながら正
負電極３２、３３に対して斜め方向から当たる。例えば
検水は、上記分岐通路５ｂから濃度検出室２内に６００
cc／分の流量で吐出される。濃度検出室２に流入した検
水は正負電極３２、３３で電気分解され、この際の電流
値が電流計３８で検出され、これがコントローラ４０に
入力され、残留塩素濃度として換算される。Thus, a part of the water from the water receiving port 5a is introduced into the concentration detecting chamber 2 from the branch passage 5b through the inlet 5c for water detection, and the positive and negative electrodes 32 are formed while forming a swirling flow. , 33 from an oblique direction. For example, the water sample is collected from the branch passage 5b into the concentration detection chamber 2 by 600.
Dispensed at a flow rate of cc / min. The test water flowing into the concentration detection chamber 2 is electrolyzed by the positive and negative electrodes 32 and 33, and the current value at this time is detected by the ammeter 38, and the detected current value is input to the controller 40 and converted as the residual chlorine concentration.
【００１４】本発明の残留塩素濃度測定装置１において
は、前記電源３７によって前記一対の正負電極３２、３
３に加えられる直流印加電圧を８８３〜９０３mVの範囲
内での一定電圧としている。このような電圧範囲内での
一定印加電圧を加えることにより、検水中に含まれる結
合残留塩素の濃度の影響を余り受けることなく、遊離残
留塩素の濃度の大小に密接に関係した値としての残留塩
素濃度を測定することができることを、本願発明者は知
見した。結合残留塩素の濃度に余り影響を受けずに遊離
残留塩素の濃度を十分に反映した残留塩素濃度を測定で
きるということは、同じ残留塩素であっても、殺菌能力
の大きい遊離残留塩素の濃度をより反映させることで、
浴槽等の水に求められる必要で且つ十分な殺菌能力をよ
り適切に維持し、管理することができるということを意
味する。In the residual chlorine concentration measuring apparatus 1 of the present invention, the pair of positive and negative electrodes 32, 3
The DC applied voltage applied to 3 is a constant voltage in the range of 883 to 903 mV. By applying a constant applied voltage within such a voltage range, the residual residual chlorine as a value closely related to the magnitude of the concentration of free residual chlorine is not significantly affected by the concentration of residual chlorine contained in the test water. The present inventor has found that the chlorine concentration can be measured. Being able to measure the concentration of residual chlorine sufficiently reflecting the concentration of free residual chlorine without being significantly affected by the concentration of combined residual chlorine means that even with the same residual chlorine, it is possible to measure the concentration of free residual chlorine that has a large sterilizing capacity. By reflecting more,
This means that necessary and sufficient sterilization ability required for water in a bathtub or the like can be more appropriately maintained and managed.
【００１５】図４は、検水中にアンモニア水を加えてい
くことで検水中の結合残留塩素濃度を増加させていく場
合、及び検水中に次亜塩素酸ナトリウムを加えていくこ
とで検水中の遊離残留塩素濃度を増加させていく場合に
おいて、検水中に含まれる実際の遊離結合残留塩素濃度
値、実際の遊離残留塩素濃度値、実際の全残留塩素濃度
値、及び本装置によって実際に測定した残留塩素濃度値
とを示したものである。図４に示す例の場合、正負電極
に加える直流印加電圧は、前記範囲８８３〜９０３mVの
中の中心値である、８９３mVとした。尚、検水のｐＨは
７．５に調整している。図４から明らかなように、本発
明の装置により測定された残留塩素濃度値は、結合残留
塩素濃度の影響を余り受けずに、遊離残留塩素濃度に密
接に相関しており、その増減と共に増減する値となって
いる。FIG. 4 shows the case where the concentration of residual chlorine in the test water is increased by adding ammonia water to the test water, and the case where sodium hypochlorite is added to the test water to increase the concentration of residual chlorine. When increasing the free residual chlorine concentration, the actual free combined residual chlorine concentration, the actual free residual chlorine concentration, the actual total residual chlorine concentration, and the actual total residual chlorine concentration contained in the test water were measured by this device. It shows the residual chlorine concentration value. In the case of the example shown in FIG. 4, the DC applied voltage applied to the positive and negative electrodes was 893 mV, which is the center value in the range 883 to 903 mV. The pH of the sample was adjusted to 7.5. As is clear from FIG. 4, the residual chlorine concentration value measured by the apparatus of the present invention is closely influenced by the free residual chlorine concentration without being significantly affected by the combined residual chlorine concentration, and increases and decreases with the increase and decrease. Value.
【００１６】本発明の装置においては、正負電極３２、
３３に加える直流印加電圧を８８３〜９０３mVとするこ
とで、測定値に及ぼす検水のｐＨの影響を僅かに抑制す
ることができる。図５は、遊離残留塩素濃度をそれぞれ
０．６３ppm 、１．００ppm 、１．５０ppm に調整した
検水に対して、印加電圧を８８３〜９０３mVの範囲内の
値である８９３mVにして測定した場合と、８８３〜９０
３mVの範囲外の値である８６８mVにして測定した場合と
における、ｐＨの変化に伴う測定値の変動を示す図であ
る。尚、測定条件は、検水の温度が２９℃、検水の導電
率が４００μS ／cm、検水の流量が３００ml／min であ
る。In the apparatus of the present invention, the positive and negative electrodes 32,
By setting the DC applied voltage applied to 33 to 883 to 903 mV, the influence of the pH of the test water on the measured value can be slightly suppressed. FIG. 5 shows the case where the applied voltage was set to 893 mV, which is a value within the range of 883 to 903 mV, for the test water whose free residual chlorine concentration was adjusted to 0.63 ppm, 1.00 ppm, and 1.50 ppm, respectively. , 883-90
It is a figure which shows the fluctuation | variation of the measured value accompanying the change of pH at the time of measuring at 868 mV which is a value outside the range of 3 mV. The measurement conditions were as follows: the temperature of the sample was 29 ° C., the conductivity of the sample was 400 μS / cm, and the flow rate of the sample was 300 ml / min.
【００１７】図５から明らかなように、本発明の装置に
より、８９３mVの印加電圧を用いて測定する場合には、
ｐＨの変化に対して、あまり影響を受けることなく安定
した測定値を得ることができる。一方、８８３〜９０３
mVの範囲を越えた８６８mVの印加電圧の場合にはｐＨの
影響を大きく受けることから、ｐＨの変動に対して安定
した測定値を得ることができない。浴槽水等において
は、長期の使用により水のｐＨが６．８〜８．０程度で
変動する。従って、前記８６８mVの印加電圧を用いて浴
槽水の残留塩素濃度を測定する場合には、ｐＨの影響に
よって安定した値を得ることができなくなる。しかし、
本発明の印加電圧の範囲で測定する場合には、浴槽水で
あっても、ｐＨの変動に左右されることなく安定した正
確な測定値を得ることができる。As is clear from FIG. 5, when the measurement is performed using the applied voltage of 893 mV by the apparatus of the present invention,
A stable measurement value can be obtained without being significantly affected by a change in pH. On the other hand, 883-903
In the case of an applied voltage of 868 mV which exceeds the range of mV, since the influence of pH is greatly affected, it is not possible to obtain a stable measured value with respect to the fluctuation of pH. In bath water or the like, the pH of water fluctuates at about 6.8 to 8.0 due to long-term use. Therefore, when the concentration of residual chlorine in bathtub water is measured using the applied voltage of 868 mV, a stable value cannot be obtained due to the influence of pH. But,
In the case where the measurement is performed in the range of the applied voltage according to the present invention, stable and accurate measurement values can be obtained without being influenced by pH fluctuation even in bathtub water.
【００１８】図６は、遊離残留塩素濃度を１．００ppm
に調整した検水に対して、印加電圧を本発明における８
８３〜９０３mVの範囲内の値である８９３mVにして測定
した場合と、従来装置における８８３〜９０３mVの範囲
外の値である８６０mVにして測定した場合とにおける、
検水の導電率の変化に伴う測定値の変動を示す図であ
る。一般に通常の水道水は導電率が１００〜２００μS
／cm（マイクロシーメンス／センチメートル）で、浴槽
では使用によって導電率が１０００μS ／cm位まで上昇
するので、導電率が測定値に及ぼす影響も考慮しておく
必要がある。FIG. 6 shows that the concentration of free residual chlorine is 1.00 ppm.
The applied voltage was adjusted to 8
When the measurement is performed at 893 mV, which is a value within the range of 83 to 903 mV, and when the measurement is performed at 860 mV, which is a value outside the range of 883 to 903 mV in the conventional device,
It is a figure which shows the fluctuation | variation of the measured value accompanying the change of the electrical conductivity of test water. Generally, tap water has a conductivity of 100 to 200 μS.
/ Cm (microsiemens / centimeter), the conductivity of which increases up to about 1000 μS / cm in a bathtub, so it is necessary to consider the effect of the conductivity on the measured value.
【００１９】図６から明らかなように、本発明の装置に
より、８９３mVの印加電圧を用いて測定する場合には、
導電率変化に対して、あまり影響を受けることなく安定
した測定値を得ることができる。一方、従来の装置によ
り、８８３〜９０３mVの範囲を越えた８６０mVの印加電
圧を用いた場合には導電率の影響を受けることから、導
電率変動に対して安定した測定値を得ることができな
い。浴槽水等においては、使用により導電率が１０００
μS ／cm程度まで上昇することから、上記８６０mVの印
加電圧を用いて浴槽水の残留塩素濃度を測定する場合に
は、導電率の影響によって安定した値を得ることができ
なくなる。しかし、本発明の印加電圧の範囲で測定する
場合には、浴槽水であっても、導電率の変動に左右され
ることなく安定した正確な測定値を得ることができる。As is apparent from FIG. 6, when the measurement is performed using the applied voltage of 893 mV by the apparatus of the present invention,
A stable measurement value can be obtained without being significantly affected by a change in conductivity. On the other hand, when an applied voltage of 860 mV exceeding the range of 883 to 903 mV is used by the conventional device, the conductivity is affected, so that a stable measurement value with respect to the conductivity fluctuation cannot be obtained. In bathtub water, etc., the conductivity is 1000
When the residual chlorine concentration in the bathtub water is measured using the applied voltage of 860 mV, a stable value cannot be obtained due to the influence of the electric conductivity. However, when the measurement is performed in the range of the applied voltage according to the present invention, stable and accurate measurement values can be obtained without being affected by the fluctuation of the conductivity even in the bath water.
【００２０】[0020]
【発明の効果】本発明は以上のように構成され、請求項
１に記載の残留塩素濃度測定装置によれば、少なくとも
一対の正負電極を有し、正負電極間に電圧を印加するこ
とで検水を電気分解した際に流れる電流値を検出し、こ
の電流値から検水に含まれる残留塩素の濃度を測定する
装置であって、前記一対の正負電極間に加える印加電圧
を８８３mV以上９０３mV以下の範囲にある一定電圧に構
成しているので、残留塩素濃度の測定において、結合残
留塩素の濃度の影響を減じ、遊離残留塩素の濃度をより
密接に反映した状態での残留塩素濃度を測定することが
できる。よってその水に真に必要で且つ十分なる殺菌能
力に対して、必要な塩素を補充することで、浴槽やプー
ル等の水を適切な殺菌能力を保有した、安定した状態に
管理することも可能となる。According to the present invention, the apparatus for measuring the concentration of residual chlorine according to the present invention has at least a pair of positive and negative electrodes, and detects by applying a voltage between the positive and negative electrodes. An apparatus for detecting a current value flowing when water is electrolyzed and measuring a concentration of residual chlorine contained in the test water from the current value, wherein an applied voltage applied between the pair of positive and negative electrodes is 883 mV or more and 903 mV or less. In the measurement of residual chlorine concentration, reduce the effect of the concentration of combined residual chlorine, and measure the residual chlorine concentration in a state that more closely reflects the concentration of free residual chlorine. be able to. Therefore, it is possible to manage the water in bathtubs, pools, etc. in a stable state with appropriate sterilization ability by replenishing the necessary chlorine with the sterilization ability that is truly necessary and sufficient for the water. Becomes
【図１】本発明の実施の形態例に係る残留塩素濃度測定
装置を浴槽設備に適用した例を示すシステム構成図であ
る。FIG. 1 is a system configuration diagram showing an example in which a residual chlorine concentration measuring device according to an embodiment of the present invention is applied to bathtub equipment.
【図２】図１に示す残留塩素濃度測定装置の全体構成図
である。FIG. 2 is an overall configuration diagram of the residual chlorine concentration measuring device shown in FIG.
【図３】残留塩素濃度測定装置の要部を示す構成図であ
る。FIG. 3 is a configuration diagram showing a main part of a residual chlorine concentration measuring device.
【図４】残留塩素濃度測定装置の一対の正負電極間に８
９３mVの印加電圧を加えた場合における、実際の遊離残
留塩素濃度と実際の結合残留塩素濃度と本発明の装置で
測定した残留塩素濃度との関係を示す図である。FIG. 4 is a diagram showing a sample between a pair of positive and negative electrodes of a residual chlorine concentration measuring device.
FIG. 9 is a diagram showing the relationship between the actual free residual chlorine concentration, the actual combined residual chlorine concentration, and the residual chlorine concentration measured by the apparatus of the present invention when an applied voltage of 93 mV is applied.
【図５】残留塩素濃度測定装置の一対の正負電極間に８
９３mVの印加電圧を加えた場合における、ｐＨの変動と
検出遊離残留塩素測定値との関係を示す図である。FIG. 5 is a diagram showing the relationship between a pair of positive and negative electrodes of a residual chlorine concentration measuring device;
FIG. 9 is a diagram showing a relationship between a change in pH and a measured value of detected free residual chlorine when an applied voltage of 93 mV is applied.
【図６】残留塩素濃度測定装置の一対の正負電極間に８
９３mVの印加電圧を加えた場合における、導電率変動と
検出遊離残留塩素測定値との関係を示す図である。FIG. 6 is a diagram showing the relationship between a pair of positive and negative electrodes of a residual chlorine concentration measuring device;
FIG. 7 is a diagram showing a relationship between a change in conductivity and a measured value of detected free residual chlorine when an applied voltage of 93 mV is applied.
１ 残留塩素濃度測定装置 ２ 濃度検出室 ３ 電極部 ４ 不要水逃がし路 ５ａ 水受け入れ口 ５ｂ 分岐通路 ５ｃ 導入口 ６ 合流室 ７ ビーズ ２０ 浴槽 ３１ ホルダー ３２ 正電極 ３３ 負電極 ３７ 電源 ３８ 電流計 ４０ コントローラ Ａ 主循環路 Ｂ 検出用循環路 DESCRIPTION OF SYMBOLS 1 Residual chlorine concentration measuring device 2 Concentration detection room 3 Electrode part 4 Unnecessary water escape path 5a Water receiving port 5b Branch passage 5c Inlet 6 Merging chamber 7 Beads 20 Bathtub 31 Holder 32 Positive electrode 33 Negative electrode 37 Power supply 38 Ammeter 40 Controller A main circuit B detection circuit
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山元 良浩 大阪府大阪市中央区南船場２−４−８ 株式会社タクミナ内 (56)参考文献 特開 平８−313481（ＪＰ，Ａ) 特開 平10−82761（ＪＰ，Ａ) 特開 平９−178699（ＪＰ，Ａ) 特開 平８−278282（ＪＰ，Ａ) 特開 平３−4159（ＪＰ，Ａ) 特開 昭64−88356（ＪＰ，Ａ) 特開 昭63−55455（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) G01N 27/416 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Yoshihiro Yamamoto 2-4-8 Minamisenba, Chuo-ku, Osaka-shi, Osaka Takumina Co., Ltd. (56) References JP-A-8-313481 (JP, A) JP-A-10 JP-A-8-27661 (JP, A) JP-A-9-178699 (JP, A) JP-A-8-278282 (JP, A) JP-A-3-4159 (JP, A) JP-A-64-88356 (JP, A) JP-A-63-55455 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G01N 27/416
Claims (1)
電極間に電圧を印加することで検水を電気分解した際に
流れる電流値を検出し、この電流値から検水に含まれる
残留塩素の濃度を測定する装置であって、前記一対の正
負電極間に加える印加電圧を８８３mV以上９０３mV以下
の範囲にある一定電圧に構成していることを特徴とする
残留塩素濃度測定装置。The present invention has at least a pair of positive and negative electrodes, and detects a current value flowing when electrolyzing test water by applying a voltage between the positive and negative electrodes, and from the current value, residual chlorine contained in the test water. A residual chlorine concentration measuring device, wherein an applied voltage applied between the pair of positive and negative electrodes is set to a constant voltage in a range of 883 mV to 903 mV.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25758098A JP3354878B2 (en) | 1998-08-26 | 1998-08-26 | Residual chlorine concentration measurement device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25758098A JP3354878B2 (en) | 1998-08-26 | 1998-08-26 | Residual chlorine concentration measurement device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000074877A JP2000074877A (en) | 2000-03-14 |
| JP3354878B2 true JP3354878B2 (en) | 2002-12-09 |
Family
ID=17308250
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25758098A Expired - Fee Related JP3354878B2 (en) | 1998-08-26 | 1998-08-26 | Residual chlorine concentration measurement device |
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| Country | Link |
|---|---|
| JP (1) | JP3354878B2 (en) |
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| JP2017104870A (en) * | 2017-03-24 | 2017-06-15 | 菊地 奈美枝 | Method for producing strongly acidic water and strongly alkaline water |
| JP7093005B2 (en) * | 2018-06-29 | 2022-06-29 | 東亜ディーケーケー株式会社 | Reagent-free total effective chlorine measuring device and its calibration method and reagent-free total effective chlorine measuring method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0610663B2 (en) * | 1986-08-26 | 1994-02-09 | 横河電機株式会社 | Residual chlorine measurement method |
| JPS6488356A (en) * | 1987-09-30 | 1989-04-03 | Yokogawa Electric Corp | Method for measuring residual chlorine |
| JPH034159A (en) * | 1989-05-31 | 1991-01-10 | Yokogawa Electric Corp | Method for measuring residual chlorine |
| JPH08278282A (en) * | 1995-04-04 | 1996-10-22 | Dkk Corp | Liberation chlorine measuring instrument |
| JP3469962B2 (en) * | 1995-05-17 | 2003-11-25 | 東亜ディーケーケー株式会社 | Free chlorine measuring device |
| JP3654694B2 (en) * | 1995-12-28 | 2005-06-02 | 株式会社クボタ | Residual chlorine measuring method and residual chlorine meter |
| JP3361237B2 (en) * | 1996-09-05 | 2003-01-07 | 株式会社メルス技研 | Residual chlorine measuring method and apparatus and residual chlorine detecting probe |
-
1998
- 1998-08-26 JP JP25758098A patent/JP3354878B2/en not_active Expired - Fee Related
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