GB2021789A - Monitoring voltage using an electron beam probe - Google Patents

Monitoring voltage using an electron beam probe

Info

Publication number
GB2021789A
GB2021789A GB7918090A GB7918090A GB2021789A GB 2021789 A GB2021789 A GB 2021789A GB 7918090 A GB7918090 A GB 7918090A GB 7918090 A GB7918090 A GB 7918090A GB 2021789 A GB2021789 A GB 2021789A
Authority
GB
United Kingdom
Prior art keywords
secondary electrons
voltage
detected
electronic element
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7918090A
Other versions
GB2021789B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB2021789A publication Critical patent/GB2021789A/en
Application granted granted Critical
Publication of GB2021789B publication Critical patent/GB2021789B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/305—Contactless testing using electron beams

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Tests Of Electronic Circuits (AREA)

Abstract

The secondary electrons released as a result of the primary electron beam from the electronic element (14) whose energy is dependent on the voltage are detected by a spectrometer (16) having at least one control electrode (24, 25). Control means incorporating a variable- gain amplifier (40), a lock-in amplifier (52) and modulation means (50) are associated with the spectrometer (16) and serve to control the voltage of the control electrode(s) (24, 25) in dependence on a value which is proportional to the integral of the energy distribution of the secondary electrons detected, such that, whatever the voltage at the measuring point, substantially only secondary electrons having energies which are not less than the maximum of the energy distribution of the secondary electrons released from the electronic element are detected. Thus deviation of the operating point caused by low energy secondary electrons not being able to escape from the electronic element at positive voltages is compensated for. <IMAGE>
GB7918090A 1978-05-30 1979-05-24 Monitoring voltage using an electron beam probe Expired GB2021789B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782823642 DE2823642A1 (en) 1978-05-30 1978-05-30 METHOD FOR CONTACTLESS POTENTIAL MEASUREMENT ON AN ELECTRONIC COMPONENT

Publications (2)

Publication Number Publication Date
GB2021789A true GB2021789A (en) 1979-12-05
GB2021789B GB2021789B (en) 1982-07-07

Family

ID=6040559

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7918090A Expired GB2021789B (en) 1978-05-30 1979-05-24 Monitoring voltage using an electron beam probe

Country Status (4)

Country Link
JP (1) JPS54157085A (en)
DE (1) DE2823642A1 (en)
GB (1) GB2021789B (en)
NL (1) NL7904226A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2126355A (en) * 1982-08-16 1984-03-21 Hitachi Ltd Potential analyzer
EP0209236A1 (en) * 1985-06-17 1987-01-21 Texas Instruments Incorporated Electron beam testing of integrated circuits
EP0389397A2 (en) * 1989-03-21 1990-09-26 International Business Machines Corporation Apparatus for opens/shorts testing of capacitively coupled networks in substrates using electron beams
EP0505280A2 (en) * 1991-03-19 1992-09-23 Fujitsu Limited A method of measuring a voltage with an electron beam apparatus

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3036660A1 (en) * 1980-09-29 1982-05-19 Siemens AG, 1000 Berlin und 8000 München ARRANGEMENT FOR STROBOSCOPIC POTENTIAL MEASUREMENTS WITH AN ELECTRON BEAM MEASURING DEVICE
US4417203A (en) * 1981-05-26 1983-11-22 International Business Machines Corporation System for contactless electrical property testing of multi-layer ceramics
US4415851A (en) * 1981-05-26 1983-11-15 International Business Machines Corporation System for contactless testing of multi-layer ceramics
DE3138901A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München IMPROVED COUNTERFIELD SPECTROMETER FOR ELECTRON BEAM MEASUREMENT TECHNOLOGY
DE3138990A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Coaxial opposing field spectrometer of high acceptance for secondary electrons and an electron beam test set
DE3138926A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Electron-optical arrangement for high-resolution electron-beam metrology
DE3138927A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Imaging spectrometer for electron-beam metrology and an electron beam measurement apparatus
DE3138929A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München IMPROVED SECONDARY ELECTRON SPECTROMETER FOR POTENTIAL MEASUREMENT ON A SAMPLE WITH AN ELECTRON PROBE
DE3206309A1 (en) * 1982-02-22 1983-09-15 Siemens AG, 1000 Berlin und 8000 München SECONDARY ELECTRON SPECTROMETER AND METHOD FOR ITS OPERATION
DE3232671A1 (en) * 1982-09-02 1984-03-08 Siemens AG, 1000 Berlin und 8000 München ARRANGEMENT AND METHOD FOR MEASURING VOLTAGE ON A CURVED MEASURING OBJECT
DE3235100A1 (en) * 1982-09-22 1984-03-22 Siemens AG, 1000 Berlin und 8000 München METHOD FOR MEASURING ELECTRICAL POTENTIALS AT BURNED SOLID MATERIAL
DE3235484A1 (en) * 1982-09-24 1984-03-29 Siemens AG, 1000 Berlin und 8000 München METHOD FOR SUPPRESSING A MALFUNCTION IN THE MEASUREMENT OF SIGNAL FLOWS WITH A BODY PROBE AND DEVICE FOR PERFORMING SUCH A METHOD
CN111108579B (en) 2017-09-29 2022-10-04 株式会社日立高新技术 Scanning electron microscope

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1246744A (en) * 1969-01-02 1971-09-15 Graham Stuart Plows Electron beam apparatus
GB1277303A (en) * 1969-09-16 1972-06-14 Gen Electric Method and apparatus for testing circuits with an electron beam

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2126355A (en) * 1982-08-16 1984-03-21 Hitachi Ltd Potential analyzer
EP0209236A1 (en) * 1985-06-17 1987-01-21 Texas Instruments Incorporated Electron beam testing of integrated circuits
US4801879A (en) * 1985-06-17 1989-01-31 Texas Instruments Incorporated Electron beam testing of integrated circuits
JP2723215B2 (en) 1985-06-17 1998-03-09 テキサス インスツルメンツ インコ−ポレイテツド Method and apparatus for monitoring the function of an integrated circuit during operation
EP0389397A2 (en) * 1989-03-21 1990-09-26 International Business Machines Corporation Apparatus for opens/shorts testing of capacitively coupled networks in substrates using electron beams
EP0389397A3 (en) * 1989-03-21 1991-08-07 International Business Machines Corporation Apparatus for opens/shorts testing of capacitively coupled networks in substrates using electron beams
EP0678752A1 (en) 1989-03-21 1995-10-25 International Business Machines Corporation Method for opens/shorts testing of capacity coupled networks in substrates using electron beams
EP0505280A2 (en) * 1991-03-19 1992-09-23 Fujitsu Limited A method of measuring a voltage with an electron beam apparatus
EP0505280A3 (en) * 1991-03-19 1993-05-19 Fujitsu Limited A method of measuring a voltage with an electron beam apparatus
US5300880A (en) * 1991-03-19 1994-04-05 Fujitsu Limited Method of measuring a voltage with an electron beam apparatus
US5416426A (en) * 1991-03-19 1995-05-16 Fujitsu Limited Method of measuring a voltage with an electron beam apparatus

Also Published As

Publication number Publication date
JPS54157085A (en) 1979-12-11
GB2021789B (en) 1982-07-07
NL7904226A (en) 1979-12-04
DE2823642A1 (en) 1980-01-03

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee