HK1096163A1 - Template replication method - Google Patents
Template replication methodInfo
- Publication number
- HK1096163A1 HK1096163A1 HK07103468.0A HK07103468A HK1096163A1 HK 1096163 A1 HK1096163 A1 HK 1096163A1 HK 07103468 A HK07103468 A HK 07103468A HK 1096163 A1 HK1096163 A1 HK 1096163A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- template
- replicas
- replication method
- template replication
- pattern
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Steroid Compounds (AREA)
- Cosmetics (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Control Of Exposure In Printing And Copying (AREA)
- Liquid Developers In Electrophotography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05105100A EP1731961B1 (en) | 2005-06-10 | 2005-06-10 | Template replication method |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1096163A1 true HK1096163A1 (en) | 2007-05-25 |
Family
ID=34977068
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK07103468.0A HK1096163A1 (en) | 2005-06-10 | 2007-03-30 | Template replication method |
HK07104676.6A HK1098543A1 (en) | 2005-06-10 | 2007-05-02 | Imprint stamp comprising cyclic olefin copolymer |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK07104676.6A HK1098543A1 (en) | 2005-06-10 | 2007-05-02 | Imprint stamp comprising cyclic olefin copolymer |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1731961B1 (zh) |
JP (1) | JP5646692B2 (zh) |
CN (1) | CN1916759B (zh) |
AT (1) | ATE413631T1 (zh) |
DE (1) | DE602005010839D1 (zh) |
ES (1) | ES2315797T3 (zh) |
HK (2) | HK1096163A1 (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8608972B2 (en) | 2006-12-05 | 2013-12-17 | Nano Terra Inc. | Method for patterning a surface |
TW201418875A (zh) | 2006-12-05 | 2014-05-16 | Nano Terra Inc | 用於圖案化表面的方法 |
WO2009032815A1 (en) * | 2007-09-06 | 2009-03-12 | 3M Innovative Properties Company | Tool for making microstructured articles |
ES2326109B1 (es) * | 2007-12-05 | 2010-06-25 | Consejo Superior De Investigaciones Cientificas | Microdispositivo de separacion y extraccion selectiva y no invasiva de particulas en suspensiones polidispersas, procedimiento de fabricacion y sus aplicaciones. |
JP5107105B2 (ja) * | 2008-03-12 | 2012-12-26 | 株式会社リコー | インプリント方法 |
WO2011095217A1 (en) * | 2010-02-05 | 2011-08-11 | Obducat Ab | Method and process for metallic stamp replication for large area nanopatterns |
CN102183875B (zh) * | 2011-05-09 | 2012-10-03 | 苏州光舵微纳科技有限公司 | 滚轮式紫外线软压印方法 |
WO2013161095A1 (ja) * | 2012-04-26 | 2013-10-31 | 東レ株式会社 | 凹凸構造を有する結晶基板の製造方法 |
KR101761010B1 (ko) | 2015-09-14 | 2017-07-25 | 한국과학기술원 | 나노전사 프린팅 방법 및 이를 이용하여 제작되는 sers 기판, sers 바이얼 및 sers 패치 |
US10507604B2 (en) | 2014-10-29 | 2019-12-17 | Korea Advanced Institute Of Science And Technology | Nanotransfer printing method and surface-enhanced raman scattering substrate, surface-enhanced raman scattering vial and surface-enhanced raman scattering patch manufactured using the same |
WO2016068538A1 (ko) * | 2014-10-29 | 2016-05-06 | 한국과학기술원 | 나노전사 프린팅 방법 및 이를 이용하여 제작되는 sers 기판, sers 바이얼 및 sers 패치 |
JP6480803B2 (ja) * | 2015-05-11 | 2019-03-13 | 俊行 阪本 | 型押し成型装置及びその方法 |
JP2019056025A (ja) | 2017-09-19 | 2019-04-11 | 東芝メモリ株式会社 | パターン形成材料及びパターン形成方法 |
US11448958B2 (en) * | 2017-09-21 | 2022-09-20 | Canon Kabushiki Kaisha | System and method for controlling the placement of fluid resist droplets |
JP2019149488A (ja) | 2018-02-27 | 2019-09-05 | 東芝メモリ株式会社 | テンプレート、テンプレートの製造方法および半導体装置の製造方法 |
CN111142329A (zh) * | 2019-12-16 | 2020-05-12 | 合肥元旭创芯半导体科技有限公司 | 一种非破坏性的半导体材料sem监控方法 |
CN112979322B (zh) * | 2021-02-20 | 2023-09-08 | 北京北方华创微电子装备有限公司 | 陶瓷件及其制作方法 |
CN113618090B (zh) * | 2021-08-11 | 2022-06-07 | 吉林大学 | 一种微纳结构辊筒模具加工与压印成形机床及其控制方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB559072A (en) | 1940-08-03 | 1944-02-02 | Budd Edward G Mfg Co | A method of making stamping dies |
DD251847A1 (de) | 1986-07-31 | 1987-11-25 | Zeiss Jena Veb Carl | Verfahren und anordnung zum bildvergleich |
JPS63149116A (ja) * | 1986-12-12 | 1988-06-21 | Dainippon Ink & Chem Inc | 注型成形品の製造方法 |
AU6752496A (en) | 1995-07-28 | 1997-03-05 | Ely Michael Rabani | Pattern formation, replication, fabrication and devices thereby |
JPH09330864A (ja) | 1996-06-10 | 1997-12-22 | Ge Yokogawa Medical Syst Ltd | 複合圧電物質製造方法及び複合圧電物質製造用マスク |
JP2000071257A (ja) * | 1998-09-02 | 2000-03-07 | Kuraray Co Ltd | 成形品の製造方法 |
JP3991471B2 (ja) * | 1998-10-01 | 2007-10-17 | 日本ゼオン株式会社 | 成形体の製造方法 |
DE10009246A1 (de) * | 2000-02-28 | 2001-08-30 | Mitsubishi Polyester Film Gmbh | Weiße, biaxial orientierte und UV-stabilisierte Polyesterfolie mit Cycloolefinocopolymer (COC), Verfahren zu ihrer Herstellung und ihre Verwendung |
JP4192414B2 (ja) * | 2000-09-14 | 2008-12-10 | 凸版印刷株式会社 | レンズシートの製造方法 |
US20030017424A1 (en) | 2001-07-18 | 2003-01-23 | Miri Park | Method and apparatus for fabricating complex grating structures |
US20030071016A1 (en) | 2001-10-11 | 2003-04-17 | Wu-Sheng Shih | Patterned structure reproduction using nonsticking mold |
JP2004039136A (ja) * | 2002-07-04 | 2004-02-05 | Pioneer Electronic Corp | 光学多層記録媒体成形用透明スタンパおよび光学多層記録媒体の製造方法 |
US6887792B2 (en) * | 2002-09-17 | 2005-05-03 | Hewlett-Packard Development Company, L.P. | Embossed mask lithography |
CN100427222C (zh) * | 2003-11-17 | 2008-10-22 | 财团法人工业技术研究院 | 以压印技术制作微电容式超声波换能器的方法 |
-
2005
- 2005-06-10 AT AT05105100T patent/ATE413631T1/de active
- 2005-06-10 ES ES05105100T patent/ES2315797T3/es active Active
- 2005-06-10 DE DE602005010839T patent/DE602005010839D1/de active Active
- 2005-06-10 EP EP05105100A patent/EP1731961B1/en active Active
-
2006
- 2006-06-12 CN CN200610110802.3A patent/CN1916759B/zh active Active
-
2007
- 2007-03-30 HK HK07103468.0A patent/HK1096163A1/xx unknown
- 2007-05-02 HK HK07104676.6A patent/HK1098543A1/xx unknown
-
2013
- 2013-06-05 JP JP2013119172A patent/JP5646692B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP5646692B2 (ja) | 2014-12-24 |
JP2013233807A (ja) | 2013-11-21 |
CN1916759B (zh) | 2011-11-09 |
ES2315797T3 (es) | 2009-04-01 |
EP1731961A1 (en) | 2006-12-13 |
HK1098543A1 (en) | 2007-07-20 |
CN1916759A (zh) | 2007-02-21 |
DE602005010839D1 (de) | 2008-12-18 |
EP1731961B1 (en) | 2008-11-05 |
ATE413631T1 (de) | 2008-11-15 |
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