HK1181823A1 - 成膜方法及成膜裝置 - Google Patents

成膜方法及成膜裝置

Info

Publication number: HK1181823A1
Authority: HK; Hong Kong
Prior art keywords: film forming; forming apparatus; forming method; film; forming
Prior art date: 2011-09-30

Application number

HK13109036.2A

Other languages

English (en)

Inventor

盐野郎

宫内充祐

姜友松

Original Assignee

新柯隆株式會社

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2011-09-30

Filing date

2013-08-02

Publication date

2013-11-15

2013-08-02 Application filed by 新柯隆株式會社 filed Critical 新柯隆株式會社

2013-11-15 Publication of HK1181823A1 publication Critical patent/HK1181823A1/zh

Links

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Crystallography & Structural Chemistry (AREA)
Physical Vapour Deposition (AREA)

HK13109036.2A 2011-09-30 2013-08-02 成膜方法及成膜裝置 HK1181823A1 (zh)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
PCT/JP2011/072586 WO2013046440A1 (ja)	2011-09-30	2011-09-30	成膜方法及び成膜装置

Publications (1)

Publication Number	Publication Date
HK1181823A1 true HK1181823A1 (zh)	2013-11-15

Family

ID=46060762

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
HK13109036.2A HK1181823A1 (zh)	2011-09-30	2013-08-02	成膜方法及成膜裝置
HK13109527.8A HK1182146A1 (zh)	2011-09-30	2013-08-15	成膜方法和成膜裝置

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
HK13109527.8A HK1182146A1 (zh)	2011-09-30	2013-08-15	成膜方法和成膜裝置

Country Status (8)

Country	Link
US (1)	US20140205762A1 (zh)
EP (1)	EP2762604B1 (zh)
JP (1)	JP4906014B1 (zh)
KR (1)	KR101312752B1 (zh)
CN (2)	CN103140598B (zh)
HK (2)	HK1181823A1 (zh)
TW (2)	TWI412617B (zh)
WO (2)	WO2013046440A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP2333132A4 (en) *	2008-09-05	2013-01-30	Shincron Co Ltd	FILM-FORMING PROCESS AND OIL-REPELLENT BASIS THEREFOR
KR101959975B1 (ko) *	2012-07-10	2019-07-16	삼성디스플레이 주식회사	유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
EP2975155A1 (en)	2014-07-15	2016-01-20	Essilor International (Compagnie Generale D'optique)	A process for physical vapor deposition of a material layer on surfaces of a plurality of substrates
WO2016107689A1 (en) *	2014-12-31	2016-07-07	Essilor International (Compagnie Générale d'Optique)	Systems and methods with improved thermal evaporation of optical coatings onto ophthalmic lens substrates
JP6445959B2 (ja) *	2015-12-16	2018-12-26	株式会社オプトラン	成膜装置および成膜方法
CN209065995U (zh) *	2018-10-15	2019-07-05	株式会社新柯隆	成膜装置
CN110230034B (zh) *	2019-05-20	2024-04-16	江苏光腾光学有限公司	光学镀膜多角度伞架及包含该伞架的镀膜机
CN110643954B (zh) *	2019-10-21	2024-03-01	上海新柯隆真空设备制造有限公司	镀膜设备、离子源、以及栅极结构

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
IL134255A0 (en) *	2000-01-27	2001-04-30	V I P Vacuum Ion Plasma Techno	System and method for deposition of coatings on a substrate
JP2005232534A (ja) *	2004-02-19	2005-09-02	Akira Yamada	フッ化物膜の成膜方法
JP2006022368A (ja) *	2004-07-07	2006-01-26	Shinko Seiki Co Ltd	表面処理装置および表面処理方法
JP2006233275A (ja) *	2005-02-24	2006-09-07	Japan Science & Technology Agency	薄膜形成装置
WO2010018639A1 (ja) *	2008-08-15	2010-02-18	株式会社シンクロン	蒸着装置及び薄膜デバイスの製造方法
EP2333132A4 (en) *	2008-09-05	2013-01-30	Shincron Co Ltd	FILM-FORMING PROCESS AND OIL-REPELLENT BASIS THEREFOR
JP4688230B2 (ja) *	2008-10-09	2011-05-25	株式会社シンクロン	成膜方法
JP4823293B2 (ja) *	2008-10-31	2011-11-24	株式会社シンクロン	成膜方法及び成膜装置
JP2010242174A (ja) *	2009-04-07	2010-10-28	Canon Inc	薄膜形成方法
JP2012032690A (ja) *	2010-08-02	2012-02-16	Seiko Epson Corp	光学物品およびその製造方法

2011
- 2011-09-30 US US13/700,527 patent/US20140205762A1/en not_active Abandoned
- 2011-09-30 CN CN201180019919.XA patent/CN103140598B/zh active Active
- 2011-09-30 WO PCT/JP2011/072586 patent/WO2013046440A1/ja active Application Filing
- 2011-09-30 KR KR1020127001275A patent/KR101312752B1/ko active IP Right Grant
- 2011-09-30 JP JP2011546501A patent/JP4906014B1/ja active Active
- 2011-09-30 EP EP11838997.2A patent/EP2762604B1/en active Active
- 2011-11-09 TW TW100140847A patent/TWI412617B/zh active
2012
- 2012-08-02 CN CN201280003215.8A patent/CN103154298B/zh active Active
- 2012-08-02 WO PCT/JP2012/069714 patent/WO2013046918A1/ja active Application Filing
- 2012-08-28 TW TW101131112A patent/TWI604075B/zh active
2013
- 2013-08-02 HK HK13109036.2A patent/HK1181823A1/zh not_active IP Right Cessation
- 2013-08-15 HK HK13109527.8A patent/HK1182146A1/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
KR20130084967A (ko)	2013-07-26
WO2013046440A1 (ja)	2013-04-04
KR101312752B1 (ko)	2013-09-27
EP2762604A4 (en)	2015-08-26
EP2762604B1 (en)	2020-04-01
TW201315826A (zh)	2013-04-16
CN103140598A (zh)	2013-06-05
JPWO2013046440A1 (ja)	2015-03-26
CN103154298B (zh)	2016-10-05
HK1182146A1 (zh)	2013-11-22
JP4906014B1 (ja)	2012-03-28
TWI604075B (zh)	2017-11-01
EP2762604A1 (en)	2014-08-06
US20140205762A1 (en)	2014-07-24
CN103140598B (zh)	2014-03-26
TW201313933A (zh)	2013-04-01
WO2013046918A1 (ja)	2013-04-04
CN103154298A (zh)	2013-06-12
TWI412617B (zh)	2013-10-21

Legal Events

Date	Code	Title	Description
2019-05-10	PC	Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)	Effective date: 20181002

Publication	Publication Date	Title
HK1204663A1 (zh)	2015-11-27	膜形成裝置及方法
EP2686739A4 (en)	2014-10-29	PICTURE GENERATING DEVICE AND PICTURE PRODUCTION METHOD
GB201118807D0 (en)	2011-12-14	Method and apparatus
GB201120458D0 (en)	2012-01-11	Apparatus and method
EP2729420A4 (en)	2015-01-28	METHOD AND APPARATUS FOR GLASS BENDING
GB201104694D0 (en)	2011-05-04	Apparatus and method
GB201102369D0 (en)	2011-03-30	Apparatus and method
EP2728858A4 (en)	2014-12-31	RECEIVING APPARATUS AND RECEIVING METHOD THEREOF
GB201323134D0 (en)	2014-02-12	Apparatus and method
HK1181823A1 (zh)	2013-11-15	成膜方法及成膜裝置
ZA201403997B (en)	2016-01-27	Deaeration apparatus and method
TWI563120B (en)	2016-12-21	Film forming apparatus
EP2762605A4 (en)	2015-04-15	FILMFORMUNGSVORRICHTUNG AND FILMFORMUNGSverfahrens
EP2786872A4 (en)	2016-12-21	PRINTER DEVICE AND PRINTING METHOD
ZA201400369B (en)	2016-01-27	Post-forming method and apparatus
GB201115459D0 (en)	2011-10-26	Apparatus and method
GB201106982D0 (en)	2011-06-08	Defobrillator apparatus and method
HK1193079A1 (zh)	2014-09-12	包裝裝置以及包裝方法
ZA201304092B (en)	2014-06-25	Apparatus and method
EP2680297A4 (en)	2014-08-13	FILM-EDGING METHOD AND FILM-EDITING DEVICE
GB201102361D0 (en)	2011-03-30	Apparatus and method
GB201106882D0 (en)	2011-06-01	Apparatus and method
GB201121779D0 (en)	2012-02-01	Apparatus and method
GB201120977D0 (en)	2012-01-18	Apparatus and method
GB201119980D0 (en)	2012-01-04	Apparatus and method