JP2502929Y2 - Vertical heat treatment device with heat insulation cylinder - Google Patents
Vertical heat treatment device with heat insulation cylinderInfo
- Publication number
- JP2502929Y2 JP2502929Y2 JP11993690U JP11993690U JP2502929Y2 JP 2502929 Y2 JP2502929 Y2 JP 2502929Y2 JP 11993690 U JP11993690 U JP 11993690U JP 11993690 U JP11993690 U JP 11993690U JP 2502929 Y2 JP2502929 Y2 JP 2502929Y2
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- Japan
- Prior art keywords
- heat insulating
- heat
- base
- cylinder
- storage space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【考案の詳細な説明】 「産業上の利用分野」 本考案は保温筒を有する縦型熱処理装置に係り、ウエ
ーハ支持ボートを設置する円筒状保温台の下側空間域
に、内部に多数の微小空間を有する保温筒を収納した縦
型熱処置装置に関する。[Detailed Description of the Invention] [Industrial field of application] The present invention relates to a vertical heat treatment apparatus having a heat insulation tube, and a large number of minute micro-insulators are provided inside a cylindrical heat insulation table on which a wafer support boat is installed. The present invention relates to a vertical heat treatment device that houses a heat retaining cylinder having a space.
「従来の技術」 従来より、例えば第3図に示すごとく周囲に加熱手段
1を囲繞した石英ガラス製炉芯管2内に、半導体ウエハ
4を積層配置した支持ボート3を収納可能に構成し、前
記加熱手段1により支持ボート3上に戴設した半導体ウ
エハ4を所定温度域まで加熱し制御しながら、該半導体
ウエハ4表面域に反応ガス又は不活性ガスを流し、半導
体ウエハ4表面域の酸化、拡散、気相成長、アニール等
の各種熱処理を行う熱処理装置は公知であり、この種の
熱処理装置においては省設置面積化を図るために、前記
炉心管2を垂直に立設した縦型構造の加熱処理炉を多用
しているが、かかる装置においてはウエハ4表面域に形
成又は注入される薄膜の厚さや不純物濃度分布のバラツ
キを防止する為に、炉芯管2内の加熱区域Aと炉芯管2
開口端側間に石英ガラス製の保温筒5を配して前記ウエ
ハ4熱処理用空間温度の均等化を図るとともに、前記炉
芯管2周囲に囲繞した加熱手段1を保温筒5上方に位置
せしめ、前記保温筒5を断熱材として機能させる事によ
り、炉芯管2開口端側に設けたOリング6その他のシー
ル部分に高温が伝搬するのを防いでいる。“Prior Art” Conventionally, for example, as shown in FIG. 3, a support boat 3 having semiconductor wafers 4 stacked therein can be housed in a quartz glass furnace core tube 2 surrounding a heating means 1, While the semiconductor wafer 4 mounted on the support boat 3 is heated to a predetermined temperature range by the heating means 1 and controlled, a reaction gas or an inert gas is flown to the surface area of the semiconductor wafer 4 to oxidize the surface area of the semiconductor wafer 4. , A heat treatment apparatus for performing various heat treatments such as diffusion, vapor phase growth, annealing, etc. is known, and in this type of heat treatment apparatus, a vertical structure in which the furnace core tube 2 is erected vertically in order to save the installation area. However, in order to prevent variations in the thickness of the thin film formed or implanted in the surface area of the wafer 4 and in the impurity concentration distribution, the heating zone A in the furnace core tube 2 is used. Furnace core tube 2
A heat insulating cylinder 5 made of quartz glass is arranged between the opening ends to equalize the space temperature for the heat treatment of the wafer 4 and the heating means 1 surrounded by the furnace core tube 2 is positioned above the heat insulating cylinder 5. By making the heat insulating cylinder 5 function as a heat insulating material, high temperature is prevented from propagating to the O-ring 6 and other sealing parts provided on the open end side of the furnace core tube 2.
そしてかかる装置においては、前記保温筒5上面に直
接支持ボート4を載置する構成を取るが、保温筒5は一
般に、密封された石英ガラス製の円筒体5a内に、長繊維
状の石英ガラスウール5bを封入して構成されている為に
耐荷重性に乏しく、この為ウエーハ枚数を多くしたり又
大口径化に制限を受ける。In such an apparatus, the support boat 4 is placed directly on the upper surface of the heat insulating tube 5, but the heat insulating tube 5 is generally a long fiber quartz glass in a hermetically sealed quartz glass cylinder 5a. Since it is constructed by enclosing the wool 5b, it has poor load-bearing capacity, which limits the number of wafers and the increase in diameter.
而も前記保温筒5はその上方の炉芯管2周囲に囲繞し
た加熱手段1よりの輻射熱により、上面側が常に高温に
曝されてている為に、密閉された円筒体5a内のガス(空
気)が熱膨張して前記圧力負荷が一層強まり、該円筒体
5aが破壊してしまう場合がある。Moreover, since the upper surface side of the heat insulating cylinder 5 is always exposed to high temperature by the radiant heat from the heating means 1 surrounded by the furnace core tube 2 above it, the gas (air ) Thermally expands to further increase the pressure load,
5a may be destroyed.
この為本考案者は先に、第2図に示すように前記保温
筒5を例えば発砲ガラス体のように多数の微小空間を内
部に有し且つそれ自体は硬質な薄膜石英ガラスが網目状
に縦横に張りめぐらされている石英ガラス体、言い換え
れば内部に多数の微小空間を有する石英ガラス製塑性体
5cで形成した保温筒5′を用いるとともに、該保温筒
5′上に直接支持ボート4を載置する事なく、該保温筒
5′を複数の小円筒体に分割して該分割した円筒体を一
体的に収納する円筒状の枠体7を用意し、該枠体7を介
して前記支持ボート4を設置するように構成した技術を
開示している。(特願昭62−203499号) 「考案が解決しようとする技術的課題」 しかしながら前記保温筒は例え枠体7内に収納されて
いても、結果として支持ボート4側の加熱域と通気状態
で炉芯管2内に配置される構成を取るために、例えばCV
D装置の様にほぼ真空状態で気相成長を行なう装置等に
おいては、前記塑性体31を真空引きした後、該塑性体31
の表面側を透明ガラス層32で隠蔽し減圧封止する構成が
好ましいが、独立気泡もしくは連続気泡として存在する
塑成体を真空引きを行なうのは中々困難であり、而も該
真空引きは前記保温筒5を大径化すればするほど困難と
なり且つ長時間化する。この為前記従来技術においては
前記保温筒を小径に複数に分割しているが、このような
構成を取ると保温筒自体の機能(保温力と断熱力)も低
下するとともに全体としての表面積が大になり、その分
前記真空処理時にはその表面に吸着しているガスやパー
ティクルが飛出し、ウエーハ汚染の原因ともなる。For this reason, the present inventor has previously shown that the heat insulation tube 5 has a large number of minute spaces inside, such as a foam glass body, as shown in FIG. A quartz glass body stretched vertically and horizontally, in other words, a quartz glass plastic body having a large number of minute spaces inside.
The heat insulation cylinder 5'formed by 5c is used, and the heat insulation cylinder 5'is divided into a plurality of small cylinders without placing the support boat 4 directly on the heat insulation cylinder 5'and the divided cylindrical body. Disclosed is a technique in which a cylindrical frame body 7 for integrally housing is prepared, and the support boat 4 is installed via the frame body 7. (Japanese Patent Application No. 62-203499) "Technical problem to be solved by the invention" However, even if the heat insulating tube is housed in the frame body 7, as a result, the heating area on the support boat 4 side and the ventilation state are not maintained. In order to have a structure arranged in the furnace core tube 2, for example, a CV
In a device such as the D device for performing vapor phase growth in a substantially vacuum state, the plastic body 31 is evacuated and then the plastic body 31 is evacuated.
It is preferable to conceal the surface side of the transparent glass layer 32 with a transparent glass layer 32 and to seal under reduced pressure, but it is difficult to evacuate the plastic body existing as closed cells or continuous cells, and the vacuuming is the heat retention. The larger the diameter of the cylinder 5, the more difficult and longer the time. For this reason, in the above-mentioned prior art, the heat retaining cylinder is divided into a plurality of small diameters. However, if such a configuration is adopted, the function (heat retaining power and adiabatic force) of the heat retaining cylinder itself is reduced and the total surface area is large. Therefore, during the vacuum treatment, the gas and particles adsorbed on the surface thereof are ejected, which also causes wafer contamination.
又前記のように複数の保温筒に分割するのはその取付
け取り出しが繁雑化するのみならず、これらを囲繞する
枠体40の構成も複雑化する。Further, the division into a plurality of heat retaining tubes as described above not only complicates the attachment and removal thereof, but also complicates the structure of the frame body 40 surrounding them.
又前記の様に保温筒がウエーハ処理域と直接通気する
構成を取る事は保温筒表面に処理ガス膜が付着し、該膜
を除去するために前記加熱処理後に保温筒をフッ酸等で
洗浄する必要があるが、洗浄により前記ガラス層がエッ
チングされ、前記洗浄液が気泡内部に入り込んでしまう
場合がある。Further, as described above, the structure in which the heat retaining tube is directly ventilated to the wafer processing area means that the treated gas film adheres to the surface of the heat retaining tube, and in order to remove the film, the heat retaining tube is washed with hydrofluoric acid or the like after the heat treatment. However, there is a case in which the glass layer is etched by the cleaning and the cleaning liquid may get inside the bubbles.
本考案はかかる従来技術の欠点に鑑み、大口径化と多
数枚化に耐えられるだけの断熱性、保温性及び高耐圧性
を有し、特にCVD等の減圧処理装置として好適に使用さ
れる保温筒を有する縦型熱処理装置を提供する事を目的
とする。In view of the drawbacks of the prior art, the present invention has a heat insulating property, a heat retaining property and a high pressure resistance that can withstand a large diameter and a large number of sheets, and is particularly suitable for use as a reduced pressure processing apparatus such as CVD. An object is to provide a vertical heat treatment apparatus having a tube.
「問題点を解決するための手段」 本考案は、上面にウエーハ支持ボート4を設置し、下
側空間に前記塑成体からなる保温筒50を収納した保温台
40を用い、該保温台40を介して保温筒収納空間Bとウエ
ーハ支持ボート収納空間Aを気密的に区分けした点を第
一の特徴とする。[Means for Solving Problems] The present invention is a heat insulating base in which a wafer supporting boat 4 is installed on an upper surface and a heat insulating cylinder 50 made of the plastic is housed in a lower space.
The first feature is that the space 40 for storing the heat-insulating cylinder and the space A for storing the wafer support boat are airtightly divided through the heat insulating base 40 by using 40.
そして第二の特徴とする所は、前記保温台40を支持す
る基台70若しくは保温台フランジ部41との間の接触部を
介して前記保温筒収納空間Bを通気又は減圧可能に構成
した点にある。The second feature is that the heat insulating cylinder storage space B can be ventilated or depressurized through a contact portion between the base 70 supporting the heat insulating base 40 or the heat insulating base flange portion 41. It is in.
そして好ましくは前記保温筒50を一の保温筒50で形成
するとともに、該一の保温筒50と保温台40を夫々炉芯管
2に対し同心状に配置するとともに、前記保温筒50上面
側で前記保温台40のウエーハ支持部背面側を支持可能に
構成した点にある。And preferably, the heat insulating cylinder 50 is formed by one heat insulating cylinder 50, and the one heat insulating cylinder 50 and the heat insulating base 40 are respectively arranged concentrically with respect to the furnace core tube 2, and at the upper surface side of the heat insulating cylinder 50. The rear side of the wafer supporting portion of the heat insulating base 40 is configured to be supported.
「作用」 かかる技術手段によれば、保温台40を介して保温筒収
納空間Bとウエーハ支持ボート収納空間Aを気密的に区
分けしつつ保温筒収納空間B側を通気状態に維持したた
めに、前記保温筒収納空間Bを常に常圧下に維持でき、
これにより前記保温筒50を形成する塑性体31を真空引き
する必要がなく常圧のまま形成可能である為、前記保温
筒505を大径化するのが容易となる。[Operation] According to the technical means, since the heat insulation cylinder storage space B and the wafer support boat storage space A are airtightly divided through the heat insulation base 40, the heat insulation cylinder storage space B side is maintained in the ventilation state. It is possible to always keep the heat insulation cylinder storage space B under normal pressure,
Accordingly, since it is possible to form the plastic body 31 forming the heat retaining cylinder 50 under normal pressure without evacuation, it is easy to increase the diameter of the heat retaining cylinder 505.
又、第4図に示すCVD装置の様にほぼ真空状態で気相
成長を行う装置においても前記収納空間Bを基台の通気
孔を通して減圧にすればよくこの時保温筒がウールでは
なく、石英ガラス塑成体からなる為、減圧配管系にウー
ルダストが吸込まれ詰ることがない。Also, in an apparatus for performing vapor phase growth in a substantially vacuum state such as the CVD apparatus shown in FIG. 4, it is sufficient to reduce the pressure in the storage space B through the ventilation holes of the base, and at this time, the heat insulating cylinder is made of quartz instead of wool. Wool dust is not sucked into the depressurized piping system because it is made of glass plastic.
即ちこの事は保温筒50を分割する事なく、炉芯管2形
状に合せて一の保温体で形成できる為に、大口径化に対
応するのに十分なる断熱容量と保温容量を持つ事が可能
となり、而も前記保温筒50の微小気泡内に空気等の気体
が存在するために前記断熱機能と保温機能が一層向上す
る。In other words, this is because the heat insulating cylinder 50 can be formed with one heat insulating body in accordance with the shape of the furnace core tube 2 without dividing the heat insulating cylinder 50, so that it has sufficient heat insulation capacity and heat insulating capacity to cope with the increase in diameter. This is possible, and since the gas such as air is present in the minute bubbles of the heat insulating cylinder 50, the heat insulating function and the heat insulating function are further improved.
又一の保温筒50で足りる事は該保温筒50を収納する保
温台40等の形状が簡単化し且つ該保温筒50の取付け取り
出しも容易であるため、洗浄も膜の付着する保温台50の
みでよく容易である。Also, one heat insulating cylinder 50 is sufficient, because the shape of the heat insulating base 40 for accommodating the heat insulating cylinder 50 is simplified and the heat insulating cylinder 50 can be easily attached and removed, so that only the heat insulating base 50 to which the film is attached can be washed. Well and easy.
又、前記の様に炉芯管2に合わせて支持ボート4を搭
載する保温台40を大径化した場合その分保温台40の耐強
度性が低下するが、本考案は前記保温筒50がそれ自体耐
圧強度を有する石英ガラス塑成体で形成したために、該
一の保温筒50と保温台40を夫々炉芯管2に対し同心状に
配置するとともに、前記保温筒50上面側で前記保温台40
のウエーハ支持部背面側を支持可能に構成する事により
前記保温台40を大径化した場合においても耐強度性が低
下する事がなく、これにより支持ボート4のウエーハ搭
載枚数を多数枚化した場合においても十分対処し得る。In addition, as mentioned above, when the diameter of the heat insulating base 40 for mounting the support boat 4 in accordance with the furnace core tube 2 is increased, the strength resistance of the heat insulating base 40 is reduced by that amount. Since the heat insulating cylinder 50 and the heat insulating base 40 are arranged concentrically with respect to the furnace core tube 2 respectively because they are formed of a quartz glass plastic body having pressure resistance per se, the heat insulating base is provided on the upper surface side of the heat insulating cylinder 50. 40
By supporting the back side of the wafer support part, the strength resistance does not decrease even when the diameter of the heat insulating base 40 is increased, and thus the number of wafers mounted on the support boat 4 is increased. It can be dealt with in some cases.
「実施例」 以下、図面を参照して本考案の好適な実施例を例示的
に詳しく説明する。ただしこの実施例に記載されている
構成部品の寸法、材質、形状、その相対配置などは特に
特定的な記載がない限りは、この考案の範囲をそれのみ
に限定する趣旨ではなく、単なる説明例に過ぎない。[Embodiment] Hereinafter, a preferred embodiment of the present invention will be exemplarily described in detail with reference to the drawings. However, unless otherwise specified, the dimensions, materials, shapes, relative positions, etc. of the components described in this embodiment are not intended to limit the scope of the present invention thereto, but merely illustrative examples. Nothing more than.
第1図は本第1考案の実施例に係る縦型構造の熱処理
装置の要部構成を示し、保温筒505が配置された炉芯管
2下方部分を図示している。FIG. 1 shows a main part configuration of a heat treatment apparatus having a vertical structure according to an embodiment of the first aspect of the present invention, and illustrates a lower part of a furnace core tube 2 in which a heat insulating cylinder 505 is arranged.
2は円筒ドーム状の縦型炉芯管2でその下端側開口部
にフランジ部21を設け、該フランジ部21を保温台40側の
フランジ部41上面に設置可能に構成するとともに、気密
的に構成する。Reference numeral 2 denotes a cylindrical dome-shaped vertical furnace core tube 2 provided with a flange portion 21 at its lower end side opening portion, and the flange portion 21 can be installed on the upper surface of the flange portion 41 on the heat insulating base 40 side, and is airtight. Configure.
保温台40は、前記炉芯管2内径より僅かに小なる外径
を有する透明石英ガラス製円筒体で形成され、上面を支
持ボート4が搭載可能な平面状をなすとともに、下端開
口部に設けたフランジ部41を炉芯管2側のフランジ部21
と同径に形成する。そして前記平面状をなす上面に同心
状にリング体42を突設し、該リング体42上に支持ボート
4を位置決め搭載可能に構成する。The heat insulating base 40 is formed of a transparent quartz glass cylinder having an outer diameter slightly smaller than the inner diameter of the furnace core tube 2, and has a flat upper surface on which the support boat 4 can be mounted and is provided at the lower end opening. The flange portion 41 on the furnace core tube 2 side 21
And the same diameter. A ring body 42 is concentrically provided on the flat upper surface so that the support boat 4 can be positioned and mounted on the ring body 42.
基台70は前記フランジ部41外径と同径の円板状をな
し、前記保温台40のフランジ部41の下面側に前記基台70
周縁面が設置可能に構成する。The base 70 has a disk shape having the same diameter as the outer diameter of the flange portion 41, and the base 70 is provided on the lower surface side of the flange portion 41 of the heat insulating base 40.
The peripheral surface can be installed.
又前記基台70はその保温台40内壁面と近接する上面側
にに同心状にリング体71を突設し、該リング体71上に保
温筒50が位置決め設置可能に構成するとともに、該基台
70中央部には貫通孔72を穿設し、外部と通気可能に構成
する。Further, the base 70 has a ring body 71 concentrically protrudingly provided on the upper surface side close to the inner wall surface of the heat insulating base 40, and the heat insulating cylinder 50 can be positioned and installed on the ring body 71. Stand
A through hole 72 is formed in the central portion of 70 to allow ventilation to the outside.
この結果、保温台40と基台70間に挟まれる保温筒収納
空間Bが通気可能に又保温台40上面側には炉芯管2が気
密的に設置されているために、該炉芯管2内部のウエー
ハ支持ボート収納空間Aと前記保温筒収納空間Bとが気
密的に区分けされる事となる。As a result, since the heat insulating cylinder storage space B sandwiched between the heat insulating base 40 and the base 70 can be ventilated and the furnace core tube 2 is airtightly installed on the upper surface side of the heat insulating base 40, the furnace core tube The wafer support boat storage space A and the heat insulation cylinder storage space B inside 2 are airtightly divided.
そして前記基台70上に設置される保温筒50は、内部に
多数の微小気泡を有する塑性体31と、その周囲を囲繞す
る透明石英ガラス製の囲繞体32から形成されている。The heat insulating cylinder 50 installed on the base 70 is formed of a plastic body 31 having a large number of minute bubbles inside and a surrounding body 32 made of transparent quartz glass surrounding the plastic body 31.
次に前記塑性体31の製造手順について説明するに、先
ず上方が開口し、前記囲繞体32と同形で且つ背高のみが
大なる石英製ルツボ32内に結晶質又はガラス質の石英微
粉を投入し、真空炉中で1300〜1600℃前後の温度で加熱
する事により、内部に多数の微小空間を有し、石英薄膜
が縦横に張りめぐらされた、いわゆる発泡ガラス状の塑
性体31が形成される。Next, in order to explain the manufacturing procedure of the plastic body 31, first, a crystalline or vitreous quartz fine powder is put into a quartz crucible 32 having an opening at the upper side and having the same shape as the surrounding body 32 and only a large height. Then, by heating in a vacuum furnace at a temperature of about 1300 to 1600 ° C, a so-called foam glass-like plastic body 31 having a large number of minute spaces inside and a quartz thin film stretched vertically and horizontally is formed. It
この際前記石英微粉内にカーボン粉とともに水を混入
して泥状にした状態で、加熱させる事により更に多数の
真空微小空間を有する発泡ガラス状の塑性体31が形成出
来、好ましい。At this time, it is preferable that foamed glass-like plastic body 31 having a large number of vacuum microspaces can be formed by heating the quartz fine powder with water mixed with carbon powder in a mud-like state to heat it.
そしてこのようにして形成された塑性体31は前記加熱
により、その表面が石英製ルツボ32と一体的に溶着する
とともに、体積が減少する為に、その減少したルツボの
上側部分を切断し、その上面に蓋体を溶着して、前記塑
性体31外周囲を囲繞体32にて囲繞させる。Then, the plastic body 31 formed in this way is heated by the heating, the surface thereof is integrally welded to the quartz crucible 32, and the volume is reduced, so that the upper portion of the reduced crucible is cut, A lid is welded to the upper surface, and the outer periphery of the plastic body 31 is surrounded by a surrounding body 32.
尚、本実施例においては保温筒収納空間Bがウエーハ
支持ボート収納空間Aと気密的に区分けさているため
に、該ルツボ32より取り出した塑性体31そのまま保温筒
50として利用する事も可能であり、又その表面をバーナ
であぶる事により表面層にのみ薄膜の透明石英ガラス層
を形成してもよい。In this embodiment, since the heat insulating cylinder storage space B is airtightly separated from the wafer support boat storage space A, the plastic body 31 taken out from the crucible 32 is kept as it is.
It can also be used as 50, and a thin transparent quartz glass layer may be formed only on the surface layer by rubbing the surface with a burner.
そして前記保温筒50は前記塑成体自体も耐圧強度を有
し、而もその表面にルツボとしても利用可能な厚肉の囲
繞体を有するために、その背高を前記収納空間高さとほ
ぼ同一に設定し、該保温筒50上面側で前記保温台40のウ
エーハ支持部背面側を支持可能に構成するのがよい。And since the heat insulating cylinder 50 has a pressure resistant strength also for the plastic body itself and has a thick walled enclosure that can also be used as a crucible on its surface, its height is substantially the same as the storage space height. It is preferable that the temperature is set so that the upper surface side of the heat insulating cylinder 50 can support the back surface side of the wafer supporting portion of the heat insulating base 40.
第4図はCVD装置に適用した実施例を示し、前記実施
例との差異を中心に説明するに、基台70の通気孔72に減
圧管系73を、又炉芯管2、保温台40の下端側に設けられ
たフランジ21、41及び基台70間に夫々Oリング22、43を
介在させ、ウエーハ収納空間Aと保温筒収納空間Bのい
ずれをも減圧若しくは真空維持可能に構成している。FIG. 4 shows an embodiment applied to a CVD apparatus. To explain mainly the differences from the above-mentioned embodiment, a pressure reducing pipe system 73 is provided in a vent hole 72 of a base 70, a furnace core tube 2, a heat insulating base 40. O-rings 22 and 43 are respectively interposed between the flanges 21 and 41 and the base 70 provided on the lower end side of the wafer storage space A and the heat insulation cylinder storage space B so that decompression or vacuum can be maintained. There is.
又この時前記収納空間Bを基台70の通気孔72を通して
減圧ににした場合に保温筒50がウールではなく、石英ガ
ラス塑成体からなる為、減圧配管系73にウールダストが
吸込まれ詰ることがない。At this time, when the storage space B is decompressed through the ventilation holes 72 of the base 70, since the heat retaining cylinder 50 is made of quartz glass plastic rather than wool, wool debris is sucked into the decompression piping system 73 and clogged. There is no.
「考案の効果」 以上記載した如く、本考案によれば、大口径化と多数
枚化に耐えられるだけの断熱性、保温性及び高耐圧性を
十分満足しつつ、CVD等の減圧処理装置としても好適に
使用される保温筒を有する縦型熱処理装置を提供する事
が出来る。[Advantage of device] As described above, according to the present invention, as a pressure reducing device for CVD, etc., while sufficiently satisfying the heat insulating property, heat retaining property and high pressure resistance that can withstand the increase in diameter and the number of sheets. It is also possible to provide a vertical heat treatment apparatus having a heat insulation tube that is preferably used.
等の種々の著効を有する。It has various remarkable effects.
第1図及び第4図は本考案の実施例に係る縦型構造の熱
処理装置の要部構成を示す要部正面断面図、第2図及び
第3図は従来公知の熱処理装置を示す正面断面図であ
る。 3:ウエーハ支持ボート 31:石英ガラス塑成体、50:保温筒 40:保温台、B:保温筒収納空間 A:ウエーハ支持ボート収納空間 70:基台、2:炉芯管FIG. 1 and FIG. 4 are front cross-sectional views of a main part showing the configuration of the main parts of a vertical heat treatment apparatus according to an embodiment of the present invention, and FIGS. 2 and 3 are front cross-section views of a conventionally known heat treatment apparatus. It is a figure. 3: Wafer support boat 31: Quartz glass plastic body, 50: Heat insulation cylinder 40: Heat insulation base, B: Heat insulation cylinder storage space A: Wafer support boat storage space 70: Base, 2: Core tube
Claims (2)
空間に内部に多数の微小空間を有する石英ガラス塑成体
からなる保温筒を収納した保温台を有し、該保温台を介
して前記保温筒収納空間とウエーハ支持ボート収納空間
を気密的に区分けするとともに、下側より前記保温台を
支持する基台若しくは該基台との間の接触部を介して前
記保温筒収納空間を通気又は減圧可能に構成した事を特
徴とする縦型熱処理装置1. A wafer support boat is installed on an upper surface, and a heat insulating base having a heat insulating cylinder made of a silica glass plastic body having a large number of minute spaces inside is provided in a lower space, and the heat insulating base is provided through the heat insulating base. The heat insulation cylinder storage space and the wafer support boat storage space are airtightly separated, and the heat insulation cylinder storage space is ventilated from below through a base supporting the heat insulation base or a contact portion between the base or the base. Vertical heat treatment equipment characterized by being able to reduce pressure
し同心状に配置するとともに、前記保温筒上面側で前記
保温台のウエーハ支持部背面側を支持可能に構成した請
求項1)記載の縦型熱処理装置2. The one heat insulating cylinder and the heat insulating base are arranged concentrically with respect to the furnace core tube, respectively, and the back surface of the wafer supporting portion of the heat insulating base can be supported by the upper surface of the heat insulating cylinder. 1) Vertical heat treatment device
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11993690U JP2502929Y2 (en) | 1990-11-16 | 1990-11-16 | Vertical heat treatment device with heat insulation cylinder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11993690U JP2502929Y2 (en) | 1990-11-16 | 1990-11-16 | Vertical heat treatment device with heat insulation cylinder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0476032U JPH0476032U (en) | 1992-07-02 |
JP2502929Y2 true JP2502929Y2 (en) | 1996-06-26 |
Family
ID=31867866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11993690U Expired - Lifetime JP2502929Y2 (en) | 1990-11-16 | 1990-11-16 | Vertical heat treatment device with heat insulation cylinder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2502929Y2 (en) |
-
1990
- 1990-11-16 JP JP11993690U patent/JP2502929Y2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0476032U (en) | 1992-07-02 |
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