HK1194150A1 - 曝光裝置、液體保持方法、及元件製造方法 - Google Patents
曝光裝置、液體保持方法、及元件製造方法Info
- Publication number
- HK1194150A1 HK1194150A1 HK14107312.0A HK14107312A HK1194150A1 HK 1194150 A1 HK1194150 A1 HK 1194150A1 HK 14107312 A HK14107312 A HK 14107312A HK 1194150 A1 HK1194150 A1 HK 1194150A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- exposure apparatus
- device manufacturing
- liquid holding
- holding method
- liquid
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161527333P | 2011-08-25 | 2011-08-25 | |
JP2012153959 | 2012-07-09 | ||
US13/593,079 US9256137B2 (en) | 2011-08-25 | 2012-08-23 | Exposure apparatus, liquid holding method, and device manufacturing method |
PCT/JP2012/072086 WO2013027866A1 (en) | 2011-08-25 | 2012-08-24 | Exposure apparatus and method of confining a liquid |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1194150A1 true HK1194150A1 (zh) | 2014-10-10 |
Family
ID=47746594
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK14107312.0A HK1194150A1 (zh) | 2011-08-25 | 2014-07-17 | 曝光裝置、液體保持方法、及元件製造方法 |
HK14111693.1A HK1198212A1 (zh) | 2011-08-25 | 2014-11-19 | 曝光裝置和限制液體的方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK14111693.1A HK1198212A1 (zh) | 2011-08-25 | 2014-11-19 | 曝光裝置和限制液體的方法 |
Country Status (8)
Country | Link |
---|---|
US (2) | US9256137B2 (zh) |
EP (1) | EP2748679A1 (zh) |
JP (2) | JP5949923B2 (zh) |
KR (1) | KR20140056284A (zh) |
CN (1) | CN103748519B (zh) |
HK (2) | HK1194150A1 (zh) |
TW (1) | TW201312293A (zh) |
WO (1) | WO2013027866A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2005655A (en) * | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
JP6212884B2 (ja) * | 2013-03-15 | 2017-10-18 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
US11372336B2 (en) | 2016-12-14 | 2022-06-28 | Asml Netherlands B.V. | Lithography apparatus and device manufacturing method |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030096435A (ko) | 1996-11-28 | 2003-12-31 | 가부시키가이샤 니콘 | 노광장치 및 노광방법 |
US6262796B1 (en) | 1997-03-10 | 2001-07-17 | Asm Lithography B.V. | Positioning device having two object holders |
US6897963B1 (en) | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
WO2001035168A1 (en) | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
US6452292B1 (en) | 2000-06-26 | 2002-09-17 | Nikon Corporation | Planar motor with linear coil arrays |
EP1364257A1 (en) | 2001-02-27 | 2003-11-26 | ASML US, Inc. | Simultaneous imaging of two reticles |
TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
AU2003256081A1 (en) | 2002-08-23 | 2004-03-11 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
CN1954408B (zh) * | 2004-06-04 | 2012-07-04 | 尼康股份有限公司 | 曝光装置、曝光方法及元件制造方法 |
WO2005122219A1 (ja) | 2004-06-09 | 2005-12-22 | Nikon Corporation | 基板保持装置及びそれを備える露光装置、露光方法、デバイス製造方法、並びに撥液プレート |
EP2605068A3 (en) | 2004-06-10 | 2013-10-02 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US7701550B2 (en) * | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7522261B2 (en) * | 2004-09-24 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20080106718A1 (en) * | 2004-12-02 | 2008-05-08 | Nikon Corporation | Exposure Apparatus and Device Manufacturing Method |
TWI424260B (zh) | 2005-03-18 | 2014-01-21 | 尼康股份有限公司 | A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method |
US20070132976A1 (en) | 2005-03-31 | 2007-06-14 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
JP4802604B2 (ja) | 2005-08-17 | 2011-10-26 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
JP2007142366A (ja) * | 2005-10-18 | 2007-06-07 | Canon Inc | 露光装置及びデバイス製造方法 |
JP5151977B2 (ja) * | 2006-05-10 | 2013-02-27 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
JP2008034801A (ja) * | 2006-06-30 | 2008-02-14 | Canon Inc | 露光装置およびデバイス製造方法 |
US8634053B2 (en) * | 2006-12-07 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2008147577A (ja) | 2006-12-13 | 2008-06-26 | Canon Inc | 露光装置及びデバイス製造方法 |
US8004651B2 (en) * | 2007-01-23 | 2011-08-23 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
US8134685B2 (en) * | 2007-03-23 | 2012-03-13 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
US7924404B2 (en) | 2007-08-16 | 2011-04-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN101408731B (zh) * | 2008-11-04 | 2010-08-18 | 浙江大学 | 一种用于浸没式光刻机的浸没控制装置 |
US20100196832A1 (en) | 2009-01-30 | 2010-08-05 | Nikon Corporation | Exposure apparatus, exposing method, liquid immersion member and device fabricating method |
US20110134400A1 (en) * | 2009-12-04 | 2011-06-09 | Nikon Corporation | Exposure apparatus, liquid immersion member, and device manufacturing method |
US20110222031A1 (en) * | 2010-03-12 | 2011-09-15 | Nikon Corporation | Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium |
US20120188521A1 (en) | 2010-12-27 | 2012-07-26 | Nikon Corporation | Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program and storage medium |
US20120162619A1 (en) | 2010-12-27 | 2012-06-28 | Nikon Corporation | Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium |
US9823580B2 (en) * | 2012-07-20 | 2017-11-21 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
US9651873B2 (en) * | 2012-12-27 | 2017-05-16 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
-
2012
- 2012-08-23 US US13/593,079 patent/US9256137B2/en active Active
- 2012-08-24 TW TW101130939A patent/TW201312293A/zh unknown
- 2012-08-24 CN CN201280040882.3A patent/CN103748519B/zh active Active
- 2012-08-24 EP EP12772522.4A patent/EP2748679A1/en not_active Withdrawn
- 2012-08-24 WO PCT/JP2012/072086 patent/WO2013027866A1/en active Application Filing
- 2012-08-24 JP JP2014526700A patent/JP5949923B2/ja active Active
- 2012-08-24 KR KR1020147004374A patent/KR20140056284A/ko not_active Application Discontinuation
-
2014
- 2014-07-17 HK HK14107312.0A patent/HK1194150A1/zh not_active IP Right Cessation
- 2014-11-19 HK HK14111693.1A patent/HK1198212A1/zh unknown
-
2016
- 2016-01-08 US US14/991,561 patent/US20160124320A1/en not_active Abandoned
- 2016-06-07 JP JP2016113931A patent/JP2016157148A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
HK1198212A1 (zh) | 2015-03-13 |
JP5949923B2 (ja) | 2016-07-13 |
CN103748519B (zh) | 2016-04-20 |
JP2014524668A (ja) | 2014-09-22 |
US20160124320A1 (en) | 2016-05-05 |
EP2748679A1 (en) | 2014-07-02 |
KR20140056284A (ko) | 2014-05-09 |
US20130059253A1 (en) | 2013-03-07 |
CN103748519A (zh) | 2014-04-23 |
TW201312293A (zh) | 2013-03-16 |
US9256137B2 (en) | 2016-02-09 |
JP2016157148A (ja) | 2016-09-01 |
WO2013027866A1 (en) | 2013-02-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20230826 |