JP2005327799A - 半導体装置の製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 239000010410 layer Substances 0.000 claims abstract description 170
- 229910052751 metal Inorganic materials 0.000 claims abstract description 81
- 239000002184 metal Substances 0.000 claims abstract description 81
- 239000000758 substrate Substances 0.000 claims abstract description 69
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000001257 hydrogen Substances 0.000 claims abstract description 52
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 52
- 239000011229 interlayer Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 41
- 239000010703 silicon Substances 0.000 claims description 40
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 38
- 210000000746 body region Anatomy 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 15
- 239000007789 gas Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 abstract description 42
- 239000012535 impurity Substances 0.000 abstract description 23
- 238000005245 sintering Methods 0.000 abstract description 14
- 230000007423 decrease Effects 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract description 3
- 108091006146 Channels Proteins 0.000 description 46
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- 229910000838 Al alloy Inorganic materials 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000005368 silicate glass Substances 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 108010075750 P-Type Calcium Channels Proteins 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- GDFCWFBWQUEQIJ-UHFFFAOYSA-N [B].[P] Chemical compound [B].[P] GDFCWFBWQUEQIJ-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- -1 boron ions Chemical class 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- SLXKOJJOQWFEFD-UHFFFAOYSA-N 6-aminohexanoic acid Chemical compound NCCCCCC(O)=O SLXKOJJOQWFEFD-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910010282 TiON Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005421 electrostatic potential Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/3003—Hydrogenation or deuterisation, e.g. using atomic hydrogen from a plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823487—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of vertical transistor structures, i.e. with channel vertical to the substrate surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66712—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/66734—Vertical DMOS transistors, i.e. VDMOS transistors with a step of recessing the gate electrode, e.g. to form a trench gate electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Plasma & Fusion (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
【解決手段】本発明は、バリアメタル層形成後、層間絶縁膜上のバリアメタル層に開口部を設け、配線層形成後に水素シンタ処理を行う。これにより、基板に達する水素量を更に増やし、閾値電圧の低下を抑制する。チャネル層の不純物濃度も低くできるので、オン抵抗が低減する。
【選択図】 図1
Description
低い不純物濃度で所望のVGSOFFを得ることができる。
2 n−型半導体層
4 チャネル層
7 トレンチ
10 MOSFET
11 ゲート酸化膜
13 ゲート電極
14 ボディ領域
15 ソース領域
16 層間絶縁膜
17 バリアメタル層
18 配線層
20 開口部
21 表面保護膜
21 n+型シリコン半導体基板
22 n−型半導体層
24 チャネル層
27 トレンチ
31 ゲート酸化膜
33 ゲート電極
34 ボディ領域
35 ソース領域
36 層間絶縁膜
37 バリアメタル層
38 配線層
40 MOSFET
41 表面保護膜
PR レジストマスク
Claims (7)
- シリコン半導体基板上に所望の素子領域を形成する工程と、
前記素子領域の一部を覆う絶縁膜を形成する工程と、
前記基板上を覆い前記絶縁膜上の一部に開口部を有する第1金属層を形成する工程と、
全面に第2金属層を形成する工程と、
前記基板表面に水素を導入する工程と、
を具備することを特徴とする半導体装置の製造方法。 - 一導電型シリコン半導体基板上に逆導電型のチャネル層を形成する工程と、
前記チャネル層と絶縁膜を介して接するゲート電極を形成する工程と、
前記ゲート電極と隣接する前記チャネル層表面に一導電型領域を形成する工程と、
前記ゲート電極上を覆う層間絶縁膜を形成する工程と、
前記基板上を覆って前記一導電型領域とコンタクトし、前記層間絶縁膜上の一部に開口部を有する第1金属層を形成する工程と、
全面に第2金属層を形成する工程と、
前記基板表面に水素を導入する工程と、
を具備することを特徴とする半導体装置の製造方法。 - ドレイン領域となる一導電型シリコン半導体基板上に逆導電型のチャネル層を形成する工程と、
前記チャネル層を貫通するトレンチを形成する工程と、
前記トレンチ内に絶縁膜を介してゲート電極を埋設する工程と、
前記ゲート電極と隣接する前記チャネル層表面に一導電型のソース領域と、該ソース領域と隣り合う前記基板表面に逆導電型のボディ領域を形成する工程と、
前記ゲート電極上を覆う層間絶縁膜を形成する工程と、
前記基板上を覆って前記ソース領域およびボディ領域とコンタクトし、前記層間絶縁膜上の一部に開口部を有する第1金属層を形成する工程と、
全面に第2金属層を形成する工程と、
前記基板表面に水素を導入する工程と、
を具備することを特徴とする半導体装置の製造方法。 - 前記開口部は、前記第1金属層の形成以前の工程で用いたマスクを用いて、前記第1金属層の一部をエッチングして形成することを特徴とする請求項2または請求項3に記載の半導体装置の製造方法。
- 前記開口部は、前記第1金属層を全面に形成した後、前記トレンチを形成したマスクを用いて、前記第1金属層の一部をエッチングして形成することを特徴とする請求項3に記載の半導体装置の製造方法。
- 前記第2金属層形成後、水素雰囲気で熱処理を行うことを特徴とする請求項1から請求項3のいずれかに記載の半導体装置の製造方法。
- 前記熱処理は水素ガス又は水素含有ガス雰囲気で300〜800℃で加熱することを特徴とする請求項6に記載の半導体装置の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004142389A JP2005327799A (ja) | 2004-05-12 | 2004-05-12 | 半導体装置の製造方法 |
TW094110804A TWI292221B (en) | 2004-05-12 | 2005-04-06 | Manufacturing method of semiconductor device |
CNA2005100674753A CN1700430A (zh) | 2004-05-12 | 2005-04-25 | 半导体装置的制造方法 |
KR1020050037401A KR100697148B1 (ko) | 2004-05-12 | 2005-05-04 | 반도체 장치의 제조 방법 |
US11/123,248 US7439137B2 (en) | 2004-05-12 | 2005-05-06 | Method for manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2004142389A JP2005327799A (ja) | 2004-05-12 | 2004-05-12 | 半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
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JP2005327799A true JP2005327799A (ja) | 2005-11-24 |
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JP2004142389A Pending JP2005327799A (ja) | 2004-05-12 | 2004-05-12 | 半導体装置の製造方法 |
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---|---|
US (1) | US7439137B2 (ja) |
JP (1) | JP2005327799A (ja) |
KR (1) | KR100697148B1 (ja) |
CN (1) | CN1700430A (ja) |
TW (1) | TWI292221B (ja) |
Cited By (7)
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JP2011003726A (ja) * | 2009-06-18 | 2011-01-06 | Fuji Electric Systems Co Ltd | 半導体装置の製造方法 |
JP2012256718A (ja) * | 2011-06-09 | 2012-12-27 | Renesas Electronics Corp | 半導体装置及び半導体装置の製造方法 |
WO2015137420A1 (ja) * | 2014-03-11 | 2015-09-17 | 富士電機株式会社 | 炭化珪素半導体装置の製造方法および炭化珪素半導体装置 |
JP2017108074A (ja) * | 2015-12-11 | 2017-06-15 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
JP2018067624A (ja) * | 2016-10-19 | 2018-04-26 | トヨタ自動車株式会社 | 半導体装置およびその製造方法 |
JP2020047676A (ja) * | 2018-09-14 | 2020-03-26 | 富士電機株式会社 | 炭化珪素半導体装置および炭化珪素半導体装置の製造方法 |
US10847649B2 (en) | 2018-04-17 | 2020-11-24 | Kabushiki Kaisha Toshiba | Semiconductor device |
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US8345134B2 (en) * | 2010-04-13 | 2013-01-01 | Northrop Grumman Systems Corporation | Indium tin oxide gate charge coupled device |
CN102931086B (zh) * | 2011-08-10 | 2015-07-08 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的制造方法 |
US8853776B2 (en) * | 2011-09-21 | 2014-10-07 | Infineon Technologies Austria Ag | Power transistor with controllable reverse diode |
US9725310B2 (en) * | 2013-12-20 | 2017-08-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Micro electromechanical system sensor and method of forming the same |
JP6107767B2 (ja) * | 2013-12-27 | 2017-04-05 | トヨタ自動車株式会社 | 半導体装置とその製造方法 |
US20160104669A1 (en) * | 2014-10-08 | 2016-04-14 | Infineon Technologies Ag | Semiconductor structure with improved metallization adhesion and method for manufacturing the same |
JP6475142B2 (ja) * | 2015-10-19 | 2019-02-27 | トヨタ自動車株式会社 | 半導体装置とその製造方法 |
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JP2011003726A (ja) * | 2009-06-18 | 2011-01-06 | Fuji Electric Systems Co Ltd | 半導体装置の製造方法 |
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JP2017108074A (ja) * | 2015-12-11 | 2017-06-15 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
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US11063123B2 (en) | 2018-09-14 | 2021-07-13 | Fuji Electric Co., Ltd. | Silicon carbide semiconductor device and method of manufacturing silicon carbide semiconductor device |
JP7119814B2 (ja) | 2018-09-14 | 2022-08-17 | 富士電機株式会社 | 炭化珪素半導体装置および炭化珪素半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
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US7439137B2 (en) | 2008-10-21 |
TWI292221B (en) | 2008-01-01 |
US20050255706A1 (en) | 2005-11-17 |
TW200539446A (en) | 2005-12-01 |
KR20060047720A (ko) | 2006-05-18 |
CN1700430A (zh) | 2005-11-23 |
KR100697148B1 (ko) | 2007-03-20 |
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