ITUB20160251A1 - Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivo - Google Patents
Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivoInfo
- Publication number
- ITUB20160251A1 ITUB20160251A1 ITUB2016A000251A ITUB20160251A ITUB20160251A1 IT UB20160251 A1 ITUB20160251 A1 IT UB20160251A1 IT UB2016A000251 A ITUB2016A000251 A IT UB2016A000251A IT UB20160251 A ITUB20160251 A IT UB20160251A IT UB20160251 A1 ITUB20160251 A1 IT UB20160251A1
- Authority
- IT
- Italy
- Prior art keywords
- semiconductor
- procedure
- mechanical stresses
- corresponding devices
- reduce thermo
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Geometry (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITUB2016A000251A ITUB20160251A1 (it) | 2016-02-01 | 2016-02-01 | Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivo |
US15/251,355 US9960131B2 (en) | 2016-02-01 | 2016-08-30 | Method for thermo-mechanical stress reduction in semiconductor devices and corresponding device |
CN201621205074.XU CN206225353U (zh) | 2016-02-01 | 2016-09-29 | 半导体器件 |
CN201610983331.0A CN107026116B (zh) | 2016-02-01 | 2016-09-29 | 用于减小半导体器件中的热机械应力的方法以及对应器件 |
DE102016118653.8A DE102016118653A1 (de) | 2016-02-01 | 2016-09-30 | Verfahren zur Reduzierung von thermomechanischer Belastung in Halbleitervorrichtungen und entsprechende Vorrichtung |
Applications Claiming Priority (1)
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ITUB2016A000251A ITUB20160251A1 (it) | 2016-02-01 | 2016-02-01 | Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivo |
Publications (1)
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ITUB20160251A1 true ITUB20160251A1 (it) | 2017-08-01 |
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ITUB2016A000251A ITUB20160251A1 (it) | 2016-02-01 | 2016-02-01 | Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivo |
Country Status (4)
Country | Link |
---|---|
US (1) | US9960131B2 (it) |
CN (2) | CN206225353U (it) |
DE (1) | DE102016118653A1 (it) |
IT (1) | ITUB20160251A1 (it) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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ITUB20160251A1 (it) * | 2016-02-01 | 2017-08-01 | St Microelectronics Srl | Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivo |
US11469194B2 (en) * | 2018-08-08 | 2022-10-11 | Stmicroelectronics S.R.L. | Method of manufacturing a redistribution layer, redistribution layer and integrated circuit including the redistribution layer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6570243B1 (en) * | 1999-12-09 | 2003-05-27 | Sharp Kabushiki Kaisha | Dummy interconnects for suppressing thermally generated stress cracks |
US20090302473A1 (en) * | 2008-02-07 | 2009-12-10 | Panasonic Corporation | Semiconductor device and manufacturing method thereof |
US20110095418A1 (en) * | 2009-10-26 | 2011-04-28 | Hwan-Sik Lim | Semiconductor package and method for fabricating the same |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
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US4949162A (en) * | 1987-06-05 | 1990-08-14 | Hitachi, Ltd. | Semiconductor integrated circuit with dummy pedestals |
JPH03129738A (ja) * | 1989-07-10 | 1991-06-03 | Nec Corp | 半導体装置 |
JP2940432B2 (ja) * | 1995-04-27 | 1999-08-25 | ヤマハ株式会社 | 半導体装置とその製造方法 |
US6118180A (en) * | 1997-11-03 | 2000-09-12 | Lsi Logic Corporation | Semiconductor die metal layout for flip chip packaging |
US6093631A (en) | 1998-01-15 | 2000-07-25 | International Business Machines Corporation | Dummy patterns for aluminum chemical polishing (CMP) |
KR100319813B1 (ko) * | 2000-01-03 | 2002-01-09 | 윤종용 | 유비엠 언더컷을 개선한 솔더 범프의 형성 방법 |
US6413863B1 (en) | 2000-01-24 | 2002-07-02 | Taiwan Semiconductor Manufacturing Company | Method to resolve the passivation surface roughness during formation of the AlCu pad for the copper process |
US6833323B2 (en) | 2003-01-29 | 2004-12-21 | Taiwan Semiconductor Manufacturing Co., Ltd | Method for forming patterned features at a semiconductor wafer periphery to prevent metal peeling |
US7364998B2 (en) | 2005-07-21 | 2008-04-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming high reliability bump structure |
US7485564B2 (en) * | 2007-02-12 | 2009-02-03 | International Business Machines Corporation | Undercut-free BLM process for Pb-free and Pb-reduced C4 |
JP5513872B2 (ja) | 2009-12-18 | 2014-06-04 | 株式会社東芝 | 固体撮像装置 |
US9123544B2 (en) * | 2011-10-21 | 2015-09-01 | Infineon Technologies Ag | Semiconductor device and method |
KR102032907B1 (ko) * | 2013-04-22 | 2019-10-16 | 삼성전자주식회사 | 반도체 소자, 반도체 패키지 및 전자 시스템 |
US20150364430A1 (en) | 2014-06-16 | 2015-12-17 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming a Dampening Structure to Improve Board Level Reliability |
ITUB20160251A1 (it) * | 2016-02-01 | 2017-08-01 | St Microelectronics Srl | Procedimento per ridurre gli stress termo-meccanici in dispositivi a semiconduttore e corrispondente dispositivo |
-
2016
- 2016-02-01 IT ITUB2016A000251A patent/ITUB20160251A1/it unknown
- 2016-08-30 US US15/251,355 patent/US9960131B2/en active Active
- 2016-09-29 CN CN201621205074.XU patent/CN206225353U/zh active Active
- 2016-09-29 CN CN201610983331.0A patent/CN107026116B/zh active Active
- 2016-09-30 DE DE102016118653.8A patent/DE102016118653A1/de not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6570243B1 (en) * | 1999-12-09 | 2003-05-27 | Sharp Kabushiki Kaisha | Dummy interconnects for suppressing thermally generated stress cracks |
US20090302473A1 (en) * | 2008-02-07 | 2009-12-10 | Panasonic Corporation | Semiconductor device and manufacturing method thereof |
US20110095418A1 (en) * | 2009-10-26 | 2011-04-28 | Hwan-Sik Lim | Semiconductor package and method for fabricating the same |
Also Published As
Publication number | Publication date |
---|---|
CN206225353U (zh) | 2017-06-06 |
CN107026116A (zh) | 2017-08-08 |
US9960131B2 (en) | 2018-05-01 |
DE102016118653A1 (de) | 2017-08-03 |
CN107026116B (zh) | 2021-07-30 |
US20170221841A1 (en) | 2017-08-03 |
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