HK1051223A1 - Satin-finished nickel or nickel alloy coating - Google Patents

Satin-finished nickel or nickel alloy coating

Info

Publication number
HK1051223A1
HK1051223A1 HK03103339A HK03103339A HK1051223A1 HK 1051223 A1 HK1051223 A1 HK 1051223A1 HK 03103339 A HK03103339 A HK 03103339A HK 03103339 A HK03103339 A HK 03103339A HK 1051223 A1 HK1051223 A1 HK 1051223A1
Authority
HK
Hong Kong
Prior art keywords
sub
ion
nickel
satin
finished
Prior art date
Application number
HK03103339A
Other languages
English (en)
Inventor
Klaus-Dieter Schulz
Wolfgang Dahms
Holger Weide
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of HK1051223A1 publication Critical patent/HK1051223A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
HK03103339A 2000-05-19 2003-05-13 Satin-finished nickel or nickel alloy coating HK1051223A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10025552A DE10025552C1 (de) 2000-05-19 2000-05-19 Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
PCT/EP2001/005286 WO2001088227A1 (fr) 2000-05-19 2001-05-09 Revetement en nickel satine ou en alliage de nickel

Publications (1)

Publication Number Publication Date
HK1051223A1 true HK1051223A1 (en) 2003-07-25

Family

ID=7643283

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03103339A HK1051223A1 (en) 2000-05-19 2003-05-13 Satin-finished nickel or nickel alloy coating

Country Status (11)

Country Link
US (1) US6919014B2 (fr)
EP (1) EP1287184B1 (fr)
KR (1) KR100776559B1 (fr)
CN (1) CN1213173C (fr)
AU (1) AU7051601A (fr)
CA (1) CA2407157C (fr)
DE (1) DE10025552C1 (fr)
ES (1) ES2256268T3 (fr)
HK (1) HK1051223A1 (fr)
TW (1) TWI226911B (fr)
WO (1) WO2001088227A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10222962A1 (de) 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge
US20060225605A1 (en) * 2005-04-11 2006-10-12 Kloeckener James R Aqueous coating compositions and process for treating metal plated substrates
EP1969160B1 (fr) * 2006-01-06 2011-04-27 Enthone, Incorporated Électrolyte et procédé de séparation d une couche métallique mate
EP2256484A1 (fr) * 2009-05-25 2010-12-01 ATOTECH Deutschland GmbH Procédé pour déterminer l'effet satin de substrats métallisés
EP2801640A1 (fr) * 2013-05-08 2014-11-12 ATOTECH Deutschland GmbH Bain électrolytique de nickel galvanique ou d'alliage de nickel pour déposer un alliage de nickel ou de nickel mi-lustré
CN104789997A (zh) * 2015-04-27 2015-07-22 南京宁美表面技术有限公司 珍珠镍电镀用添加剂、珍珠镍电镀溶液及电镀方法
CN105350034B (zh) * 2015-11-25 2017-11-17 广东致卓环保科技有限公司 珍珠镍电镀添加剂及其应用
JPWO2018066398A1 (ja) * 2016-10-07 2019-07-25 上村工業株式会社 ニッケルめっき液及びニッケルめっき液の製造方法
EP3456870A1 (fr) * 2017-09-13 2019-03-20 ATOTECH Deutschland GmbH Bain et procédé de remplissage d'une tranchée ou d'un accès d'interconnexion verticale d'une pièce à usiner, de nickel ou d'un alliage de nickel
WO2019215287A1 (fr) 2018-05-09 2019-11-14 Atotech Deutschland Gmbh Réseau de couches comprenant du nickel et son procédé de fabrication
CN109112583B (zh) * 2018-10-29 2019-12-10 清远信和汽车部件有限公司 一种珍珠镍电镀工艺
JP2022528995A (ja) * 2019-04-15 2022-06-16 アトテック ドイチェランド ゲーエムベーハー ウント コ カーゲー 半光沢ニッケル又は半光沢ニッケル合金コーティングを析出するためのガルバニックニッケル又はニッケル合金電気めっき浴
CN111850623A (zh) * 2020-05-08 2020-10-30 德锡化学(山东)有限公司 一种用于获得绒面镍层的电镀液及电镀工艺

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3255096A (en) * 1963-11-01 1966-06-07 Harshaw Chem Corp Electrodeposition of nickel
DE1621085C3 (de) * 1967-05-16 1980-02-14 Henkel Kgaa, 4000 Duesseldorf Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage
US3697391A (en) * 1970-07-17 1972-10-10 M & T Chemicals Inc Electroplating processes and compositions
DE2327881B2 (de) * 1973-06-01 1978-06-22 Langbein-Pfanhauser Werke Ag, 4040 Neuss Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge
JPS56152988A (en) * 1980-04-30 1981-11-26 Nobuyuki Koura Nickel satin finish plating bath of heavy ruggedness
US4526968A (en) * 1981-08-24 1985-07-02 M&T Chemicals Inc. Quaternary aminehydroxypropane sulfobetaines
CS241666B1 (cs) * 1984-05-30 1986-04-17 Jaroslav Dostal Leskutvorná přísada pro elektrolytické vylučování lesklých niklových povlaků o tloušťkách do 10 uin
CS241664B1 (cs) * 1984-05-30 1986-04-17 Jaroslav Dostal Leskutvarná přísada pro elektrolytické vylučování lesklých niklových povlaků o tloušťkách do .25 μΐη
DE3736171A1 (de) * 1987-10-26 1989-05-03 Collardin Gmbh Gerhard Verbessertes verfahren zur abscheidung satinglaenzender nickelniederschlaege
JP3429895B2 (ja) * 1995-03-20 2003-07-28 株式会社大和化成研究所 錫−ビスマス合金電気めっき浴
DE19540011C2 (de) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen
JP3716380B2 (ja) * 1997-06-06 2005-11-16 石原薬品株式会社 スズ及びスズ合金メッキ浴、当該メッキ浴の管理方法及び調製方法

Also Published As

Publication number Publication date
KR20030023626A (ko) 2003-03-19
US6919014B2 (en) 2005-07-19
EP1287184A1 (fr) 2003-03-05
CA2407157A1 (fr) 2001-11-22
KR100776559B1 (ko) 2007-11-15
CN1429283A (zh) 2003-07-09
US20030159940A1 (en) 2003-08-28
AU7051601A (en) 2001-11-26
CA2407157C (fr) 2009-10-20
TWI226911B (en) 2005-01-21
ES2256268T3 (es) 2006-07-16
WO2001088227A1 (fr) 2001-11-22
DE10025552C1 (de) 2001-08-02
CN1213173C (zh) 2005-08-03
EP1287184B1 (fr) 2006-02-01

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20140509