JP2019091068A - 液晶表示装置 - Google Patents
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Abstract
Description
また、この配向膜を用いて、IPS方式の液晶表示装置を作製し、輝度緩和定数を測定したところ、オゾンを吹き付けなかった膜では54時間であったが、オゾンを吹き付けた膜では42時間と、輝度緩和特性が向上した。
Claims (14)
- 画素電極とTFTとを備え、表面に第1配向膜が形成されたTFT基板と、前記TFT基板に対向して配置され、前記TFT基板側の表面に第2配向膜が形成された対向基板と、前記TFT基板の前記第1配向膜と前記対向基板の前記第2配向膜の間に液晶層が挟持された液晶表示装置であって、
前記第2配向膜は偏光光照射により液晶配向規制力が付与された膜であり、
前記第2配向膜は、炭素原子、窒素原子、酸素原子の3つの元素間における酸素原子の比率が膜厚方向に向けて変化し、表面側が内部側よりも前記酸素原子の比率が高く、
前記第2配向膜が、ポリイミドを含む光分解型の光配向膜であることを特徴とする液晶表示装置。 - 請求項1記載の液晶表示装置において、
前記酸素原子の比率が前記第2配向膜の表面から内部に向かってなだらかに減少していることを特徴とする液晶表示装置。 - 請求項1記載の液晶表示装置において、
前記第2配向膜の前記酸素原子の比率の低い位置における前記酸素原子の比率をA(%)とし、前記酸素原子の比率の高い位置における前記酸素原子の比率をB(%)とした場合に、BはAの1.25倍以上であることを特徴とする液晶表示装置。 - 請求項1記載の液晶表示装置において、
前記酸素原子の比率が15%以上である厚みが、前記第2配向膜全体の厚みの50%以下であることを特徴とする液晶表示装置。 - 請求項1記載の液晶表示装置において、
前記第2配向膜の表面凹凸の大きさが二乗平均平方根で1nm以下であることを特徴とする液晶表示装置。 - 請求項1記載の液晶表示装置において、
前記第2配向膜の表面側が内部側よりも炭素原子の比率が低いことを特徴とする液晶表示装置。 - 請求項1記載の液晶表示装置において、
前記第2配向膜が2種類の積層した構造からなり、光配向が可能な光配向性の上層と前記光配向性の上層よりも抵抗率が小さい低抵抗性の下層からなる2層構造であることを特徴とする液晶表示装置。 - 画素電極とTFTとを備え、表面に第1配向膜が形成されたTFT基板と、前記TFT基板に対向して配置され、前記TFT基板側の表面に第2配向膜が形成された対向基板と、前記TFT基板の前記第1配向膜と前記対向基板の前記第2配向膜の間に液晶層が挟持された液晶表示装置であって、
横電界を形成して前記液晶層の配向方向を変化させるものであり、
前記第2配向膜は偏光光照射により液晶配向規制力が付与された膜であり、
前記第2配向膜は、炭素原子、窒素原子、酸素原子の3つの元素間における酸素原子の比率が膜厚方向に向けて変化し、表面側が内部側よりも酸素原子の比率が高く、
前記第2配向膜が、(化1)に示すポリイミドを含む光分解型の光配向膜であることを特徴とする液晶表示装置。(化1)中の、括弧[ ]の中が繰り返し単位の化学構造、添え字nは繰り返し単位の数、Nは窒素原子、Oは酸素原子であり、Aはシクロブタン環を含む4価の有機基、Dは2価の有機基を示す。
- 請求項8記載の液晶表示装置において、
前記酸素原子の比率が前記第2配向膜の表面から内部に向かってなだらかに減少していることを特徴とする液晶表示装置。 - 請求項8記載の液晶表示装置において、
前記第2配向膜の前記酸素原子の比率の低い位置における前記酸素原子の比率をA(%)とし、前記酸素原子の比率の高い位置における前記酸素原子の比率をB(%)とした場合に、BはAの1.25倍以上であることを特徴とする液晶表示装置。 - 請求項8記載の液晶表示装置において、
前記酸素原子の比率が15%以上である厚みが、前記第2配向膜全体の厚みの50%以下であることを特徴とする液晶表示装置。 - 請求項8記載の液晶表示装置において、
前記第2配向膜の表面凹凸の大きさが二乗平均平方根で1nm以下であることを特徴とする液晶表示装置。 - 請求項8記載の液晶表示装置において、
前記第2配向膜の表面側が内部側よりも炭素原子の比率が低いことを特徴とする液晶表示装置。 - 請求項8記載の液晶表示装置において、
前記第2配向膜が2種類の積層した構造からなり、光配向が可能な光配向性の上層と前記光配向性の上層よりも抵抗率が小さい低抵抗性の下層からなる2層構造であることを特徴とする液晶表示装置。
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006189834A (ja) * | 2004-12-30 | 2006-07-20 | Lg Philips Lcd Co Ltd | 液晶表示装置の配向膜形成方法 |
JP2011095696A (ja) * | 2009-01-30 | 2011-05-12 | Sony Corp | 液晶表示装置及びその製造方法 |
JP2011170031A (ja) * | 2010-02-17 | 2011-09-01 | Hitachi Displays Ltd | 液晶表示装置 |
CN103091903A (zh) * | 2013-01-10 | 2013-05-08 | 京东方科技集团股份有限公司 | 光分解型配向膜的制备方法、液晶显示基板和装置 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006189834A (ja) * | 2004-12-30 | 2006-07-20 | Lg Philips Lcd Co Ltd | 液晶表示装置の配向膜形成方法 |
JP2011095696A (ja) * | 2009-01-30 | 2011-05-12 | Sony Corp | 液晶表示装置及びその製造方法 |
JP2011170031A (ja) * | 2010-02-17 | 2011-09-01 | Hitachi Displays Ltd | 液晶表示装置 |
CN103091903A (zh) * | 2013-01-10 | 2013-05-08 | 京东方科技集团股份有限公司 | 光分解型配向膜的制备方法、液晶显示基板和装置 |
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