IT1261394B - Dispositivo e metodo per formare un rivestimento mediante pirolisi - Google Patents

Dispositivo e metodo per formare un rivestimento mediante pirolisi

Info

Publication number
IT1261394B
IT1261394B ITTO930987A ITTO930987A IT1261394B IT 1261394 B IT1261394 B IT 1261394B IT TO930987 A ITTO930987 A IT TO930987A IT TO930987 A ITTO930987 A IT TO930987A IT 1261394 B IT1261394 B IT 1261394B
Authority
IT
Italy
Prior art keywords
coating chamber
coating
substrate
ceiling
pyrolysis
Prior art date
Application number
ITTO930987A
Other languages
English (en)
Inventor
Robert Terneu
Secondo Franceschi
Original Assignee
Glaverbel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel filed Critical Glaverbel
Publication of ITTO930987A0 publication Critical patent/ITTO930987A0/it
Publication of ITTO930987A1 publication Critical patent/ITTO930987A1/it
Application granted granted Critical
Publication of IT1261394B publication Critical patent/IT1261394B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Si descrive un dispositivo per formare per pirolisi un rivestimento di metallo o composto metallico su una faccia di un substrato di vetro caldo in movimento portando la faccia a contatto con un reagente gassoso. Il dispositivo comprende mezzi di supporto (20) per trasportare il substrato (16) attraverso una camera di rivestimento (14). E' previsto almeno un ingresso del reagente gassoso sotto forma di una feritoia (12) che si apre direttamente nella camera di rivestimento e si estende trasversalmente al percorso del substrato per fornire e distribuire reagente gassoso alla camera di rivestimento. E' prevista almeno un'uscita (18) per i gas di scarico per scaricare gas di scarico dalla camera di rivestimento. L'invenzione è caratterizzata dalla presenza di mezzi schermanti mobili (40) posti nella camera di rivestimento adiacenti al soffitto (38) di questa, per ridurre la formazione di depositi sul soffitto della camera di rivestimento.(Figura 1).
ITTO930987A 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi IT1261394B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB939300400A GB9300400D0 (en) 1993-01-11 1993-01-11 A device and method for forming a coating by pyrolysis

Publications (3)

Publication Number Publication Date
ITTO930987A0 ITTO930987A0 (it) 1993-12-23
ITTO930987A1 ITTO930987A1 (it) 1995-06-23
IT1261394B true IT1261394B (it) 1996-05-20

Family

ID=10728522

Family Applications (2)

Application Number Title Priority Date Filing Date
ITTO930987A IT1261394B (it) 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi
ITTO930986A IT1261393B (it) 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi

Family Applications After (1)

Application Number Title Priority Date Filing Date
ITTO930986A IT1261393B (it) 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi

Country Status (15)

Country Link
US (3) US5522911A (it)
JP (2) JPH072548A (it)
AT (2) AT405831B (it)
BE (2) BE1008560A3 (it)
CA (2) CA2113029A1 (it)
CH (2) CH687204A5 (it)
CZ (2) CZ287432B6 (it)
DE (2) DE4400209A1 (it)
ES (2) ES2111418B1 (it)
FR (2) FR2700325B1 (it)
GB (3) GB9300400D0 (it)
IT (2) IT1261394B (it)
LU (2) LU88451A1 (it)
NL (2) NL9400041A (it)
SE (3) SE9400037L (it)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6200389B1 (en) 1994-07-18 2001-03-13 Silicon Valley Group Thermal Systems Llc Single body injector and deposition chamber
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
US6231971B1 (en) * 1995-06-09 2001-05-15 Glaverbel Glazing panel having solar screening properties
US5882368A (en) * 1997-02-07 1999-03-16 Vidrio Piiano De Mexico, S.A. De C.V. Method for coating glass substrates by ultrasonic nebulization of solutions
US7096692B2 (en) * 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US6103015A (en) * 1998-01-19 2000-08-15 Libbey-Owens-Ford Co. Symmetrical CVD coater with lower upstream exhaust toe
DE19923591A1 (de) * 1999-05-21 2000-11-23 Fleissner Maschf Gmbh Co Vorrichtung mit einem Düsenbalken zur Erzeugung von Flüssigkeitsstrahlen zur Strahlbeaufschlagung der Fasern einer Warenbahn
US6413579B1 (en) 2000-01-27 2002-07-02 Libbey-Owens-Ford Co. Temperature control of CVD method for reduced haze
US6808741B1 (en) * 2001-10-26 2004-10-26 Seagate Technology Llc In-line, pass-by method for vapor lubrication
CN100358234C (zh) * 2002-07-31 2007-12-26 E.On瑞典股份公司 电机
CN100498968C (zh) 2003-03-19 2009-06-10 松下电器产业株式会社 车载记录/再现设备、记录/再现设备及其***和方法
JP4124046B2 (ja) * 2003-07-10 2008-07-23 株式会社大阪チタニウムテクノロジーズ 金属酸化物被膜の成膜方法および蒸着装置
US9017480B2 (en) * 2006-04-06 2015-04-28 First Solar, Inc. System and method for transport
KR20110014653A (ko) * 2008-05-19 2011-02-11 이 아이 듀폰 디 네모아 앤드 캄파니 전자 소자에서 증기 코팅 장치 및 방법
EP2123793A1 (en) * 2008-05-20 2009-11-25 Helianthos B.V. Vapour deposition process
US8557328B2 (en) * 2009-10-02 2013-10-15 Ppg Industries Ohio, Inc. Non-orthogonal coater geometry for improved coatings on a substrate
FI9160U1 (fi) * 2010-01-04 2011-04-14 Beneq Oy Pinnoituslaite
FI20106088A0 (fi) * 2010-10-21 2010-10-21 Beneq Oy Pinnankäsittelylaite ja -menetelmä
KR101806916B1 (ko) * 2011-03-17 2017-12-12 한화테크윈 주식회사 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법
US20130130597A1 (en) * 2011-11-21 2013-05-23 James William Brown Glass treatment apparatus and methods of treating glass
JP5148743B1 (ja) * 2011-12-20 2013-02-20 シャープ株式会社 薄膜成膜装置、薄膜成膜方法および薄膜太陽電池の製造方法
MX2014013233A (es) * 2014-10-30 2016-05-02 Ct Investig Materiales Avanzados Sc Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.
US20160186320A1 (en) * 2014-12-26 2016-06-30 Metal Industries Research And Development Centre Apparatus for continuously forming a film through chemical vapor deposition
US11124877B2 (en) 2015-10-19 2021-09-21 Toshiba Mitsubishi-Electric Industrial Systems Corporation Film forming device including a detachable bottom plate for forming a film on a substrate
WO2019239192A1 (en) * 2018-06-15 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3597178A (en) * 1969-04-17 1971-08-03 Ppg Industries Inc Process and apparatus for removing atmospheric contaminants in a float glass operation
US3837832A (en) * 1971-04-29 1974-09-24 Ppg Industries Inc Apparatus for making float glass
US3888649A (en) * 1972-12-15 1975-06-10 Ppg Industries Inc Nozzle for chemical vapor deposition of coatings
GB1507465A (en) * 1974-06-14 1978-04-12 Pilkington Brothers Ltd Coating glass
JPS51126209A (en) * 1975-04-25 1976-11-04 Central Glass Co Ltd Method and apparatus for production of which reflects heat rays
GB1507996A (en) * 1975-06-11 1978-04-19 Pilkington Brothers Ltd Coating glass
GB1524326A (en) * 1976-04-13 1978-09-13 Bfg Glassgroup Coating of glass
US4092953A (en) * 1976-12-09 1978-06-06 The D. L. Auld Company Apparatus for coating glass containers
EP0007147A1 (en) * 1978-07-12 1980-01-23 Imperial Chemical Industries Plc Liquid dispenser and process for dispensing liquid reaction mixtures onto web or sheet material
CA1138725A (en) * 1978-07-20 1983-01-04 Robert Terneu Glass coating
BE879189A (fr) * 1978-10-19 1980-04-04 Bfg Glassgroup Procede de formation d'un revetement d'oxyde d'etain sur un support de verre chaud et produits ainsi obtenus
CH628600A5 (fr) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.
CH643469A5 (fr) * 1981-12-22 1984-06-15 Siv Soc Italiana Vetro Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide.
US4595634A (en) * 1983-08-01 1986-06-17 Gordon Roy G Coating process for making non-iridescent glass
GB8408118D0 (en) * 1984-03-29 1984-05-10 Pilkington Brothers Plc Coating glass
US4900110A (en) * 1984-07-30 1990-02-13 Ppg Industries, Inc. Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon
US5122394A (en) * 1985-12-23 1992-06-16 Atochem North America, Inc. Apparatus for coating a substrate
US4761171A (en) * 1987-02-09 1988-08-02 Libbey-Owens-Ford Co. Apparatus for coating glass
US4793282A (en) * 1987-05-18 1988-12-27 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
GB2209176A (en) * 1987-08-28 1989-05-04 Pilkington Plc Coating glass
GB8824102D0 (en) * 1988-10-14 1988-11-23 Pilkington Plc Apparatus for coating glass
GB8914047D0 (en) * 1989-06-19 1989-08-09 Glaverbel Method of and apparatus for pyrolytically forming an oxide coating on a hot glass substrate
DE69113994T2 (de) * 1990-02-22 1996-05-02 Roy Gerald Gordon Titannitrid- oder zinnoxidauflage auf der oberfläche einer beschichtungsanlage.
GB2247691B (en) * 1990-08-31 1994-11-23 Glaverbel Method of coating glass
FR2672518B1 (fr) * 1991-02-13 1995-05-05 Saint Gobain Vitrage Int Buse a alimentation dissymetrique pour la formation d'une couche de revetement sur un ruban de verre, par pyrolyse d'un melange gazeux.
FR2677639B1 (fr) * 1991-06-14 1994-02-25 Saint Gobain Vitrage Internal Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium.

Also Published As

Publication number Publication date
NL9400041A (nl) 1994-08-01
IT1261393B (it) 1996-05-20
AT405279B (de) 1999-06-25
BE1008559A3 (fr) 1996-06-04
ES2112093B1 (es) 1998-11-16
FR2700326A1 (fr) 1994-07-13
ITTO930986A1 (it) 1994-07-12
LU88450A1 (fr) 1994-12-01
NL9400042A (nl) 1994-08-01
FR2700325A1 (fr) 1994-07-13
BE1008560A3 (fr) 1996-06-04
ITTO930986A0 (it) 1993-12-23
CH687203A5 (fr) 1996-10-15
GB2274116B (en) 1995-08-23
JPH073463A (ja) 1995-01-06
JP3423388B2 (ja) 2003-07-07
US6112554A (en) 2000-09-05
CA2113029A1 (en) 1994-07-12
GB9400046D0 (en) 1994-03-02
ITTO930987A0 (it) 1993-12-23
FR2700325B1 (fr) 1996-11-29
ATA1394A (de) 1999-04-15
GB2274115A (en) 1994-07-13
SE9400037L (sv) 1994-07-12
CZ1694A3 (en) 1995-06-14
ES2111418B1 (es) 1998-10-16
DE4400209A1 (de) 1994-07-14
LU88451A1 (fr) 1994-12-01
FR2700326B1 (fr) 1996-11-29
ES2112093A1 (es) 1998-03-16
ATA1494A (de) 1998-11-15
AT405831B (de) 1999-11-25
SE508197C2 (sv) 1998-09-14
GB9300400D0 (en) 1993-03-03
ITTO930987A1 (it) 1995-06-23
US5522911A (en) 1996-06-04
CH687204A5 (fr) 1996-10-15
GB2274116A (en) 1994-07-13
CA2113028A1 (en) 1994-07-12
ES2111418A1 (es) 1998-03-01
GB9400045D0 (en) 1994-03-02
CZ284096B6 (cs) 1998-08-12
DE4400208A1 (de) 1994-07-14
CZ287432B6 (en) 2000-11-15
SE504491C2 (sv) 1997-02-24
SE9400038D0 (sv) 1994-01-10
SE9400037D0 (sv) 1994-01-10
GB2274115B (en) 1995-08-23
SE9400038L (sv) 1994-07-12
CZ1794A3 (en) 1995-06-14
US5709726A (en) 1998-01-20
JPH072548A (ja) 1995-01-06

Similar Documents

Publication Publication Date Title
IT1261394B (it) Dispositivo e metodo per formare un rivestimento mediante pirolisi
CA1269061C (en) PRODUCTION OF DIAMOND-LIKE CARBON COATINGS
CZ38295A3 (en) Chemisorptive reaction process and a reactor for alternating adsorption and desorption of polar gas
ATE265089T1 (de) Eine plasmaanlage mit atmosphärischem druck
WO2003067635A3 (en) Reactor assembly and processing method
TW332311B (en) The substrate treatment apparatus
GB0014620D0 (en) Reactor
MY114569A (en) Process for producing a device for mercury dispensing, reactive gases sorption and electrode shielding within flourescent lamps and device thus produced
BR8905216A (pt) Aparelho para depositar sobre a superficie de uma fita em movimento de vidro quente um revestimento formado pela reacao de pelo menos dois reagentes gasosos,processo para depositar um revestimento e vidro revestido
PT95433A (pt) Processo de producao de pelicula de aluminio, depositada
KR920004294A (ko) 허어메틱피복 광파이버의 제조방법 및 제조장치
DE60013838D1 (de) Abdichtungsmittel und dessen verwendung in abscheidungsreaktor
DE69818409D1 (de) Gasmischung für Plasmaspritzen und ihre Verwendung für Feuerfestmaterial-Plasmaspritzen
TW343393B (en) Electron emissive film
BR9903805A (pt) Processo para aumentar a adesão de partìculas metálicas a um substrato de carbono, material formado por um substrato de carbono e partìculas metálicas, e, uso do mesmo.
JPS6468476A (en) Photoexcitation vapor chemical growth device
GB2390379B (en) Methods and apparatus for forming precursors
IT1259347B (it) Metodo per ottenere la combustione di gas poveri mediante un gas comburente e relativo dispositivo di combustione
IT1257698B (it) Procedimento e impianto per la formazione di un deposito metallico mediante proiezione ad arco elettrico.
NO932698L (no) Laserapparat av metalldamp-type
KR890010267A (ko) 내화금속용 저압화학증착장치의 가스공급계
Hayashi et al. Effect of Dilution Gases in Methane on the Deposition of Diamond-Like Carbon in a Microwave Discharge
Dóbé et al. Rate and stoichiometry of the fast gas titration reaction HCO+ O 2→ CO+ HO 2
SU1805677A1 (ru) Способ плазменного напыления покрытий
JPH03283426A (ja) 薄膜形成方法

Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970820