JP2018048393A - 導電性構成部品をコーティングするための方法および導電性構成部品用コーティング - Google Patents
導電性構成部品をコーティングするための方法および導電性構成部品用コーティング Download PDFInfo
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- JP2018048393A JP2018048393A JP2017139684A JP2017139684A JP2018048393A JP 2018048393 A JP2018048393 A JP 2018048393A JP 2017139684 A JP2017139684 A JP 2017139684A JP 2017139684 A JP2017139684 A JP 2017139684A JP 2018048393 A JP2018048393 A JP 2018048393A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
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Abstract
Description
a) 20℃から300℃の間の温度範囲および0.1Torrから10Torrの間の使用圧力での、正電位の支持体を用いた電子衝撃によって、導電性構成部品の表面を清浄化する工程であり、プラズマ雰囲気下の気体が、水素、酸素、アルゴン、窒素またはこれらの組合せからなる群より選択される、工程と、
b) 200℃から650℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力および導体構成部品支持体に印加される−200Vから−1000Vの間の電圧での、水素、酸素、アルゴン、窒素、メタン、アセチレンまたは他のイオン化可能な炭化水素ガスの群のうちの2種以上の気体の組合せから選択される気体イオンによる衝撃を含む、導電性構成部品に機械的支持体を堆積する工程と、
c) 200℃から650℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、および導体構成部品支持体に印加される−200Vから−1000Vの間の電圧での、水素、酸素、アルゴン、窒素、メタン、アセチレンまたは他のイオン化可能な炭化水素ガスの群のうちの2種以上の気体の組合せから選択される気体イオンによる衝撃を含む、凹凸形状改質を行う工程と、
d) 200℃から350℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、50kHzから150kHzまでの周波数で動作するDC電源パルスの時間に対して75%から90%の間のプラズマ源接続時間、および導体構成部品支持体に印加される−300Vから−1000Vの間の電圧での気体イオンによる衝撃によって、導電性構成部品に化学的支持層を堆積する工程であり、気体が、炭素との化学親和力を有する元素を含有する気体状または液体状前駆物質からなる群より選択される、工程と、
e) 200℃から350℃までの温度範囲、1Torrから3Torrの間の使用圧力、50kHzから150kHzまでの周波数において75%から90%の間のプラズマ源接続時間、および導電性構成部品支持体に印加される−300Vから−1000Vの間の電圧での、気体状炭化水素イオンによる衝撃によって、化学的支持層の表面上に非晶質炭素層を堆積する工程であり、プラズマ雰囲気下の気体が、少なくとも1種の金属ラジカルを有する少なくとも1種の液体状前駆物質またはこのような前駆物質と少なくとも1種のイオン化可能な炭化水素ガスとの組合せからなる群より選択され、構成部品上に堆積されるイオンを発生させている、工程
とを含む、方法を提供する。
・ 導電性構成部品の表面と直接接触している少なくとも1つの第1の機械的支持層と、
・ 機械的支持層と非晶質炭素層との間にある少なくとも1つの化学的支持層と、
・ 化学的支持層に付着した少なくとも1つの非晶質炭素層
とを含む、導電性構成部品用コーティングを特徴とする。
a) 20℃から300℃の間の温度範囲および0.1Torrから10Torrの間の使用圧力での、正電位の支持体を用いた電子衝撃によって、導電性構成部品の表面を清浄化する工程であり、プラズマ雰囲気下の気体が、水素、酸素、アルゴン、窒素またはこれらの組合せからなる群より選択される、工程と、
b) 200℃から650℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、および導体構成部品支持体に印加される−200Vから−1000Vの間の電圧での、水素、酸素、アルゴン、窒素、メタン、アセチレンまたは他のイオン化可能な炭化水素ガスの群のうちの2種以上の気体の組合せから選択される気体イオンによる衝撃を含む、導電性構成部品に機械的支持体を堆積する工程と、
c) 200℃から650℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力および導体構成部品支持体に印加される−200Vから−1000Vの間の電圧での、水素、酸素、アルゴン、窒素、メタン、アセチレンまたは他のイオン化可能な炭化水素ガスの群のうちの2種以上の気体の組合せから選択される気体イオンによる衝撃を含む、凹凸形状改質を行う工程と、
d) 200℃から350℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、50kHzから150kHzまでの周波数で動作するDC電源パルスの時間に対して75%から90%の間のプラズマ源接続時間、および導体構成部品支持体に印加される−300Vから−1000Vの間の電圧での気体イオンによる衝撃によって、導電性構成部品に化学的支持層を堆積する工程であり、気体が、炭素との化学親和力を有する元素を含有する気体状または液体状前駆物質からなる群より選択される、工程と、
e) 200℃から350℃までの温度範囲、1Torrから3Torrの間の使用圧力、50kHzから150kHzまでの周波数で動作するDC電源パルスの時間に対して75%から90%の間のプラズマ源接続時間、および導電性構成部品支持体に印加される−300Vから−1000Vの間の電圧での、気体状炭化水素イオンによる衝撃によって、化学的支持層の表面上に非晶質炭素層を堆積する工程であり、プラズマ雰囲気下の気体が、少なくとも1種の金属ラジカルを有する少なくとも1種の液体状前駆物質またはこのような前駆物質と少なくとも1種のイオン化可能な炭化水素ガスとの組合せからなる群より選択され、構成部品上に堆積されるイオンを発生させている、工程
とを含む、方法を提供する。
・ 窒化処理、セメンテーション、炭窒化物化処理、ボリート化処理(boreeting)による、少なくとも1つの機械的支持層の形成、または
・ 導電性構成部品のマトリックス硬化用元素によって表面富化された少なくとも1つの拡散層の形成、または
・ これらの組合せ
を含む。
・ 導電性構成部品の表面と直接接触している少なくとも1つの第1の機械的支持層と、
・ 機械的支持層と非晶質炭素層との間にある少なくとも1つの化学的支持層と、
・ 化学的支持層に付着した少なくとも1つの非晶質炭素層
とを含む、導電性構成部品用コーティングを特徴とする。
・ 導電性構成部品の表面上にある250μmから300μmまでの厚さの少なくとも1つの拡散層と、
・ 導電性構成部品の表面と直接接触している、窒化物から構成された10μmの厚さの少なくとも1つの機械的支持層と、
・ 機械的支持層と非晶質炭素層との間にある少なくとも1つの化学的支持層と、
・ 少なくとも1つの非晶質炭素層
とを含む。
約10μmの厚さの窒化物から構成された層を、この層の真下で一般的なSAE1020鋼の上に、250μmから300μmの間の厚さを有する拡散層がある状態になるように生成するために、次のパラメータを使用した:400Vのパルス負電圧、50kHzの周波数において75%のプラズマ源接続時間、2Torrの圧力、550℃の温度、窒素(90%)、水素(9%)およびメタン(1%)から構成された気体混合物、1000sccmの気体流量ならびに90分の堆積保持時間。
化学的支持層の生成のために選択された液体状前駆物質は、ヘキサメチルジシロキサンだった。プラズマリアクターの外側に配置されたヘキサメチルジシロキサン受器と、反応器チャンバとの圧力差により、このヘキサメチルジシロキサンを蒸発させ、チャンバ内に導入し、プラズマによってイオン化した。この場合、ケイ素、水素および炭素を含有する化学的付着層の堆積が起きる。軽度の凹凸形状改質を受けており、機械的支持層を有する、無研磨の矯正済みSAE1020鋼構成部品上に約1.2μmの厚さを有する化学的付着層を堆積するために、次のパラメータを使用した:500V(負)の電圧、50kHzの周波数において75%のプラズマ源接続時間、1Torrの圧力、250℃の温度、水素ガス(30%)、アルゴン(30%)、メタン(38%)およびヘキサメチルジシロキサン(2%)、1000sccmの気体流速ならびに35分の堆積時間。
Claims (8)
- 導電性構成部品をコーティングするための方法であって、導電性構成部品が、プラズマリアクター内で極性反転を受けることができる支持体と接触しており、
a) 20℃から300℃の間の温度範囲および0.1Torrから10Torrの間の使用圧力での、正電位の支持体を用いた電子衝撃によって、導電性構成部品の表面を清浄化する工程であり、プラズマ雰囲気下の気体が、水素、酸素、アルゴン、窒素またはこれらの組合せからなる群より選択される、工程と、
b) 200℃から650℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、および導体構成部品支持体に印加される−200Vから−1000Vの間の電圧での、水素、酸素、アルゴン、窒素、メタン、アセチレンまたは他のイオン化可能な炭化水素ガスの群のうちの2種以上の気体の組合せから選択される気体イオンによる衝撃を含む、導電性構成部品に機械的支持体を堆積する工程と、
c) 200℃から650℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、および導体構成部品支持体に印加される−200Vから−1000Vの間の電圧での、水素、酸素、アルゴン、窒素、メタン、アセチレンまたは他のイオン化可能な炭化水素ガスの群のうちの2種以上の気体の組合せから選択される気体イオンによる衝撃を含む、凹凸形状改質を行う工程と、
d) 200℃から350℃の間の温度範囲、0.1Torrから10Torrの間の使用圧力、50kHzから150kHzまでの周波数で動作するDC電源パルスの時間に対して75%から90%の間のプラズマ源接続時間、および導体構成部品支持体に印加される−300Vから−1000Vの間の電圧での気体イオンによる衝撃によって、導電性構成部品に化学的支持層を堆積する工程であり、気体が、炭素との化学親和力を有する元素を含有する気体状または液体状前駆物質からなる群より選択される、工程と、
e) 200℃から350℃までの温度範囲、1Torrから3Torrの間の使用圧力、50kHzから150kHzまでの周波数で動作するDC電源パルスの時間に対して75%から90%の間のプラズマ源接続時間、および導電性構成部品支持体に印加される−300Vから−1000Vの間の電圧での、気体状炭化水素イオンによる衝撃によって、化学的支持層の表面上に非晶質炭素層を堆積する工程であり、プラズマ雰囲気下の気体が、少なくとも1種の金属ラジカルを有する少なくとも1種の液体状前駆物質またはこのような前駆物質と少なくとも1種のイオン化可能な炭化水素ガスとの組合せからなる群より選択され、構成部品上に堆積されるイオンを発生させている、工程
とを含むことを特徴とする、方法。 - 工程d)の気体が、少なくとも1種の金属ラジカルを有する少なくとも1種の液体状前駆物質またはこの前駆物質と少なくとも1種のイオン化可能な炭化水素ガスとの組合せからなる群のものであり、部品に堆積されるイオンを発生させていることを特徴とする、請求項1に記載の導電性構成部品をコーティングするための方法。
- コーティングプロセスが、単一のサイクルによって実施されることを特徴とする、請求項1または2に記載の導電性構成部品をコーティングするための方法。
- 工程b)が、
・ 窒化処理、セメンテーション、炭窒化物化処理、ボリート化処理による、少なくとも1つの機械的支持層の形成、または
・ 導電性構成部品のマトリックス硬化用元素によって表面富化された少なくとも1つの拡散層の形成、または
・ これらの組合せ
を含むこと特徴とする、請求項1から3のいずれか一項に記載の導電性構成部品をコーティングするための方法。 - 請求項4に記載の導電性構成部品をコーティングするための方法によって製造された導電性構成部品用コーティングであって、
・ 導電性構成部品の表面と直接接触している少なくとも1つの第1の機械的支持層と、
・ 機械的支持層と非晶質炭素層との間にある少なくとも1つの化学的支持層と、
・ 化学的支持層に付着した少なくとも1つの非晶質炭素層
とを含むことを特徴とする、導電性構成部品用コーティング。 - 導電性構成部品の表面上にある拡散層を含むことを特徴とする、請求項5に記載の導電性構成部品用コーティング。
- ・ 導電性構成部品の表面上にある250μmから300μmまでの厚さの少なくとも1つの拡散層と、
・ 導電性構成部品の表面と直接接触している、窒化物から構成された10μmの厚さの少なくとも1つの機械的支持層と、
・ 機械的支持層と非晶質炭素層との間にある少なくとも1つの化学的支持層と、
・ 少なくとも1つの非晶質炭素層
とを含むことを特徴とする、請求項6に記載の導電性構成部品用コーティング。 - 化学的支持層が、ケイ素、炭素および水素から構成されており、1.2μmの厚さを有することを特徴とする、請求項5から7のいずれか一項に記載の導電性構成部品用コーティング。
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CN108677123A (zh) * | 2018-06-13 | 2018-10-19 | 中国地质大学(北京) | 一种基体表面喷涂Fe基非晶合金涂层及其渗氮处理的方法 |
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BR102016016715A2 (pt) | 2018-02-06 |
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CN107630204A (zh) | 2018-01-26 |
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