BE606888A
(de)
*
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1960-08-05 |
1900-01-01 |
|
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US3474719A
(en)
*
|
1966-04-15 |
1969-10-28 |
Gaf Corp |
Offset printing plates
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US3634082A
(en)
*
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1967-07-07 |
1972-01-11 |
Shipley Co |
Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether
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US3837860A
(en)
*
|
1969-06-16 |
1974-09-24 |
L Roos |
PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
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US3647443A
(en)
*
|
1969-09-12 |
1972-03-07 |
Eastman Kodak Co |
Light-sensitive quinone diazide polymers and polymer compositions
|
JPS5343285B2
(de)
*
|
1972-07-26 |
1978-11-18 |
|
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US3930857A
(en)
*
|
1973-05-03 |
1976-01-06 |
International Business Machines Corporation |
Resist process
|
JPS5421089B2
(de)
*
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1973-05-29 |
1979-07-27 |
|
|
DE2331377C2
(de)
*
|
1973-06-20 |
1982-10-14 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches Kopiermaterial
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US4196003A
(en)
*
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1974-02-01 |
1980-04-01 |
Fuji Photo Film Co., Ltd. |
Light-sensitive o-quinone diazide copying composition
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US4007047A
(en)
*
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1974-06-06 |
1977-02-08 |
International Business Machines Corporation |
Modified processing of positive photoresists
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US3961101A
(en)
*
|
1974-09-16 |
1976-06-01 |
Rca Corporation |
Process for improved development of electron-beam-sensitive resist films
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US3961100A
(en)
*
|
1974-09-16 |
1976-06-01 |
Rca Corporation |
Method for developing electron beam sensitive resist films
|
DE2529054C2
(de)
*
|
1975-06-30 |
1982-04-29 |
Ibm Deutschland Gmbh, 7000 Stuttgart |
Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
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DE2547905C2
(de)
*
|
1975-10-25 |
1985-11-21 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches Aufzeichnungsmaterial
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US4102686A
(en)
*
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1977-02-25 |
1978-07-25 |
Polychrome Corporation |
Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin
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JPS585798B2
(ja)
*
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1977-06-30 |
1983-02-01 |
富士写真フイルム株式会社 |
平版印刷版用不感脂化液およびそれを用いる平版印刷版の製造方法
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JPS5635130A
(en)
*
|
1979-08-31 |
1981-04-07 |
Fujitsu Ltd |
Resist material and method for forming resist pattern
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US4508813A
(en)
*
|
1980-06-16 |
1985-04-02 |
Fujitsu Limited |
Method for producing negative resist images
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DE3151078A1
(de)
*
|
1981-12-23 |
1983-07-28 |
Hoechst Ag, 6230 Frankfurt |
Verfahren zur herstellung von reliefbildern
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DE3325022A1
(de)
*
|
1983-07-11 |
1985-01-24 |
Hoechst Ag, 6230 Frankfurt |
Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
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DE3325023A1
(de)
*
|
1983-07-11 |
1985-01-24 |
Hoechst Ag, 6230 Frankfurt |
Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
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GB2171530B
(en)
*
|
1985-02-27 |
1989-06-28 |
Imtec Products Inc |
Method of producing reversed photoresist images by vapour diffusion
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US5256522A
(en)
*
|
1985-08-12 |
1993-10-26 |
Hoechst Celanese Corporation |
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
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US4931381A
(en)
*
|
1985-08-12 |
1990-06-05 |
Hoechst Celanese Corporation |
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
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US5217840A
(en)
*
|
1985-08-12 |
1993-06-08 |
Hoechst Celanese Corporation |
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
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ZA872295B
(de)
*
|
1986-03-13 |
1987-09-22 |
|
|
GB2188448B
(en)
*
|
1986-03-13 |
1989-11-15 |
Horsell Graphic Ind Ltd |
Reversal processing of exposed lithographic printing plates
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EP0288533A4
(de)
*
|
1986-10-20 |
1989-02-06 |
Macdermid Inc |
Bildumkehrsystem und -verfahren.
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DE3771501D1
(de)
*
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1987-03-27 |
1991-08-22 |
Horsell Graphic Ind Ltd |
Behandlungsverfahren fuer belichtete flachdruckplatten.
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JP2598059B2
(ja)
*
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1987-03-27 |
1997-04-09 |
ホーセル グラフィック インダストリーズ リミッティッド |
露光式石版の製造方法
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US4775609A
(en)
*
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1987-05-18 |
1988-10-04 |
Hoescht Celanese Corporation |
Image reversal
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KR900005232A
(ko)
*
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1988-09-29 |
1990-04-13 |
존 에이 페니 |
음화 상 생성방법.
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CA2001852A1
(en)
*
|
1988-11-01 |
1990-05-01 |
Iwao Numakura |
Process and apparatus for the formation of negative resist pattern
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DE3837500A1
(de)
*
|
1988-11-04 |
1990-05-23 |
Hoechst Ag |
Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
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EP0394738A3
(de)
*
|
1989-04-24 |
1991-03-27 |
Siemens Aktiengesellschaft |
Vereinfachtes Mehrlagenphotoresistsystem
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EP0413087A1
(de)
*
|
1989-07-20 |
1991-02-20 |
International Business Machines Corporation |
Lichtempfindliche Zusammensetzung und ihre Verwendung
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US7157213B2
(en)
*
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2004-03-01 |
2007-01-02 |
Think Laboratory Co., Ltd. |
Developer agent for positive type photosensitive compound
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EP1574907A1
(de)
*
|
2004-03-08 |
2005-09-14 |
Think Laboratory Co., Ltd. |
Entwickler für positiv arbeitende, fotoempfindliche Zusammensetzung
|