JP2009294235A - アトムプローブ装置及びアトムプローブ分析方法 - Google Patents
アトムプローブ装置及びアトムプローブ分析方法 Download PDFInfo
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- JP2009294235A JP2009294235A JP2009220844A JP2009220844A JP2009294235A JP 2009294235 A JP2009294235 A JP 2009294235A JP 2009220844 A JP2009220844 A JP 2009220844A JP 2009220844 A JP2009220844 A JP 2009220844A JP 2009294235 A JP2009294235 A JP 2009294235A
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Abstract
【解決手段】本発明のアトムプローブ装置用試料の予備加工は、FIB装置を用いて試料所望観察部位をブロック状に切り出すステップと、該ブロック状の切り出し試料を試料基板上に移送して固定するステップと、該試料基板上に固定されたブロック状の試料をFIBエッチング加工によって針先形状に加工するステップとからなる。また、針先形状に加工された試料は多層構造の層方向が針の長手方向に平行となるように形成する。
【選択図】図2
Description
1a… 針状試料
2… 試料固定基板
3… プローブ
4、4a、4b… 保護膜
5… 仮固定部
6… 本固定部
Claims (2)
- 多層構造からなる試料の各層の端部に引き出し電界を印加する引き出し電極と、
前記多層構造の各層の蒸発電界の強度を記憶する記憶手段と、
イオンを検出するためのスクリーン上の到着位置を検知する手段とを備え、
前記多層構造の各層の蒸発電界強度と前記到達位置から特定する層の端部位置を特定する機能を有するアトムプローブ装置。 - 多層構造の各層の界面の方向が針の長手方向に平行となる針先形状の試料の前記各層の端部に電界を印加して蒸発したイオンがスクリーンに到達した位置を検出し前記試料を構成する元素について分析するアトムプローブ分析方法において、
前記試料に印加する電界強度を徐々に上げる工程と、
前記各層の蒸発電界強度を記憶する工程と、
前記各層の蒸発電界強度を用いて前記スクリーンにイオンが到達した位置から前記試料の構成元素の位置を補正する工程と、
を含むアトムプローブ分析方法。
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JP2009220844A JP4902712B2 (ja) | 2009-09-25 | 2009-09-25 | アトムプローブ分析方法 |
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JP2009220844A JP4902712B2 (ja) | 2009-09-25 | 2009-09-25 | アトムプローブ分析方法 |
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JP2004075873A Division JP4393899B2 (ja) | 2004-03-17 | 2004-03-17 | アトムプローブ装置用試料及びその加工方法 |
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JP2009294235A true JP2009294235A (ja) | 2009-12-17 |
JP4902712B2 JP4902712B2 (ja) | 2012-03-21 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150026970A (ko) | 2013-09-02 | 2015-03-11 | 가부시키가이샤 히다치 하이테크 사이언스 | 하전 입자 빔 장치 |
KR20150026971A (ko) | 2013-09-02 | 2015-03-11 | 가부시키가이샤 히다치 하이테크 사이언스 | 하전 입자 빔 장치 |
US9875878B2 (en) | 2013-12-05 | 2018-01-23 | Hitachi, Ltd. | Sample holder and analytical vacuum device |
JPWO2019224993A1 (ja) * | 2018-05-25 | 2021-02-18 | 三菱電機株式会社 | 透過型電子顕微鏡試料の作製方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0821793A (ja) * | 1994-07-08 | 1996-01-23 | Hitachi Ltd | 金属材料の耐腐食性評価方法、高耐食合金の設計方法、金属材料の腐食状態診断方法およびプラントの運転方法 |
JP2002042715A (ja) * | 2000-07-25 | 2002-02-08 | Kanazawa Inst Of Technology | 組成分布立体表示アトムプローブおよび走査型組成分布立体表示アトムプローブ |
JP2005265516A (ja) * | 2004-03-17 | 2005-09-29 | Sii Nanotechnology Inc | アトムプローブ装置及びその試料予備加工方法 |
-
2009
- 2009-09-25 JP JP2009220844A patent/JP4902712B2/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0821793A (ja) * | 1994-07-08 | 1996-01-23 | Hitachi Ltd | 金属材料の耐腐食性評価方法、高耐食合金の設計方法、金属材料の腐食状態診断方法およびプラントの運転方法 |
JP2002042715A (ja) * | 2000-07-25 | 2002-02-08 | Kanazawa Inst Of Technology | 組成分布立体表示アトムプローブおよび走査型組成分布立体表示アトムプローブ |
JP2005265516A (ja) * | 2004-03-17 | 2005-09-29 | Sii Nanotechnology Inc | アトムプローブ装置及びその試料予備加工方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150026970A (ko) | 2013-09-02 | 2015-03-11 | 가부시키가이샤 히다치 하이테크 사이언스 | 하전 입자 빔 장치 |
KR20150026971A (ko) | 2013-09-02 | 2015-03-11 | 가부시키가이샤 히다치 하이테크 사이언스 | 하전 입자 빔 장치 |
JP2015050069A (ja) * | 2013-09-02 | 2015-03-16 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
US9245713B2 (en) | 2013-09-02 | 2016-01-26 | Hitachi High-Tech Science Corporation | Charged particle beam apparatus |
US9318303B2 (en) | 2013-09-02 | 2016-04-19 | Hitachi High-Tech Science Corporation | Charged particle beam apparatus |
US9875878B2 (en) | 2013-12-05 | 2018-01-23 | Hitachi, Ltd. | Sample holder and analytical vacuum device |
JPWO2019224993A1 (ja) * | 2018-05-25 | 2021-02-18 | 三菱電機株式会社 | 透過型電子顕微鏡試料の作製方法 |
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