JP2017516081A - セラミック担体、セラミック担体を有するセンサ素子、加熱素子およびセンサモジュール、ならびにセラミック担体の製造方法 - Google Patents
セラミック担体、セラミック担体を有するセンサ素子、加熱素子およびセンサモジュール、ならびにセラミック担体の製造方法 Download PDFInfo
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Abstract
Description
特徴a、cおよびdの組み合わせ。
特徴b、cおよびdの組み合わせ。
特徴a、b、cおよびdの組み合わせ。
11 表面
12 中間層
13 導体路
14a 第1の被覆層
14b 第2の被覆層
15 摺動部
16 密着部
17 凹部
18 側面
19 底面
20 絶縁層
21 電極構造体
22 機能層
23 担体基板
Claims (18)
- プラチナまたはプラチナ合金からなる薄膜構造体(10)が上に配置されたセラミック担体、特にAl2O3担体であって、
当該担体および/または当該薄膜構造体(10)は、異なる熱膨張係数に起因する機械的応力を低減するようになっており、
a)当該薄膜構造体(10)の領域における当該担体の表面(11)が、密着を低減するために少なくとも部分的に平滑化され、
かつ/または
b)当該担体の表面(11)が中間層(12)を有し、その上に当該薄膜構造体(10)が配置され、当該中間層(12)の熱膨張係数が8×10−6/K〜16×10−6/K、特に8.5×10−6/K〜14×10−6/Kであり、
かつ/または
c)当該薄膜構造体(10)は、少なくとも一つの導体路(13)を有し、当該導体路(13)は、少なくとも部分的に波形でありかつ当該担体の表面(11)に沿って延在しており、波形の当該導体路(13)の振幅は、0.2×B〜2×B、特に0.4×B〜1×Bであり、かつ波形の当該導体路(13)の波長は、3×B〜10×B、特に4×B〜7×Bであり、ただし、「B」は、当該導体路(13)の幅であり、
かつ/または
d)酸化物ナノ粒子、特にAl2O3および/もしくはMgOの酸化物ナノ粒子を含む第1の被覆層(14a)が、当該薄膜構造体(10)に直接付与されていることを特徴とする、担体。 - 当該薄膜構造体(10)の領域における当該表面(11)は、少なくとも一つの摺動部(15)および少なくとも一つの密着部(16)を形成していることを特徴とする、請求項1に記載の担体。
- 当該薄膜構造体(10)の全領域における当該表面(11)は、平滑化されていることを特徴とする、請求項1に記載の担体。
- 当該薄膜構造体(10)の領域における当該表面(11)は、少なくとも一つの凹部を形成する深さ方向のプロファイル、特に、少なくとも一つの凹部を形成する帯状の深さ方向のプロファイルを有しており、当該凹部(17)の当該表面(11)は平滑化されていることを特徴とする、請求項1〜3のいずれか一項に記載の担体。
- 当該薄膜構造体(10)の少なくとも一つの導体路(13)が、帯状の深さ方向のプロファイルに対して、特に30°〜90°の範囲の角度で配置されていることを特徴とする、請求項4に記載の担体。
- 当該凹部(17)が、二つの傾斜した側面(18)と、当該側面(18)間の底面(19)とを有する台形断面を有し、少なくとも一つの側面(18)、特に両側面(18)が、当該底面(19)に対して10°〜80°、特に45°〜60°の角度で立ち上がっていることを特徴とする、請求項4および5のいずれか一項に記載の担体。
- 当該凹部(17)は、0.4μm〜1.2μm、特に0.6μm〜1.0μmの深さを有し、かつ/または5μm〜20μm、特に10μm〜15μmの幅を有することを特徴とする、請求項4〜6のいずれか一項に記載の担体。
- 当該帯状の深さ方向のプロファイルは、複数の平行な凹部(17)を有し、当該凹部(17)の間隔は、いずれも5μm〜20μm、特に10μm〜15μmであることを特徴とする、請求項4〜7のいずれか一項に記載の担体。
- 当該中間層(12)の熱膨張係数が、当該薄膜構造体(10)の熱膨張係数より最大で1.5倍大きいことを特徴とする、請求項1〜8のいずれか一項に記載の担体。
- 当該中間層(12)の厚さが0.2μm〜3μm、特に1μm〜2.2μmであることを特徴とする、請求項1〜9のいずれか一項に記載の担体。
- 当該中間層(12)は、少なくとも一つの電気絶縁性金属酸化物を含む、請求項1〜10のいずれか一項に記載の担体。
- 当該中間層(12)は、MgOおよび/またはBaOを含み、特にMgOおよび/またはBaOからなり、または少なくとも一つの電気絶縁性金属酸化物とAl2O3との混合物を含むかまたは当該混合物からなることを特徴とする、請求項1〜11のいずれか一項に記載の担体。
- 当該波形の導体路(13)は、当該表面(11)に沿って延在する複数の弧を有しており、波形の下部構造が、当該弧の間の導体路の部分に少なくとも形成されているか、または、当該波形の導体路(13)は、櫛状に配列された、電極の複数の指状部を形成していることを特徴とする、請求項1〜12のいずれか一項に記載の担体。
- 当該波形の導体路(13)は、正弦波および/または鋸歯形状の波および/または台形波の形状となっていることを特徴とする、請求項1〜13のいずれか一項に記載の担体。
- 当該第1の被覆層(14a)が、特にガラスからなる第2の被覆層(14b)により密封封止されていることを特徴とする、請求項1〜14のいずれか一項に記載の担体。
- 請求項1〜15のいずれか一項に記載の担体を備えるセンサ素子、加熱素子またはセンサモジュール。
- 当該担体上に種々のセンサ構造物が配置されており、プラチナまたはプラチナ合金からなる当該薄膜構造体(10)が、少なくとも一つのセンサ構造物を形成しており、かつ電極構造物が少なくとも一つの他のセンサ構造物を形成していることを特徴とする、請求項16に記載のセンサモジュール。
- 請求項1に記載のセラミック担体を製造する方法であって、
少なくとも薄膜構造体(10)の領域において、担体の表面(11)を、平滑化のため、エッチング、特にイオンエッチングにより除去し、かつ/または
中間層(12)を、薄膜法、特にPVD法またはCVD法によって当該担体の表面(11)に付与し、かつ/または
波形の導体路(13)を、薄膜法、特にPVD法もしくはCVD法またはリソグラフィー法によって当該担体の表面(11)に付与する、方法。
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DE102014104219.0A DE102014104219B4 (de) | 2014-03-26 | 2014-03-26 | Keramikträger sowie Sensorelement, Heizelement und Sensormodul jeweils mit einem Keramikträger und Verfahren zur Herstellung eines Keramikträgers |
DE102014104219.0 | 2014-03-26 | ||
PCT/EP2015/056356 WO2015144748A1 (de) | 2014-03-26 | 2015-03-25 | Keramikträger sowie sensorelement, heizelement und sensormodul jeweils mit einem keramikträger und verfahren zur herstellung eines keramikträgers |
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- 2015-03-25 CN CN201580014672.0A patent/CN106104235B/zh not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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JP6622711B2 (ja) | 2019-12-18 |
WO2015144748A1 (de) | 2015-10-01 |
TWI606558B (zh) | 2017-11-21 |
EP3123154A1 (de) | 2017-02-01 |
CN106104235B (zh) | 2019-12-31 |
KR20160138039A (ko) | 2016-12-02 |
TW201541573A (zh) | 2015-11-01 |
CN106104235A (zh) | 2016-11-09 |
US20170110225A1 (en) | 2017-04-20 |
DE102014104219A1 (de) | 2015-10-01 |
DE102014104219B4 (de) | 2019-09-12 |
US10529470B2 (en) | 2020-01-07 |
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