JP2012505315A - 高電界陽極酸化装置 - Google Patents
高電界陽極酸化装置 Download PDFInfo
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- JP2012505315A JP2012505315A JP2011534411A JP2011534411A JP2012505315A JP 2012505315 A JP2012505315 A JP 2012505315A JP 2011534411 A JP2011534411 A JP 2011534411A JP 2011534411 A JP2011534411 A JP 2011534411A JP 2012505315 A JP2012505315 A JP 2012505315A
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- current
- anodizing apparatus
- electrolyte
- temperature
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/005—Apparatus specially adapted for electrolytic conversion coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/02—Heating or cooling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Automation & Control Theory (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Description
図6は5%リン酸溶液で数分間境界層を除去し気孔を拡張した最終メンブレインの写真(図6a)とSEM写真(図6b)を示した。
11:電解槽
12:電解液
13:陽極
14:陰極
15:陰極リード線
16:金属支持体
17:攪拌手段
18:Oリング
19:冷却台
100:電源供給手段
200:温度制御手段
210:温度センサー
220:冷却手段
230:加熱手段
300:反応速度調節手段
310:計測手段
320:高濃度電解液供給手段
Claims (8)
- 陽極酸化セル(10)の電解液(12)に金属陽極(13)と相対電極を浸漬し、金属を酸化させて表面にナノ構造体を形成する陽極酸化装置において、
電解液(12)中の金属陽極(13)と相対電極との間に一定のパターンの電圧を印加する電源供給手段(100)と、
前記電極および電解液(12)の温度が一定に維持されるように制御する温度制御手段(200)と、
前記電源供給手段(100)で供給された電圧によって発生する電流を測定し、電流値に応じて電解質の濃度を調節することにより、電流を一定の水準に維持する反応速度調節手段(300)とを含んでなることを特徴とする高電界陽極酸化装置。 - 前記陽極酸化する金属陽極(13)の材料は、Al、Ti、Zr、Hf、Ta、Nb、Wおよびこれらの合金のうちいずれか一つであり、必要に応じて熱処理、電解研磨または化学研磨の前処理が行われることを特徴とする請求項1に記載の高電界陽極酸化装置。
- 前記相対電極はチューブ状に形成されることを特徴とする請求項1に記載の高電界陽極酸化装置。
- 前記チューブ状に形成された相対電極の内部に冷却水が流れるようにして電解液を冷却させることを特徴とする請求項3に記載の高電界陽極酸化装置。
- 前記電源供給手段(100)は、直流、交流、パルスおよびバイアスのうちいずれか一つの電圧またはこれらの組み合わせを前記金属陽極(13)と前記相対電極との間に印加し、ナノ構造体の気孔間の間隔に合わせて電圧を制御することができるように形成されることを特徴とする請求項1に記載の高電界陽極酸化装置。
- 前記温度制御手段(200)は、前記金属陽極(13)の後面に接触して設けられ、温度センサー(210)と冷却手段(220)を備えるもので、必要に応じて一定温度の維持のために加熱手段(230)を共に備えることを特徴とする請求項1に記載の高電界陽極酸化装置。
- 前記温度制御手段(200)は、電解液(12)の温度を低めるために電解液冷却手段をさらに備えることを特徴とする請求項6に記載の高電界陽極酸化装置。
- 前記反応速度調節手段(300)は、前記電源供給手段(100)で供給される電圧によって前記金属陽極(13)と前記相対電極との間に発生する電流を測定する計測手段(310)と、前記計測手段(310)によって、予め設定した電流値より低い電流が測定される場合には開放され、高い電流が測定される場合には閉鎖される高濃度電解液供給手段(320)とを含んでなることを特徴とする請求項1に記載の高電界陽極酸化装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090093786A KR101215536B1 (ko) | 2009-10-01 | 2009-10-01 | 고전계 양극산화장치 |
KR10-2009-0093786 | 2009-10-01 | ||
PCT/KR2009/007268 WO2011040679A1 (ko) | 2009-10-01 | 2009-12-07 | 고전계 양극산화장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012505315A true JP2012505315A (ja) | 2012-03-01 |
JP5250700B2 JP5250700B2 (ja) | 2013-07-31 |
Family
ID=43826465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011534411A Expired - Fee Related JP5250700B2 (ja) | 2009-10-01 | 2009-12-07 | 高電界陽極酸化装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20110209990A1 (ja) |
JP (1) | JP5250700B2 (ja) |
KR (1) | KR101215536B1 (ja) |
CN (1) | CN102209803A (ja) |
WO (1) | WO2011040679A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016522735A (ja) * | 2013-03-15 | 2016-08-04 | プレジデント アンド フェローズ オブ ハーバード カレッジ | 極短電気パルスによる原子的に薄い膜中のナノ孔の製造 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101352356B1 (ko) * | 2012-04-05 | 2014-02-05 | 한전원자력연료 주식회사 | 튜브의 내부 표면 양극산화 장치 및 방법 |
KR101349744B1 (ko) * | 2012-06-29 | 2014-01-17 | 한국표준과학연구원 | 나노 구조체 및 그 제조 방법 |
CN103590084B (zh) * | 2012-08-16 | 2018-08-17 | 盛美半导体设备(上海)有限公司 | 一种快速制备纳米结构阵列的装置及方法 |
TWI465301B (zh) * | 2012-09-25 | 2014-12-21 | Univ Southern Taiwan Sci & Tec | 多孔性氧化鋁模板之製作裝置 |
CN104884681B (zh) * | 2012-12-03 | 2018-05-25 | 加利福尼亚大学董事会 | 用于涂覆表面的装置、***和方法 |
CN104152967B (zh) * | 2014-07-16 | 2017-02-01 | 常州大学 | 一种铝合金阳极氧化装置 |
WO2019183083A1 (en) * | 2018-03-19 | 2019-09-26 | The Trustees Of The University Of Pennsylvania | Bulk nanoporous materials for on-site and on-board generation of hydrogen and other products |
CN110618172B (zh) * | 2018-06-20 | 2022-05-24 | 深圳市裕展精密科技有限公司 | 钛或钛合金的阳极氧化电解液的分析方法及分析*** |
DE102021105128A1 (de) | 2021-03-03 | 2022-09-08 | Nanowired Gmbh | Galvanisches Wachsen einer Vielzahl von Nanodrähten |
DE102021105126A1 (de) | 2021-03-03 | 2022-09-08 | Nanowired Gmbh | Galvanisches Wachsen von Nanodrähten auf einem Substrat |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH04120298A (ja) * | 1990-09-07 | 1992-04-21 | Showa Alum Corp | 陽極酸化処理における陽極酸化皮膜厚さ制御方法 |
JPH0920998A (ja) * | 1995-05-01 | 1997-01-21 | Shimada Phys & Chem Ind Co Ltd | 酸化膜形成方法および電源装置 |
JP2003025298A (ja) * | 2001-05-11 | 2003-01-29 | Canon Inc | 細孔を有する構造体及びその製造方法 |
JP2004307917A (ja) * | 2003-04-04 | 2004-11-04 | Fuji Photo Film Co Ltd | 電解処理液の濃度制御方法及び装置 |
Family Cites Families (9)
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US2542112A (en) * | 1945-04-16 | 1951-02-20 | Boeing Co | Method of regenerating aluminum anodizing solution |
US3616325A (en) * | 1967-12-06 | 1971-10-26 | Fmc Corp | Process for producing potassium peroxydiphosphate |
JPH0849094A (ja) * | 1994-08-04 | 1996-02-20 | Mitsubishi Heavy Ind Ltd | 局部陽極酸化処理方法及び装置 |
JP2837397B2 (ja) * | 1995-12-04 | 1998-12-16 | テクノ工業株式会社 | アルミニウムまたはアルミニウム合金の陽極酸化処理装置 |
JP2002235194A (ja) * | 2001-02-05 | 2002-08-23 | Fuji Denka Kk | アルミニウム又はアルミニウム合金の陽極酸化処理における処理液の管理方法 |
WO2005014893A1 (en) * | 2003-08-11 | 2005-02-17 | Canon Kabushiki Kaisha | Method for production of structure and porous member |
US20060032760A1 (en) * | 2004-08-13 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
KR100851204B1 (ko) * | 2006-11-09 | 2008-08-07 | 금오공과대학교 산학협력단 | 양극 산화 장치 |
US20110284385A1 (en) * | 2010-05-21 | 2011-11-24 | Pioneer Metal Finishing | Method and Apparatus For Anodizing Objects |
-
2009
- 2009-10-01 KR KR1020090093786A patent/KR101215536B1/ko active IP Right Grant
- 2009-12-07 JP JP2011534411A patent/JP5250700B2/ja not_active Expired - Fee Related
- 2009-12-07 WO PCT/KR2009/007268 patent/WO2011040679A1/ko active Application Filing
- 2009-12-07 CN CN2009801448991A patent/CN102209803A/zh active Pending
-
2011
- 2011-04-27 US US13/095,460 patent/US20110209990A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04120298A (ja) * | 1990-09-07 | 1992-04-21 | Showa Alum Corp | 陽極酸化処理における陽極酸化皮膜厚さ制御方法 |
JPH0920998A (ja) * | 1995-05-01 | 1997-01-21 | Shimada Phys & Chem Ind Co Ltd | 酸化膜形成方法および電源装置 |
JP2003025298A (ja) * | 2001-05-11 | 2003-01-29 | Canon Inc | 細孔を有する構造体及びその製造方法 |
JP2004307917A (ja) * | 2003-04-04 | 2004-11-04 | Fuji Photo Film Co Ltd | 電解処理液の濃度制御方法及び装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016522735A (ja) * | 2013-03-15 | 2016-08-04 | プレジデント アンド フェローズ オブ ハーバード カレッジ | 極短電気パルスによる原子的に薄い膜中のナノ孔の製造 |
Also Published As
Publication number | Publication date |
---|---|
CN102209803A (zh) | 2011-10-05 |
WO2011040679A1 (ko) | 2011-04-07 |
JP5250700B2 (ja) | 2013-07-31 |
KR101215536B1 (ko) | 2012-12-26 |
US20110209990A1 (en) | 2011-09-01 |
KR20110036233A (ko) | 2011-04-07 |
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