JP2007516152A - カバサイト含有モレキュラーシーブ、その合成及びオイシジェネートからオレフィンへの変換におけるその使用 - Google Patents
カバサイト含有モレキュラーシーブ、その合成及びオイシジェネートからオレフィンへの変換におけるその使用 Download PDFInfo
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- JP2007516152A JP2007516152A JP2006547213A JP2006547213A JP2007516152A JP 2007516152 A JP2007516152 A JP 2007516152A JP 2006547213 A JP2006547213 A JP 2006547213A JP 2006547213 A JP2006547213 A JP 2006547213A JP 2007516152 A JP2007516152 A JP 2007516152A
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- 239000002808 molecular sieve Substances 0.000 title claims abstract description 67
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 37
- 150000001336 alkenes Chemical class 0.000 title claims abstract description 23
- 230000015572 biosynthetic process Effects 0.000 title claims description 37
- 238000003786 synthesis reaction Methods 0.000 title claims description 32
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 63
- 239000000463 material Substances 0.000 claims abstract description 52
- 239000000203 mixture Substances 0.000 claims abstract description 49
- 239000002178 crystalline material Substances 0.000 claims abstract description 37
- 230000016507 interphase Effects 0.000 claims abstract 2
- 239000003153 chemical reaction reagent Substances 0.000 claims description 59
- 239000003054 catalyst Substances 0.000 claims description 45
- -1 N, N, N-trimethylcyclohexylammonium compound Chemical class 0.000 claims description 41
- 230000006698 induction Effects 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 38
- 229910052757 nitrogen Inorganic materials 0.000 claims description 36
- 239000013078 crystal Substances 0.000 claims description 34
- 150000001875 compounds Chemical class 0.000 claims description 27
- 230000001939 inductive effect Effects 0.000 claims description 22
- 239000011541 reaction mixture Substances 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 18
- 150000003868 ammonium compounds Chemical class 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 150000004820 halides Chemical class 0.000 claims description 14
- 229910001868 water Inorganic materials 0.000 claims description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 10
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 230000000717 retained effect Effects 0.000 claims description 6
- 239000000725 suspension Substances 0.000 claims description 6
- KKXBPUAYFJQMLN-UHFFFAOYSA-N 1-adamantyl(trimethyl)azanium Chemical compound C1C(C2)CC3CC2CC1([N+](C)(C)C)C3 KKXBPUAYFJQMLN-UHFFFAOYSA-N 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical group [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical group [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 239000011135 tin Chemical group 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000010936 titanium Chemical group 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 230000002194 synthesizing effect Effects 0.000 claims description 2
- 238000009795 derivation Methods 0.000 claims 2
- 150000002366 halogen compounds Chemical class 0.000 claims 2
- WYMOJXIRERFNHS-UHFFFAOYSA-N 1,1,2-trimethylpiperidin-1-ium Chemical class CC1CCCC[N+]1(C)C WYMOJXIRERFNHS-UHFFFAOYSA-N 0.000 claims 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 abstract description 8
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 abstract description 8
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract description 6
- 239000005977 Ethylene Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 44
- 239000012071 phase Substances 0.000 description 40
- 238000004458 analytical method Methods 0.000 description 31
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 26
- 239000010457 zeolite Substances 0.000 description 24
- 229910021536 Zeolite Inorganic materials 0.000 description 19
- 239000000523 sample Substances 0.000 description 19
- 238000002441 X-ray diffraction Methods 0.000 description 17
- 239000000377 silicon dioxide Substances 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 13
- 239000007789 gas Substances 0.000 description 12
- 239000007787 solid Substances 0.000 description 12
- 238000005004 MAS NMR spectroscopy Methods 0.000 description 11
- 230000007547 defect Effects 0.000 description 11
- 230000000737 periodic effect Effects 0.000 description 11
- 229910000323 aluminium silicate Inorganic materials 0.000 description 10
- 239000002002 slurry Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 238000004627 transmission electron microscopy Methods 0.000 description 10
- 239000000571 coke Substances 0.000 description 9
- 239000003085 diluting agent Substances 0.000 description 9
- 229930195733 hydrocarbon Natural products 0.000 description 9
- 150000002430 hydrocarbons Chemical class 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 230000008025 crystallization Effects 0.000 description 7
- 238000001212 derivatisation Methods 0.000 description 7
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000004215 Carbon black (E152) Substances 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 5
- 238000003917 TEM image Methods 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 230000001788 irregular Effects 0.000 description 5
- 239000010453 quartz Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 239000001569 carbon dioxide Substances 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 238000005119 centrifugation Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 239000000411 inducer Substances 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 238000002216 synchrotron radiation X-ray diffraction Methods 0.000 description 4
- 229920002994 synthetic fiber Polymers 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 238000004566 IR spectroscopy Methods 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 238000004676 ballistic electron emission microscopy Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
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- 238000002447 crystallographic data Methods 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 238000000024 high-resolution transmission electron micrograph Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 238000006317 isomerization reaction Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- GNUJKXOGRSTACR-UHFFFAOYSA-M 1-adamantyl(trimethyl)azanium;hydroxide Chemical compound [OH-].C1C(C2)CC3CC2CC1([N+](C)(C)C)C3 GNUJKXOGRSTACR-UHFFFAOYSA-M 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
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- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000002445 carbon-13 magic angle spinning nuclear magnetic resonance spectrum Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
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- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
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- 238000001914 filtration Methods 0.000 description 2
- 239000003502 gasoline Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
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- 150000003053 piperidines Chemical class 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 238000000634 powder X-ray diffraction Methods 0.000 description 2
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- 229910052761 rare earth metal Inorganic materials 0.000 description 2
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- 230000035484 reaction time Effects 0.000 description 2
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- 238000011069 regeneration method Methods 0.000 description 2
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- 238000012360 testing method Methods 0.000 description 2
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- UGLONIPXPWGWMQ-UHFFFAOYSA-M 1,1,2,6-tetramethylpiperidin-1-ium;hydroxide Chemical compound [OH-].CC1CCCC(C)[N+]1(C)C UGLONIPXPWGWMQ-UHFFFAOYSA-M 0.000 description 1
- YWZGBJRUJMCHLS-UHFFFAOYSA-N 1,1-diethyl-2,6-dimethylpiperidin-1-ium Chemical class CC[N+]1(CC)C(C)CCCC1C YWZGBJRUJMCHLS-UHFFFAOYSA-N 0.000 description 1
- YITHLEHDZCSGKF-UHFFFAOYSA-M 1,1-diethyl-2,6-dimethylpiperidin-1-ium;hydroxide Chemical compound [OH-].CC[N+]1(CC)C(C)CCCC1C YITHLEHDZCSGKF-UHFFFAOYSA-M 0.000 description 1
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
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- 239000005995 Aluminium silicate Substances 0.000 description 1
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- BMTAFVWTTFSTOG-UHFFFAOYSA-N Butylate Chemical compound CCSC(=O)N(CC(C)C)CC(C)C BMTAFVWTTFSTOG-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
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- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-O Piperidinium(1+) Chemical class C1CC[NH2+]CC1 NQRYJNQNLNOLGT-UHFFFAOYSA-O 0.000 description 1
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- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000005192 alkyl ethylene group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- DKNWSYNQZKUICI-UHFFFAOYSA-N amantadine Chemical compound C1C(C2)CC3CC2CC1(N)C3 DKNWSYNQZKUICI-UHFFFAOYSA-N 0.000 description 1
- 229960003805 amantadine Drugs 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000004523 catalytic cracking Methods 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 238000004939 coking Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000013481 data capture Methods 0.000 description 1
- 238000006900 dealkylation reaction Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000007210 heterogeneous catalysis Methods 0.000 description 1
- YUWFEBAXEOLKSG-UHFFFAOYSA-N hexamethylbenzene Chemical compound CC1=C(C)C(C)=C(C)C(C)=C1C YUWFEBAXEOLKSG-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000013178 mathematical model Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000012229 microporous material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000006384 oligomerization reaction Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000011176 pooling Methods 0.000 description 1
- 238000001144 powder X-ray diffraction data Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 238000010518 undesired secondary reaction Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
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Abstract
(n)X2O3:YO2
(式中、Xは三価元素であり、Yは四価元素であり、nは0乃至0.5である。)
を含む組成を有する、結晶物質を開示する。
この物質はメタノールを低オレフィン、特に、エチレン及びプロピレンへの変換において、活性及び選択性を示す。
【選択図】図1
Description
一の側面おいて、本発明は、実質的にフレームワークのリンを含まず、積層欠陥又はCHAフレームワークタイプモレキュラーシーブ及びAEIフレームワークタイプモレキュラーシーブの少なくとも1の連晶相を有するCHAフレームワークタイプモレキュラーシーブを含む結晶物質に属する。前記物質はか焼された、無水形態において、以下のモル関係:
(n)X2O3:YO2
(式中、Xは、アルミニウム、ホウ素、鉄、インジウム、及び/又はガリウム等の三価元素であり、Yはケイ素、スズ、チタニウム、及び/又はゲルマニウム等の四価元素であり、nは0乃至0.5、好都合なことには0乃至約0.125、例えば約0.001乃至約0.1、例えば約0.0017乃至約0.02である。)を含む組成物を有する。
(n)X2O3:YO2
(式中、Xは三価元素、Yは四価元素及びnは、0乃至0.5である。)
を含む組成を有する結晶物質を合成する方法に関係する。前記方法は、
(a)水の供給源、四価元素Yの酸化の供給源、及び任意で三価元素Xの酸化物の供給源を含む前記物質を形成する能力のある反応混合物を調製する工程と、
(b)積層欠陥又はCAHフレームワークタイプモレキュラーシーブ及びAEIフレームワークタイプモレキュラーシーブの少なくとも1の連晶相を含む前記結晶物質の結晶を形成するのに十分な条件下に前記反応混合物を維持する工程と、及び
(c)(b)から前記結晶物質を回収する工程とを含む。
本発明は、新規なフレームワークのリンを実質的まず、及び、積層欠陥又はCHAフレームワークタイプモレキュラーシーブ及びAEIフレームワークタイプモレキュラーシーブの少なくとも1の連晶相を有するCHAフレームワークタイプモレキュラーシーブを含む新規な結晶物質に関係する。本発明は、ハロゲン化物、特にフッ化物の媒体の中における新規な結晶物質の合成、及びオキシジェネート、特にメタノールをオレフィン、特に、エチレン及びプロピレンへ変換する方法における前記物質の使用に関係する。
(n)X2O3:YO2
のモル関係を含む組成を有する。式中、Xは、アルミニウム、ホウ素、鉄、インジウム、及び/又はガリウム、のような三価元素であり、通常アルミニウムである。Yは、ケイ素、スズ、チタン、及び/又はガリウム等の四価元素であり、通常ケイ素である。nは0乃至約0.5であり、好都合には0乃至約0.125、例えば、0.001乃至約0.1、具体的には約0.0017乃至約0.02である。ハロゲン含有化合物をこの物質の合成に用いる場合、本発明の物質はか焼形態において、通常、約1乃至約100ppm、例えば、約5乃至約50ppm、例えば約10乃至20ppmの、わずかな量のハロゲン化合物、好ましくはフッ化物を含む。
(n)X2O3:YO2:(m)R:(x)F:zH2O
の式のモル関係を含む組成を有する。この式において、X、Y及びnは前述の段落で定義され、Rは少なくとも1の有機誘導試薬であり、mは約0.01乃至約2、具体的には約0.1乃至約1の間で変動し、zは約0.5乃至約100、例えば約2乃至20の間で変動し、xは約0乃至約20、例えば約0.01乃至1の間で変動する。結晶化の間に存在することによりこの物質に関係しているR及びF組成物は、少なくとも部分的に、以下で詳細に説明する結晶化後の後処理により除去できる。通常、その合成形態(as−synthesized form)において、本発明の連晶はアルキルメタルの低いレベル、通常、モルベースでX2O3の50%未満の任意のカリウム及びナトリウムを組み合わせた量を含む。この理由から、アルキル金属カチオンを除去するための主要なイオン交換工程を行うことなしに、通常、前記物質は有機誘導試薬(R)を除去した後に触媒活性を示す。
SiO2:0.00083Al2O3:0.45DEDMP:0.05TEAA:0.6F:5.0H2O
SSZ−13を製造するために、U.S.Patent No.4,544,538に記載の方法を以下のように行った。2.00gの1N NaOH、2.78gの0.27モルN,N,N−トリメチルアダマンタンアンモニウム水酸化物及び3.22gの脱イオン水を連続的に23mlのテフロンを裏打ちしたペア(Parr)オートクレーブに添加した。得られた溶液に、0.05gのアルミニウム水酸化物(Teheis F−200 乾燥ゲル、50%Al2O3)を添加し、透明になるまで溶液を攪拌した。0.60gの燻蒸シリカ(Cab−O−Sil,M5グレード、97% SiO2)をオートクレーブにその後添加し、溶液を均一になるまで混合した。
薄茶色の天然のカバサイトのサンプルを西アメリカから得た。前記カバサイトは、Si/Al=3.70、0.28wt%のNa、0.33%のK、0.03%のCa、0.28%のMg、及び1.50wt%のFeを有すると解析された。前処理せずにこのサンプルの透過電子顕微鏡像を撮影し、結果を図7に示した。BF−TEMの中にいかなる欠陥も存在しなかった。BF−TEM解析のために作成された500カードの中にも欠陥は観察されなかった。
SiO2 :0.00083Al2O3:0.375DEDMP:0.125TEAA:0.6F:5.0H2O
Claims (29)
- フレームワークのリンを実質的に含まず、積層欠陥又はCHAフレームワークタイプモレキュラーシーブ及びAEIフレームワークタイプモレキュラーシーブの少なくとも1の連晶相を有するCHAフレームワークタイプのモレキュラーシーブを含む結晶物質であって、か焼された無水形態において以下のモル関係:
(n)X2O3:YO2
(式中、Xは三価元素であり、Yは四価元素であり、nは0乃至0.5である。)
を含む組成を有することを特徴とする結晶物質。 - 前記nが、0.001乃至0.1、例えば0.0017乃至0.02であることを特徴とする請求項1に記載の結晶物質。
- か焼形態において、前記物質が重量比で1乃至100ppm、例えば重量比で5乃至50ppm、例えば重量比で10乃至20ppmのハロゲン化物を含むことを特徴とする請求項1又は請求項2に記載の結晶物質。
- 前記ハロゲン化合物がフッ化物を含むことを特徴とする請求項3に記載の結晶物質。
- 前記Yが、ケイ素、スズ、チタン、ゲルマニウム、又はこれらの組み合わせであることを特徴とする請求項1乃至4のいずれか1請求項に記載の結晶物質。
- 前記Xが、アルミニウム、ホウ素、鉄、インジウム、ガリウム又はこれらの組み合わせであることを特徴とする請求項1乃至5のいずれか1請求項に記載の結晶物質。
- 前記Yがケイ素であり、前記Xがアルミニウムであることを特徴とする請求項1乃至6に記載の結晶物質。
- 少なくとも1つのCHAフレームワークタイプモレキュラーシーブを含み、as−合成された形態(as−synthesized form)においてCHAフレームワークタイプモレキュラーシーブの合成を誘導するための第一誘導試薬及びAEIフレームワークタイプモレキュラーシーブの合成を誘導するための第二配誘導試薬を分子内構造に含む結晶物質であって、前記第一及び前記第二誘導試薬が異なることを特徴とする結晶物質。
- 前記第一誘導試薬が、少なくとも1のN−アルキル−3−キヌクリジノール、N,N,N−トリアルキル−エキソアミノノルボルナン、N,N,N−トリメチル−1−アダマンタンモニウム化合物、N,N,N−トリメチル−2−アダマンタンアンモニウム化合物、N,N,N−トリメチルシクロヘキシルアンモニウム化合物、N,N−ジメチル−3,3−ジメチルピペリジニウム化合物、N,N−メチルエチル−3,3−ジメチルピペリジニウム化合物、N,N−ジメチル−2−メチルピペリジニウム化合物、1,3,3,6,6−ペンタメチル−6−アゾニオ(azonio)−ビシクロ(3.2.1)オクタン化合物、及びN,N−ジメチルシクロヘキシルアミンを含むことを特徴とする請求項8の結晶物質。
- 前記第一誘導試薬が多環系アミン又はアンモニウム化合物を含むことを特徴とする請求項8に記載の結晶物質。
- 前記第一誘導試薬がN,N,N−トリメチル−1−アダマンチルアンモニウム化合物を含む請求項8乃至10のいずれか1請求項に記載の結晶物質。
- 前記第二誘導試薬が単環系アミン又はアンモニウム化合物を含むことを特徴とする請求項8乃至11のいずれか1請求項に記載の結晶物質。
- 前記第二誘導試薬が、N,N−ジメチル−2,6−ジメチルピペリジニウム化合物又はN,N−ジエチル−2,6−ジメチルピペリジニウム化合物を含むことを特徴とする請求項8乃至12のいずれか1請求項に記載の結晶物質。
- as−合成された(as−synthesized)物質中に保持される第一及び第二誘導試薬の総モル量に対するas−合成された(as−synthesized)物質中に保持される第二誘導試薬のモル量が0.1乃至0.3の間であることを特徴とする請求項8乃至13のいずれか1請求項に記載の結晶物質。
- CHAフレームワークタイプモレキュラーシーブを含み、以下のモル関係:
(n)X2O3:YO2
(式中、Xは三価元素であり、Yは四価元素であり、nは0乃至0.5である。)
を含む組成を有する結晶物質を合成する方法であって、
前記方法が、
(a)前記物質を形成する能力を有する、水の供給源、四価元素Yの酸化物の供給源、及び任意に三価元素Xの酸化物の供給源を含む、反応混合物を調製する工程、
(b)積層欠陥又は少なくとも1のCHAフレームワークタイプモレキュラーシーブ及びAEIフレームワークタイプモレキュラーシーブの連晶相を含む前記結晶物質の結晶を形成するのに十分な条件下において前記反応混合物を維持する工程、及び
(c)前記結晶物質を(b)から回収する工程を含む方法。 - 前記反応混合物が、前記結晶物質の形成を誘導するための少なくとも1の有機誘導試薬(R)をも含むことを特徴とする請求項15に記載の方法。
- 前記反応混合物が、CHAフレームワークタイプ物質の形成を誘導するための少なくとも1の有機誘導試薬、及びAEIフレームワークタイプ物質の形成を誘導するための少なくとも1の有機誘導試薬を含むことを特徴とする請求項15又は請求項16に記載の方法。
- 前記第一誘導試薬が、N,N,N−トリメチル−1−アダマンチルアンモニウム化合物を含むことを特徴とする請求項17に記載の方法。
- 前記第二誘導試薬が、N,N−ジエチル−2,6−ジメチルピペリジニウム化合物を含むことを特徴とする請求項17又は請求項18に記載の方法。
- 前記反応混合物中の第二有機誘導試薬に対する第一有機誘導試薬のモル比が、0.01乃至100の間であることを特徴とする請求項17乃至19に記載の方法。
- 前記反応混合物がハロゲン化合物又はハロゲン化物含有化合物も含むことを特徴とする請求項15乃至20のいずれか1請求項に記載の方法。
- 前記反応混合物が、フッ化物又はフッ化物含有化合物も含むことを特徴とする請求項15乃至21のいずれか1請求項に記載の方法。
- 前記(b)における条件が、50℃乃至300℃の温度を含むことを特徴とする請求項15乃至22のいずれか1請求項に記載の方法。
- 前記反応混合物が、種結晶も含むことを特徴とする請求項15乃至23のいずれか1請求項に記載の方法。
- 前記種結晶が、液体媒体中のコロイド懸濁液として前記反応混合物に添加されることを特徴とする請求項15乃至24のいずれか1請求項に記載の方法。
- 前記種結晶が、AEI、OFF、CHA、及び/又はLEVフレームワークタイプを有する結晶物質を含む請求項15乃至25のいずれか1請求項に記載の方法。
- 前記反応混合物が、以下の組成
H2O/YO2 0.1乃至20、
ハロゲン化物/YO2 0乃至2、
R/YO2 0.01乃至2、及び
X2O3/YO2 0乃至0.5、
を有することを特徴とする請求項16乃至26のいずれか1請求項に記載の方法。 - 請求項1乃至14のいずれか1請求項に記載の結晶物質又は請求項15乃至27のいずれか1請求項に記載の方法により生産された結晶物質を含む触媒に、オキシジェネレート変換条件下で、有機オキシジェネート化合物を接触させる工程を含むオレフィンの生産方法。
- 前記有機オキシジネート化合物がメタノール、ジメチルエーテル、又はこれらの組み合わせを含むことを特徴とする請求項28に記載の方法。
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US20050154244A1 (en) | 2005-07-14 |
CA2548315C (en) | 2009-07-14 |
WO2005063623A3 (en) | 2006-07-20 |
CA2548315A1 (en) | 2005-07-14 |
WO2005063623A2 (en) | 2005-07-14 |
JP4842143B2 (ja) | 2011-12-21 |
EA200601210A1 (ru) | 2006-12-29 |
EA010203B1 (ru) | 2008-06-30 |
CN100577564C (zh) | 2010-01-06 |
CN1922107A (zh) | 2007-02-28 |
US7094389B2 (en) | 2006-08-22 |
EP1701914B1 (en) | 2019-02-20 |
EP1701914A2 (en) | 2006-09-20 |
ZA200603766B (en) | 2008-04-30 |
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