JP2020141054A - 半導体装置の製造方法及び半導体装置 - Google Patents
半導体装置の製造方法及び半導体装置 Download PDFInfo
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- JP2020141054A JP2020141054A JP2019035719A JP2019035719A JP2020141054A JP 2020141054 A JP2020141054 A JP 2020141054A JP 2019035719 A JP2019035719 A JP 2019035719A JP 2019035719 A JP2019035719 A JP 2019035719A JP 2020141054 A JP2020141054 A JP 2020141054A
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- insulating layer
- organic insulating
- base film
- bump base
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Abstract
Description
図7は、上記実施形態の一変形例に係る工程を示す断面図である。この工程は、図4の(c)に示すバンプ下地膜26の熱処理を行ったのち、図5の(a)に示す有機絶縁層32を形成する前に実施される。この工程では、バンプ下地膜26から露出した有機絶縁層31の部分をエッチングする(図中の矢印E)ことにより、当該部分に凹部31bを形成する。エッチングは、例えばO2プラズマを用いた反応性イオンエッチング(RIE)である。凹部31bの深さは、例えば有機絶縁層31の厚さの半分以下(有機絶縁層31の厚さが2μmである場合、1μm以下)である。図8は、上記の工程の後、有機絶縁層32を形成した状態を示す断面図である。同図に示すように、有機絶縁層32は凹部31bを埋め込む。
Claims (9)
- 半導体領域上に第1の有機絶縁層を形成する工程と、
前記第1の有機絶縁層に接する縁部を含むバンプ下地膜を形成する工程と、
前記バンプ下地膜の熱処理を行う工程と、
少なくとも前記バンプ下地膜の前記縁部上から前記バンプ下地膜周りの前記第1の有機絶縁層上にわたって設けられ、前記第1の有機絶縁層に接し、前記バンプ下地膜の表面を露出させる第1の開口を有する第2の有機絶縁層を形成する工程と、
を含む、半導体装置の製造方法。 - 前記熱処理を行う工程ののち、前記第2の有機絶縁層を形成する工程の前に、前記第1の有機絶縁層のエッチングを行う工程を更に含む、請求項1に記載の半導体装置の製造方法。
- 前記第2の有機絶縁層は感光性樹脂を主に含み、
前記第2の有機絶縁層を形成する工程は、前記第2の有機絶縁層を露光及び現像して前記第1の開口を形成する工程を含む、請求項1または請求項2に記載の半導体装置の製造方法。 - 前記第1の開口を覆い前記バンプ下地膜に接する半田バンプをリフロー形成する工程を更に含む、請求項1から請求項3のいずれか1項に記載の半導体装置の製造方法。
- 前記熱処理を行う工程では、前記半田バンプのリフロー温度よりも高い温度で前記熱処理を行う、請求項4に記載の半導体装置の製造方法。
- 前記第1の有機絶縁層を形成する工程では、信号配線としての金属配線が形成された前記半導体領域上に、前記金属配線を露出させる第2の開口を有する前記第1の有機絶縁層を形成し、
前記第1の有機絶縁層を形成する工程と前記バンプ下地膜を形成する工程との間に、前記第1の有機絶縁層上のグランド配線領域にグランド配線としての第1の金属膜を形成し、前記グランド配線領域から隔離した信号配線領域に信号配線としての第2の金属膜を形成する工程を更に含み、前記第2の金属膜は前記第2の開口を通じて前記金属配線と接続しており、
前記バンプ下地膜を形成する工程では、前記第1の金属膜を覆う前記バンプ下地膜の部分と、前記第2の金属膜を覆う前記バンプ下地膜の部分とを分離して形成する、請求項1から請求項5のいずれか1項に記載の半導体装置の製造方法。 - 半導体領域と、
前記半導体領域上に設けられた第1の有機絶縁層と、
前記第1の有機絶縁層上に位置する縁部を含むバンプ下地膜と、
少なくとも前記バンプ下地膜の前記縁部上から前記バンプ下地膜周りの前記第1の有機絶縁層上にわたって設けられ、前記第1の有機絶縁層に接し、前記バンプ下地膜の表面を露出させる第1の開口を有する第2の有機絶縁層と、
前記第1の開口を覆い前記バンプ下地膜に接する半田バンプと、
を備える、半導体装置。 - 前記第2の有機絶縁層を構成する材料が、前記第1の有機絶縁層と前記バンプ下地膜との隙間に入り込んでいる、請求項7に記載の半導体装置。
- 前記第1の有機絶縁層は、前記半導体領域上に形成された信号配線としての金属配線を露出させる第2の開口を有し、
当該半導体装置は、前記第1の有機絶縁層上のグランド配線領域に設けられたグランド配線としての第1の金属膜と、前記グランド配線領域から隔離した信号配線領域に設けられ、前記第2の開口を通じて前記金属配線と接続する信号配線としての第2の金属膜と、を更に備え、
前記バンプ下地膜は、前記第1の金属膜を覆う第1の部分と、前記第1の部分と分離しており前記第2の金属膜を覆う第2の部分とを含む、請求項7または請求項8に記載の半導体装置。
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