JP2011003414A - 荷電粒子線装置 - Google Patents
荷電粒子線装置 Download PDFInfo
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- JP2011003414A JP2011003414A JP2009145920A JP2009145920A JP2011003414A JP 2011003414 A JP2011003414 A JP 2011003414A JP 2009145920 A JP2009145920 A JP 2009145920A JP 2009145920 A JP2009145920 A JP 2009145920A JP 2011003414 A JP2011003414 A JP 2011003414A
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- 239000002245 particle Substances 0.000 title claims abstract description 55
- 108010083687 Ion Pumps Proteins 0.000 claims abstract description 111
- 102000006391 Ion Pumps Human genes 0.000 claims abstract description 50
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- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 description 17
- 238000007689 inspection Methods 0.000 description 15
- 230000035882 stress Effects 0.000 description 12
- 238000010894 electron beam technology Methods 0.000 description 11
- 238000006073 displacement reaction Methods 0.000 description 9
- 230000002238 attenuated effect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000013016 damping Methods 0.000 description 6
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- 238000010884 ion-beam technique Methods 0.000 description 2
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F9/00—Springs, vibration-dampers, shock-absorbers, or similarly-constructed movement-dampers using a fluid or the equivalent as damping medium
- F16F9/30—Springs, vibration-dampers, shock-absorbers, or similarly-constructed movement-dampers using a fluid or the equivalent as damping medium with solid or semi-solid material, e.g. pasty masses, as damping medium
- F16F9/306—Springs, vibration-dampers, shock-absorbers, or similarly-constructed movement-dampers using a fluid or the equivalent as damping medium with solid or semi-solid material, e.g. pasty masses, as damping medium of the constrained layer type, i.e. comprising one or more constrained viscoelastic layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0216—Means for avoiding or correcting vibration effects
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- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
【解決手段】試料3を内部に配置する試料室4と、荷電粒子線10を試料3に照射するための荷電粒子線光学鏡筒1と、荷電粒子線光学鏡筒1の内部を排気するイオンポンプ2a、2bとを備える荷電粒子線装置において、試料室4に、イオンポンプ2a、2bの一端に対向してフレーム16が固定され、フレーム16とイオンポンプ2a、2bの一端との間に振動吸収体が設けられ、この振動吸収体は、粘弾性体シート20a、bを金属板18a18b、21a、21bで挟んだ積層構造体によって構成される。
【選択図】図1
Description
E=1/2・M・V2=1/2・K・X2
速度Vや変位Xは、イオンポンプの固有角振動数ωnと加速度の絶対値Aから求めても良い。バネ定数Kは、イオンポンプの固有角振動数ωnと質量Mから算出可能である。
V=A/ωn
X=A/ωn2
K=ωn2・M
図5(a)〜(c)に、粘弾性体による振動エネルギーの吸収メカニズムを示す。
τ=G*・γ
=(G’+G”・j)・γ
=G’・(1+η・j)・γ
τ:せん断応力
G*:複素せん断弾性係数
G’:複素せん断弾性係数の実数部(貯蔵せん断弾性率)
G”:複素せん断弾性係数の虚数部(損失せん断弾性率)
γ:せん断歪
η:損失係数(=G”/G’)
j:虚数単位
図5(b)は、粘弾性体のせん断歪γとせん断応力τとの関係を示す図である。せん断歪γとせん断応力τとの関係は、τ=G*・γと表されるが、複素せん断弾性係数G*に虚数項があるために、直線ではなく楕円で表される。
Claims (4)
- 試料を内部に配置する試料室と、荷電粒子線を前記試料に照射するための荷電粒子線光学鏡筒と、前記荷電粒子線光学鏡筒の内部を排気するイオンポンプとを備える荷電粒子線装置において、
前記試料室を形成する部材に、前記イオンポンプの一端に対向してフレームが固定され、
前記フレームと前記イオンポンプの一端との間に振動吸収体が設けられ、この振動吸収体は、粘弾性体シートを金属板で挟んだ積層構造体によって構成されることを特徴とする荷電粒子線装置。 - 試料を内部に配置する試料室と、前記試料室を支持する荷重板と、荷電粒子線を前記試料に照射するための荷電粒子線光学鏡筒と、前記荷電粒子線光学鏡筒の内部を排気するイオンポンプとを備える荷電粒子線装置において、
前記荷重板に、前記イオンポンプの一端に対向してフレームが固定され、
前記フレームと前記イオンポンプの一端との間に振動吸収体が設けられ、この振動吸収体は、粘弾性体シートを金属板で挟んだ積層構造体によって構成されることを特徴とする荷電粒子線装置。 - 請求項1記載の荷電粒子線装置において、
前記イオンポンプを複数備え、
前記フレームは、複数の前記イオンポンプの数に合わせて分割され、
分割された前記フレームのそれぞれは、前記試料室を形成する部材または他のフレームに固定され、複数の前記イオンポンプのそれぞれとの間に前記積層構造体を備える荷電粒子線装置。 - 請求項2記載の荷電粒子線装置において、
前記イオンポンプを複数備え、
前記フレームは、複数の前記イオンポンプの数に合わせて分割され、
分割された前記フレームのそれぞれは、前記荷重板または他のフレームに固定され、複数の前記イオンポンプのそれぞれとの間に前記積層構造体を備える荷電粒子線装置。
Priority Applications (3)
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---|---|---|---|
JP2009145920A JP5364462B2 (ja) | 2009-06-19 | 2009-06-19 | 荷電粒子線装置 |
PCT/JP2010/003698 WO2010146790A1 (ja) | 2009-06-19 | 2010-06-03 | 荷電粒子線装置 |
US13/378,827 US8629410B2 (en) | 2009-06-19 | 2010-06-03 | Charged particle radiation device |
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JP2009145920A JP5364462B2 (ja) | 2009-06-19 | 2009-06-19 | 荷電粒子線装置 |
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JP2011003414A true JP2011003414A (ja) | 2011-01-06 |
JP5364462B2 JP5364462B2 (ja) | 2013-12-11 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014216207A (ja) * | 2013-04-25 | 2014-11-17 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
Families Citing this family (7)
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JP5537386B2 (ja) * | 2010-11-09 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
KR101882824B1 (ko) | 2014-01-31 | 2018-07-27 | 에이에스엠엘 네델란즈 비.브이. | 스테이지 위치설정 시스템 및 리소그래피 장치 |
JP6676407B2 (ja) | 2016-02-26 | 2020-04-08 | 株式会社日立ハイテク | 荷電粒子線装置、及び荷電粒子線装置用制振ダンパ |
JP6633986B2 (ja) * | 2016-07-20 | 2020-01-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP6484601B2 (ja) * | 2016-11-24 | 2019-03-13 | 株式会社Kokusai Electric | 処理装置及び半導体装置の製造方法 |
JP6872429B2 (ja) * | 2017-06-07 | 2021-05-19 | 株式会社日立ハイテク | 荷電粒子線装置 |
TW202145297A (zh) * | 2020-02-06 | 2021-12-01 | 荷蘭商Asml荷蘭公司 | 用於離子泵的振動阻尼和共振減小 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09190791A (ja) * | 1996-01-09 | 1997-07-22 | Jeol Ltd | イオンポンプを備えた荷電粒子線装置 |
JP2001076660A (ja) * | 1999-09-07 | 2001-03-23 | Jeol Ltd | 荷電粒子ビーム装置 |
JP2007157682A (ja) * | 2005-11-10 | 2007-06-21 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP2008052947A (ja) * | 2006-08-23 | 2008-03-06 | Jeol Ltd | 荷電粒子ビーム装置 |
JP2008052946A (ja) * | 2006-08-23 | 2008-03-06 | Jeol Ltd | ビーム応用装置 |
JP2009004112A (ja) * | 2007-06-19 | 2009-01-08 | Hitachi High-Technologies Corp | 荷電粒子線装置およびその真空立上げ方法 |
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EP1271605A4 (en) * | 2000-11-02 | 2009-09-02 | Ebara Corp | ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS |
US6809323B2 (en) * | 2002-04-03 | 2004-10-26 | Nikon Corporation | Isolated frame caster |
JP2005268268A (ja) * | 2004-03-16 | 2005-09-29 | Canon Inc | 電子ビーム露光装置 |
JP4751635B2 (ja) * | 2005-04-13 | 2011-08-17 | 株式会社日立ハイテクノロジーズ | 磁界重畳型電子銃 |
JP5086105B2 (ja) * | 2008-01-07 | 2012-11-28 | 株式会社日立ハイテクノロジーズ | ガス電界電離イオン源 |
JP5476087B2 (ja) * | 2008-12-03 | 2014-04-23 | 日本電子株式会社 | 荷電粒子線装置の物***置決め装置 |
US8729467B2 (en) * | 2009-10-07 | 2014-05-20 | Hitachi High-Technologies Corporation | Charged particle radiation device |
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- 2009-06-19 JP JP2009145920A patent/JP5364462B2/ja active Active
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- 2010-06-03 US US13/378,827 patent/US8629410B2/en active Active
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09190791A (ja) * | 1996-01-09 | 1997-07-22 | Jeol Ltd | イオンポンプを備えた荷電粒子線装置 |
JP2001076660A (ja) * | 1999-09-07 | 2001-03-23 | Jeol Ltd | 荷電粒子ビーム装置 |
JP2007157682A (ja) * | 2005-11-10 | 2007-06-21 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP2008052947A (ja) * | 2006-08-23 | 2008-03-06 | Jeol Ltd | 荷電粒子ビーム装置 |
JP2008052946A (ja) * | 2006-08-23 | 2008-03-06 | Jeol Ltd | ビーム応用装置 |
JP2009004112A (ja) * | 2007-06-19 | 2009-01-08 | Hitachi High-Technologies Corp | 荷電粒子線装置およびその真空立上げ方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014216207A (ja) * | 2013-04-25 | 2014-11-17 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
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US8629410B2 (en) | 2014-01-14 |
JP5364462B2 (ja) | 2013-12-11 |
WO2010146790A1 (ja) | 2010-12-23 |
US20120091362A1 (en) | 2012-04-19 |
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