JP2017069240A - 貼り合わせsoiウェーハの製造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 40
- 238000010438 heat treatment Methods 0.000 claims abstract description 72
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 32
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000013078 crystal Substances 0.000 claims abstract description 29
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 29
- 239000010703 silicon Substances 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000001301 oxygen Substances 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 17
- 235000012431 wafers Nutrition 0.000 claims description 192
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 32
- 229910052757 nitrogen Inorganic materials 0.000 claims description 16
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 description 37
- 238000007254 oxidation reaction Methods 0.000 description 37
- 239000000758 substrate Substances 0.000 description 12
- 238000005468 ion implantation Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000002840 nitric oxide donor Substances 0.000 description 8
- 230000006641 stabilisation Effects 0.000 description 8
- 238000011105 stabilization Methods 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- 230000001698 pyrogenic effect Effects 0.000 description 5
- -1 but in this case Chemical compound 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000004854 X-ray topography Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005247 gettering Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
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Abstract
Description
前記ベースウェーハとして、抵抗率が100Ω・cm以上、初期格子間酸素濃度が10ppma以下であるシリコン単結晶ウェーハを準備する工程と、
前記ベースウェーハに、酸化性雰囲気下、700℃以上1000℃以下の温度で5時間以上の熱処理を施すことにより、前記ベースウェーハ表面にシリコン酸化膜を形成する工程と、
前記シリコン酸化膜を介して前記ベースウェーハと前記ボンドウェーハを貼り合わせる工程と、
貼り合わせた前記ボンドウェーハを薄膜化してSOI層を形成する工程とを有することを特徴とする貼り合わせSOIウェーハの製造方法を提供する。
前記ベースウェーハ表面に形成する前記シリコン酸化膜の厚さを1μm以上とすることが好ましい。
上述したように、高抵抗低酸素基板を使用した場合、スリップ転位が発生しやすくなり、また、抵抗率の変動を抑制するためには、ドナーを消滅させる長時間の熱処理を必要とし、製造効率が悪いという問題があった。
の後、デバイス製造工程などで600℃あるいは450℃といったNOドナーの形成される低温熱処理を行っても、抵抗率の変化を抑制することができる。このため、安定して初期の高抵抗率を維持することのできる貼り合わせSOIウェーハを得ることができる。
ベースウェーハとして、酸素濃度6.8ppma(ASTM’79)、抵抗率が2000Ω・cm、直径300mm、p型、結晶方位<100>のCZシリコン単結晶ウェーハ(窒素ドープなし)を準備した。
ベースウェーハとして、酸素濃度6.8ppma(ASTM’79)、抵抗率が2000Ω・cm、窒素濃度8.9×1013atoms/cm3である直径300mm、p型、結晶方位<100>のCZシリコン単結晶ウェーハを準備した。
ベースウェーハとして、酸素濃度6.8ppma(ASTM’79)、抵抗率が2000Ω・cm、窒素濃度1.4×1014atoms/cm3である直径300mm、p型、結晶方位<100>のCZシリコン単結晶ウェーハを準備した。
ベースウェーハとして、実施例1と同様のCZシリコン単結晶ウェーハを準備した。
ベースウェーハとして、実施例2と同様のCZシリコン単結晶ウェーハを準備した。そして、このベースウェーハに対し、酸化温度1100℃、酸化時間3時間のパイロジェニック酸化で1μmの酸化膜を成長させた。
ベースウェーハとして、実施例2と同様のCZシリコン単結晶ウェーハを準備した。そして、このベースウェーハに対し、酸化温度950℃、酸化時間2時間のパイロジェニック酸化で0.4μmの酸化膜を成長させた。
4…イオン注入層、 5…SOI層、 6…剥離ウェーハ、
7…貼り合わせSOIウェーハ。
Claims (3)
- いずれもシリコン単結晶からなるボンドウェーハとベースウェーハとをシリコン酸化膜を介して貼り合わせて貼り合わせSOIウェーハを製造する方法であって、
前記ベースウェーハとして、抵抗率が100Ω・cm以上、初期格子間酸素濃度が10ppma以下であるシリコン単結晶ウェーハを準備する工程と、
前記ベースウェーハに、酸化性雰囲気下、700℃以上1000℃以下の温度で5時間以上の熱処理を施すことにより、前記ベースウェーハ表面にシリコン酸化膜を形成する工程と、
前記シリコン酸化膜を介して前記ベースウェーハと前記ボンドウェーハを貼り合わせる工程と、
貼り合わせた前記ボンドウェーハを薄膜化してSOI層を形成する工程とを有することを特徴とする貼り合わせSOIウェーハの製造方法。 - 前記ベースウェーハとして、窒素濃度が1×1013〜1×1015atoms/cm3である前記シリコン単結晶ウェーハを用いることを特徴とする請求項1に記載の貼り合わせSOIウェーハの製造方法。
- 前記シリコン酸化膜を形成する工程において、
前記ベースウェーハ表面に形成する前記シリコン酸化膜の厚さを1μm以上とすることを特徴とする請求項1または請求項2に記載の貼り合わせSOIウェーハの製造方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
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JP2015189399A JP6447439B2 (ja) | 2015-09-28 | 2015-09-28 | 貼り合わせsoiウェーハの製造方法 |
EP16850559.2A EP3358600B1 (en) | 2015-09-28 | 2016-08-22 | Method for producing bonded soi wafer |
KR1020187006698A KR102509310B1 (ko) | 2015-09-28 | 2016-08-22 | 접합 soi 웨이퍼의 제조방법 |
US15/754,003 US11056381B2 (en) | 2015-09-28 | 2016-08-22 | Method for producing bonded SOI wafer |
PCT/JP2016/003798 WO2017056376A1 (ja) | 2015-09-28 | 2016-08-22 | 貼り合わせsoiウェーハの製造方法 |
CN201680049105.3A CN108028170B (zh) | 2015-09-28 | 2016-08-22 | 贴合式soi晶圆的制造方法 |
SG11201801408YA SG11201801408YA (en) | 2015-09-28 | 2016-08-22 | Method for producing bonded soi wafer |
TW105126977A TWI698907B (zh) | 2015-09-28 | 2016-08-24 | 貼合式soi晶圓的製造方法 |
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JP2015189399A JP6447439B2 (ja) | 2015-09-28 | 2015-09-28 | 貼り合わせsoiウェーハの製造方法 |
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JP2017069240A true JP2017069240A (ja) | 2017-04-06 |
JP2017069240A5 JP2017069240A5 (ja) | 2018-03-29 |
JP6447439B2 JP6447439B2 (ja) | 2019-01-09 |
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US (1) | US11056381B2 (ja) |
EP (1) | EP3358600B1 (ja) |
JP (1) | JP6447439B2 (ja) |
KR (1) | KR102509310B1 (ja) |
CN (1) | CN108028170B (ja) |
SG (1) | SG11201801408YA (ja) |
TW (1) | TWI698907B (ja) |
WO (1) | WO2017056376A1 (ja) |
Cited By (6)
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KR20200030405A (ko) | 2018-09-12 | 2020-03-20 | 주식회사 이피지 | 관통형 전극 제조 방법 및 그 방법에 의해 제조되는 관통형 전극 |
WO2020204143A1 (ja) | 2019-04-05 | 2020-10-08 | 株式会社トクヤマ | 多結晶シリコン原料 |
WO2020204141A1 (ja) | 2019-04-05 | 2020-10-08 | 株式会社トクヤマ | 多結晶シリコン原料 |
JP2021531645A (ja) * | 2018-07-13 | 2021-11-18 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co., Ltd. | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
US11244852B2 (en) | 2018-11-13 | 2022-02-08 | Shin-Etsu Handotai Co., Ltd. | Method for manufacturing bonded SOI wafer |
JP2022514572A (ja) * | 2018-12-24 | 2022-02-14 | ソイテック | デジタル用途及び無線周波数用途のための半導体構造、並びにそのような構造を製造するためのプロセス |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102016112139B3 (de) * | 2016-07-01 | 2018-01-04 | Infineon Technologies Ag | Verfahren zum Reduzieren einer Verunreinigungskonzentration in einem Halbleiterkörper |
TWI668739B (zh) * | 2018-04-03 | 2019-08-11 | 環球晶圓股份有限公司 | 磊晶基板及其製造方法 |
JP7242220B2 (ja) * | 2018-09-03 | 2023-03-20 | キヤノン株式会社 | 接合ウェハ及びその製造方法、並びにスルーホール形成方法 |
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FR3110282B1 (fr) * | 2020-05-18 | 2022-04-15 | Soitec Silicon On Insulator | Procédé de fabrication d’un substrat semi-conducteur sur isolant pour applications radiofréquences |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003068744A (ja) * | 2001-08-30 | 2003-03-07 | Shin Etsu Handotai Co Ltd | シリコンウエーハの製造方法及びシリコンウエーハ並びにsoiウエーハ |
JP2003224247A (ja) * | 2002-01-29 | 2003-08-08 | Shin Etsu Handotai Co Ltd | Soiウエーハ及びsoiウエーハの製造方法 |
JP2005206391A (ja) * | 2004-01-20 | 2005-08-04 | Shin Etsu Handotai Co Ltd | シリコン単結晶基板の抵抗率保証方法及びシリコン単結晶基板の製造方法並びにシリコン単結晶基板 |
JP2014107357A (ja) * | 2012-11-26 | 2014-06-09 | Shin Etsu Handotai Co Ltd | Soiウェーハの製造方法 |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09331049A (ja) * | 1996-04-08 | 1997-12-22 | Canon Inc | 貼り合わせsoi基板の作製方法及びsoi基板 |
JP3697106B2 (ja) * | 1998-05-15 | 2005-09-21 | キヤノン株式会社 | 半導体基板の作製方法及び半導体薄膜の作製方法 |
WO2000055397A1 (fr) * | 1999-03-16 | 2000-09-21 | Shin-Etsu Handotai Co., Ltd. | Procede de production d'une tranche de silicium et tranche de silicium ainsi obtenue |
US6375738B1 (en) * | 1999-03-26 | 2002-04-23 | Canon Kabushiki Kaisha | Process of producing semiconductor article |
JP4463957B2 (ja) * | 2000-09-20 | 2010-05-19 | 信越半導体株式会社 | シリコンウエーハの製造方法およびシリコンウエーハ |
JP2002184960A (ja) * | 2000-12-18 | 2002-06-28 | Shin Etsu Handotai Co Ltd | Soiウェーハの製造方法及びsoiウェーハ |
US6743495B2 (en) * | 2001-03-30 | 2004-06-01 | Memc Electronic Materials, Inc. | Thermal annealing process for producing silicon wafers with improved surface characteristics |
US7084046B2 (en) * | 2001-11-29 | 2006-08-01 | Shin-Etsu Handotai Co., Ltd. | Method of fabricating SOI wafer |
JP2006216826A (ja) * | 2005-02-04 | 2006-08-17 | Sumco Corp | Soiウェーハの製造方法 |
JP2007059704A (ja) * | 2005-08-25 | 2007-03-08 | Sumco Corp | 貼合せ基板の製造方法及び貼合せ基板 |
JP4715470B2 (ja) * | 2005-11-28 | 2011-07-06 | 株式会社Sumco | 剥離ウェーハの再生加工方法及びこの方法により再生加工された剥離ウェーハ |
JP2007227424A (ja) * | 2006-02-21 | 2007-09-06 | Sumco Corp | Simoxウェーハの製造方法 |
KR100701314B1 (ko) | 2006-12-05 | 2007-03-29 | 곽종보 | 조명용 발전기 |
JP4820801B2 (ja) * | 2006-12-26 | 2011-11-24 | 株式会社Sumco | 貼り合わせウェーハの製造方法 |
JP5045095B2 (ja) * | 2006-12-26 | 2012-10-10 | 信越半導体株式会社 | 半導体デバイスの製造方法 |
JP5009124B2 (ja) * | 2007-01-04 | 2012-08-22 | コバレントマテリアル株式会社 | 半導体基板の製造方法 |
EP2140480A4 (en) * | 2007-04-20 | 2015-04-22 | Semiconductor Energy Lab | METHOD FOR PRODUCING AN SOI SUBSTRATE AND SEMICONDUCTOR ARRANGEMENT |
JP5280015B2 (ja) * | 2007-05-07 | 2013-09-04 | 信越半導体株式会社 | Soi基板の製造方法 |
JP5245380B2 (ja) * | 2007-06-21 | 2013-07-24 | 信越半導体株式会社 | Soiウェーハの製造方法 |
JP5510256B2 (ja) | 2010-10-06 | 2014-06-04 | 株式会社Sumco | シリコンウェーハの製造方法 |
JP5993550B2 (ja) | 2011-03-08 | 2016-09-14 | 信越半導体株式会社 | シリコン単結晶ウェーハの製造方法 |
KR101870476B1 (ko) * | 2011-03-16 | 2018-06-22 | 썬에디슨, 인크. | 핸들 웨이퍼에 고 비저항 영역을 갖는 실리콘-온-인슐레이터 구조체 및 그러한 구조체를 제조하는 방법 |
WO2012136998A1 (en) * | 2011-04-06 | 2012-10-11 | Isis Innovation Limited | Heterogeneous integration of group iii-v or ii-vi materials with silicon or germanium |
US9634098B2 (en) * | 2013-06-11 | 2017-04-25 | SunEdison Semiconductor Ltd. (UEN201334164H) | Oxygen precipitation in heavily doped silicon wafers sliced from ingots grown by the Czochralski method |
US9209069B2 (en) * | 2013-10-15 | 2015-12-08 | Sunedison Semiconductor Limited (Uen201334164H) | Method of manufacturing high resistivity SOI substrate with reduced interface conductivity |
US9768056B2 (en) * | 2013-10-31 | 2017-09-19 | Sunedison Semiconductor Limited (Uen201334164H) | Method of manufacturing high resistivity SOI wafers with charge trapping layers based on terminated Si deposition |
JP6118757B2 (ja) * | 2014-04-24 | 2017-04-19 | 信越半導体株式会社 | 貼り合わせsoiウェーハの製造方法 |
EP3221884B1 (en) * | 2014-11-18 | 2022-06-01 | GlobalWafers Co., Ltd. | High resistivity semiconductor-on-insulator wafers with charge trapping layers and method of manufacturing thereof |
JP6726180B2 (ja) * | 2014-11-18 | 2020-07-22 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co.,Ltd. | 高抵抗率半導体・オン・インシュレータウエハおよび製造方法 |
JP6179530B2 (ja) * | 2015-01-23 | 2017-08-16 | 信越半導体株式会社 | 貼り合わせsoiウェーハの製造方法 |
EP3367424B1 (en) * | 2015-03-03 | 2022-10-19 | GlobalWafers Co., Ltd. | Charge trapping polycrystalline silicon films on silicon substrates with controllable film stress |
US9881832B2 (en) * | 2015-03-17 | 2018-01-30 | Sunedison Semiconductor Limited (Uen201334164H) | Handle substrate for use in manufacture of semiconductor-on-insulator structure and method of manufacturing thereof |
US10026642B2 (en) * | 2016-03-07 | 2018-07-17 | Sunedison Semiconductor Limited (Uen201334164H) | Semiconductor on insulator structure comprising a sacrificial layer and method of manufacture thereof |
US10269617B2 (en) * | 2016-06-22 | 2019-04-23 | Globalwafers Co., Ltd. | High resistivity silicon-on-insulator substrate comprising an isolation region |
WO2018080772A1 (en) * | 2016-10-26 | 2018-05-03 | Sunedison Semiconductor Limited | High resistivity silicon-on-insulator substrate having enhanced charge trapping efficiency |
KR102587815B1 (ko) * | 2016-12-05 | 2023-10-10 | 글로벌웨이퍼스 씨오., 엘티디. | 높은 저항률 실리콘-온-절연체 구조 및 그의 제조 방법 |
EP3562978B1 (en) * | 2016-12-28 | 2021-03-10 | Sunedison Semiconductor Limited | Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield |
-
2015
- 2015-09-28 JP JP2015189399A patent/JP6447439B2/ja active Active
-
2016
- 2016-08-22 EP EP16850559.2A patent/EP3358600B1/en active Active
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- 2016-08-22 CN CN201680049105.3A patent/CN108028170B/zh active Active
- 2016-08-22 KR KR1020187006698A patent/KR102509310B1/ko active IP Right Grant
- 2016-08-24 TW TW105126977A patent/TWI698907B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003068744A (ja) * | 2001-08-30 | 2003-03-07 | Shin Etsu Handotai Co Ltd | シリコンウエーハの製造方法及びシリコンウエーハ並びにsoiウエーハ |
JP2003224247A (ja) * | 2002-01-29 | 2003-08-08 | Shin Etsu Handotai Co Ltd | Soiウエーハ及びsoiウエーハの製造方法 |
JP2005206391A (ja) * | 2004-01-20 | 2005-08-04 | Shin Etsu Handotai Co Ltd | シリコン単結晶基板の抵抗率保証方法及びシリコン単結晶基板の製造方法並びにシリコン単結晶基板 |
JP2014107357A (ja) * | 2012-11-26 | 2014-06-09 | Shin Etsu Handotai Co Ltd | Soiウェーハの製造方法 |
Cited By (15)
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---|---|---|---|---|
JP7248711B2 (ja) | 2018-07-13 | 2023-03-29 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ構造 |
JP7527425B2 (ja) | 2018-07-13 | 2024-08-02 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ構造 |
JP2021531645A (ja) * | 2018-07-13 | 2021-11-18 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co., Ltd. | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
JP2021532570A (ja) * | 2018-07-13 | 2021-11-25 | グローバルウェーハズ カンパニー リミテッドGlobalWafers Co., Ltd. | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ構造 |
JP7470233B2 (ja) | 2018-07-13 | 2024-04-17 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
JP7275172B2 (ja) | 2018-07-13 | 2023-05-17 | グローバルウェーハズ カンパニー リミテッド | 優れた性能、安定性および製造性を有する無線周波数シリコン・オン・インシュレータ・ウエハ・プラットフォーム |
KR20200030405A (ko) | 2018-09-12 | 2020-03-20 | 주식회사 이피지 | 관통형 전극 제조 방법 및 그 방법에 의해 제조되는 관통형 전극 |
US11244852B2 (en) | 2018-11-13 | 2022-02-08 | Shin-Etsu Handotai Co., Ltd. | Method for manufacturing bonded SOI wafer |
JP2022514572A (ja) * | 2018-12-24 | 2022-02-14 | ソイテック | デジタル用途及び無線周波数用途のための半導体構造、並びにそのような構造を製造するためのプロセス |
JP7259167B2 (ja) | 2018-12-24 | 2023-04-18 | ソイテック | デジタル用途及び無線周波数用途のための半導体構造、並びにそのような構造を製造するためのプロセス |
KR20210149715A (ko) | 2019-04-05 | 2021-12-09 | 가부시키가이샤 도쿠야마 | 다결정 실리콘 원료 |
WO2020204143A1 (ja) | 2019-04-05 | 2020-10-08 | 株式会社トクヤマ | 多結晶シリコン原料 |
US11932964B2 (en) | 2019-04-05 | 2024-03-19 | Tokuyama Coporation | Polycrystalline silicon material |
KR20210149714A (ko) | 2019-04-05 | 2021-12-09 | 가부시키가이샤 도쿠야마 | 다결정 실리콘 원료 |
WO2020204141A1 (ja) | 2019-04-05 | 2020-10-08 | 株式会社トクヤマ | 多結晶シリコン原料 |
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EP3358600A1 (en) | 2018-08-08 |
KR102509310B1 (ko) | 2023-03-13 |
EP3358600A4 (en) | 2019-05-29 |
KR20180058713A (ko) | 2018-06-01 |
CN108028170B (zh) | 2022-03-15 |
US20180247860A1 (en) | 2018-08-30 |
JP6447439B2 (ja) | 2019-01-09 |
CN108028170A (zh) | 2018-05-11 |
SG11201801408YA (en) | 2018-03-28 |
TW201721710A (zh) | 2017-06-16 |
EP3358600B1 (en) | 2022-08-03 |
WO2017056376A1 (ja) | 2017-04-06 |
TWI698907B (zh) | 2020-07-11 |
US11056381B2 (en) | 2021-07-06 |
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