JP2000351939A - Coating solution for forming transparent thin layer of low refractive index, antireflecting transparent electroconductive membrane and display device - Google Patents
Coating solution for forming transparent thin layer of low refractive index, antireflecting transparent electroconductive membrane and display deviceInfo
- Publication number
- JP2000351939A JP2000351939A JP11166560A JP16656099A JP2000351939A JP 2000351939 A JP2000351939 A JP 2000351939A JP 11166560 A JP11166560 A JP 11166560A JP 16656099 A JP16656099 A JP 16656099A JP 2000351939 A JP2000351939 A JP 2000351939A
- Authority
- JP
- Japan
- Prior art keywords
- forming
- coating liquid
- transparent thin
- thin film
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、比較的短時間で、
均一な厚みに、歩留り良く、反射防止性透明導電膜を形
成できる低屈折率透明薄膜層形成用塗布液、反射防止性
透明導電膜及び表示装置に関する。なお、本発明におい
て、「低屈折率透明薄膜層形成用塗布液」の「低屈折
率」とは、この塗布液を用いて形成された「透明薄膜
層」の屈折率が、この「透明薄膜層」に積層される「透
明導電層」の屈折率よりも小さいことを意味する。BACKGROUND OF THE INVENTION The present invention relates to
The present invention relates to a coating liquid for forming a low-refractive-index transparent thin film layer, an antireflective transparent conductive film, and a display device capable of forming an antireflective transparent conductive film with a uniform thickness and a good yield. In the present invention, the “low refractive index” of the “coating liquid for forming a low-refractive-index transparent thin film layer” means that the refractive index of the “transparent thin-film layer” formed using this coating liquid is the “transparent thin-film”. Means lower than the refractive index of the “transparent conductive layer” laminated on the “layer”.
【０００２】[0002]
【従来の技術】従来、反射防止性透明導電膜としては、
屈折率と膜厚を制御した複数の薄膜層を積層した積層型
の反射防止性透明導電膜が知られており、その具体的な
形成方法としては、透明基板上に高屈折率透明導電層を
湿式形成し、該導電層上に低屈折率透明膜層を湿式形成
する方法や、透明基板上にＣＶＤ法やスパッタ法で高屈
折率透明導電層を乾式形成した後、該導電層上に低屈折
率透明膜層を湿式形成する方法などが知られている。2. Description of the Related Art Conventionally, as an antireflective transparent conductive film,
A laminated antireflective transparent conductive film in which a plurality of thin film layers with controlled refractive indices and film thicknesses are laminated is known, and as a specific method for forming the same, a high refractive index transparent conductive layer is formed on a transparent substrate. Wet-forming, wet-forming a low-refractive-index transparent film layer on the conductive layer, or dry-forming a high-refractive-index transparent conductive layer on a transparent substrate by CVD or sputtering, and then forming a low-refractive-index transparent conductive layer on the conductive layer. A method of wet-forming a refractive index transparent film layer and the like are known.
【０００３】そして、前記低屈折率透明薄膜層を湿式形
成する塗布液として、シリコンアルコキシド及び／また
はその加水分解生成物を各種有機溶媒、例えばアルコー
ル等と混合したものが知られており、そのための塗布方
法として、短時間で均一な厚みの薄膜を形成することが
できるスピンコート法が好適に使用されている。[0003] As a coating solution for wet-forming the low refractive index transparent thin film layer, a mixture of silicon alkoxide and / or a hydrolysis product thereof with various organic solvents such as alcohol is known. As a coating method, a spin coating method capable of forming a thin film having a uniform thickness in a short time is suitably used.
【０００４】〔問題点〕しかしながら、上記塗布液を用
いてスピンコート法により低屈折率透明薄膜層を形成す
る方法は、他の塗布法、例えばスプレーコート法等に比
較して、短時間で均一な厚みの薄膜を形成することがで
き、精密な膜厚制御を行うことができるという利点があ
るものの、必要な塗布液量が多量となる他、ゴミなどに
より塗布面が汚れやすく生産歩留まりが悪く、このた
め、クリーンルーム等のクリーン度の高い塗布環境を用
意する必要があった。[Problems] However, the method of forming a low-refractive-index transparent thin film layer by spin coating using the above-mentioned coating solution is more uniform in a shorter time than other coating methods such as spray coating. Although it has the advantage of being able to form a thin film having a small thickness and to be able to perform precise film thickness control, it requires a large amount of coating liquid, and the coated surface is easily contaminated by dust and the like, and the production yield is poor. Therefore, it is necessary to prepare a coating environment having a high degree of cleanness, such as a clean room.
【０００５】[0005]
【発明が解決しようとする課題】本発明は、上記従来の
技術が有する問題点に鑑み成されたもので、これを解決
するため具体的に設定した課題は、スプレーコート法を
用いても、スピンコート法により形成された反射防止性
透明導電膜とほぼ同等の光学特性を有する反射防止性透
明導電膜を、比較的短時間で均一な厚みに、歩留り良く
形成することができる低屈折率透明薄膜層形成用塗布
液、この塗布液を用いて形成された透明薄膜層を備えた
反射防止性透明導電膜、この反射防止性透明導電膜が表
示面に形成された表示装置を提供することにある。DISCLOSURE OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and the problems specifically set in order to solve the problems are to use a spray coating method. A low-refractive-index transparent film that can be formed with a uniform thickness in a relatively short time and with good yield in a relatively short time, with a uniform anti-reflective transparent conductive film having almost the same optical properties as the anti-reflective transparent conductive film formed by spin coating. To provide a coating liquid for forming a thin film layer, an antireflective transparent conductive film having a transparent thin film layer formed using the coating liquid, and a display device having the antireflective transparent conductive film formed on a display surface. is there.
【０００６】[0006]
【課題を解決するための手段】本発明者等は、鋭意検討
の結果、上記課題はシリコンアルコキシドをバインダー
成分として含む低屈折率透明薄膜層形成用塗布液に、特
定のアルコールと、特定量の水を添加することにより解
決し得ることを知見し、この知見に基づき本発明を完成
させたものである。As a result of intensive studies, the present inventors have found that the above-mentioned problem is caused by adding a specific alcohol and a specific amount to a low refractive index transparent thin film layer forming coating solution containing silicon alkoxide as a binder component. The inventors have found that the problem can be solved by adding water, and have completed the present invention based on this finding.
【０００７】即ち、本発明における請求項１に係る低屈
折率透明薄膜層形成用塗布液は、低屈折率透明薄膜層を
形成するための塗布液であって、該塗布液中には、バイ
ンダー成分としてのシリコンアルコキシド及び／又はそ
の加水分解生成物と、炭素数が３以下のアルコールと、
20 〜 50 重量％の水とを少なくとも含むことを特徴と
するものである。That is, the coating liquid for forming a low-refractive-index transparent thin film layer according to claim 1 of the present invention is a coating liquid for forming a low-refractive-index transparent thin film layer, and the coating liquid contains a binder. A silicon alkoxide and / or a hydrolysis product thereof as a component, and an alcohol having 3 or less carbon atoms,
And at least 20 to 50% by weight of water.
【０００８】そして、請求項２に係る低屈折率透明薄膜
層形成用塗布液は、レベリング剤としてシリコン系界面
活性剤を 0.001〜0.1 重量％含むことが好ましい。The coating liquid for forming a low-refractive-index transparent thin film layer according to the second aspect of the present invention preferably contains 0.001 to 0.1% by weight of a silicon-based surfactant as a leveling agent.
【０００９】さらにまた、請求項３に係る低屈折率透明
薄膜層形成用塗布液は、コロイダルシリカを 0.05 〜0.
1 重量％含むことが好ましい。Furthermore, the coating liquid for forming a low refractive index transparent thin film layer according to claim 3 is characterized in that colloidal silica is contained in an amount of 0.05 to 0.1.
It is preferred to contain 1% by weight.
【００１０】さらにまた、請求項４に係る低屈折率透明
薄膜層形成用塗布液は、ジアセトンアルコール、セロソ
ルブ、グリコール、オクタノール、Ｎ−メチル−２−ピ
ロリドンからなる群から選ばれた少なくとも１種を含む
ことが好ましい。[0010] Furthermore, the coating liquid for forming a low refractive index transparent thin film layer according to claim 4 is at least one selected from the group consisting of diacetone alcohol, cellosolve, glycol, octanol, and N-methyl-2-pyrrolidone. It is preferable to include
【００１１】また、請求項５に係る反射防止性透明導電
膜は、高屈折率透明導電層の上層に、前記低屈折率透明
薄膜層形成用塗布液を用いて形成された低屈折率透明薄
膜層が積層されてなることを特徴とするものである。The antireflective transparent conductive film according to claim 5, wherein the low refractive index transparent thin film is formed on the high refractive index transparent conductive layer using the coating liquid for forming the low refractive index transparent thin film layer. It is characterized in that the layers are stacked.
【００１２】また、請求項６に係る表示装置は、前記反
射防止性透明導電膜が表示面に形成されてなることを特
徴とするものである。The display device according to a sixth aspect is characterized in that the antireflective transparent conductive film is formed on a display surface.
【００１３】[0013]
【発明の実施の形態】以下、実施の形態により本発明を
詳細に説明する。ただし、この実施の形態は、発明の主
旨をより良く理解させるため具体的に説明するものであ
り、特に指定のない限り、発明内容を限定するものでは
ない。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to embodiments. However, this embodiment is specifically described for better understanding of the gist of the invention, and does not limit the content of the invention unless otherwise specified.
【００１４】〔低屈折率透明薄膜層形成用塗布液〕実施
の形態における低屈折率透明薄膜層形成用塗布液は、シ
リコンアルコキシド及び／又はその加水分解生成物と、
炭素数が３以下のアルコールと、２０〜５０重量％の水
と、を少なくとも含有している。[Coating solution for forming low-refractive-index transparent thin-film layer] The coating solution for forming a low-refractive-index transparent thin-film layer in the embodiment comprises silicon alkoxide and / or a hydrolysis product thereof,
It contains at least an alcohol having 3 or less carbon atoms and 20 to 50% by weight of water.
【００１５】シリコンアルコキシドとは、次式、 Ｓｉ（ＯＲ1 ）m Ｒ2 n ……（式１） （式中、Ｒ1 、Ｒ2 はアルキル基であり、ｍは１〜４の
整数、ｎは０〜３の整数であり、かつｍ＋ｎ＝４であ
る）で表される化合物、またはその加水分解物の１種ま
たは２種以上の混合物である。The silicon alkoxide is represented by the following formula: Si (OR 1 ) m R 2 n (Formula 1) wherein R 1 and R 2 are alkyl groups, m is an integer of 1 to 4, and n Is an integer of 0 to 3 and m + n = 4), or one or a mixture of two or more hydrolysates thereof.
【００１６】この例として、特にテトラエトキシシラン
（Ｓｉ（ＯＣ2 Ｈ5 ）4 ）は、薄膜形成性、透明性、高
屈折率透明薄膜層との接合性、膜強度、及び反射防止性
能の観点から好適に使用される。As an example of this, particularly, tetraethoxysilane (Si (OC 2 H 5 ) 4 ) is used in view of thin film forming property, transparency, bonding with a high refractive index transparent thin film layer, film strength, and antireflection performance. Is preferably used.
【００１７】また、炭素数が３以下のアルコールとして
は、メチルアルコール、エチルアルコール、プロピルア
ルコール、イソプロピルアルコール等を例示することが
できる。この炭素数が３以下のアルコールの前記塗布液
中での含有量は 10 重量％以上であることが好ましく、
この含有量が 10 重量％未満となると基板への塗布後の
乾燥速度が不充分となり成膜性が低下するので好ましく
ない。Examples of the alcohol having 3 or less carbon atoms include methyl alcohol, ethyl alcohol, propyl alcohol, and isopropyl alcohol. The content of the alcohol having 3 or less carbon atoms in the coating solution is preferably 10% by weight or more,
If the content is less than 10% by weight, the drying speed after application to the substrate is insufficient, and the film forming property is undesirably reduced.
【００１８】また、低屈折率透明薄膜層形成用塗布液中
には、炭素数が４以上のアルコール、例えばブチルアル
コール、オクチルアルコール等が、塗布液中に多くとも
40重量％程度共存することが許容される。Further, in the coating liquid for forming a low refractive index transparent thin film layer, an alcohol having 4 or more carbon atoms, for example, butyl alcohol, octyl alcohol, etc., is contained in the coating liquid at most.
Coexistence of about 40% by weight is permitted.
【００１９】また、低屈折率透明薄膜層形成用塗布液中
には、水を 20 〜 50 重量％含有していることが極めて
重要であり、水の含有量が 20 重量％未満、または 50
重％量超であると、当初の目的を達成することができな
い。その理由は必ずしも定かではないが、次のように考
えられる。即ち、水の含有量が 20 重量％未満である
と、得られる透明薄膜層形成用塗布液の粘性が高く透明
薄膜層が凹凸状となり光の散乱量が増加してヘーズ値が
大きくなる。また、水の含有量が 50 重量％超である
と、スプレー後の塗膜の乾燥速度が小さくすぎ、滲みが
生じて膜面がギラツキ、また干渉色が虹色となり不適で
ある。It is extremely important that the coating liquid for forming a low refractive index transparent thin film layer contains 20 to 50% by weight of water, and the water content is less than 20% by weight or 50% by weight.
If the amount exceeds 30% by weight, the original purpose cannot be achieved. Although the reason is not clear, it is considered as follows. That is, when the content of water is less than 20% by weight, the viscosity of the obtained coating liquid for forming a transparent thin film layer is high, the transparent thin film layer becomes uneven, the amount of light scattering increases, and the haze value increases. On the other hand, if the water content is more than 50% by weight, the drying speed of the coating film after spraying is too low, bleeding occurs, the film surface is glaring, and the interference color becomes rainbow.
【００２０】また、低屈折率透明薄膜層形成用塗布液
は、レベリング剤としてシリコン系界面活性剤を 0.001
〜0.1 重量％含むことが好ましい。このシリコン系界面
活性剤は、低屈折率透明薄膜層形成用塗布液の表面張力
を低下させて塗布性を改善するためのものである。そし
て、シリコン系界面活性剤の添加量が 0.001重量％未満
ではレベリング剤としての作用が不充分であり、一方、
添加量が 0.1重量％超では膜強度が低下し、またヘーズ
値が上昇するので好ましくない。The coating liquid for forming the low-refractive-index transparent thin film layer contains a silicone-based surfactant as a leveling agent in an amount of 0.001.
Preferably, it contains 0.1 to 0.1% by weight. This silicon-based surfactant is used to lower the surface tension of the coating liquid for forming a low-refractive-index transparent thin film layer to improve coating properties. If the addition amount of the silicon-based surfactant is less than 0.001% by weight, the action as a leveling agent is insufficient.
If the addition amount exceeds 0.1% by weight, the film strength decreases and the haze value increases, which is not preferable.
【００２１】さらに、低屈折率透明薄膜層形成用塗布液
は、コロイダルシリカを0.05〜0.1重量％含むことが好
ましい。前記のコロイダルシリカは、屈折率を調製し、
ヘーズ値を低下させるためのものであり、その添加量が
0.05 重量％未満では効果が不充分であり、一方、添加
量が 0.1重量％超では膜の耐久性が低下するので好まし
くない。Further, the coating liquid for forming a low refractive index transparent thin film layer preferably contains colloidal silica in an amount of 0.05 to 0.1% by weight. The colloidal silica adjusts the refractive index,
This is for lowering the haze value.
If the amount is less than 0.05% by weight, the effect is insufficient. On the other hand, if the amount is more than 0.1% by weight, the durability of the film decreases, which is not preferable.
【００２２】さらに、低屈折率透明薄膜層形成用塗布液
は、ジアセトンアルコール、セロソルブ、グリコール、
オクタノール、Ｎ−メチル−２−ピロリドンからなる群
から選ばれる少なくとも１種を含むことが好ましい。こ
れらの添加剤は、 0.001〜 30 重量％程度の添加によ
り、塗膜の乾燥時間を調整する働きがあり、成膜性が向
上する。また、水よりも沸点が高い溶剤は乾燥時に最後
まで塗膜中に残存し、膜厚を均一化させたり、固形分の
凝集を防ぐ効果がある。さらに、低屈折率透明薄膜層形
成用塗布液には、有機系または無機系の染料、顔料を添
加してもよい。Further, the coating liquid for forming the low-refractive-index transparent thin-film layer includes diacetone alcohol, cellosolve, glycol,
It is preferable to include at least one selected from the group consisting of octanol and N-methyl-2-pyrrolidone. When these additives are added in an amount of about 0.001 to 30% by weight, they have a function of adjusting the drying time of the coating film, and the film forming property is improved. In addition, a solvent having a higher boiling point than water remains in the coating film to the end at the time of drying, and has an effect of making the film thickness uniform and preventing aggregation of solids. Further, an organic or inorganic dye or pigment may be added to the coating liquid for forming a low refractive index transparent thin film layer.
【００２３】そして、このように構成された低屈折率透
明薄膜層形成用塗布液は、塗布液の粘性、乾燥速度等が
適切に調整されているので、塗布法としてスプレーコー
ト法を用いても、低屈折率透明薄膜層が凹凸状となら
ず、光の散乱量が増加してヘーズ値が大きくなることも
なく、しかも、滲みが生じて膜面がギラつくこともな
く、また干渉色も薄紫色〜青紫色となり視認性も優れた
ものとなる。また、膜強度、膜の耐久性にも優れてい
る。In the coating liquid for forming a low-refractive-index transparent thin-film layer formed as described above, since the viscosity and drying speed of the coating liquid are appropriately adjusted, the spray coating method can be used as the coating method. The low-refractive-index transparent thin film layer does not become uneven, the amount of light scattering does not increase, and the haze value does not increase.Moreover, bleeding does not occur, and the film surface does not glare. It becomes light purple to blue purple, and the visibility is also excellent. Also, the film strength and the durability of the film are excellent.
【００２４】〔反射防止性透明導電膜〕この実施の形態
における反射防止性透明導電膜は、透明導電層の上層
に、前記の低屈折率透明薄膜層形成用塗布液をスプレー
コート法により塗布して成膜した低屈折率透明薄膜層が
積層されてなる。[Anti-reflective transparent conductive film] The anti-reflective transparent conductive film in this embodiment is obtained by applying the above-mentioned coating liquid for forming a low-refractive-index transparent thin film layer to the upper layer of the transparent conductive layer by a spray coating method. And a low-refractive-index transparent thin film layer formed by deposition.
【００２５】ここに、前記透明導電層を形成するための
塗布液（以下、「透明導電層形成用塗布液」という）、
及びその塗布方法は、従来の透明導電層形成用塗布液、
その塗布方法を採用することができ、特に限定されな
い。透明導電層形成用塗布液の具体例としては、金微粒
子、銀微粒子、白金属金属微粒子や、ＡＴＯ、ＩＴＯ等
の金属酸化物微粒子等の導電性物質が、分散粒子径10
〜 2000 Å程度に分散した各種導電性塗料を例示するこ
とができる。Here, a coating solution for forming the transparent conductive layer (hereinafter referred to as a “coating solution for forming a transparent conductive layer”),
And its coating method is a conventional transparent conductive layer forming coating solution,
The application method can be adopted, and there is no particular limitation. Specific examples of the coating liquid for forming a transparent conductive layer include conductive materials such as fine gold particles, fine silver particles, fine white metal particles, and fine metal oxide particles such as ATO and ITO.
Various conductive paints dispersed to about 2000 mm can be exemplified.
【００２６】また、透明導電層形成用塗布液の塗布法と
しては、スピンコート法、ロールコート法、スプレーコ
ート法、バーコート法、ディップ法、メニスカスコート
法等を例示することができる。このうち、スピンコート
法は、短時間で均一な厚みの薄膜を形成することができ
るので好適である。Examples of the method of applying the coating liquid for forming a transparent conductive layer include spin coating, roll coating, spray coating, bar coating, dipping, and meniscus coating. Among them, the spin coating method is preferable because a thin film having a uniform thickness can be formed in a short time.
【００２７】一般に、多層薄膜における層間界面反射防
止性能は、薄膜の屈折率と膜厚、および積層薄膜数によ
り決定されるため、実施の形態における透明導電膜にお
いても、導電層および透明層の積層数を考慮して、それ
ぞれの導電層及び透明層の厚みを設計することにより、
効果的な反射防止効果が得られる。In general, the interlayer interface antireflection performance of a multilayer thin film is determined by the refractive index and thickness of the thin film and the number of laminated thin films. By designing the thickness of each conductive layer and transparent layer in consideration of the number,
An effective anti-reflection effect is obtained.
【００２８】反射防止能を有する多層膜では、防止しよ
うとする反射光の波長をλとするとき、２層構成の反射
防止膜であれば基材側から高屈折率層と低屈折率とをそ
れぞれλ／4 、λ／4 、またはλ／2 、λ／4 の光学的
膜厚とすることによって効果的に反射を防止することが
できる。また３層構成の反射防止膜であれば基材側から
中屈折率層、高屈折率層および低屈折率層の順にλ／4
、λ／2 、λ／4 の光学的膜厚とすることが有効とさ
れる。In a multilayer film having an antireflection function, when the wavelength of the reflected light to be prevented is λ, if the antireflection film has a two-layer structure, the high refractive index layer and the low refractive index are determined from the substrate side. By setting the optical film thickness to λ / 4, λ / 4, or λ / 2, λ / 4, reflection can be effectively prevented. In the case of an antireflection film having a three-layer structure, a medium refractive index layer, a high refractive index layer, and a low refractive index layer are arranged in the order of λ / 4 from the substrate side.
, Λ / 2, and λ / 4.
【００２９】そして、このようにして作製された反射防
止性透明導電膜は、上層に成膜された低屈折率透明薄膜
層が凹凸状とならず、また、光の散乱量が増加してヘー
ズ値が大きくなることもなく、しかも、滲みが生じて膜
面がギラつくこともなく、干渉色も薄紫色〜青紫色とな
るので、反射防止性、視認性等の光学特性が、スピンコ
ート法で作製された低屈折率透明薄膜層を備えた反射防
止性透明導電膜とほぼ同等の光学特性を有するものとな
る。また、膜強度や膜の耐久性にも優れている。In the antireflective transparent conductive film thus produced, the low refractive index transparent thin film layer formed on the upper layer does not become uneven, and the amount of light scattering increases, so that the haze increases. The optical properties such as anti-reflection property and visibility are improved by the spin coating method because the value does not increase, the blur does not occur and the film surface does not glare, and the interference color becomes light purple to blue purple. It has optical characteristics substantially equal to those of the antireflective transparent conductive film provided with the low refractive index transparent thin film layer prepared in the above. Also, the film strength and the durability of the film are excellent.
【００３０】〔表示装置〕実施の形態における表示装置
は、前記の反射防止性透明導電膜が陰極線管、プラズマ
ディスプレイなどの表示面上に形成されている。この表
示装置は、表示面の帯電が防止されているので画像表示
面に挨などが付着せず、電磁波が遮蔽されるので各種の
電磁波障害が防止され、光透過性に優れているので画像
が明るく、透過画像の色相が自然であり、表示面の外観
が良好であり、しかも耐久性にも優れており、スピンコ
ート法で作製された低屈折率透明薄膜層を備えた反射防
止性透明導電膜とほぼ同等の光学特性を有するものとな
る。[Display Device] In the display device according to the embodiment, the antireflection transparent conductive film is formed on a display surface of a cathode ray tube, a plasma display or the like. Since this display device is prevented from being charged on the display surface, it does not adhere to the image display surface, shields electromagnetic waves, prevents various electromagnetic wave disturbances, and is excellent in light transmittance, so that images can be displayed. Bright, natural hue of transmitted image, good appearance of display surface, excellent durability, anti-reflective transparent conductive with low refractive index transparent thin film layer manufactured by spin coating method It has optical characteristics almost equivalent to those of the film.
【００３１】[0031]
【実施例】以下に、実施の形態に従った具体的な実施の
例を説明する。 「高屈折率透明導電層形成用塗布液の調整」後述の各実
施例および各比較例に共通の高屈折率透明導電層形成用
塗布液として、下記のものを調整した。 平均粒径 80 ｎｍのＩＴＯ微粒子 ： 2.0 重量部 0.25 Ｎ硝酸溶液 ： 5.0 重量部 イソブタノール ： 75.5 重量部 エチルセロソルブ ： 2.5 重量部 ｎ―メチル−２−ピロリドン ： 15.0 重量部 を混合して得られた混合液を超音波分散機（ BRANSON U
LTRASONICS 社製「ソニファイヤー450」）で分散して高
屈折率透明導電層形成用塗布液を調整した。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a specific embodiment according to the embodiment will be described. "Preparation of coating liquid for forming a high-refractive-index transparent conductive layer" As a coating liquid for forming a high-refractive-index transparent conductive layer common to each of Examples and Comparative Examples described below, the following was prepared. ITO fine particles having an average particle size of 80 nm: 2.0 parts by weight 0.25 N nitric acid solution: 5.0 parts by weight Isobutanol: 75.5 parts by weight Ethyl cellosolve: 2.5 parts by weight n-methyl-2-pyrrolidone: 15.0 parts by weight Ultrasonic disperser (BRANSON U)
The dispersion was dispersed with LTRASONICS “Sonifire 450” to prepare a coating liquid for forming a high refractive index transparent conductive layer.
【００３２】 〔実施例１〕 「低屈折率透明薄膜層形成用塗布液の調整」 テトラエトキシシラン ： 1.5 重量部 0.1Ｎ硝酸溶液 ： 5.5 重量部 変性エタノール ： 38.5 重量部 イソプロパノール ： 33.0 重量部 シリコン系界面活性剤（ビッグジャパン社製ＢＹＫ―３４５） ： 0.005 重量部 純水 ： 21.5 重量部 を混合し、均一な溶液とした。[Example 1] "Preparation of coating liquid for forming low refractive index transparent thin film layer" Tetraethoxysilane: 1.5 parts by weight 0.1 N nitric acid solution: 5.5 parts by weight Modified ethanol: 38.5 parts by weight Isopropanol: 33.0 parts by weight Silicon-based Surfactant (BYK-345 manufactured by Big Japan): 0.005 parts by weight Pure water: 21.5 parts by weight was mixed to form a uniform solution.
【００３３】「反射防止性透明導電膜付き陰極線管の作
製」高屈折率透明導電層形成用塗布液を陰極線管の表示
面にスピンコーターを用いて塗布し、乾燥後、この塗布
面上に低屈折率透明薄膜層形成用塗布液をスプレーコー
ト法を用いて塗布し、この陰極線管を乾燥機に入れ、 1
50℃で１時間焼き付け処理して反射防止性透明導電膜を
有する実施例１の陰極線管を作製した。"Preparation of a cathode ray tube with an antireflective transparent conductive film" A coating liquid for forming a high-refractive-index transparent conductive layer is applied to the display surface of the cathode ray tube using a spin coater, dried and then coated on the coated surface. The coating liquid for forming the refractive index transparent thin film layer is applied by a spray coating method, and the cathode ray tube is put in a dryer, and 1
The cathode ray tube of Example 1 having an antireflective transparent conductive film was prepared by baking at 50 ° C. for 1 hour.
【００３４】〔実施例２〕 「低屈折率透明薄膜層形成用塗布液の調整」変性エタノ
ールを 32.5 重量部、純水を 27.5 重量部に変更した他
は実施例１に準じて、実施例２の屈折率透明薄膜層形成
用塗布液を調整した。 「反射防止性透明導電膜付き陰極線管の作製」前記実施
例２の低屈折率透明薄膜層形成用塗布液を用いた他は実
施例１に準じて、反射防止性透明導電膜を有する実施例
２の陰極線管を作製した。[Example 2] [Preparation of coating liquid for forming low-refractive-index transparent thin film layer] Example 2 was carried out in the same manner as in Example 1 except that the modified ethanol was changed to 32.5 parts by weight and the pure water was changed to 27.5 parts by weight. Was prepared. "Preparation of a cathode ray tube with an anti-reflective transparent conductive film" Example having an anti-reflective transparent conductive film according to Example 1 except that the coating liquid for forming a low refractive index transparent thin film layer of Example 2 was used. 2 cathode ray tubes were produced.
【００３５】〔実施例３〕 「低屈折率透明薄膜層形成用塗布液の調整」変性エタノ
ールを 27.5 重量部、純水を 32.5 重量部に変更した他
は実施例１に準じて、実施例３の低屈折率透明薄膜層形
成用塗布液を調整した。 「反射防止性透明導電膜付き陰極線管の作製」前記実施
例３の低屈折率透明薄膜層形成用塗布液を用いた他は実
施例１に準じて、反射防止性透明導電膜を有する実施例
３の陰極線管を作製した。Example 3 "Preparation of coating liquid for forming low refractive index transparent thin film layer" Example 3 was carried out in the same manner as in Example 1 except that the modified ethanol was changed to 27.5 parts by weight and the pure water was changed to 32.5 parts by weight. Of the low-refractive-index transparent thin film layer forming coating liquid was prepared. "Production of a cathode ray tube with an antireflective transparent conductive film" Example having an antireflective transparent conductive film according to Example 1 except that the coating liquid for forming a low refractive index transparent thin film layer of Example 3 was used. No. 3 cathode ray tubes were produced.
【００３６】〔実施例４〕 「低屈折率透明薄膜層形成用塗布液の調整」変性エタノ
ールを 22.5 重量部、純水を 37.5 重量部に変更した他
は実施例１に準じて、実施例４の低屈折率透明薄膜層形
成用塗布液を調整した。 「反射防止性透明導電膜付き陰極線管の作製」前記実施
例４の低屈折率透明薄膜層形成用塗布液を用いた他は実
施例１に準じて、反射防止性透明導電膜を有する実施例
４の陰極線管を作製した。Example 4 "Preparation of coating liquid for forming low refractive index transparent thin film layer" Example 4 was carried out in the same manner as in Example 1 except that the modified ethanol was changed to 22.5 parts by weight and the pure water was changed to 37.5 parts by weight. Of the low-refractive-index transparent thin film layer forming coating liquid was prepared. "Production of a cathode ray tube with an anti-reflective transparent conductive film" Example having an anti-reflective transparent conductive film according to Example 1 except that the coating liquid for forming a low refractive index transparent thin film layer of Example 4 was used. 4 was manufactured.
【００３７】〔実施例５〕 「低屈折率透明薄膜層形成用塗布液の調整」変性エタノ
ールを 17.5 重量部、純水を 42.5 重量部に変更した他
は実施例１に準じて、実施例５の低屈折率透明薄膜層形
成用塗布液を調整した。 「反射防止性透明導電膜付き陰極線管の作製」前記実施
例５の低屈折率透明薄膜層形成用塗布液を用いた他は実
施例１に準じて、反射防止性透明導電膜を有する実施例
５の陰極線管を作製した。Example 5 "Preparation of coating liquid for forming low refractive index transparent thin film layer" Example 5 was carried out in the same manner as in Example 1 except that 17.5 parts by weight of denatured ethanol and 42.5 parts by weight of pure water were changed. Of the low-refractive-index transparent thin film layer forming coating liquid was prepared. "Preparation of a cathode ray tube with an anti-reflective transparent conductive film" Example having an anti-reflective transparent conductive film according to Example 1 except that the coating liquid for forming a low refractive index transparent thin film layer of Example 5 was used. 5 were manufactured.
【００３８】〔比較例１〕 「低屈折率透明薄膜層形成用塗布液の調整」変性エタノ
ールを55.5．重量部、純水を 4.5重量部に変更した他は
実施例１に準じて低屈折率透明薄膜層形成用塗布液を調
整した。 「反射防止性透明導電膜付き陰極線管の作製」前記の低
屈折率透明薄膜層形成用塗布液を用いた他は実施例１に
準じて、反射防止性透明導電膜を有する比較例１の陰極
線管を作製した。[Comparative Example 1] "Preparation of coating liquid for forming low refractive index transparent thin film layer" A coating liquid for forming a low-refractive-index transparent thin film layer was prepared in the same manner as in Example 1 except that the parts by weight and pure water were changed to 4.5 parts by weight. "Preparation of a cathode ray tube with an anti-reflective transparent conductive film" A cathode ray tube of Comparative Example 1 having an anti-reflective transparent conductive film according to Example 1, except that the coating liquid for forming a low-refractive-index transparent thin film layer was used. A tube was made.
【００３９】〔比較例２〕 「低屈折率透明薄膜層形成用塗布液の調整」変性エタノ
ールを 12.5 重量部、純水を 47.5 重量部に変更した他
は実施例１に準じて低屈折率透明薄膜層形成用塗布液を
調整した。 「反射防止性透明導電膜付き陰極線管の作製」前記の低
屈折率透明薄膜層形成用塗布液を用いた他は実施例１に
準じて、反射防止性透明導電膜を有する比較例２の陰極
線管を作製した。[Comparative Example 2] [Preparation of coating liquid for forming low refractive index transparent thin film layer] A low refractive index transparent film was prepared in the same manner as in Example 1 except that denatured ethanol was changed to 12.5 parts by weight and pure water was changed to 47.5 parts by weight. A coating liquid for forming a thin film layer was prepared. "Preparation of a cathode ray tube with an anti-reflective transparent conductive film" The cathode ray tube of Comparative Example 2 having an anti-reflective transparent conductive film according to Example 1 except that the coating liquid for forming a low refractive index transparent thin film layer was used. A tube was made.
【００４０】 〔比較例３〕 「低屈折率透明薄膜層形成用塗布液の調整」 メタノール ： 43.0 重量部 エタノール ： 33.0 重量部 ｎ−ブタノール ： 6.7 重量部 ジアセトンアルコール ： 2.0 重量部 エチレングリコールモノエチルエーテル ： 10.0 重量部 テトラメトキシシラン ： 1.1 重量部 0.036Ｎ塩酸水溶液 ： 4.2 重量部 を混合し、均一な溶液とした。Comparative Example 3 “Preparation of Coating Solution for Forming Low Refractive Index Transparent Thin Film Layer” Methanol: 43.0 parts by weight Ethanol: 33.0 parts by weight n-butanol: 6.7 parts by weight Diacetone alcohol: 2.0 parts by weight Ethylene glycol monoethyl Ether: 10.0 parts by weight Tetramethoxysilane: 1.1 parts by weight 0.036N hydrochloric acid aqueous solution: 4.2 parts by weight was mixed to form a uniform solution.
【００４１】「反射防止性透明導電膜付き陰極線管の作
製」この調整した低屈折率透明薄膜層形成用塗布液を用
い、塗布法としてスピンコート法を用いた他は実施例１
に準じて、反射防止性透明導電膜を有する比較例３の陰
極線管を作製した。"Preparation of a cathode ray tube with an anti-reflective transparent conductive film" Example 1 was repeated except that the prepared coating liquid for forming a low refractive index transparent thin film layer was used and a spin coating method was used as a coating method.
A cathode ray tube of Comparative Example 3 having an antireflective transparent conductive film was produced according to the method described in Example 1.
【００４２】「評価試験」陰極線管の表示面上に形成さ
れた反射防止性透明導電膜の性能を、下記の装置または
方法で測定した。 最低反射率； (株) 日立製作所製、SPECTRO PHOTO METE
R U-3410 により測定 干 渉 色；目視による観察、及び (株) 日立製作所
製、SPECTRO PHOTOMETERU-3410 により、膜の反射率を
測定し、最低反射率を示すピーク波長から判定 ヘーズ値 ；東京電色 (株) 製、AUTOMATIC HAZE METER
により測定 膜 強 度；太平理化工業社 (株) 製、ラビングテスタ
ーを用い、１ｋｇｆの荷重を負荷しながら消しゴムを１
００回往復した後、発生した傷の有無を目視観察。な
お、この評価基準は次のとおり。 ○；傷なし、○△；僅かに傷あり、 △；多少傷あり、×；傷多数あり 膜の耐久性； 80 ℃の温水に１時間浸漬した後、膜表面
の状況を目視観察及び膜強度測定。なお、この評価基準
は次のとおり。 ○；欠陥なし、○△；僅かに欠陥あり、 △；多少欠陥あり、×；欠陥多数あり 以上の評価試験の結果を表１に示した。"Evaluation Test" The performance of the antireflective transparent conductive film formed on the display surface of the cathode ray tube was measured by the following apparatus or method. Minimum reflectance; SPECTRO PHOTO METE, manufactured by Hitachi, Ltd.
Measured with RU-3410 Interference color; Visual observation, and by measuring the reflectance of the film with SPECTRO PHOTOMETERU-3410 manufactured by Hitachi, Ltd. Haze value determined from the peak wavelength showing the lowest reflectance; TEPCO AUTOMATIC HAZE METER, manufactured by Color Co., Ltd.
Film strength; using a rubbing tester, manufactured by Taihei Rika Kogyo Co., Ltd., while applying a load of 1 kgf,
After reciprocating 00 times, the presence or absence of the generated scratch was visually observed. The evaluation criteria are as follows. ○: No scratch, ○ △: Slight scratch, △: Slight scratch, X: Many scratches Film durability: After immersion in hot water of 80 ° C for 1 hour, visual observation of film surface condition and film strength Measurement. The evaluation criteria are as follows. ；: No defect, △: Slight defect, Δ: Some defect, X: Many defects The results of the above evaluation tests are shown in Table 1.
【００４３】[0043]
【表１】 [Table 1]
【００４４】以上の結果より、実施例の低屈折率透明薄
膜層形成用塗布液を用いれば、スプレーコート法を用い
ても、スピンコート法を用いて形成された反射防止性透
明導電膜とほぼ同等の光学特性を有する反射防止性透明
導電膜を形成することができることが判明した。From the above results, when the coating liquid for forming a low-refractive-index transparent thin film layer of the example was used, the anti-reflective transparent conductive film formed by the spin coating method was almost completely formed by the spray coating method. It has been found that an antireflective transparent conductive film having the same optical characteristics can be formed.
【００４５】[0045]
【発明の効果】以上のように、本発明の請求項１に係る
低屈折率透明薄膜層形成用塗布液は、該塗布液中に、シ
リコンアルコキシド及び／又はその加水分解生成物と、
炭素数が３以下のアルコールと、 20 〜 50 重量％の水
とを少なくとも含むから、従来のスピンコート法に替え
てスプレーコート法を用いても、スピンコート法により
形成された反射防止性透明導電膜とほぼ同等の光学特性
を有する反射防止性透明導電膜を、比較的短時間で均一
な厚みに形成することができる他、必要な塗布液量が少
量ですみ、また、ゴミなどにより塗布面が汚れにくく、
生産歩留まりが向上し、さらに、クリーンルーム等のク
リーン度の高い塗布環境を用意する必要がなくなるとい
う効果を奏する。As described above, the coating liquid for forming a low refractive index transparent thin film layer according to claim 1 of the present invention comprises, in the coating liquid, silicon alkoxide and / or a hydrolysis product thereof;
Since it contains at least an alcohol having 3 or less carbon atoms and 20 to 50% by weight of water, even if a spray coating method is used instead of the conventional spin coating method, an antireflective transparent conductive film formed by the spin coating method is used. In addition to being able to form an anti-reflective transparent conductive film with almost the same optical properties as the film and having a uniform thickness in a relatively short time, the required amount of coating liquid is small and the coating surface can be reduced by dust. Is hard to get dirty,
This has the effect of improving the production yield and eliminating the need for preparing a highly clean coating environment such as a clean room.
【００４６】また、請求項２に係る低屈折率透明薄膜層
形成用塗布液は、シリコン系界面活性剤を 0.001〜0.1
重量％含むから、塗布液の表面張力を低下させて均一な
厚みに形成することができるとともに使用塗布液量を少
量化し、塗布性を改善することができる。The coating liquid for forming a low-refractive-index transparent thin-film layer according to claim 2 contains a silicon-based surfactant in an amount of 0.001 to 0.1.
Since the coating liquid is contained by weight%, the coating liquid can be formed to have a uniform thickness by lowering the surface tension of the coating liquid, and the amount of the coating liquid used can be reduced to improve the coating property.
【００４７】また、請求項３に係る低屈折率透明薄膜層
形成用塗布液は、コロイダルシリカを 0.05 〜0.1 重量
％含むから、屈折率を調整し、ヘーズ値を低下させ、し
かも膜の耐久性を向上させることができる。Further, since the coating liquid for forming a low-refractive-index transparent thin film layer according to claim 3 contains 0.05 to 0.1% by weight of colloidal silica, the refractive index is adjusted, the haze value is reduced, and the durability of the film is improved. Can be improved.
【００４８】また、請求項４に係る低屈折率透明薄膜層
形成用塗布液は、ジアセトンアルコール、セロソルブ、
グリコール、オクタノール、Ｎ−メチル２−ピロリドン
からなる群から選ばれる少なくとも１種を含むから、塗
膜の乾燥時間が調節でき、成膜性を向上させることがで
きる。Further, the coating liquid for forming a low-refractive-index transparent thin film layer according to claim 4 comprises diacetone alcohol, cellosolve,
Since it contains at least one selected from the group consisting of glycol, octanol, and N-methyl 2-pyrrolidone, the drying time of the coating film can be adjusted and the film formability can be improved.
【００４９】また、請求項５に係る反射防止性透明導電
膜は、透明導電層の上層に前記の低屈折率透明薄膜層形
成用塗布液を用いて形成された低屈折率透明薄膜層が積
層されてなるように構成されているから、上層に成膜さ
れた低屈折率透明薄膜層が凹凸状とならず、また、光の
散乱量が増加してヘーズ値が大きくなることもなく、し
かも、滲みが生じて膜面がギラつくこともなく、干渉色
も薄紫色〜青紫色となるので、反射防止性、視認性等の
光学特性が、スピンコート法で作製された低屈折率透明
薄膜層を備えた反射防止性透明導電膜とほぼ同等の光学
特性を有するものとなるという効果を奏する。Further, in the antireflection transparent conductive film according to claim 5, a low refractive index transparent thin film layer formed by using the coating liquid for forming a low refractive index transparent thin film layer is laminated on the transparent conductive layer. Since the low refractive index transparent thin film layer formed on the upper layer is not uneven, and the haze value does not increase due to an increase in the amount of light scattering, and Since the film surface does not glare due to bleeding and the interference color becomes light purple to blue purple, the optical characteristics such as antireflection property and visibility are low-refractive-index transparent thin films manufactured by spin coating. This has the effect of having optical characteristics substantially equivalent to those of the antireflective transparent conductive film having the layer.
【００５０】また、請求項６に係る表示装置は、前記の
反射防止性透明導電膜が表示面に形成されてなるから、
表示面の帯電が防止されて画像表示面に挨などが付着せ
ず、電磁波が遮蔽されるので各種の電磁波障害が防止さ
れ、光透過性に優れているので画像が明るく、透過画像
の色相が自然であり、表示面の外観が良好であり、しか
も耐久性にも優れており、スピンコート法で作製された
低屈折率透明薄膜層を備えた反射防止性透明導電膜とほ
ぼ同等の光学特性を有し、しかも廉価で工業的に生産容
易な表示装置を得ることができるという効果を奏する。In the display device according to the sixth aspect, the antireflective transparent conductive film is formed on a display surface.
Electrification of the display surface is prevented, no greeting adheres to the image display surface, and electromagnetic waves are shielded, preventing various electromagnetic wave disturbances, and having excellent light transmittance, the image is bright, and the hue of the transmitted image is improved. It is natural, has a good appearance of the display surface, and has excellent durability, and has almost the same optical characteristics as an antireflective transparent conductive film with a low-refractive-index transparent thin film layer manufactured by spin coating. In addition, there is an effect that it is possible to obtain a display device which is inexpensive and industrially easy to produce.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｃ０９Ｄ 183/04 Ｃ０９Ｄ 183/04 ５Ｇ３０７ Ｇ０２Ｂ 1/11 Ｇ０９Ｆ 9/30 ３４８Ｚ Ｇ０９Ｆ 9/30 ３４８ Ｈ０１Ｂ 5/14 Ａ Ｈ０１Ｂ 5/14 Ｈ０１Ｊ 5/08 Ｈ０１Ｊ 5/08 Ｇ０２Ｂ 1/10 Ａ (72)発明者 阿部 俊一 千葉県船橋市豊富町585番地 住友大阪セ メント株式会社新材料事業部内 Ｆターム(参考） 2K009 AA05 AA06 CC09 CC42 CC47 DD02 EE03 4F100 AA20A AH02A AH06A AT00B BA02 CA18A JG01A JN01A JN06 JN18A YY00A 4G059 AC04 AC12 EA05 EB05 EB07 FA05 FA28 FA30 FB05 4J038 DL021 DL032 DL051 HA446 JA19 JA20 JA26 JA33 JB27 JC32 KA09 MA08 MA09 NA01 NA19 NA20 5C094 AA42 AA43 AA55 DA13 ED12 FB01 FB04 FB12 GB01 JA01 5G307 FA01 FB01 FC03 FC08 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme court ゛ (Reference) C09D 183/04 C09D 183/04 5G307 G02B 1/11 G09F 9/30 348Z G09F 9/30 348 H01B 5/14 A H01B 5/14 H01J 5/08 H01J 5/08 G02B 1/10 A (72) Inventor Shunichi Abe 585 Tomimachi, Funabashi-shi, Chiba F-term in the New Materials Business Division of Sumitomo Osaka Cement Co., Ltd. 2K009 AA05 AA06 CC09 CC42 CC47 DD02 EE03 4F100 AA20A AH02A AH06A AT00B BA02 CA18A JG01A JN01A JN06 JN18A YY00A 4G059 AC04 AC12 EA05 EB05 EB07 FA05 FA28 FA30 FB05 4J038 DL021 NA32 A19 JA32 JA05A32 JA05A32 JA03A33 ED12 FB01 FB04 FB12 GB01 JA01 5G307 FA01 FB01 FC03 FC08
Claims (6)
液であって、 該塗布液中には、シリコンアルコキシド及び／又はその
加水分解生成物と、炭素数が３以下のアルコールと、 2
0 〜 50 重量％の水とを少なくとも含むことを特徴とす
る低屈折率透明薄膜層形成用塗布液。1. A coating liquid for forming a low-refractive-index transparent thin film layer, comprising: a silicon alkoxide and / or a hydrolysis product thereof; an alcohol having 3 or less carbon atoms; Two
A coating liquid for forming a low-refractive-index transparent thin film layer, comprising at least 0 to 50% by weight of water.
％含むことを特徴とする請求項１記載の低屈折率透明薄
膜層形成用塗布液。2. The coating liquid for forming a low-refractive-index transparent thin film layer according to claim 1, comprising 0.001 to 0.1% by weight of a silicon-based surfactant.
むことを特徴とする請求項１または請求項２記載の低屈
折率透明薄膜層形成用塗布液。3. The coating liquid for forming a low-refractive-index transparent thin-film layer according to claim 1, wherein the coating liquid contains 0.05 to 0.1% by weight of colloidal silica.
コール、オクタノール、Ｎ−メチル−２−ピロリドンか
らなる群から選ばれる少なくとも１種を含むことを特徴
とする請求項１〜３のいずれかに記載の低屈折率透明薄
膜層形成用塗布液。4. The method according to claim 1, further comprising at least one member selected from the group consisting of diacetone alcohol, cellosolve, glycol, octanol, and N-methyl-2-pyrrolidone. Coating liquid for forming a refractive index transparent thin film layer.
れかに記載の低屈折率透明薄膜層形成用塗布液を用いて
形成された低屈折率透明薄膜層が積層されてなることを
特徴とする反射防止性透明導電膜。5. A low-refractive-index transparent thin film layer formed using the coating liquid for forming a low-refractive-index transparent thin-film layer according to claim 1 on an upper layer of the transparent conductive layer. An anti-reflective transparent conductive film, characterized in that:
示面に形成されてなることを特徴とする表示装置。6. A display device comprising the antireflective transparent conductive film according to claim 5 formed on a display surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11166560A JP2000351939A (en) | 1999-06-14 | 1999-06-14 | Coating solution for forming transparent thin layer of low refractive index, antireflecting transparent electroconductive membrane and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11166560A JP2000351939A (en) | 1999-06-14 | 1999-06-14 | Coating solution for forming transparent thin layer of low refractive index, antireflecting transparent electroconductive membrane and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000351939A true JP2000351939A (en) | 2000-12-19 |
Family
ID=15833536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11166560A Pending JP2000351939A (en) | 1999-06-14 | 1999-06-14 | Coating solution for forming transparent thin layer of low refractive index, antireflecting transparent electroconductive membrane and display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000351939A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002189122A (en) * | 2000-12-20 | 2002-07-05 | Bridgestone Corp | Front surface protective filter for plasma display |
| JP2005202389A (en) * | 2003-12-18 | 2005-07-28 | Toppan Printing Co Ltd | Antireflection laminated body |
| JP2010189616A (en) * | 2009-02-17 | 2010-09-02 | Toray Saehan Inc | Antistatic polyester film of which defect of coating appearance is improved and method for producing the same |
-
1999
- 1999-06-14 JP JP11166560A patent/JP2000351939A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002189122A (en) * | 2000-12-20 | 2002-07-05 | Bridgestone Corp | Front surface protective filter for plasma display |
| JP2005202389A (en) * | 2003-12-18 | 2005-07-28 | Toppan Printing Co Ltd | Antireflection laminated body |
| JP2010189616A (en) * | 2009-02-17 | 2010-09-02 | Toray Saehan Inc | Antistatic polyester film of which defect of coating appearance is improved and method for producing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101484543B (en) | Antireflective coating composition with stain resistance, antireflective coating film using the same, and its manufacturing method | |
| US20080268215A1 (en) | Thin-Film Laminate | |
| JP2002317152A (en) | Coating agent having low refractive index and reflection preventive film | |
| US6858294B1 (en) | Coating fluid for forming hard coating and substrates covered with hard coating | |
| JP3387204B2 (en) | Polarizing plate, method for manufacturing polarizing plate, and liquid crystal display device | |
| JPH10142401A (en) | Low-reflectivity transparent conductive film as well as its production and display device | |
| JP2005144849A (en) | Transparent conductive film and reflection preventing transparent conductive film | |
| JP3478589B2 (en) | Paint for forming conductive / high-refractive-index film and transparent laminate with conductive / anti-reflective coating obtained therefrom | |
| JP2000351939A (en) | Coating solution for forming transparent thin layer of low refractive index, antireflecting transparent electroconductive membrane and display device | |
| JPH0748543A (en) | Low-refractive index film forming coating material, and transparent laminated body and cathode ray tube with antistatic and antireflection film | |
| US6524499B1 (en) | Transparent conductive film and display device | |
| JP2013107995A (en) | Coating composition and antireflection film using the same | |
| JPH11211901A (en) | Antireflection article | |
| JP2006289901A (en) | Reflection preventing film and display unit | |
| JP3403578B2 (en) | Antireflection colored transparent conductive film and cathode ray tube | |
| JP4076668B2 (en) | Weatherproof hard coat composition | |
| US20060134427A1 (en) | Optical laminate | |
| JP3356966B2 (en) | Transparent conductive film, method of manufacturing the same, and display device | |
| JP4271438B2 (en) | Transparent conductive film forming paint, transparent conductive film, method for producing the same, and display device including the same | |
| JP2001126540A (en) | Transparent conductive film and display device | |
| JP2007148201A (en) | Method for manufacturing antireflection film and display apparatus | |
| JPH0789720A (en) | Coating liquid for colored film forming, colored film, colored antistatic film and colored low reflective antistatic film | |
| JP2006058728A (en) | Antireflection member | |
| JP2002003746A (en) | Coating for forming transparent electroconductive film, transparent electroconductive film and display device | |
| JP2002341107A (en) | Electrically conductive antireflection film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040713 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040910 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20070206 |