JP2009105295A5 - - Google Patents

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Publication number
JP2009105295A5
JP2009105295A5 JP2007277162A JP2007277162A JP2009105295A5 JP 2009105295 A5 JP2009105295 A5 JP 2009105295A5 JP 2007277162 A JP2007277162 A JP 2007277162A JP 2007277162 A JP2007277162 A JP 2007277162A JP 2009105295 A5 JP2009105295 A5 JP 2009105295A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007277162A
Other versions
JP2009105295A (ja
JP4857239B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007277162A priority Critical patent/JP4857239B2/ja
Priority claimed from JP2007277162A external-priority patent/JP4857239B2/ja
Priority to US12/288,284 priority patent/US7923990B2/en
Priority to KR1020080104839A priority patent/KR100998552B1/ko
Priority to TW097140908A priority patent/TW200919626A/zh
Publication of JP2009105295A publication Critical patent/JP2009105295A/ja
Publication of JP2009105295A5 publication Critical patent/JP2009105295A5/ja
Application granted granted Critical
Publication of JP4857239B2 publication Critical patent/JP4857239B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007277162A 2007-10-25 2007-10-25 ウェハ保持装置 Expired - Fee Related JP4857239B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007277162A JP4857239B2 (ja) 2007-10-25 2007-10-25 ウェハ保持装置
US12/288,284 US7923990B2 (en) 2007-10-25 2008-10-17 Wafer holder
KR1020080104839A KR100998552B1 (ko) 2007-10-25 2008-10-24 웨이퍼 홀더
TW097140908A TW200919626A (en) 2007-10-25 2008-10-24 Wafer holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007277162A JP4857239B2 (ja) 2007-10-25 2007-10-25 ウェハ保持装置

Publications (3)

Publication Number Publication Date
JP2009105295A JP2009105295A (ja) 2009-05-14
JP2009105295A5 true JP2009105295A5 (ja) 2010-12-02
JP4857239B2 JP4857239B2 (ja) 2012-01-18

Family

ID=40583061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007277162A Expired - Fee Related JP4857239B2 (ja) 2007-10-25 2007-10-25 ウェハ保持装置

Country Status (4)

Country Link
US (1) US7923990B2 (ja)
JP (1) JP4857239B2 (ja)
KR (1) KR100998552B1 (ja)
TW (1) TW200919626A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011029217A (ja) * 2009-07-21 2011-02-10 Okawa Kanagata Sekkei Jimusho:Kk ウェーハ用ホルダ
EP2515322A4 (en) * 2009-12-18 2017-03-01 Nikon Corporation Pair of substrate holders, method for manufacturing device, separation device, method for separating substrates, substrate holder, and device for positioning substrate
RU2523356C2 (ru) * 2012-10-16 2014-07-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Новгородский государственный университет имени Ярослава Мудрого" Конструкция электродов для снятия электрокардиограммы
TW201714243A (zh) * 2015-10-05 2017-04-16 Els System Technology Co Ltd 承載裝置
US9881820B2 (en) * 2015-10-22 2018-01-30 Lam Research Corporation Front opening ring pod
JP6842948B2 (ja) * 2017-02-24 2021-03-17 リンテック株式会社 位置決め装置および位置決め方法
ES2884373T3 (es) * 2017-06-28 2021-12-10 Meyer Burger Germany Gmbh Dispositivo para el transporte de un sustrato, dispositivo de tratamiento con una placa de alojamiento adaptada a un soporte de sustrato de tal dispositivo y procedimiento para el procesado de un sustrato bajo utilización de tal dispositivo para el transporte de un sustrato, así como planta de tratamiento

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201948A (ja) * 1993-12-29 1995-08-04 Dainippon Screen Mfg Co Ltd 基板搬送治具
US6137303A (en) * 1998-12-14 2000-10-24 Sony Corporation Integrated testing method and apparatus for semiconductor test operations processing
JP4128023B2 (ja) * 2002-04-26 2008-07-30 株式会社トプコン ウェーハ保持装置
JP4471747B2 (ja) * 2004-06-24 2010-06-02 アピックヤマダ株式会社 半導体装置の製造装置
JP2007109771A (ja) * 2005-10-12 2007-04-26 Matsushita Electric Ind Co Ltd プラズマ処理装置用のトレイ

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