JP6636238B2 - プラズモン界面とその製造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000463 material Substances 0.000 claims description 197
- 239000010410 layer Substances 0.000 claims description 188
- 239000010409 thin film Substances 0.000 claims description 103
- 230000003287 optical effect Effects 0.000 claims description 86
- 229910052751 metal Inorganic materials 0.000 claims description 49
- 239000002184 metal Substances 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 28
- 239000012790 adhesive layer Substances 0.000 claims description 19
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 15
- 238000007743 anodising Methods 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 12
- 239000000853 adhesive Substances 0.000 claims description 11
- 230000001070 adhesive effect Effects 0.000 claims description 11
- 239000010931 gold Substances 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 10
- 239000010408 film Substances 0.000 claims description 9
- 229910052737 gold Inorganic materials 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 7
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 238000002048 anodisation reaction Methods 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 239000010407 anodic oxide Substances 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000013500 data storage Methods 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
- B32B2037/243—Coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/20—Inorganic coating
- B32B2255/205—Metallic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/28—Multiple coating on one surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2551/00—Optical elements
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Integrated Circuits (AREA)
Description
2 プラズモン材料層
3 薄膜ライトパイプ構造
4 支持基板層
5 接着剤
6 導波路層
7 緩衝層
8 接着層
10 多層材料積層体
12 薄膜プラズモン層、プラズモン材料の薄膜層12
14 基板層
16 第1表面
17 接着層
18 薄膜光導波路構造
20 第2表面
22 導波路層
24 緩衝層
26 材料積層体
28 導波路構造
Claims (17)
- 基板層(14)を用意する工程と、
前記基板層(14)の上にプラズモン材料の層(12)を配置する工程と、
光導波路材料の金属成分を前記プラズモン材料の層(12)の上に直接堆積させる工程と、
前記光導波路材料の前記金属成分を陽極酸化して、前記プラズモン材料の層(12)に光を結合する、前記金属成分の光学的に透明な酸化物を形成する工程であって、前記金属成分の前記光学的に透明な酸化物は光導波路構造(18)を形成する、工程と、
を含み、
前記光導波路材料の前記金属成分を陽極酸化する前記工程では、前記光導波路材料の前記金属成分に前記プラズモン材料の層(12)を通して電流を供給し、前記プラズモン材料の層(12)は前記陽極酸化を行うための電極として機能する、
多層材料積層体(10)の製造方法。 - 光導波路材料の金属成分を堆積させる前記工程は、
第1の光導波路材料(24)の金属成分を前記プラズモン材料の層(12)に直接堆積させる工程と、
第2の光導波路材料(22)の金属成分を前記第1の光導波路材料(24)の前記金属成分に直接堆積させる工程と、
を含み、
前記第1の光導波路材料(24)の前記金属成分の屈折率は前記第2の光導波路材料(22)の前記金属成分の屈折率より低い、請求項1に記載の方法。 - 前記第1の光導波路材料(24)の前記金属成分はアルミニウムを含み、前記第2の光導波路材料(22)の前記金属成分はタンタルを含む、請求項2に記載の方法。
- 前記光導波路材料(22、24)の前記金属成分を陽極酸化する前記工程は、前記アルミニウムおよび前記タンタルを陽極酸化して酸化アルミニウム(Al2O3)および五酸化タンタル(Ta2O5)をそれぞれ形成する工程を含む、請求項3に記載の方法。
- 前記プラズモン材料の層(12)は金および銀のいずれかを含む、請求項1乃至4のいずれかに記載の方法。
- 前記光導波路構造(18)は化学量論的組成の膜を含む、請求項1乃至5のいずれかに記載の方法。
- 前記光導波路構造(18)は前記プラズモン材料の層(12)と直接的に原子接合し、前記光導波路構造(18)と前記プラズモン材料の層(12)との間に接着中間層が存在しない、請求項1乃至6のいずれかに記載の方法。
- 前記基板層(14)と前記プラズモン材料の層(12)との間に接着層(17)を付加して前記基板層(14)を前記プラズモン材料の層(12)に接着する工程をさらに含む、請求項1乃至7のいずれかに記載の方法。
- 前記多層材料積層体(10)は近接場光発生器に用いる目的で構成される、請求項1乃至8のいずれかに記載の方法。
- 基板層(14)と、
前記基板層(14)の上に配置されるプラズモン材料の層(12)と、
前記プラズモン材料の層(12)に直接付着される、陽極酸化された光導波路構造(18)であって、光学的に透明な金属酸化物を含む前記陽極酸化された光導波路構造(18)と、
を含み、
前記光導波路構造(18)は前記プラズモン材料の層(12)と直接的に原子接合し、前記光導波路構造(18)と前記プラズモン材料の層(12)との間に接着中間層が付加されず、
前記光導波路構造(18)は酸化アルミニウム(Al2O3)を含み、前記プラズモン材料の層(12)の上に直接配置された第1の光導波路材料と、五酸化タンタル(Ta2O5)を含み、前記第1の光導波路材料の上に直接配置された第2の光導波路材料と、を含み、
前記酸化アルミニウム(Al2O3)と前記五酸化タンタル(Ta2O5)の各々は、前記Al2O3と前記Ta2O5のアルミニウム成分とタンタル成分としてプラズモン材料の層(12)に付加された後、前記Al2O3と前記Ta2O5を形成する陽極酸化が実施される、
多層材料積層体(10)。 - 前記プラズモン材料の層(12)が金および銀のいずれかを含む、請求項10に記載の多層材料積層体(10)。
- 前記光導波路構造(18)が化学量論的組成の膜を含む、請求項10または11に記載の多層材料積層体(10)。
- 前記多層材料積層体(10)が近接場光発生器に統合される、請求項10乃至12のいずれかに記載の多層材料積層体(10)。
- 基板層(14)を用意する工程と、
前記基板層(14)に接着層(17)を付加する工程と、
薄膜プラズモン材料(12)を前記接着層(17)によって前記基板層(14)に付着させる工程と、
前記薄膜プラズモン材料(12)に薄膜金属層を直接堆積させる工程であって、前記薄膜金属層は光学ライトパイプ材料の金属成分を含む、工程と、
前記薄膜金属層を陽極酸化して、前記金属成分の光学的に透明な酸化物を形成する工程であって、前記金属成分の前記光学的に透明な酸化物は前記薄膜プラズモン材料(12)上に薄膜光学ライトパイプ(18)を形成する、工程と、
を含み、
前記薄膜金属層を陽極酸化する前記工程は、前記薄膜プラズモン材料(12)によって前記薄膜金属層に電流を供給する工程を含み、前記薄膜プラズモン材料(12)は前記陽極酸化を行うための電極として機能し、
前記薄膜光学ライトパイプ(18)は前記薄膜プラズモン材料(12)と直接接触し、前記薄膜光学ライトパイプ(18)と前記薄膜プラズモン材料(12)との間に接着中間層が存在しない、近接場光発生器のための多層材料積層体(10)の製作方法。 - 前記薄膜金属層を堆積させる前記工程は、導波路層(22)の薄膜金属成分と緩衝層(24)の薄膜金属成分を付加する工程を含む、請求項14に記載の方法。
- 前記導波路層(22)の前記薄膜金属成分は薄膜タンタル層を含み、前記緩衝層(24)の前記薄膜金属成分は薄膜アルミニウム層を含み、前記薄膜タンタル層と前記薄膜アルミニウム層の少なくとも1つは陽極酸化されて五酸化タンタル(Ta2O5)と酸化アルミニウム(Al2O3)の少なくとも1つを形成する、請求項15に記載の方法。
- 前記薄膜金属層を陽極酸化する前記工程は化学量論的組成の薄膜光学ライトパイプ(18)を形成する、請求項14乃至16のいずれかに記載の方法。
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US13/970,852 | 2013-08-20 | ||
US13/970,852 US9465160B2 (en) | 2013-08-20 | 2013-08-20 | Plasmonic interface and method of manufacturing thereof |
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KR101257309B1 (ko) * | 2011-11-11 | 2013-04-23 | 한국과학기술연구원 | 광섬유 표면 플라즈몬 공진 센서 및 이를 이용한 센싱 방법 |
-
2013
- 2013-08-20 US US13/970,852 patent/US9465160B2/en active Active
-
2014
- 2014-08-05 EP EP14179835.5A patent/EP2840422A3/en not_active Ceased
- 2014-08-07 TW TW103127087A patent/TWI657278B/zh active
- 2014-08-13 JP JP2014164626A patent/JP6636238B2/ja active Active
- 2014-08-14 CA CA2859421A patent/CA2859421A1/en not_active Abandoned
- 2014-08-19 KR KR20140107958A patent/KR20150021477A/ko not_active Application Discontinuation
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EP2840422A2 (en) | 2015-02-25 |
TW201520621A (zh) | 2015-06-01 |
CA2859421A1 (en) | 2015-02-20 |
JP2015041107A (ja) | 2015-03-02 |
US9465160B2 (en) | 2016-10-11 |
EP2840422A3 (en) | 2015-06-03 |
TWI657278B (zh) | 2019-04-21 |
US20150055924A1 (en) | 2015-02-26 |
KR20150021477A (ko) | 2015-03-02 |
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