JP2008001828A5 - - Google Patents
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- JP2008001828A5 JP2008001828A5 JP2006173777A JP2006173777A JP2008001828A5 JP 2008001828 A5 JP2008001828 A5 JP 2008001828A5 JP 2006173777 A JP2006173777 A JP 2006173777A JP 2006173777 A JP2006173777 A JP 2006173777A JP 2008001828 A5 JP2008001828 A5 JP 2008001828A5
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- 229920001296 polysiloxane Polymers 0.000 claims description 11
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 10
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 5
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- -1 specifically Chemical group 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Description
本発明の硬化性オルガノポリシロキサン組成物は、(A)一般式:
R1 3SiO(R1 2SiO) mSiR1 3
(式中、R1は同じか、または異なる置換もしくは非置換の一価炭化水素基であり、但し、一分子中、全R1の少なくとも2個はアルケニル基であり、全R1の少なくとも1個はアリール基であり、また、mは0〜100の整数である。)
で表されるオルガノポリシロキサン 100質量部、
(B)平均単位式:
(R2SiO3/2)a(R2 2SiO2/2)b(R2 3SiO1/2)c
{式中、R2は同じか、または異なる置換もしくは非置換の一価炭化水素基であり、但し、一分子中、全R2の0.5モル%以上はアルケニル基であり、全R2の25モル%以上はアリール基であり、また、a、b、cはそれぞれ、0.30≦a≦0.60、0.30≦b≦0.55、a+b+c=1.00、および、0.10≦c/(a+b)≦0.30を満たす数である。}
で表されるオルガノポリシロキサン 10〜150質量部、
(C)一分子中、少なくとも平均2個のケイ素原子結合アリール基と少なくとも平均2個のケイ素原子結合水素原子を有するオルガノポリシロキサン{(A)成分中および(B)成分中のアルケニル基の合計1モルに対して、本成分中のケイ素原子結合水素原子が0.1〜10モルとなる量}、
および
(D)ヒドロシリル化反応用触媒(本組成物の硬化を促進する量)
から少なくともなることを特徴とする。
また、本発明の半導体装置は、半導体素子が上記の硬化性オルガノポリシロキサン組成物の硬化物により被覆されていることを特徴とする。
The curable organopolysiloxane composition of the present invention has a general formula (A):
R 1 3 SiO (R 1 2 SiO ) m SiR 1 3
(In the formula, R 1 is the same or different substituted or unsubstituted monovalent hydrocarbon group, provided that at least two of all R 1 are alkenyl groups in one molecule, and at least 1 of all R 1 is Is an aryl group, and m is an integer of 0 to 100.)
100 parts by mass of an organopolysiloxane represented by
(B) Average unit formula:
(R 2 SiO 3/2 ) a (R 2 2 SiO 2/2 ) b (R 2 3 SiO 1/2 ) c
{In the formula, R 2 is the same or different substituted or unsubstituted monovalent hydrocarbon group, provided that 0.5 mol% or more of all R 2 in one molecule is an alkenyl group, and all R 2 25 mol% or more of the above is an aryl group, and a, b, and c are 0.30 ≦ a ≦ 0.60, 0.30 ≦ b ≦ 0.55, a + b + c = 1.00, and 0, respectively. .10 ≦ c / (a + b) ≦ 0.3. }
10 to 150 parts by mass of an organopolysiloxane represented by
(C) Organopolysiloxane having at least two silicon atom-bonded aryl groups and at least two silicon atom-bonded hydrogen atoms in one molecule {total of alkenyl groups in component (A) and component (B) The amount of silicon atom-bonded hydrogen atoms in this component is 0.1 to 10 mol with respect to 1 mol},
And (D) a catalyst for hydrosilylation reaction (amount that accelerates curing of the composition)
It consists of at least.
The semiconductor device of the present invention is characterized in that a semiconductor element is covered with a cured product of the curable organopolysiloxane composition.
はじめに、本発明の硬化性オルガノポリシロキサン組成物を詳細に説明する。
(A)成分のオルガノポリシロキサンは、本組成物の硬化性を向上させ、また、本組成物を低粘度とするための主剤であり、一般式:
R1 3SiO(R1 2SiO) mSiR1 3
で表される。上式中、R1は同じか、または異なる置換もしくは非置換の一価炭化水素基であり、具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基等のアルキル基;ビニル基、アリル基、ブテニル基、ペンテニル基、ヘキセニル基等のアルケニル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基;クロロメチル基、3−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン置換アルキル基が例示され、好ましくは、メチル基、ビニル基、フェニル基である。但し、本組成物を十分に硬化させるためには、一分子中、全R1(ケイ素原子結合全有機基)の少なくとも2個はアルケニル基であることが必要であり、特に、このアルケニル基はビニル基であることが好ましい。また、本組成物を硬化して得られる硬化物の光の屈折、反射、散乱等による減衰が小さくなることから、一分子中、全R1(ケイ素原子結合全有機基)の少なくとも1個はアリール基であることが必要であり、特に、このアリール基はフェニル基であることが好ましい。また、上式中、mは0〜100の範囲内の整数であり、好ましくは、1〜100の範囲内の整数であり、さらに好ましくは、2〜100の範囲内の整数であり、特に好ましくは、2〜50の範囲内の整数である。これは、mが上記範囲の下限未満であると、得られる硬化物の可撓性が低下したり、基材に対する密着性が低下する傾向があるからであり、一方、上記範囲の上限を超えると、充填性が低下したり、得られる硬化物の機械的特性が低下する傾向があるからである。
First, the curable organopolysiloxane composition of the present invention will be described in detail.
The organopolysiloxane of component (A) is a main agent for improving the curability of the composition and making the composition have a low viscosity.
R 1 3 SiO (R 1 2 SiO ) m SiR 1 3
It is represented by In the above formula, R 1 is the same or different substituted or unsubstituted monovalent hydrocarbon group, specifically, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group Alkyl groups such as vinyl groups, allyl groups, butenyl groups, pentenyl groups, hexenyl groups, etc .; alkenyl groups such as phenyl groups, tolyl groups, xylyl groups, naphthyl groups; aralkyl groups such as benzyl groups, phenethyl groups; Examples include halogen-substituted alkyl groups such as chloromethyl group, 3-chloropropyl group, 3,3,3-trifluoropropyl group, preferably methyl group, vinyl group, and phenyl group. However, in order to sufficiently cure the composition, at least two of all R 1 (silicon-bonded all organic groups) in one molecule must be alkenyl groups. A vinyl group is preferred. Further, since the attenuation due to light refraction, reflection, scattering, etc. of the cured product obtained by curing the composition is small, at least one of all R 1 (silicon atom-bonded all organic groups) in one molecule is It is necessary to be an aryl group, and in particular, this aryl group is preferably a phenyl group. In the above formula, m is an integer in the range of 0 to 100, preferably an integer in the range of 1 to 100, more preferably an integer in the range of 2 to 100, particularly preferably. Is an integer in the range of 2-50. This is because if m is less than the lower limit of the above range, the flexibility of the resulting cured product tends to decrease, or the adhesion to the substrate tends to decrease, while the upper limit of the above range is exceeded. This is because the filling property tends to decrease and the mechanical properties of the resulting cured product tend to decrease.
本組成物において、(D)成分の含有量は、本組成物の硬化を促進する量であれば特に限定されないが、具体的には、本組成物に対して、本成分中の金属原子が質量単位で0.01〜500ppmの範囲内となる量であることが好ましく、特に、0.01〜50ppmの範囲内となる量であることが好ましい。これは、(D)成分の含有量が上記範囲の下限未満であると、本組成物が十分に硬化しなくなる傾向があるからであり、一方、上記範囲の上限を超えると、得られる硬化物に着色等の問題を生じる傾向があるからである。 In the present composition, the content of the component (D) is not particularly limited as long as it is an amount that promotes the curing of the present composition. The amount is preferably in the range of 0.01 to 500 ppm by mass unit, and particularly preferably in the range of 0.01 to 50 ppm. This is because if the content of the component ( D ) is less than the lower limit of the above range, the composition tends not to be cured sufficiently, whereas if the content exceeds the upper limit of the above range, the resulting cured product is obtained. This is because they tend to cause problems such as coloring.
Claims (1)
R1 3SiO(R1 2SiO) mSiR1 3
(式中、R1は同じか、または異なる置換もしくは非置換の一価炭化水素基であり、但し、一分子中、全R1の少なくとも2個はアルケニル基であり、全R1の少なくとも1個はアリール基であり、また、mは0〜100の整数である。)
で表されるオルガノポリシロキサン 100質量部、
(B)平均単位式:
(R2SiO3/2)a(R2 2SiO2/2)b(R2 3SiO1/2)c
{式中、R2は同じか、または異なる置換もしくは非置換の一価炭化水素基であり、但し、一分子中、全R2の0.5モル%以上はアルケニル基であり、全R2の25モル%以上はアリール基であり、また、a、b、cはそれぞれ、0.30≦a≦0.60、0.30≦b≦0.55、a+b+c=1.00、および、0.10≦c/(a+b)≦0.30を満たす数である。}
で表されるオルガノポリシロキサン 10〜150質量部、
(C)一分子中、少なくとも平均2個のケイ素原子結合アリール基と少なくとも平均2個のケイ素原子結合水素原子を有するオルガノポリシロキサン{(A)成分中および(B)成分中のアルケニル基の合計1モルに対して、本成分中のケイ素原子結合水素原子が0.1〜10モルとなる量}、
および
(D)ヒドロシリル化反応用触媒(本組成物の硬化を促進する量)
から少なくともなる硬化性オルガノポリシロキサン組成物。 (A) General formula:
R 1 3 SiO (R 1 2 SiO ) m SiR 1 3
(In the formula, R 1 is the same or different substituted or unsubstituted monovalent hydrocarbon group, provided that at least two of all R 1 are alkenyl groups in one molecule, and at least 1 of all R 1 is Is an aryl group, and m is an integer of 0 to 100.)
100 parts by mass of an organopolysiloxane represented by
(B) Average unit formula:
(R 2 SiO 3/2 ) a (R 2 2 SiO 2/2 ) b (R 2 3 SiO 1/2 ) c
{In the formula, R 2 is the same or different substituted or unsubstituted monovalent hydrocarbon group, provided that 0.5 mol% or more of all R 2 in one molecule is an alkenyl group, and all R 2 25 mol% or more of the above is an aryl group, and a, b, and c are 0.30 ≦ a ≦ 0.60, 0.30 ≦ b ≦ 0.55, a + b + c = 1.00, and 0, respectively. .10 ≦ c / (a + b) ≦ 0.3. }
10 to 150 parts by mass of an organopolysiloxane represented by
(C) Organopolysiloxane having at least two silicon atom-bonded aryl groups and at least two silicon atom-bonded hydrogen atoms in one molecule {total of alkenyl groups in component (A) and component (B) The amount of silicon atom-bonded hydrogen atoms in this component is 0.1 to 10 mol with respect to 1 mol},
And (D) a catalyst for hydrosilylation reaction (amount that accelerates curing of the composition)
A curable organopolysiloxane composition comprising at least
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006173777A JP5202822B2 (en) | 2006-06-23 | 2006-06-23 | Curable organopolysiloxane composition and semiconductor device |
TW096119562A TWI425053B (en) | 2006-06-23 | 2007-05-31 | Curable organopolysiloxane composition and semiconductor device |
MYPI20085206A MY147862A (en) | 2006-06-23 | 2007-06-18 | Curable organopolysiloxane composition and semiconductor device |
CN2007800215923A CN101466795B (en) | 2006-06-23 | 2007-06-18 | Curable organopolysiloxane composition and semiconductor device |
EP07767457A EP2032653B1 (en) | 2006-06-23 | 2007-06-18 | Curable organopolysiloxane composition and semiconductor device |
KR1020087031182A KR101436800B1 (en) | 2006-06-23 | 2007-06-18 | Curable organopolysiloxane composition and semiconductor device |
PCT/JP2007/062649 WO2007148812A1 (en) | 2006-06-23 | 2007-06-18 | Curable organopolysiloxane composition and semiconductor device |
AT07767457T ATE451426T1 (en) | 2006-06-23 | 2007-06-18 | CURABLE ORGANOPOLYSILOXANE COMPOSITION AND SEMICONDUCTOR COMPONENT |
US12/306,049 US8080614B2 (en) | 2006-06-23 | 2007-06-18 | Curable organopolysiloxane composition and semiconductor device |
DE602007003724T DE602007003724D1 (en) | 2006-06-23 | 2007-06-18 | HARDENABLE ORGANOPOLYSILOXAN COMPOSITION AND SEMICONDUCTOR ELEMENT |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006173777A JP5202822B2 (en) | 2006-06-23 | 2006-06-23 | Curable organopolysiloxane composition and semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008001828A JP2008001828A (en) | 2008-01-10 |
JP2008001828A5 true JP2008001828A5 (en) | 2009-07-30 |
JP5202822B2 JP5202822B2 (en) | 2013-06-05 |
Family
ID=38446035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006173777A Active JP5202822B2 (en) | 2006-06-23 | 2006-06-23 | Curable organopolysiloxane composition and semiconductor device |
Country Status (10)
Country | Link |
---|---|
US (1) | US8080614B2 (en) |
EP (1) | EP2032653B1 (en) |
JP (1) | JP5202822B2 (en) |
KR (1) | KR101436800B1 (en) |
CN (1) | CN101466795B (en) |
AT (1) | ATE451426T1 (en) |
DE (1) | DE602007003724D1 (en) |
MY (1) | MY147862A (en) |
TW (1) | TWI425053B (en) |
WO (1) | WO2007148812A1 (en) |
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