JP2007180124A - 回路モジュールおよび回路モジュールの製造方法 - Google Patents
回路モジュールおよび回路モジュールの製造方法 Download PDFInfo
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- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
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Abstract
【解決手段】回路モジュール200は、多層基板210、回路素子220、封止樹脂層230、および回路素子30を内包する回路装置10、封止樹脂層240を含む。多層基板210の上に回路素子220が実装されている。回路素子は、封止樹脂層230によって封止されている。封止樹脂層230の上に回路装置10が搭載されている。回路装置10は、銅で構成された金属基板32および配線層20にそれぞれ実装された回路素子30および受動部品40を有する。受動部品40は、はんだにより配線層20に接続されている。回路素子30および受動部品40は予め封止樹脂で封止されている。封止樹脂層230および回路装置10は、封止樹脂層240で封止されている。多層基板210の下面に設けられたはんだボール211の融点は、受動部品40の接続に使用されるはんだの融点よりも低い。
【選択図】図1
Description
まず、図5および図6を用いて、回路装置10の製造工程について説明する。まず、図5(A)に示すように、銅板100の上に、リソグラフィ法により配線層のパターンに合わせてレジスト110を選択的に形成する。銅板100の膜厚はたとえば125μmである。具体的には、ラミネーター装置を用いて銅板100に膜厚20μmのレジスト膜を貼り付け、配線層のパターンを有するフォトマスクを用いてUV露光した後、Na2CO3溶液を用いて現像し、未露光領域のレジストを除去することによって、銅板100の上にレジスト110が選択的に形成される。なお、レジスト110との密着性向上のために、レジスト膜のラミネート前に、銅板100の表面に研磨、洗浄等の前処理を必要に応じて施すことが望ましい。
Claims (4)
- 第1の配線基板と、
前記第1の配線基板の下面に設けられ、外部の実装対象との電気的接続に用いられる第1のはんだと、
前記第1の配線基板に実装された第1の回路素子と、
前記第1の回路素子の上方に設けられ、前記第1の配線基板と電気的に接続された第2の配線基板と、
前記第2の配線基板に実装された第2の回路素子および受動部品と、
前記第1の回路素子、前記第2の回路素子および前記受動部品を封止する封止樹脂層と、
を備え、
前記受動部品が前記第2の配線基板に第2のはんだによって接合され、
前記第2のはんだの融点が前記第1のはんだの融点より高いことを特徴とする回路モジュール。 - 前記第2の配線基板が前記第2のはんだを溶融させたときに変形しない程度の耐熱性を有することを特徴とする請求項1に記載の回路モジュール。
- 第1の配線基板に第1の回路素子を実装する工程と、
第2の配線基板に第2の回路素子および受動部品が実装され、前記第2の回路素子および受動部品が封止樹脂によって封止された回路装置であって、前記受動部品が前記第2の配線基板にはんだによって接合された回路装置を前記第1の回路素子の上方に実装する工程と、
前記第1の回路素子および前記回路装置を封止樹脂で一体的に封止する工程と、
前記受動部品の接合に用いられるはんだよりも融点が低いはんだで構成されたはんだボールを前記第1の配線基板の下面に接合する工程と、
を備えることを特徴とする回路モジュールの製造方法。 - 前記第2の配線基板として、前記受動部品の接合に用いられるはんだを溶融させたときに変形しない程度の耐熱性を有する材料を用いることを特徴とする請求項3に記載の回路モジュールの製造方法。
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JP2007180124A true JP2007180124A (ja) | 2007-07-12 |
JP4955997B2 JP4955997B2 (ja) | 2012-06-20 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007281276A (ja) * | 2006-04-10 | 2007-10-25 | Nec Electronics Corp | 半導体装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0620736A (ja) * | 1992-12-10 | 1994-01-28 | Sumitomo Wiring Syst Ltd | 雌形電気接続子の成形方法 |
JP2001127588A (ja) * | 1999-10-28 | 2001-05-11 | Tdk Corp | 弾性表面波分波器 |
JP2003100985A (ja) * | 2001-09-26 | 2003-04-04 | Sanyo Electric Co Ltd | 回路モジュール |
JP2004259886A (ja) * | 2003-02-25 | 2004-09-16 | Seiko Epson Corp | 半導体装置、電子デバイス、電子機器、半導体装置の製造方法および電子デバイスの製造方法 |
JP2004319678A (ja) * | 2003-04-15 | 2004-11-11 | Fujitsu Ltd | 指紋センサ装置及びその製造方法 |
JP2005026469A (ja) * | 2003-07-02 | 2005-01-27 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JP2005303267A (ja) * | 2004-03-18 | 2005-10-27 | Toshiba Corp | 積層型電子部品 |
-
2005
- 2005-12-27 JP JP2005374218A patent/JP4955997B2/ja not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0620736A (ja) * | 1992-12-10 | 1994-01-28 | Sumitomo Wiring Syst Ltd | 雌形電気接続子の成形方法 |
JP2001127588A (ja) * | 1999-10-28 | 2001-05-11 | Tdk Corp | 弾性表面波分波器 |
JP2003100985A (ja) * | 2001-09-26 | 2003-04-04 | Sanyo Electric Co Ltd | 回路モジュール |
JP2004259886A (ja) * | 2003-02-25 | 2004-09-16 | Seiko Epson Corp | 半導体装置、電子デバイス、電子機器、半導体装置の製造方法および電子デバイスの製造方法 |
JP2004319678A (ja) * | 2003-04-15 | 2004-11-11 | Fujitsu Ltd | 指紋センサ装置及びその製造方法 |
JP2005026469A (ja) * | 2003-07-02 | 2005-01-27 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JP2005303267A (ja) * | 2004-03-18 | 2005-10-27 | Toshiba Corp | 積層型電子部品 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007281276A (ja) * | 2006-04-10 | 2007-10-25 | Nec Electronics Corp | 半導体装置 |
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