JP3193995U - 表示装置 - Google Patents
表示装置 Download PDFInfo
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- JP3193995U JP3193995U JP2014004387U JP2014004387U JP3193995U JP 3193995 U JP3193995 U JP 3193995U JP 2014004387 U JP2014004387 U JP 2014004387U JP 2014004387 U JP2014004387 U JP 2014004387U JP 3193995 U JP3193995 U JP 3193995U
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 94
- 239000002184 metal Substances 0.000 claims abstract description 94
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 239000004973 liquid crystal related substance Substances 0.000 claims description 36
- 239000003566 sealing material Substances 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 13
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 239000003990 capacitor Substances 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 222
- 239000010409 thin film Substances 0.000 description 26
- 238000010586 diagram Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 239000011241 protective layer Substances 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 229920005591 polysilicon Polymers 0.000 description 7
- 238000005401 electroluminescence Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 238000011982 device technology Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8723—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
<第1実施形態>
なお、本実施形態において、各有機ELユニット15は、赤色光、緑色光及び青色光を発光することができるが、これに限定されない。例えば、有機ELユニット15は、白色光を生成する有機ELユニットであってもよい。その場合、第2基板12には、カラーフィルタ素子(図示せず)がさらに配置される必要がある。
また、本実施形態において、第1金属層111及び第2金属層116の材料は、本技術分野でよく用いる導電性材料、例えば、金属、合金、金属酸化物、金属酸窒化物、または本技術分野でよく用いる他の電極材料であってもよいが、金属材料であることが好ましい。本実施形態において、第1金属層111がモリブデンで、第2金属層116が、第1基板11上から順次に積層されるTi層、Al層及びTi層の複合金属層である。
<第2実施形態>
102 酸化シリコン緩衝層
103 ポリシリコン層
104 酸化シリコン絶縁層
11 第1基板
111 第1金属層
111’ モリブデン金属層
112 ゲート絶縁層
113 半導体層
114 第1絶縁層
114a 第1側壁
115 第2絶縁層
115a 第2側壁
116 第2金属層
116a 開口領域
117 平坦層
117a 平坦層開口
118 保護層
118a 保護層開口
12 第2基板
13 封止材
14 支持部材
15 有機ELユニット
151 第1電極
152 有機発光層
153 第2電極
16 画素規定層
161 画素開口
17 スペーサ
18 液晶表示ユニット
181 液晶層
24 薄膜トランジスタユニット
25 蓄積電極
A 表示領域
B 非表示領域
E 領域
R1 接続領域
T 薄膜トランジスタ素子領域
T1、T2 厚さ
P−P’ 断面線
Claims (18)
- 表示装置であって、
第1基板と、
前記第1基板上に設置される第1絶縁層と、
前記第1絶縁層上に設置される第2絶縁層と、
前記第2絶縁層上に設置され、複数の線路を含み、且つ隣り合う2つの線路の間に前記第2絶縁層を露出させる開口領域が形成される金属パターン層と、を含み、
前記複数の線路の下方における前記第2絶縁層の厚さは、前記開口領域によって露出される前記第2絶縁層の厚さよりも厚いことを特徴とする表示装置。 - 前記開口領域によって露出される前記第2絶縁層の厚さは、前記金属パターン層の下方における前記第2絶縁層の厚さより約10〜95%薄くなっていることを特徴とする請求項1に記載の表示装置。
- 前記第1絶縁層は、酸化シリコン層であることを特徴とする請求項1に記載の表示装置。
- 前記第2絶縁層は、窒化シリコン層であることを特徴とする請求項1に記載の表示装置。
- 前記第1絶縁層は、第1側壁を有し、
前記第2絶縁層は、第2側壁を有し、
前記第1側壁は、前記第2側壁に突出されることを特徴とする請求項1に記載の表示装置。 - 前記第1基板上には、封止材がさらに設けられ、
前記金属パターン層の下方における前記第2絶縁層の厚さは、前記封止材の下方における前記第2絶縁層の厚さよりも厚いことを特徴とする請求項1に記載の表示装置。 - 前記表示装置は、有機EL表示装置であることを特徴とする請求項1に記載の表示装置。
- 前記金属パターン層及び前記開口領域内に設けられる平坦層をさらに含むことを特徴とする請求項7に記載の表示装置。
- 有機ELユニットをさらに含み、
前記有機ELユニットは、第1電極、第2電極、及び前記第1電極と前記第2電極との間に挟設される有機発光層を含み、
前記金属パターン層は、前記第1電極に電気的に接続されることを特徴とする請求項7に記載の表示装置。 - 前記表示装置は、液晶表示装置であることを特徴とする請求項1に記載の表示装置。
- 液晶表示ユニットをさらに含み、
前記液晶表示ユニットは、第1電極、第2電極、及び前記第1電極と前記第2電極との間に挟設される液晶層を含み、
前記金属パターン層は、前記第1電極に電気的に接続されることを特徴とする請求項10に記載の表示装置。 - 表示装置であって、
第1基板と、
前記第1基板上に設置される第1絶縁層と、
前記第1絶縁層上に設置される第2絶縁層と、
前記第2絶縁層を部分的に被覆する金属層と、を含み、
前記金属層の下方における前記第2絶縁層の厚さは、前記金属層の下方以外における前記第2絶縁層の厚さよりも厚いことを特徴とする表示装置。 - 前記金属層の下方以外における前記第2絶縁層の厚さは、前記金属層の下方における前記第2絶縁層の厚さより約10〜95%薄くなっていることを特徴とする請求項12に記載の表示装置。
- 前記第1絶縁層は、酸化シリコン層であることを特徴とする請求項12に記載の表示装置。
- 前記第2絶縁層は、窒化シリコン層であることを特徴とする請求項12に記載の表示装置。
- 前記第1絶縁層は、第1側壁を有し、
前記第2絶縁層は、第2側壁を有し、
前記第1側壁は、前記第2側壁に突出されることを特徴とする請求項12に記載の表示装置。 - 前記第1基板上には、封止材がさらに設けられ、
前記金属層の下方における前記第2絶縁層の厚さは、前記封止材の下方における前記第2絶縁層の厚さよりも厚いことを特徴とする請求項12に記載の表示装置。 - 前記表示装置は、液晶表示装置または有機EL表示装置であることを特徴とする請求項12に記載の表示装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW103116212 | 2014-05-07 | ||
TW103116212A TWI553836B (zh) | 2014-05-07 | 2014-05-07 | 顯示裝置 |
Publications (1)
Publication Number | Publication Date |
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JP3193995U true JP3193995U (ja) | 2014-10-30 |
Family
ID=51167666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014004387U Active JP3193995U (ja) | 2014-05-07 | 2014-08-19 | 表示装置 |
Country Status (6)
Country | Link |
---|---|
US (5) | US9406737B2 (ja) |
EP (1) | EP2942814A1 (ja) |
JP (1) | JP3193995U (ja) |
KR (1) | KR20150127528A (ja) |
CN (2) | CN105097825B (ja) |
TW (1) | TWI553836B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107437554A (zh) * | 2016-05-27 | 2017-12-05 | 三星显示有限公司 | 显示装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI553836B (zh) | 2014-05-07 | 2016-10-11 | 群創光電股份有限公司 | 顯示裝置 |
US10528172B2 (en) * | 2016-06-17 | 2020-01-07 | Microsoft Technology Licensing, Llc | Pressure sensor for display devices |
CN106252357B (zh) * | 2016-08-24 | 2019-05-21 | 武汉华星光电技术有限公司 | 低温多晶硅薄膜晶体管阵列基板及其制作方法、液晶面板 |
US11133580B2 (en) * | 2017-06-22 | 2021-09-28 | Innolux Corporation | Antenna device |
CN109326634B (zh) * | 2018-09-30 | 2020-11-06 | 云谷(固安)科技有限公司 | 显示面板及其制备方法、显示装置 |
CN109785760B (zh) * | 2019-01-16 | 2020-11-24 | 深圳市华星光电半导体显示技术有限公司 | Led显示屏模组及显示装置 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107437554A (zh) * | 2016-05-27 | 2017-12-05 | 三星显示有限公司 | 显示装置 |
CN107437554B (zh) * | 2016-05-27 | 2023-08-15 | 三星显示有限公司 | 显示装置 |
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US20150325634A1 (en) | 2015-11-12 |
KR20150127528A (ko) | 2015-11-17 |
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US10649290B2 (en) | 2020-05-12 |
EP2942814A1 (en) | 2015-11-11 |
CN105097825A (zh) | 2015-11-25 |
US20200233273A1 (en) | 2020-07-23 |
US9406737B2 (en) | 2016-08-02 |
TW201543652A (zh) | 2015-11-16 |
TWI553836B (zh) | 2016-10-11 |
US20230255065A1 (en) | 2023-08-10 |
CN105097825B (zh) | 2019-03-08 |
US20160307923A1 (en) | 2016-10-20 |
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