JP2022530366A - 高ピークパワーを有する極短パルスの光束に耐性のある反射型回折格子及びその製造方法 - Google Patents
高ピークパワーを有する極短パルスの光束に耐性のある反射型回折格子及びその製造方法 Download PDFInfo
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
- 第1の金属は、金及び銀、又は金、及び/若しくは銀、及び/若しくは別の材料の合金、例えば金-ニッケル合金、金-銅合金、金-銀合金、金-銀-イリジウム合金又は金-銅-銀-イリジウム合金の中から選択される。
- 第1の金属は、金又は金合金であることが好ましい。
- 外部反射層の厚さは、100nm~500nm、好ましくは100nm~150nmである。
- 他の金属は、ニッケル、銅、モリブデン、クロム、銀又は銀-イリジウム合金の中から選択される。
- 中間金属層の厚さは、20nm~250nm、例えば50nm~150nmである。
Claims (13)
- 基板(1)の表面(10)上に形成された格子線(11)と、外部反射層(13)とを含む、高ピークパワーの極短パルスの光束に耐性のある反射型回折格子において、前記外部反射層(13)と、前記格子線(11)を含む前記基板表面(10)との間に配置された少なくとも1つの中間金属層(14)を含み、前記外部反射層(13)は、前記中間金属層(14)との境界面を有し、前記外部反射層(13)は、第1の金属からなり、及び前記中間金属層(14)は、別の金属からなり、前記他の金属は、前記第1の金属の電子-フォノン結合定数よりも高い電子-フォノン結合定数を有し、前記外部反射層(13)は、前記第1の金属の反射係数によって決定される下限と、前記第1の金属の熱拡散長によって決定される上限とを有する範囲の厚さを有し、及び前記中間金属層(14)は、前記反射型回折格子の、高ピークパワーの極短パルスの光束への耐性を高めるように、最小値よりも大きい別の厚さを有することを特徴とする、高ピークパワーの極短パルスの光束に耐性のある反射型回折格子。
- 前記第1の金属は、金及び銀、又は金及び/若しくは銀の合金、又は金-ニッケル合金、金-銅合金、金-銀合金、金-銀-イリジウム合金若しくは金-銅-銀-イリジウム合金の中から選択される、請求項1に記載の回折格子。
- 前記外部反射層(13)の前記厚さは、100nm~500nmである、請求項2に記載の回折格子。
- 前記他の金属は、ニッケル、銅、モリブデン、クロム、銀又は銀-イリジウム合金の中から選択される、請求項1~3のいずれか一項に記載の回折格子。
- 前記中間金属層(14)の前記厚さは、20nm~250nmである、請求項1~4のいずれか一項に記載の回折格子。
- 前記格子線(11)を含む前記基板の前記表面上に配置された接着層(2)を更に含み、前記接着層(2)は、前記基板表面と前記中間金属層(14)との間に配置され、前記接着層(2)は、25ナノメートル未満の厚さを有する、請求項1~5のいずれか一項に記載の回折格子。
- 前記接着層(2)は、クロム又はチタンで作られる、請求項6に記載の回折格子。
- 前記基板は、シリカ、シリコン、ゼロデュア、パイレックス又はホウケイ酸塩で作られる、請求項1~7のいずれか一項に記載の回折格子。
- 前記格子線(11)は、前記基板に形成されるか、又は前記格子線(11)は、前記基板上に堆積された感光性樹脂によって形成される、請求項1~8のいずれか一項に記載の回折格子。
- 前記外部反射層(13)の表面において形成された誘電体薄膜コーティングを更に含む、請求項1~9のいずれか一項に記載の回折格子。
- 前記基板と前記中間金属層(14)との間に配置された少なくとも別の中間金属層を更に含み、前記中間金属層(14)及び前記他の中間金属層は、いくつかの中間金属層の積層体を形成する、請求項1~10のいずれか一項に記載の回折格子。
- 基板(1)の表面(10)上に回折格子線(11)を形成するステップと、中間金属層(14)を堆積させるステップと、外部反射層(13)を堆積させるステップとを含む、反射型回折格子を製造する方法であって、前記外部反射層(13)は、前記中間金属層(14)との境界面を有し、前記外部反射層は、第1の金属からなり、及び前記中間金属層(14)は、別の金属からなり、前記他の金属は、前記第1の金属の電子-フォノン結合定数よりも高い電子-フォノン結合定数を有し、前記外部反射層は、前記第1の金属の反射係数によって決定される下限と、前記第1の金属の熱拡散長によって決定される上限とを有する範囲の厚さを有し、前記中間金属層(14)は、前記反射型回折格子の、高ピークパワーの極短パルスの光束への耐性を高めるように、最小値よりも大きい別の厚さを有する、方法。
- 前記中間金属層(14)を堆積させるステップ前に、前記格子線上に接着層(2)を堆積させる追加的なステップを更に含む、請求項12に記載の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1904240A FR3095281B1 (fr) | 2019-04-19 | 2019-04-19 | Réseau de diffraction en réflexion résistant à un flux lumineux à impulsions ultra-courtes de forte puissance crête et son procédé de fabrication |
FR1904240 | 2019-04-19 | ||
PCT/EP2020/060822 WO2020212556A1 (fr) | 2019-04-19 | 2020-04-17 | Réseau de diffraction en réflexion résistant à un flux lumineux à impulsions ultra-courtes de forte puissance crête et son procédé de fabrication |
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JP2022530366A true JP2022530366A (ja) | 2022-06-29 |
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Country Status (7)
Country | Link |
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US (1) | US20220179137A1 (ja) |
EP (1) | EP3956700A1 (ja) |
JP (1) | JP2022530366A (ja) |
CN (1) | CN114041072A (ja) |
FR (1) | FR3095281B1 (ja) |
IL (1) | IL287376A (ja) |
WO (1) | WO2020212556A1 (ja) |
Families Citing this family (1)
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CN115437053B (zh) * | 2022-09-29 | 2024-04-12 | 中国科学院上海光学精密机械研究所 | 脉冲压缩的琥珀金光栅及其制备方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4846552A (en) * | 1986-04-16 | 1989-07-11 | The United States Of America As Represented By The Secretary Of The Air Force | Method of fabricating high efficiency binary planar optical elements |
JPH05346502A (ja) * | 1992-04-16 | 1993-12-27 | Canon Inc | 樹脂製光学部品の高反射ミラー |
US20040190141A1 (en) * | 2003-03-27 | 2004-09-30 | The Regents Of The University Of California | Durable silver thin film coating for diffraction gratings |
US20120093191A1 (en) * | 2009-04-29 | 2012-04-19 | Horiba Jobin Yvon Sas | Metal diffraction grating with high reflection resistance to a femtosecond mode flow, system including such an grating, and method for improving the damage threshold of a metal diffraction grating |
WO2014118925A1 (ja) * | 2013-01-31 | 2014-08-07 | 株式会社島津製作所 | レーザパルス圧縮用回折格子及びレーザ装置 |
US20180050904A1 (en) * | 2016-02-17 | 2018-02-22 | The Curators Of The University Of Missouri | Fabrication of multilayer nanograting structures |
WO2018226539A1 (en) * | 2017-06-08 | 2018-12-13 | Lawrence Livermore National Security, Llc | Metal-overcoated grating and method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006178312A (ja) * | 2004-12-24 | 2006-07-06 | Canon Inc | 表面反射型位相格子 |
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2019
- 2019-04-19 FR FR1904240A patent/FR3095281B1/fr active Active
-
2020
- 2020-04-17 US US17/594,466 patent/US20220179137A1/en active Pending
- 2020-04-17 WO PCT/EP2020/060822 patent/WO2020212556A1/fr active Application Filing
- 2020-04-17 JP JP2021561903A patent/JP2022530366A/ja active Pending
- 2020-04-17 EP EP20720027.0A patent/EP3956700A1/fr active Pending
- 2020-04-17 CN CN202080044906.7A patent/CN114041072A/zh active Pending
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2021
- 2021-10-19 IL IL287376A patent/IL287376A/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4846552A (en) * | 1986-04-16 | 1989-07-11 | The United States Of America As Represented By The Secretary Of The Air Force | Method of fabricating high efficiency binary planar optical elements |
JPH05346502A (ja) * | 1992-04-16 | 1993-12-27 | Canon Inc | 樹脂製光学部品の高反射ミラー |
US20040190141A1 (en) * | 2003-03-27 | 2004-09-30 | The Regents Of The University Of California | Durable silver thin film coating for diffraction gratings |
US20120093191A1 (en) * | 2009-04-29 | 2012-04-19 | Horiba Jobin Yvon Sas | Metal diffraction grating with high reflection resistance to a femtosecond mode flow, system including such an grating, and method for improving the damage threshold of a metal diffraction grating |
WO2014118925A1 (ja) * | 2013-01-31 | 2014-08-07 | 株式会社島津製作所 | レーザパルス圧縮用回折格子及びレーザ装置 |
US20180050904A1 (en) * | 2016-02-17 | 2018-02-22 | The Curators Of The University Of Missouri | Fabrication of multilayer nanograting structures |
WO2018226539A1 (en) * | 2017-06-08 | 2018-12-13 | Lawrence Livermore National Security, Llc | Metal-overcoated grating and method |
Also Published As
Publication number | Publication date |
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US20220179137A1 (en) | 2022-06-09 |
FR3095281A1 (fr) | 2020-10-23 |
EP3956700A1 (fr) | 2022-02-23 |
CN114041072A (zh) | 2022-02-11 |
IL287376A (en) | 2021-12-01 |
FR3095281B1 (fr) | 2021-08-27 |
WO2020212556A1 (fr) | 2020-10-22 |
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