JP2021034600A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2021034600A JP2021034600A JP2019154361A JP2019154361A JP2021034600A JP 2021034600 A JP2021034600 A JP 2021034600A JP 2019154361 A JP2019154361 A JP 2019154361A JP 2019154361 A JP2019154361 A JP 2019154361A JP 2021034600 A JP2021034600 A JP 2021034600A
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- bonding layers
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Abstract
Description
図1〜図13に基づき、本発明の第1実施形態にかかる半導体装置A10について説明する。半導体装置A10は、絶縁層10、配線層20、複数の接合層39、半導体素子31、複数の電子部品32、封止樹脂40、および複数の端子50を備える。半導体装置A10は、配線基板に表面実装される樹脂パッケージ形式によりものである。ここで、図1は、理解の便宜上、封止樹脂40を透過している。図2は、理解の便宜上、図1に対して半導体素子31、および複数の電子部品32をさらに透過している。図2において透過した半導体素子31、および複数の電子部品32を、それぞれ想像線(二点鎖線)で示している。
図28〜図32に基づき、本発明の第2実施形態にかかる半導体装置A20について説明する。これらの図において、先述した半導体装置A10と同一または類似の要素には同一の符号を付して、重複する説明を省略する。ここで、図28は、理解の便宜上、封止樹脂40を透過している。図29は、理解の便宜上、図28に対して半導体素子31、および複数の電子部品32をさらに透過している。図29において透過した半導体素子31、および複数の電子部品32を、それぞれ想像線で示している。
10:絶縁層
101:主面
102:裏面
11:貫通部
20:配線層
20A:下地層
20B:本体層
21:基部
211:底面
212:側面
212A:露出部
22:本体部
23:バンプ部
24:台座部
31:半導体素子
31A:裏面
311:パッド
312:ダミーパッド
313:絶縁膜
314:再配線
314A:本体層
314B:バンプ層
32:電子部品
321:電極
39:接合層
391:第1接合層
392:第2接合層
40:封止樹脂
50:端子
501:底部
502:側部
C:中心
80:基材
801:仮固定層
802:剥離層
81:絶縁層
811:貫通部
82:配線層
82A:下地層
82B:本体層
83:封止樹脂
84:テープ
G:溝
z:厚さ方向
x:第1方向
y:第2方向
Claims (17)
- 配線層と、
前記配線層の上に配置され、かつ導電性を有する複数の接合層と、
前記配線層に対向する裏面と、前記裏面に設けられた複数のパッドと、を有するとともに、前記複数の接合層を介して前記配線層に接合された半導体素子と、を備え、
厚さ方向に沿って視て、前記複数の接合層は、格子状に配列され、
前記複数のパッドの各々は、前記半導体素子の内部に構成された回路と、前記複数の接合層のいずれかと、に導通し、
前記厚さ方向に沿って視て、前記複数のパッドの少なくともいずれかが前記複数の接合層から離れて位置することを特徴とする、半導体装置。 - 前記厚さ方向に沿って視て、前記複数の接合層は、前記半導体素子と重なっている、請求項1に記載の半導体装置。
- 前記半導体素子は、前記裏面に配置され、かつ前記複数のパッドの各々の一部が露出する絶縁膜と、前記絶縁膜の上に設けられた再配線と、を有し、
前記再配線は、前記複数のパッドの少なくともいずれかにつながるとともに、前記複数の接合層の少なくともいずれかを介して前記配線層に接合されている、請求項2に記載の半導体装置。 - 前記再配線は、本体層、および複数のバンプ層を有し、
前記本体層は、前記複数のパッドの少なくともいずれかと、前記絶縁膜との双方に接し、
前記複数のバンプ層は、前記本体層から前記厚さ方向に突出し、
前記複数のバンプ層の各々は、前記複数の接合層のいずれかを介して前記配線層に接合されている、請求項3に記載の半導体装置。 - 前記厚さ方向に沿って視て、前記複数の接合層の各々の外形の大きさは、前記半導体素子の中心から前記半導体素子の周縁に向かうにつれて徐々に大である、請求項3または4に記載の半導体装置。
- 前記半導体素子は、前記絶縁層の上に設けられ、かつ前記回路との電気絶縁がなされたダミーパッドを有し、
前記ダミーパッドは、前記複数の接合層のいずれかを介して前記配線層に接合されている、請求項3ないし5のいずれかに記載の半導体装置。 - 前記ダミーパッドは、前記複数の接合層のうち、前記厚さ方向に沿って視て前記半導体素子の中心に対して最外周に位置する前記複数の接合層のいずれかに対向している、請求項6に記載の半導体装置。
- 前記ダミーパッドは、前記複数の接合層のうち、前記厚さ方向に沿って視て四隅に位置する4つの当該接合層のいずれかに対向している、請求項7に記載の半導体装置。
- 前記裏面に対向する主面を有する絶縁層をさらに備え、
前記絶縁層は、前記厚さ方向において前記配線層に対して前記半導体素子とは反対側に位置し、
前記配線層は、前記主面に配置された複数の本体部を有し、
前記複数の接合層の各々は、前記複数の本体部のいずれかの上に配置されている、請求項2ないし8のいずれかに記載の半導体装置。 - 前記配線層は、前記複数の本体部のいずれかから前記厚さ方向に突出する複数のバンプ部を有し、
前記複数の接合層は、前記複数のバンプ部に対して個別に配置されている、請求項9に記載の半導体装置。 - 前記絶縁層は、前記主面から前記厚さ方向に貫通する複数の貫通部を有し、
前記配線層は、前記複数の貫通部に個別に収容された部分を含み、かつ前記複数の本体部のいずれかにつながるものを含む複数の基部を有し、
前記複数の基部の各々は、前記厚さ方向において前記主面とは反対側を向き、かつ前記複数の貫通部のいずれかから露出する底面を有する、請求項9または10に記載の半導体装置。 - 複数の端子をさらに備え、
前記複数の端子は、前記複数の基部の前記底面を個別に覆っている、請求項11に記載の半導体装置。 - 前記複数の基部の各々は、前記複数の基部のいずれかの前記底面につながり、かつ前記厚さ方向に対して直交する方向を向く側面を有し、
前記複数の基部の各々の前記側面は、前記複数の貫通部のいずれかから露出する露出部を含む、請求項12に記載の半導体装置。 - 前記複数の端子の各々は、前記複数の基部のいずれかの前記底面を覆う底部と、当該底部につながる前記複数の基部のいずれかの前記露出部を覆う側部と、を有する、請求項13に記載の半導体装置。
- 複数の電子部品をさらに備え、
前記複数の電子部品の各々は、互いに離れて位置する一対の電極を有し、
前記複数の電子部品の各々の前記一対の電極は、前記配線層との導通が確保された状態で前記配線層に接合されている、請求項9ないし14のいずれかに記載の半導体装置。 - 前記配線層は、前記複数の本体部のいずれかから前記厚さ方向に突出するものを含む複数の台座部を有し、
前記複数の電子部品の各々の前記一対の電極は、前記複数の台座部のうち、隣り合う2つの当該台座部に対して個別に接合されている、請求項15に記載の半導体装置。 - 封止樹脂をさらに備え、
前記封止樹脂は、前記主面および前記配線層の双方に接し、かつ前記半導体素子、および前記複数の電子部品を覆っている、請求項15または16に記載の半導体装置。
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