GB784001A - Positive diazotype printing plates - Google Patents
Positive diazotype printing platesInfo
- Publication number
- GB784001A GB784001A GB15451/55A GB1545155A GB784001A GB 784001 A GB784001 A GB 784001A GB 15451/55 A GB15451/55 A GB 15451/55A GB 1545155 A GB1545155 A GB 1545155A GB 784001 A GB784001 A GB 784001A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazo
- cellulose
- copolymer
- exposed
- offset
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US451271A US2772972A (en) | 1954-08-20 | 1954-08-20 | Positive diazotype printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
GB784001A true GB784001A (en) | 1957-10-02 |
Family
ID=23791529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB15451/55A Expired GB784001A (en) | 1954-08-20 | 1955-05-27 | Positive diazotype printing plates |
Country Status (7)
Country | Link |
---|---|
US (1) | US2772972A (de) |
BE (1) | BE540225A (de) |
CH (1) | CH347712A (de) |
DE (1) | DE1108079B (de) |
FR (1) | FR1134857A (de) |
GB (1) | GB784001A (de) |
NL (2) | NL199728A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3634086A (en) * | 1966-05-31 | 1972-01-11 | Howson Algraphy Ltd | Solvent development of light-sensitive diazo layers |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE507657A (de) * | 1950-12-06 | |||
GB907718A (en) * | 1957-11-01 | 1962-10-10 | Lithoplate Inc | Hydrophilic base plates for diazo presensitized lithographic printing plates |
US2993788A (en) * | 1958-06-17 | 1961-07-25 | Gen Aniline & Film Corp | Multicolor reproduction using light sensitive diazo oxides |
US3130051A (en) * | 1958-12-10 | 1964-04-21 | Gen Aniline & Film Corp | Process for producing negative working offset diazo printing plates |
DE1095665B (de) * | 1959-01-12 | 1960-12-22 | Hans Hoerner | Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten |
US3095301A (en) * | 1959-04-06 | 1963-06-25 | Gen Aniline & Film Corp | Electrophotographic element |
US3173788A (en) * | 1960-02-10 | 1965-03-16 | Gen Aniline & Film Corp | Developing positive working photolitho-graphic printing plates containing diazo oxides |
US3164468A (en) * | 1960-06-06 | 1965-01-05 | Gen Aniline & Film Corp | Photomechanical reversal process and foil and dyes for use therein |
US3086861A (en) * | 1960-07-01 | 1963-04-23 | Gen Aniline & Film Corp | Printing plates comprising ink receptive azo dye surfaces |
US3149972A (en) * | 1960-08-16 | 1964-09-22 | Gen Aniline & Film Corp | Diazo and resinous coupler printing plates for photomechanical reproduction |
BE612386A (de) * | 1961-01-09 | |||
NL280959A (de) * | 1961-07-28 | |||
CA774047A (en) * | 1963-12-09 | 1967-12-19 | Shipley Company | Light-sensitive material and process for the development thereof |
US3486450A (en) * | 1964-02-27 | 1969-12-30 | Eastman Kodak Co | Color proofing system |
DE1472771A1 (de) * | 1965-07-30 | 1969-01-02 | Adox Du Pont Fotowerke | Verfahren zur Herstellung von masshaltigen photographischen Filmen |
US3549373A (en) * | 1966-03-19 | 1970-12-22 | Ricoh Kk | Negative-to-positive reversible copy sheet |
US3474719A (en) * | 1966-04-15 | 1969-10-28 | Gaf Corp | Offset printing plates |
NL136645C (de) * | 1966-12-12 | |||
US3637384A (en) * | 1969-02-17 | 1972-01-25 | Gaf Corp | Positive-working diazo-oxide terpolymer photoresists |
US3920455A (en) * | 1971-05-28 | 1975-11-18 | Polychrome Corp | Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters |
JPS521663B2 (de) * | 1973-02-10 | 1977-01-17 | ||
JPS5421089B2 (de) * | 1973-05-29 | 1979-07-27 | ||
GB1482921A (en) * | 1973-07-31 | 1977-08-17 | Glaxo Lab Ltd | Polymers |
WO1979000593A1 (en) * | 1978-02-06 | 1979-08-23 | Napp Systems Inc | Desensitizing solution and process for treating a diazo photosensitive printing plate |
CA1180931A (en) * | 1980-09-15 | 1985-01-15 | Robert W. Hallman | Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer |
EP0288533A4 (de) * | 1986-10-20 | 1989-02-06 | Macdermid Inc | Bildumkehrsystem und -verfahren. |
EP0280197A3 (de) * | 1987-02-23 | 1990-05-23 | Oki Electric Industry Company, Limited | Verfahren zur Herstellung einer Photolackstruktur |
EP0410606B1 (de) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Polysiloxane und positiv arbeitende Resistmasse |
US5308744A (en) * | 1993-03-05 | 1994-05-03 | Morton International, Inc. | Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives |
US5314782A (en) * | 1993-03-05 | 1994-05-24 | Morton International, Inc. | Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative |
JPH0876380A (ja) | 1994-09-06 | 1996-03-22 | Fuji Photo Film Co Ltd | ポジ型印刷版組成物 |
JP3522923B2 (ja) | 1995-10-23 | 2004-04-26 | 富士写真フイルム株式会社 | ハロゲン化銀感光材料 |
DE825927T1 (de) | 1996-04-23 | 1998-07-16 | Horsell, Graphic Industries Ltd., Leeds | Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit |
TW502135B (en) * | 1996-05-13 | 2002-09-11 | Sumitomo Bakelite Co | Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same |
US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
GB9622657D0 (en) | 1996-10-31 | 1997-01-08 | Horsell Graphic Ind Ltd | Direct positive lithographic plate |
DE69706396T2 (de) | 1997-01-03 | 2002-04-18 | Sumitomo Bakelite Co. Ltd., Tokio/Tokyo | Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung |
US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
WO1999001796A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Llc | Pattern-forming methods |
US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
US6045963A (en) * | 1998-03-17 | 2000-04-04 | Kodak Polychrome Graphics Llc | Negative-working dry planographic printing plate |
US6296982B1 (en) | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
WO2002037184A1 (fr) * | 2000-10-31 | 2002-05-10 | Sumitomo Bakelite Company Limited | Composition de resine photosensible positive, son procede de preparation, et dispositifs a semi-conducteur |
US7416822B2 (en) * | 2004-01-20 | 2008-08-26 | Asahi Kasei Emd Corporation | Resin and resin composition |
JP5034269B2 (ja) | 2005-03-31 | 2012-09-26 | 大日本印刷株式会社 | パターン形成材料、及びポリイミド前駆体樹脂組成物 |
CN101495919B (zh) | 2006-08-15 | 2015-05-06 | 旭化成电子材料株式会社 | 正型感光性树脂组合物及制备固化浮凸图案的方法、半导体装置 |
WO2017170600A1 (ja) | 2016-03-31 | 2017-10-05 | 旭化成株式会社 | 感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置 |
CN112142613B (zh) * | 2020-09-22 | 2021-06-25 | 江南大学 | 一种松香基小分子有机凝胶剂及其形成的环己烷凝胶 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE525534C (de) * | 1930-07-09 | 1931-05-26 | Klimsch & Co | Verfahren zum Entwickeln von Chromat-Schellackkopien |
BE416158A (de) * | 1935-01-12 | |||
DE699462C (de) * | 1936-02-15 | 1940-11-29 | Kodak Akt Ges | Photographischer Film mit Haftschicht fuer die lichtempfindliche Emulsion |
DE754015C (de) * | 1940-02-24 | 1953-05-11 | Johannes Dr Albrecht | Lichtempfindliche Schicht zur Herstellung von Druckformen |
DE862956C (de) * | 1941-10-30 | 1953-01-15 | Basf Ag | Verfahren zur Herstellung von Mischpolymerisaten |
NL69492C (de) * | 1947-05-09 | |||
NL70798C (de) * | 1948-10-15 | |||
BE510563A (de) * | 1949-07-23 | |||
DE960335C (de) * | 1951-06-07 | 1957-03-21 | Kalle & Co Ag | Lichtempfindliches Material |
DE904733C (de) * | 1951-09-29 | 1954-02-22 | Johannes Herzog & Co Photochem | Lichtempfindliches Material fuer die Herstellung von Quellreliefs fuer Druckzwecke und Verfahren zum Drucken mit den Reliefs |
BE523231A (de) * | 1953-05-22 |
-
0
- NL NL95407D patent/NL95407C/xx active
- NL NL199728D patent/NL199728A/xx unknown
- BE BE540225D patent/BE540225A/xx unknown
-
1954
- 1954-08-20 US US451271A patent/US2772972A/en not_active Expired - Lifetime
-
1955
- 1955-05-27 GB GB15451/55A patent/GB784001A/en not_active Expired
- 1955-07-20 FR FR1134857D patent/FR1134857A/fr not_active Expired
- 1955-08-04 DE DEG17721A patent/DE1108079B/de active Pending
- 1955-08-17 CH CH347712D patent/CH347712A/de unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3634086A (en) * | 1966-05-31 | 1972-01-11 | Howson Algraphy Ltd | Solvent development of light-sensitive diazo layers |
Also Published As
Publication number | Publication date |
---|---|
DE1108079B (de) | 1961-05-31 |
NL95407C (de) | |
NL199728A (de) | |
US2772972A (en) | 1956-12-04 |
FR1134857A (fr) | 1957-04-18 |
CH347712A (de) | 1960-07-15 |
BE540225A (de) |
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