JP2627939B2 - Office materials covered with carbon film - Google Patents
Office materials covered with carbon filmInfo
- Publication number
- JP2627939B2 JP2627939B2 JP23316788A JP23316788A JP2627939B2 JP 2627939 B2 JP2627939 B2 JP 2627939B2 JP 23316788 A JP23316788 A JP 23316788A JP 23316788 A JP23316788 A JP 23316788A JP 2627939 B2 JP2627939 B2 JP 2627939B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- film
- office
- carbon film
- main component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Drawing Aids And Blackboards (AREA)
- Tables And Desks Characterized By Structural Shape (AREA)
- Polymerisation Methods In General (AREA)
Description
【発明の詳細な説明】 「発明の利用分野」 本発明は、紙、人体または衣服とこすれ得る面を持つ
有機物の事務用部材の表面を、炭素または炭素を主成分
とする保護用被膜で覆ったものである。そして耐摩耗性
を向上させ、ほこりの付着を防ぎ、静電気の発生を防い
だものである。DETAILED DESCRIPTION OF THE INVENTION "Field of Application of the Invention" The present invention covers the surface of an organic office member having a surface that can be rubbed with paper, a human body, or clothing with a protective coating mainly composed of carbon or carbon. It is a thing. Further, the abrasion resistance is improved, the adhesion of dust is prevented, and the generation of static electricity is prevented.
本発明はかかる薄膜として、可視領域で透光性を有す
るとともに、硬度が十分な炭素または炭素を主成分とす
る被膜を摩耗防止用保護膜としたものである。特にこの
保護膜は、有機物上に密着させ得るとともに、その電気
的固有抵抗として1×106〜5×1012Ωcmを有せしめ
て、静電気の発生を防ぐとともに、表面に平滑性を有せ
しめ、ほこりの付着が防がんとしたものである。According to the present invention, as such a thin film, carbon or a film containing carbon as a main component having sufficient hardness while having a light-transmitting property in a visible region is used as a protective film for preventing wear. In particular, this protective film can be brought into close contact with an organic material, and has an electric resistivity of 1 × 10 6 to 5 × 10 12 Ωcm, thereby preventing the generation of static electricity and having a smooth surface. The adhesion of dust is cancer prevention.
本発明は、かかるフロントガラス、サイドガラス、リ
アウインド等の窓にプラズマCVD法で炭素膜または炭素
を主成分とする被膜を形成せんとしたものである。In the present invention, a carbon film or a film containing carbon as a main component is formed on a window such as a windshield, a side glass, and a rear window by a plasma CVD method.
「従来技術」 一般にプラズマCVD法においては、平坦面を有する導
電性基板上に平面状に成膜する方法が工業的に有効であ
るとされている。さらに、プラズマCVD法でありなが
ら、スパッタ効果を伴わせつつ成膜させる方法も知られ
ている。その代表例である炭素膜のコーティングに関し
ては、本発明人の出願になる特許願『炭素被膜を有する
複合体およびその作製方法』(特願昭56−146936昭和56
年9月17日出願)が知られている。しかし、これらは一
対の電極のみを用いる平行平板型の一方の電極(カソー
ド側)に基板を配設し、導体基板であるため、自ら発生
するセルフバイアスを用いて平坦面の上面に炭素膜を成
膜する方法である。"Prior Art" Generally, in a plasma CVD method, a method of forming a film in a planar shape on a conductive substrate having a flat surface is considered to be industrially effective. Further, a method of forming a film with a sputtering effect while being a plasma CVD method is also known. Regarding the coating of a carbon film, which is a typical example, see the patent application “Composite with a carbon film and a method for producing the same” (Japanese Patent Application No. 56-146936, Showa 56) filed by the present inventor.
(Filed on September 17, 2008). However, since these are conductor substrates, the substrate is disposed on one electrode (cathode side) of a parallel plate type using only a pair of electrodes, and a carbon film is formed on the upper surface of a flat surface using self-bias generated by itself. This is a method for forming a film.
「従来の問題点」 しかし、かかるスパッタ効果を伴わせつつ成膜させる
従来例は、絶縁材料の事務用部材上に膜を作ることがで
きない。本発明はかかる目的のためになされたものであ
る。"Conventional Problems" However, in the conventional example in which a film is formed with such a sputtering effect, a film cannot be formed on an office member made of an insulating material. The present invention has been made for such a purpose.
「問題を解決すべき手段」 本発明は、摩擦を伴う事務用部材、特に紙、人体、衣
服等とこすれることにより、傷が着きやすく、またはほ
こりが付着しやすい透光性を有する有機物の表面を有す
る部材上に、保護膜として、炭素または炭素を主成分と
する被膜を設けたものである。この被膜に固有抵抗とし
て1×106〜5×1012Ωcmを有せしめ、ほこり(一般に
絶縁性または鉱物性)を伴う摩擦による静電気の発生を
防ぎ、ひいてはほこりの付着、ほこりによる透光性表面
の微小傷の発生による失透または「にごり」を防ぎ、常
に鮮やかな透光性の面を保存せしめたものである。"Means for Solving the Problem" The present invention relates to a surface of an organic material having a light-transmitting property that is easily scratched or easily adhered to dust by rubbing with an office member having friction, particularly paper, a human body, clothes, or the like. Is provided on the member having the above, as a protective film, a film containing carbon or carbon as a main component. This film has a specific resistance of 1 × 10 6 to 5 × 10 12 Ωcm to prevent the generation of static electricity due to friction caused by dust (generally insulating or mineral), and thus to adhere to dust and to transmit light due to dust. It prevents the devitrification or "smearing" due to the generation of micro scratches, and always preserves a vivid light-transmitting surface.
本発明は、かかる目的の保護膜として、固有抵抗がビ
ッカース硬度として600〜6000kg/cm2の値を有するプラ
ズマ重合またはCVD法による炭素または炭素を主成分と
する膜を有機物上に密着せしめ得ることの発見に基づ
く。According to the present invention, as a protective film for this purpose, a film having carbon or carbon as a main component by plasma polymerization or a CVD method having a specific resistance of Vickers hardness of 600 to 6000 kg / cm 2 can be adhered to an organic material. Based on the discovery of
この薄膜の形成として、SP3軌道を有するダイヤモン
ドの類似のC−C結合をつくり、比抵抗(固有抵抗)1
×106〜5×1012Ωcm、代表的には1×107〜5×1011Ω
cmを有するとともに、光学的エネルギバンド巾(Egとい
う)が1.0eV以上、好ましくは1.5〜5.5eVを有する可視
領域で透光性のダイヤモンドと類似の特性を有する炭素
膜または炭素を主成分(副成分の主たるものは水素、弗
素、窒素である)とする被膜を形成した。As the formation of this thin film, a similar CC bond of diamond having SP 3 orbitals is formed, and a specific resistance (specific resistance) 1
× 10 6 to 5 × 10 12 Ωcm, typically 1 × 10 7 to 5 × 10 11 Ωcm
cm, and a carbon film or carbon having properties similar to diamond that is transparent in the visible region having an optical energy bandwidth (Eg) of 1.0 eV or more, preferably 1.5 to 5.5 eV. The main components were hydrogen, fluorine and nitrogen).
本発明を用いた透光性有機物は、固有抵抗1×1015Ω
cm以上の絶縁性部材であり、材料は、ポリエステル樹
脂、アルキド樹脂、オイルフリーアルキド樹脂、不飽和
ポリエステル樹脂、アクリル樹脂、アミノ樹脂が用いら
れる。特に自動車ライン用にはアクリルラッカー、アク
リルメラミン、ブロックアクリルウレタンの有機溶融型
の有機物とした。The translucent organic substance using the present invention has a specific resistance of 1 × 10 15 Ω.
It is an insulating member of cm or more, and the material is polyester resin, alkyd resin, oil-free alkyd resin, unsaturated polyester resin, acrylic resin, amino resin. In particular, for an automobile line, an organic melting type organic material of acrylic lacquer, acrylic melamine, and block acrylic urethane was used.
本発明方法での成膜に際し、弗素の如きハロゲン元素
と窒素とを、プラズマCVD中に炭化物気体に加えて同時
に混入させて、厚さ方向に均一な濃度勾配を設けた炭素
を主成分とする被膜または添加物の有無を制御した多層
の複合膜を作ってもよい。When forming a film by the method of the present invention, a halogen element such as fluorine and nitrogen are simultaneously added to a carbide gas during plasma CVD and mixed together, and the main component is carbon having a uniform concentration gradient in a thickness direction. A multilayer composite film with or without a coating or with or without additives may be made.
以下に図面に従って本発明の作製方法を記す。 The manufacturing method of the present invention will be described below with reference to the drawings.
「実施例1」 第2図は、下敷き等の事務用部材上に薄膜形成方法を
実施するためのプラズマCVD装置の概要を示す。Example 1 FIG. 2 shows an outline of a plasma CVD apparatus for performing a thin film forming method on an office member such as an underlay.
図面において、プラズマCVD装置の反応容器(7)は
ゲート弁(9)で外部と仕切られている。ガス系(30)
において、キャリアガスであるアルゴンを(31)より、
反応性気体である炭化水素気体、例えばメタン、エチレ
ンを(32)より、添加物気体である弗素炭素(C2F6,C6F
8)を(33)より、反応容器のエッチング用気体である
酸素を(34)より、バルブ(28)、流量計(29)をへて
反応系(50)中にノズル(25)より導入する。エチレン
と二弗化炭素とを導入すると、水素と弗素が添加された
SP3結合を多数有するダイヤモンド状炭素膜(DLCともい
うが、添加物が添加されたDLCを含めて本発明は炭素ま
たは炭素を主成分とする被膜という)を成膜できる。In the drawing, a reaction vessel (7) of a plasma CVD apparatus is separated from the outside by a gate valve (9). Gas system (30)
In the above, argon as a carrier gas was changed from (31) to
Reactive hydrocarbon gases, such as methane and ethylene, were added from (32) to fluorocarbon (C 2 F 6 , C 6 F
8 ) From (33), oxygen as the etching gas for the reaction vessel is introduced from (34) through the valve (28) and the flow meter (29) through the nozzle (25) into the reaction system (50). . When ethylene and carbon difluoride were introduced, hydrogen and fluorine were added.
A diamond-like carbon film having a large number of SP 3 bonds (also referred to as DLC, including DLC to which an additive is added, in the present invention is referred to as carbon or a film containing carbon as a main component) can be formed.
これと同一主成分の被膜を作るため、C2F6,C6F8を(3
2)より、またNH3を(33)より導入して形成してもよ
い。In order to form a coating of the same main component, C 2 F 6 and C 6 F 8 (3
Alternatively, NH 3 may be introduced from (33).
この反応容器(7)の上下に第1の一対の電極を同一
形状を有せしめて第1および第2の電極(3−1),
(3−2)をアルミニウムの金属メッシュで構成せしめ
る。反応性気体はノズル(25)より下方向に放出され
る。さらに第2の一対の電極である第3の電極(13−
1),(13−2),・・・(13−n)と他の第4の電極
(13′−1),(13′−2)・・・(13′−n)(それ
ぞれを集合させて第3および第4の電極という)を部材
を互いにはさみこみ配置とする。部材(1−),(1−
2)・・・(1−n)は絶縁材料であるが、ここに第2
の交番電圧を加え、交流的には実質的に導体化してバイ
アスを印加した。部材(1)上の有機物の被形成面
(1′)には、プラズマ雰囲気またはポジティブシース
ができ、負の自己バイアスが印加される。この負の自己
バイアスが積極的に発生するよう、第2の交番電圧の周
波数を10Hz〜100KHzとイオンが第3と第4の電極間を半
周期(半サイクル)の間にゆきわたるように低い周波数
とした。部材(1)は有機物の被形成面(1′)を有
し、第1の高周波の交番電圧によりグロー放電のプラズ
マ化した反応性気体は、反応空間(8)で均一に分散
し、反応空間でのプラズマ電位を均質にした。A first pair of electrodes are formed above and below the reaction vessel (7) to have the same shape, and the first and second electrodes (3-1),
(3-2) is constituted by an aluminum metal mesh. The reactive gas is discharged downward from the nozzle (25). Further, a third electrode (13-
(1), (13-2),... (13-n) and other fourth electrodes (13′-1), (13′-2). The third and fourth electrodes are sandwiched between the members. Members (1-), (1-
2)... (1-n) is an insulating material.
, And a bias was applied in a substantially AC-conducting manner. A plasma atmosphere or a positive sheath is formed on the surface (1 ') on which the organic substance is formed on the member (1), and a negative self-bias is applied. In order to positively generate this negative self-bias, the frequency of the second alternating voltage is set to 10 Hz to 100 KHz and a low frequency such that ions spread between the third and fourth electrodes for a half cycle (half cycle). And The member (1) has a surface (1 ') on which an organic substance is to be formed, and the reactive gas converted into a plasma of the glow discharge by the first high-frequency alternating voltage is uniformly dispersed in the reaction space (8). The plasma potential at was made homogeneous.
さらにプラズマ反応空間での電位分布をより等しくさ
せるため、電源系(40)には独立した二種類の周波数の
交番電圧が印加できるようになっている。第1の交番電
圧は1〜100MHz例えば13,56MHzの高周波であり、一対を
なす2つの電源(15−1),(15−2)即ち(15)より
LCR回路でできたマッチングボックス(16−1),(16
−2)に至る。このマッチングボックスでの互いの位相
は位相調整器(26)により調整し、互いに180゜また0
゜ずれて供給できるようにしている。そして対称型また
は同相型の出力を有し、電源(15−1),(15−2)の
それぞれの一端(4−1),(4−2)は一対の第1お
よび第2の電極(3−1),(3−2)にそれぞれ連結
されている。また、それぞれの電源(15−1),(15−
2)の他端は接地(5−1),(5−2)されている。
第2の10Hz〜100KHz例えば50Hzの交番電圧が電源(17)
即ち(17−1),(17−2)より一対の第3の電極(13
−1),・・・(13−n)および第4の電極(13′−
1)・・・(13′−n)に連結されており、印加されて
いる。その一対の電極(13),(13′)での出力はこの
一対の電極にはさまれた部材(1)に自己バイアスがか
かるようになされている。Further, in order to make the potential distribution in the plasma reaction space more uniform, alternating voltages of two independent frequencies can be applied to the power supply system (40). The first alternating voltage is a high frequency of 1 to 100 MHz, for example, 13,56 MHz, and is supplied from a pair of two power supplies (15-1) and (15-2), that is, (15).
Matching boxes (16-1), (16
-2). The phase of each of the matching boxes is adjusted by a phase adjuster (26) so that they are 180 ° and 0 ° from each other.
供給 Supply can be made out of alignment. The power supplies (15-1) and (15-2) each have one end (4-1) and (4-2) of a symmetric or in-phase output. 3-1) and (3-2). In addition, each power supply (15-1), (15-
The other end of 2) is grounded (5-1) and (5-2).
A second 10 Hz to 100 KHz, for example, an alternating voltage of 50 Hz is a power supply (17)
That is, from (17-1) and (17-2), a pair of third electrodes (13
-1),... (13-n) and the fourth electrode (13'-
1)... (13′-n) are connected and applied. The output from the pair of electrodes (13) and (13 ') is configured to apply a self-bias to the member (1) sandwiched between the pair of electrodes.
かくして反応空間にプラズマ(8)が発生する。排気
系(25)は、圧力調整バルブ(21),ターボ分子ポンプ
(22),ロータリーポンプ(23)を経て不要気体を排気
する。Thus, plasma (8) is generated in the reaction space. The exhaust system (25) exhausts unnecessary gas through a pressure adjusting valve (21), a turbo molecular pump (22), and a rotary pump (23).
これらの反応性気体は、反応空間(60)で0.001〜1.0
torr例えば0.05torrとした。These reactive gases are present in the reaction space (60) at 0.001 to 1.0
torr For example, 0.05 torr.
かかる空間において、13.56MHzの周波数の0.5〜5KW
(単位面積あたり0.03〜3W/cm2)例えば1KW(単位面積
あたり0.6W/cm2の高エネルギ)の第1の高周波電圧を加
える。さらに第2の交番電圧による交流バイアスの印加
により、被形成面上には−200〜−600V(例えばその出
力は1KW)の負の自己バイアス電圧が印加されており、
この負の自己バイアス電圧により加速された反応性気体
を部材上にスパッタしつつ成膜し、かつ緻密な膜とする
ことができた。In such a space, 0.5 to 5 KW of 13.56 MHz frequency
(Per unit area 0.03~3W / cm 2) for example adding the first high frequency voltage of 1 KW (high energy per unit area 0.6W / cm 2). Further, by applying an AC bias by the second alternating voltage, a negative self-bias voltage of -200 to -600 V (for example, the output is 1 KW) is applied on the surface to be formed,
The reactive gas accelerated by the negative self-bias voltage was formed on the member while being sputtered, thereby forming a dense film.
反応性気体は、例えばエチレンと弗化炭素の混合気体
とした。その割合はC2F6/C2H4=1/4〜4/1とし、代表的
には1/1である。この割合を可変することにより、透過
率および比抵抗を制御することができる。部材(1)の
温度は〜150℃、代表的には外部加熱をすることなく室
温に保持させる。The reactive gas was, for example, a mixed gas of ethylene and carbon fluoride. The ratio is C 2 F 6 / C 2 H 4 = 1/4 to 4/1, typically 1/1. By changing this ratio, the transmittance and the specific resistance can be controlled. The temperature of the member (1) is maintained at 150150 ° C., typically at room temperature without external heating.
かくして、被形成面上は比抵抗1×106〜5×1012Ωc
mを有し、有機樹脂上にも密着させて成膜させる。可変
光に対し、透光性のアモルファス構造または結晶構造を
有する弗素と水素とが添加された炭素または炭素を主成
分とする被膜を0.1〜8μm例えば0.5μm(平面部),1
〜3μm(凸部)に生成させた。成膜速度は100〜1000
Å/分を有していた。Thus, the specific resistance is 1 × 10 6 to 5 × 10 12 Ωc on the surface to be formed.
m, and is formed in close contact with an organic resin to form a film. For variable light, a carbon or carbon-based coating containing fluorine and hydrogen having a light-transmitting amorphous structure or a crystalline structure added with 0.1 to 8 μm, for example, 0.5 μm (flat portion), 1
33 μm (projections). Deposition rate is 100-1000
Å / min.
かくして部材である下敷き、その他の部材に炭素を主
成分とする被膜、特に炭素中に水素を30原子%以下含有
するとともに、0.3〜10原子%弗素が混入した炭素を形
成させることができた。有機物上に100〜2000Åの厚さ
にエチレンのみによる第1の炭素を設け、さらにその上
に弗素と水素とが添加された炭素を主成分とする被膜を
も多層に形成させることができた。Thus, the underlay as a member and other members could form a coating containing carbon as a main component, particularly carbon containing not more than 30 atomic% of hydrogen in carbon and containing 0.3 to 10 atomic% of fluorine. The first carbon consisting of only ethylene was provided on the organic material to a thickness of 100 to 2000 mm, and a multilayer film mainly composed of carbon to which fluorine and hydrogen were added could be formed thereon.
「実施例2」 この実施例は実施例1で用いた装置により、第1図に
示す如く、透光性有機物の部材要部上に炭素を主成分と
する膜を作製した例である。Example 2 In this example, as shown in FIG. 1, a film containing carbon as a main component was formed on a main part of a translucent organic material using the apparatus used in Example 1.
第1図(A)において、事務用品(事務用部材)であ
る上記を示す。その縦断面部を第1図(B)に示す。In FIG. 1 (A), the above-mentioned office supplies (office members) are shown. The longitudinal section is shown in FIG. 1 (B).
第1図(A),(B)において、この透光性プラスチ
ックス(1)は軽量であり、例えばアクリル樹脂で設け
られている。その被形成面を有する部材(1)上に炭素
または炭素を主成分とする耐摩耗性の保護膜(45)を0.
1〜8μmの厚さに設けた。In FIGS. 1A and 1B, the light-transmitting plastics (1) is lightweight, and is made of, for example, an acrylic resin. On the member (1) having the surface to be formed, carbon or a wear-resistant protective film (45) containing carbon as a main component is used.
The thickness was set to 1 to 8 μm.
本発明において、特にこの炭素または弗素が添加され
た炭素を主成分とする被膜は静電気の発生によるゴミの
付着を防ぐため、その比抵抗は1×106〜5×1012Ωcm
の範囲、特に好ましくは1×107〜5×1011Ωcmの範囲
とした。In the present invention, in particular, the coating mainly composed of carbon or carbon to which fluorine is added has a specific resistance of 1 × 10 6 to 5 × 10 12 Ωcm in order to prevent adhesion of dust due to generation of static electricity.
, Particularly preferably 1 × 10 7 to 5 × 10 11 Ωcm.
第1図(C)は三角定規でありA−A′の縦断面図を
(D)に示す。この定規の上表面に炭素または炭素を主
成分とする被膜(45)を0.5μmの厚さに実施例1に従
って形成した。紙、人体、衣服等との摩擦が多く、また
鉱物質のほこりがこすれやすく、結果として失透、濁り
が摩耗により発生しやすいため、本発明は優れたもので
ある。FIG. 1 (C) is a triangular ruler, and FIG. 1 (D) is a longitudinal sectional view taken along line AA '. On the upper surface of this ruler, a coating (45) containing carbon or carbon as a main component was formed to a thickness of 0.5 μm according to Example 1. The present invention is excellent because it has high friction with paper, human body, clothes, etc., and is liable to rub off dust of mineral substances, and as a result, devitrification and turbidity are easily generated by abrasion.
「効果」 本発明は、特にその上面を水はけのよい弗素が添加さ
れたビッカース硬度600〜3000kg/cm2の炭素を主成分と
する被膜、またはビッカース硬度が1000〜7000kg/cm2の
炭素(水素も添加されている)の多層膜を有機物上に密
着させてコートした。その結果、紙、人体、衣服により
こすれやすい凸部により厚く耐摩耗性膜として形成する
ことができた。"Effects" The present invention is particularly applicable to a coating mainly composed of carbon having a Vickers hardness of 600 to 3000 kg / cm 2 and a carbon (hydrogen having a Vickers hardness of 1000 to 7000 kg / cm 2) to which fluorine having good drainage is added. Was also applied onto the organic material. As a result, it was possible to form a thick and wear-resistant film by the convex portions that easily rub against paper, the human body, and clothing.
以上に示す如く、これまで柔らかいためまったく使え
なかったプラスチック製ウインドを作ることの可能性を
実現したことで有効である。As described above, it is effective to realize the possibility of making a plastic window that has been unusable because of its softness.
以上の説明より明らかな如く、本発明は有機樹脂また
はこれらの多層膜をコーティグして設けたものに特に有
効である。この複合体は、他の多くの実施例にみられる
如く、その応用ははかりしれないものであり、特にこの
炭素が150℃以下の低温で形成でき、このため下地の塗
装面と有機物の変成による色調を変わらず、その硬度ま
た基体または部材で対する密着性がきわめて優れている
のが特徴である。As is clear from the above description, the present invention is particularly effective for those provided with an organic resin or a multilayered film formed by coating. This composite, as seen in many other embodiments, is of immeasurable application, especially when the carbon can be formed at low temperatures below 150 ° C. The feature is that the color tone does not change, and the hardness and the adhesion to a substrate or a member are extremely excellent.
第1図は本発明の事務用部材上への炭素膜または炭素を
主成分とした保護膜をコートした例およびその要部を示
す。 第2図は本発明のプラズマCVD装置の製造装置の概要を
示す。FIG. 1 shows an example in which a carbon film or a protective film containing carbon as a main component is coated on an office member of the present invention, and an essential part thereof. FIG. 2 shows an outline of a plasma CVD apparatus manufacturing apparatus according to the present invention.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐々木 麻里 神奈川県厚木市長谷398番地 株式会社 半導体エネルギー研究所内 (72)発明者 土屋 三憲 神奈川県厚木市長谷398番地 株式会社 半導体エネルギー研究所内 (72)発明者 川野 篤 神奈川県厚木市長谷398番地 株式会社 半導体エネルギー研究所内 審査官 荒井 良子 (56)参考文献 特開 昭55−146799(JP,A) 実開 昭58−42088(JP,U) 実開 昭55−115892(JP,U) 実開 昭58−143291(JP,U) ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Mari Sasaki 398 Hase, Hase, Atsugi-shi, Kanagawa Prefecture (72) Inventor Sannori Sanya 398 Hase, Atsugi-shi, Kanagawa, Japan Semiconductor Energy Research Institute (72 ) Inventor Atsushi Kawano 398 Hase, Atsugi-shi, Kanagawa Pref. Examiner at Semiconductor Energy Laboratory Co., Ltd. Yoshiko Arai (56) References JP-A-55-146799 (JP, A) Sho-55-115892 (JP, U) Sho-sho 58-143291 (JP, U)
Claims (2)
物の部材であって、前記有機物表面に1×106〜5×10
12Ωcmの固有抵抗を有しかつ透光性を有する炭素または
炭素を主成分とする膜が設けられたことを特徴とする炭
素膜で覆われた事務用部材。An organic member having a surface that can be rubbed with paper, a human body, and clothes, wherein the organic material has a surface of 1 × 10 6 to 5 × 10
An office member covered with a carbon film, provided with carbon or a film having carbon as a main component, which has a specific resistance of 12 Ωcm and a translucency.
材は定規、三角定規、下敷き、事務机上面よりなること
を特徴とする炭素膜で覆われた事務用部材。2. An office member covered with a carbon film according to claim 1, wherein the office member comprises a ruler, a triangle ruler, an underlay, and a top surface of an office desk.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23316788A JP2627939B2 (en) | 1988-09-16 | 1988-09-16 | Office materials covered with carbon film |
US07/403,821 US5041201A (en) | 1988-09-16 | 1989-09-07 | Plasma processing method and apparatus |
KR1019890013120A KR920007022B1 (en) | 1988-09-16 | 1989-09-11 | Plasma processing method and apparatus |
EP89309352A EP0359567B1 (en) | 1988-09-16 | 1989-09-14 | Plasma processing method and apparatus |
DE68917550T DE68917550T2 (en) | 1988-09-16 | 1989-09-14 | Method and device for plasma treatment. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23316788A JP2627939B2 (en) | 1988-09-16 | 1988-09-16 | Office materials covered with carbon film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0280300A JPH0280300A (en) | 1990-03-20 |
JP2627939B2 true JP2627939B2 (en) | 1997-07-09 |
Family
ID=16950772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23316788A Expired - Lifetime JP2627939B2 (en) | 1988-09-16 | 1988-09-16 | Office materials covered with carbon film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2627939B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6579833B1 (en) | 1999-09-01 | 2003-06-17 | The Board Of Trustees Of The University Of Illinois | Process for converting a metal carbide to carbon by etching in halogens |
US7241475B2 (en) * | 2004-09-30 | 2007-07-10 | The Aerospace Corporation | Method for producing carbon surface films by plasma exposure of a carbide compound |
-
1988
- 1988-09-16 JP JP23316788A patent/JP2627939B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0280300A (en) | 1990-03-20 |
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