HK1176745A1 - 非製冷紅外檢測器及用於製造非製冷紅外檢測器的方法 - Google Patents
非製冷紅外檢測器及用於製造非製冷紅外檢測器的方法Info
- Publication number
- HK1176745A1 HK1176745A1 HK13103818.9A HK13103818A HK1176745A1 HK 1176745 A1 HK1176745 A1 HK 1176745A1 HK 13103818 A HK13103818 A HK 13103818A HK 1176745 A1 HK1176745 A1 HK 1176745A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- manufacturing
- methods
- same
- infrared detector
- uncooled infrared
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
- G01J5/024—Special manufacturing steps or sacrificial layers or layer structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14669—Infrared imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32298210P | 2010-04-12 | 2010-04-12 | |
| PCT/US2011/032136 WO2011130284A2 (en) | 2010-04-12 | 2011-04-12 | Uncooled infrared detector and methods for manufacturing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1176745A1 true HK1176745A1 (zh) | 2013-08-02 |
Family
ID=44760325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK13103818.9A HK1176745A1 (zh) | 2010-04-12 | 2013-03-26 | 非製冷紅外檢測器及用於製造非製冷紅外檢測器的方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8941064B2 (zh) |
| EP (2) | EP3024028B1 (zh) |
| JP (1) | JP5751544B2 (zh) |
| KR (1) | KR101528968B1 (zh) |
| CN (1) | CN102884627B (zh) |
| CA (1) | CA2800847C (zh) |
| HK (1) | HK1176745A1 (zh) |
| IL (1) | IL222342A (zh) |
| WO (1) | WO2011130284A2 (zh) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5143176B2 (ja) * | 2010-03-31 | 2013-02-13 | 株式会社東芝 | 赤外線撮像素子およびその製造方法 |
| TWI439679B (zh) * | 2011-08-03 | 2014-06-01 | Univ Nat Chiao Tung | 電校式輻射計 |
| US9646874B1 (en) | 2013-08-05 | 2017-05-09 | Sandia Corporation | Thermally-isolated silicon-based integrated circuits and related methods |
| TWI512955B (zh) * | 2013-08-26 | 2015-12-11 | Ind Tech Res Inst | 半導體元件結構、紅外線感測元件與其製作方法 |
| US9219185B2 (en) | 2013-12-19 | 2015-12-22 | Excelitas Technologies Singapore Pte. Ltd | CMOS integrated method for the fabrication of thermopile pixel with umbrella absorber on semiconductor substrate |
| US9373772B2 (en) * | 2014-01-15 | 2016-06-21 | Excelitas Technologies Singapore Pte. Ltd. | CMOS integrated method for the release of thermopile pixel on a substrate by using anisotropic and isotropic etching |
| US9324760B2 (en) | 2014-01-21 | 2016-04-26 | Excelitas Technologies Singapore Pte. Ltd | CMOS integrated method for fabrication of thermopile pixel on semiconductor substrate with buried insulation regions |
| CN105261622B (zh) * | 2014-06-03 | 2017-12-22 | 上海丽恒光微电子科技有限公司 | 一种成像探测器的制造方法 |
| WO2015187886A1 (en) * | 2014-06-04 | 2015-12-10 | Flir Systems, Inc. | Systems and methods for enhanced bolometer response |
| TWI569427B (zh) * | 2014-10-22 | 2017-02-01 | 精材科技股份有限公司 | 半導體封裝件及其製法 |
| US9726547B2 (en) | 2014-11-25 | 2017-08-08 | Globalfoundries Inc. | Microbolometer devices in CMOS and BiCMOS technologies |
| KR20190049616A (ko) * | 2015-12-16 | 2019-05-09 | 미크로센스 엘렉트로니크 싼. 베 틱. 아.쎄. 오데테우 테크노켄트 오데테우-메에테 알라니 | 마이크로볼로미터 구조 |
| TWI615985B (zh) | 2015-12-25 | 2018-02-21 | 財團法人工業技術研究院 | 光感測元件及其製造方法 |
| CN106932105A (zh) * | 2015-12-31 | 2017-07-07 | 上海丽恒光微电子科技有限公司 | 一种红外探测器及其制备方法 |
| US10128302B2 (en) * | 2016-01-28 | 2018-11-13 | Ams Sensors Uk Limited | IR detector array device |
| US11211305B2 (en) | 2016-04-01 | 2021-12-28 | Texas Instruments Incorporated | Apparatus and method to support thermal management of semiconductor-based components |
| US10787303B2 (en) | 2016-05-29 | 2020-09-29 | Cellulose Material Solutions, LLC | Packaging insulation products and methods of making and using same |
| US11078007B2 (en) | 2016-06-27 | 2021-08-03 | Cellulose Material Solutions, LLC | Thermoplastic packaging insulation products and methods of making and using same |
| US10074639B2 (en) | 2016-12-30 | 2018-09-11 | Texas Instruments Incorporated | Isolator integrated circuits with package structure cavity and fabrication methods |
| US20180315808A1 (en) * | 2017-04-28 | 2018-11-01 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Organic light emitting (oled) display panels, and the manufacturing methods and display devices thereof |
| US11056382B2 (en) * | 2018-03-19 | 2021-07-06 | Globalfoundries U.S. Inc. | Cavity formation within and under semiconductor devices |
| US10727161B2 (en) * | 2018-08-06 | 2020-07-28 | Texas Instruments Incorporated | Thermal and stress isolation for precision circuit |
| CN110627014B (zh) * | 2019-09-19 | 2022-09-23 | 中国科学院上海微***与信息技术研究所 | 一种在衬底上制作悬浮红外热堆的方法 |
| CN114112055B (zh) * | 2021-03-26 | 2023-07-07 | 北京北方高业科技有限公司 | 一种基于cmos工艺的红外探测器及其制备方法 |
| CN113720455A (zh) * | 2021-03-26 | 2021-11-30 | 北京北方高业科技有限公司 | 基于cmos工艺的红外探测器 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69732862T2 (de) * | 1997-12-18 | 2006-04-13 | Mitsubishi Denki K.K. | Halbleiteranordnung zur aufnahme von infrarotbildern |
| JP3366590B2 (ja) * | 1998-02-04 | 2003-01-14 | 科学技術振興事業団 | 温度測定装置、熱型赤外線イメージセンサ及び温度測定方法 |
| JP3589997B2 (ja) * | 2001-03-30 | 2004-11-17 | 株式会社東芝 | 赤外線センサおよびその製造方法 |
| JP4865957B2 (ja) * | 2001-05-17 | 2012-02-01 | 三菱電機株式会社 | 熱型赤外線固体撮像装置の製造方法 |
| JP3675770B2 (ja) * | 2002-03-22 | 2005-07-27 | 株式会社東芝 | 熱型赤外線撮像素子 |
| JP4028441B2 (ja) * | 2003-06-18 | 2007-12-26 | 株式会社東芝 | 赤外線固体撮像素子およびその製造方法 |
| WO2005098380A1 (en) * | 2004-04-08 | 2005-10-20 | Tayfun Akin | Ultra low-cost uncooled infrared detector arrays in cmos |
| JPWO2006132155A1 (ja) * | 2005-06-06 | 2009-01-08 | 松下電器産業株式会社 | 電子デバイス及びその製造方法 |
| JP4372097B2 (ja) * | 2005-12-27 | 2009-11-25 | 株式会社東芝 | 赤外線センサ、赤外線カメラ、赤外線センサの駆動方法および赤外線カメラの駆動方法 |
| JP4775128B2 (ja) * | 2006-06-15 | 2011-09-21 | 日産自動車株式会社 | 赤外線検出装置 |
| DE102006028435A1 (de) | 2006-06-21 | 2007-12-27 | Robert Bosch Gmbh | Sensor und Verfahren zu seiner Herstellung |
| KR100928200B1 (ko) * | 2007-10-31 | 2009-11-25 | 한국전자통신연구원 | 바이폴라 트랜지스터 기반의 비냉각형 적외선 센서 및 그의제조 방법 |
| KR100925214B1 (ko) * | 2007-11-29 | 2009-11-06 | 한국전자통신연구원 | 볼로미터 및 그 제조 방법 |
| JP2009174917A (ja) * | 2008-01-22 | 2009-08-06 | Oki Semiconductor Co Ltd | 赤外線検出素子、及び赤外線検出素子の製造方法 |
| JP2009229260A (ja) * | 2008-03-24 | 2009-10-08 | Toshiba Corp | 赤外線センサ素子 |
| JP4975669B2 (ja) * | 2008-03-25 | 2012-07-11 | 株式会社東芝 | 赤外線検出器およびこの赤外線検出器を備えた固体撮像素子 |
| JP2010032410A (ja) | 2008-07-30 | 2010-02-12 | Toshiba Corp | イメージセンサおよびその製造方法 |
-
2011
- 2011-04-12 EP EP15197214.8A patent/EP3024028B1/en active Active
- 2011-04-12 JP JP2013505054A patent/JP5751544B2/ja active Active
- 2011-04-12 WO PCT/US2011/032136 patent/WO2011130284A2/en active Application Filing
- 2011-04-12 KR KR1020127027283A patent/KR101528968B1/ko active IP Right Grant
- 2011-04-12 US US13/085,205 patent/US8941064B2/en active Active
- 2011-04-12 EP EP11769450.5A patent/EP2559067B1/en active Active
- 2011-04-12 CA CA2800847A patent/CA2800847C/en active Active
- 2011-04-12 CN CN201180018553.4A patent/CN102884627B/zh active Active
-
2012
- 2012-10-10 IL IL222342A patent/IL222342A/en active IP Right Grant
-
2013
- 2013-03-26 HK HK13103818.9A patent/HK1176745A1/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CA2800847C (en) | 2015-11-24 |
| KR20130007618A (ko) | 2013-01-18 |
| KR101528968B1 (ko) | 2015-06-15 |
| US8941064B2 (en) | 2015-01-27 |
| CN102884627A (zh) | 2013-01-16 |
| EP3024028A1 (en) | 2016-05-25 |
| IL222342A0 (en) | 2012-12-31 |
| US20110248374A1 (en) | 2011-10-13 |
| EP2559067B1 (en) | 2019-11-06 |
| IL222342A (en) | 2016-10-31 |
| JP2013529295A (ja) | 2013-07-18 |
| JP5751544B2 (ja) | 2015-07-22 |
| CN102884627B (zh) | 2015-12-16 |
| EP2559067A2 (en) | 2013-02-20 |
| EP2559067A4 (en) | 2015-06-10 |
| CA2800847A1 (en) | 2011-10-20 |
| EP3024028B1 (en) | 2023-03-08 |
| WO2011130284A2 (en) | 2011-10-20 |
| WO2011130284A3 (en) | 2012-02-23 |
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