JP2024506056A - 特にマイクロリソグラフィ用の光学系を調整する方法 - Google Patents

特にマイクロリソグラフィ用の光学系を調整する方法 Download PDF

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Publication number
JP2024506056A
JP2024506056A JP2023547904A JP2023547904A JP2024506056A JP 2024506056 A JP2024506056 A JP 2024506056A JP 2023547904 A JP2023547904 A JP 2023547904A JP 2023547904 A JP2023547904 A JP 2023547904A JP 2024506056 A JP2024506056 A JP 2024506056A
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JP
Japan
Prior art keywords
layer
optical
wavefront
optical element
optical system
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Pending
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JP2023547904A
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English (en)
Japanese (ja)
Inventor
グルップ ミカエル
シュクロベール ビタリー
シッケタンツ トーマス
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2024506056A publication Critical patent/JP2024506056A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2023547904A 2021-02-09 2021-12-17 特にマイクロリソグラフィ用の光学系を調整する方法 Pending JP2024506056A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021201193.4A DE102021201193A1 (de) 2021-02-09 2021-02-09 Verfahren zur Justage eines optischen Systems, insbesondere für die Mikrolithographie
DE102021201193.4 2021-02-09
PCT/EP2021/086614 WO2022171339A1 (de) 2021-02-09 2021-12-17 Verfahren zur justage eines optischen systems, insbesondere für die mikrolithographie

Publications (1)

Publication Number Publication Date
JP2024506056A true JP2024506056A (ja) 2024-02-08

Family

ID=80112270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023547904A Pending JP2024506056A (ja) 2021-02-09 2021-12-17 特にマイクロリソグラフィ用の光学系を調整する方法

Country Status (4)

Country Link
JP (1) JP2024506056A (de)
CN (1) CN116745702A (de)
DE (1) DE102021201193A1 (de)
WO (1) WO2022171339A1 (de)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533449A (en) 1984-04-16 1985-08-06 The Perkin-Elmer Corporation Rapid surface figuring by selective deposition
WO1997033203A1 (en) * 1996-03-07 1997-09-12 Philips Electronics N.V. Imaging system and apparatus for ultraviolet lithography
JP3924806B2 (ja) 1996-06-10 2007-06-06 株式会社ニコン 反射防止膜
US7261957B2 (en) 2000-03-31 2007-08-28 Carl Zeiss Smt Ag Multilayer system with protecting layer system and production method
US7629572B2 (en) 2005-10-28 2009-12-08 Carl Zeiss Laser Optics Gmbh Optical devices and related systems and methods
EP2109134B1 (de) 2007-01-25 2017-03-01 Nikon Corporation Optisches element, belichtungsvorrichtung mit dem optischen element und bauelementeherstellungsverfahren
DE102008041144A1 (de) * 2007-08-21 2009-03-05 Carl Zeiss Smt Ag Optische Anordnung und optisches Abbildungssystem damit, Verfahren zu deren Optimierung und Verfahren zum Herstellen eines optischen Elements
DE102011083461A1 (de) 2011-09-27 2013-03-28 Carl Zeiss Smt Gmbh Verfahren zum Erzeugen einer Deckschicht aus Siliziumoxid an einem EUV-Spiegel
DE102011054837A1 (de) 2011-10-26 2013-05-02 Carl Zeiss Laser Optics Gmbh Optisches Element
DE102012212194B4 (de) 2012-07-12 2017-11-09 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Veränderung einer optischen Wellenfront in einem katoptrischen Objektiv einer solchen Anlage
DE102012223669A1 (de) 2012-12-19 2013-11-21 Carl Zeiss Smt Gmbh Wellenfrontkorrektur von beschichteten Spiegeln
DE102013212462A1 (de) * 2013-06-27 2015-01-15 Carl Zeiss Smt Gmbh Oberflächenkorrektur von Spiegeln mit Entkopplungsbeschichtung
DE102014225197A1 (de) 2014-12-09 2015-11-26 Carl Zeiss Smt Gmbh Verfahren zum Verändern einer Oberflächenform, reflektives optisches Element, Projektionsobjektiv und EUV-Lithographieanlage
DE102015207153A1 (de) * 2015-04-20 2016-10-20 Carl Zeiss Smt Gmbh Wellenfrontkorrekturelement zur Verwendung in einem optischen System
DE102016200814A1 (de) 2016-01-21 2017-07-27 Carl Zeiss Smt Gmbh Reflektives optisches Element und optisches System für die EUV-Lithographie
NL2020103A (en) * 2017-01-17 2018-07-23 Asml Netherlands Bv Lithographic Apparatus and Method
DE102018203241A1 (de) * 2018-03-05 2019-09-05 Carl Zeiss Smt Gmbh Optisches Element, sowie Verfahren zur Korrektur der Wellenfrontwirkung eines optischen Elements

Also Published As

Publication number Publication date
WO2022171339A1 (de) 2022-08-18
CN116745702A (zh) 2023-09-12
DE102021201193A1 (de) 2022-08-11

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