NL95407C - - Google Patents

Info

Publication number
NL95407C
NL95407C NL95407DA NL95407C NL 95407 C NL95407 C NL 95407C NL 95407D A NL95407D A NL 95407DA NL 95407 C NL95407 C NL 95407C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL95407C publication Critical patent/NL95407C/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
NL95407D 1954-08-20 NL95407C (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
NL95407C true NL95407C (de)

Family

ID=23791529

Family Applications (2)

Application Number Title Priority Date Filing Date
NL95407D NL95407C (de) 1954-08-20
NL199728D NL199728A (de) 1954-08-20

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL199728D NL199728A (de) 1954-08-20

Country Status (7)

Country Link
US (1) US2772972A (de)
BE (1) BE540225A (de)
CH (1) CH347712A (de)
DE (1) DE1108079B (de)
FR (1) FR1134857A (de)
GB (1) GB784001A (de)
NL (2) NL199728A (de)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE507657A (de) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (de) * 1959-01-12 1960-12-22 Hans Hoerner Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (de) * 1961-01-09
NL280959A (de) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (de) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Verfahren zur Herstellung von masshaltigen photographischen Filmen
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
NL136645C (de) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (de) * 1973-02-10 1977-01-17
JPS5421089B2 (de) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
WO1979000593A1 (en) * 1978-02-06 1979-08-23 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
EP0288533A4 (de) * 1986-10-20 1989-02-06 Macdermid Inc Bildumkehrsystem und -verfahren.
EP0280197A3 (de) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Verfahren zur Herstellung einer Photolackstruktur
EP0410606B1 (de) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Polysiloxane und positiv arbeitende Resistmasse
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3522923B2 (ja) 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
DE825927T1 (de) 1996-04-23 1998-07-16 Horsell, Graphic Industries Ltd., Leeds Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit
TW502135B (en) * 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
DE69706396T2 (de) 1997-01-03 2002-04-18 Sumitomo Bakelite Co. Ltd., Tokio/Tokyo Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
WO2002037184A1 (fr) * 2000-10-31 2002-05-10 Sumitomo Bakelite Company Limited Composition de resine photosensible positive, son procede de preparation, et dispositifs a semi-conducteur
US7416822B2 (en) * 2004-01-20 2008-08-26 Asahi Kasei Emd Corporation Resin and resin composition
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
CN101495919B (zh) 2006-08-15 2015-05-06 旭化成电子材料株式会社 正型感光性树脂组合物及制备固化浮凸图案的方法、半导体装置
WO2017170600A1 (ja) 2016-03-31 2017-10-05 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置
CN112142613B (zh) * 2020-09-22 2021-06-25 江南大学 一种松香基小分子有机凝胶剂及其形成的环己烷凝胶

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (de) * 1930-07-09 1931-05-26 Klimsch & Co Verfahren zum Entwickeln von Chromat-Schellackkopien
BE416158A (de) * 1935-01-12
DE699462C (de) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographischer Film mit Haftschicht fuer die lichtempfindliche Emulsion
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
DE862956C (de) * 1941-10-30 1953-01-15 Basf Ag Verfahren zur Herstellung von Mischpolymerisaten
NL69492C (de) * 1947-05-09
NL70798C (de) * 1948-10-15
BE510563A (de) * 1949-07-23
DE960335C (de) * 1951-06-07 1957-03-21 Kalle & Co Ag Lichtempfindliches Material
DE904733C (de) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Lichtempfindliches Material fuer die Herstellung von Quellreliefs fuer Druckzwecke und Verfahren zum Drucken mit den Reliefs
BE523231A (de) * 1953-05-22

Also Published As

Publication number Publication date
DE1108079B (de) 1961-05-31
NL199728A (de)
US2772972A (en) 1956-12-04
GB784001A (en) 1957-10-02
FR1134857A (fr) 1957-04-18
CH347712A (de) 1960-07-15
BE540225A (de)

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