GB2021789A - Monitoring voltage using an electron beam probe - Google Patents
Monitoring voltage using an electron beam probeInfo
- Publication number
- GB2021789A GB2021789A GB7918090A GB7918090A GB2021789A GB 2021789 A GB2021789 A GB 2021789A GB 7918090 A GB7918090 A GB 7918090A GB 7918090 A GB7918090 A GB 7918090A GB 2021789 A GB2021789 A GB 2021789A
- Authority
- GB
- United Kingdom
- Prior art keywords
- secondary electrons
- voltage
- detected
- electronic element
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/305—Contactless testing using electron beams
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measurement Of Current Or Voltage (AREA)
- Tests Of Electronic Circuits (AREA)
Abstract
The secondary electrons released as a result of the primary electron beam from the electronic element (14) whose energy is dependent on the voltage are detected by a spectrometer (16) having at least one control electrode (24, 25). Control means incorporating a variable- gain amplifier (40), a lock-in amplifier (52) and modulation means (50) are associated with the spectrometer (16) and serve to control the voltage of the control electrode(s) (24, 25) in dependence on a value which is proportional to the integral of the energy distribution of the secondary electrons detected, such that, whatever the voltage at the measuring point, substantially only secondary electrons having energies which are not less than the maximum of the energy distribution of the secondary electrons released from the electronic element are detected. Thus deviation of the operating point caused by low energy secondary electrons not being able to escape from the electronic element at positive voltages is compensated for. <IMAGE>
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19782823642 DE2823642A1 (en) | 1978-05-30 | 1978-05-30 | METHOD FOR CONTACTLESS POTENTIAL MEASUREMENT ON AN ELECTRONIC COMPONENT |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2021789A true GB2021789A (en) | 1979-12-05 |
GB2021789B GB2021789B (en) | 1982-07-07 |
Family
ID=6040559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB7918090A Expired GB2021789B (en) | 1978-05-30 | 1979-05-24 | Monitoring voltage using an electron beam probe |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS54157085A (en) |
DE (1) | DE2823642A1 (en) |
GB (1) | GB2021789B (en) |
NL (1) | NL7904226A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2126355A (en) * | 1982-08-16 | 1984-03-21 | Hitachi Ltd | Potential analyzer |
EP0209236A1 (en) * | 1985-06-17 | 1987-01-21 | Texas Instruments Incorporated | Electron beam testing of integrated circuits |
EP0389397A2 (en) * | 1989-03-21 | 1990-09-26 | International Business Machines Corporation | Apparatus for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
EP0505280A2 (en) * | 1991-03-19 | 1992-09-23 | Fujitsu Limited | A method of measuring a voltage with an electron beam apparatus |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3036660A1 (en) * | 1980-09-29 | 1982-05-19 | Siemens AG, 1000 Berlin und 8000 München | ARRANGEMENT FOR STROBOSCOPIC POTENTIAL MEASUREMENTS WITH AN ELECTRON BEAM MEASURING DEVICE |
US4417203A (en) * | 1981-05-26 | 1983-11-22 | International Business Machines Corporation | System for contactless electrical property testing of multi-layer ceramics |
US4415851A (en) * | 1981-05-26 | 1983-11-15 | International Business Machines Corporation | System for contactless testing of multi-layer ceramics |
DE3138901A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | IMPROVED COUNTERFIELD SPECTROMETER FOR ELECTRON BEAM MEASUREMENT TECHNOLOGY |
DE3138990A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Coaxial opposing field spectrometer of high acceptance for secondary electrons and an electron beam test set |
DE3138926A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Electron-optical arrangement for high-resolution electron-beam metrology |
DE3138927A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Imaging spectrometer for electron-beam metrology and an electron beam measurement apparatus |
DE3138929A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | IMPROVED SECONDARY ELECTRON SPECTROMETER FOR POTENTIAL MEASUREMENT ON A SAMPLE WITH AN ELECTRON PROBE |
DE3206309A1 (en) * | 1982-02-22 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | SECONDARY ELECTRON SPECTROMETER AND METHOD FOR ITS OPERATION |
DE3232671A1 (en) * | 1982-09-02 | 1984-03-08 | Siemens AG, 1000 Berlin und 8000 München | ARRANGEMENT AND METHOD FOR MEASURING VOLTAGE ON A CURVED MEASURING OBJECT |
DE3235100A1 (en) * | 1982-09-22 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR MEASURING ELECTRICAL POTENTIALS AT BURNED SOLID MATERIAL |
DE3235484A1 (en) * | 1982-09-24 | 1984-03-29 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR SUPPRESSING A MALFUNCTION IN THE MEASUREMENT OF SIGNAL FLOWS WITH A BODY PROBE AND DEVICE FOR PERFORMING SUCH A METHOD |
CN111108579B (en) | 2017-09-29 | 2022-10-04 | 株式会社日立高新技术 | Scanning electron microscope |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1246744A (en) * | 1969-01-02 | 1971-09-15 | Graham Stuart Plows | Electron beam apparatus |
GB1277303A (en) * | 1969-09-16 | 1972-06-14 | Gen Electric | Method and apparatus for testing circuits with an electron beam |
-
1978
- 1978-05-30 DE DE19782823642 patent/DE2823642A1/en not_active Withdrawn
-
1979
- 1979-05-24 GB GB7918090A patent/GB2021789B/en not_active Expired
- 1979-05-24 JP JP6456079A patent/JPS54157085A/en active Pending
- 1979-05-29 NL NL7904226A patent/NL7904226A/en not_active Application Discontinuation
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2126355A (en) * | 1982-08-16 | 1984-03-21 | Hitachi Ltd | Potential analyzer |
EP0209236A1 (en) * | 1985-06-17 | 1987-01-21 | Texas Instruments Incorporated | Electron beam testing of integrated circuits |
US4801879A (en) * | 1985-06-17 | 1989-01-31 | Texas Instruments Incorporated | Electron beam testing of integrated circuits |
JP2723215B2 (en) | 1985-06-17 | 1998-03-09 | テキサス インスツルメンツ インコ−ポレイテツド | Method and apparatus for monitoring the function of an integrated circuit during operation |
EP0389397A2 (en) * | 1989-03-21 | 1990-09-26 | International Business Machines Corporation | Apparatus for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
EP0389397A3 (en) * | 1989-03-21 | 1991-08-07 | International Business Machines Corporation | Apparatus for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
EP0678752A1 (en) | 1989-03-21 | 1995-10-25 | International Business Machines Corporation | Method for opens/shorts testing of capacity coupled networks in substrates using electron beams |
EP0505280A2 (en) * | 1991-03-19 | 1992-09-23 | Fujitsu Limited | A method of measuring a voltage with an electron beam apparatus |
EP0505280A3 (en) * | 1991-03-19 | 1993-05-19 | Fujitsu Limited | A method of measuring a voltage with an electron beam apparatus |
US5300880A (en) * | 1991-03-19 | 1994-04-05 | Fujitsu Limited | Method of measuring a voltage with an electron beam apparatus |
US5416426A (en) * | 1991-03-19 | 1995-05-16 | Fujitsu Limited | Method of measuring a voltage with an electron beam apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS54157085A (en) | 1979-12-11 |
GB2021789B (en) | 1982-07-07 |
NL7904226A (en) | 1979-12-04 |
DE2823642A1 (en) | 1980-01-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |