FR3091006B1 - Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites - Google Patents

Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites Download PDF

Info

Publication number
FR3091006B1
FR3091006B1 FR1873500A FR1873500A FR3091006B1 FR 3091006 B1 FR3091006 B1 FR 3091006B1 FR 1873500 A FR1873500 A FR 1873500A FR 1873500 A FR1873500 A FR 1873500A FR 3091006 B1 FR3091006 B1 FR 3091006B1
Authority
FR
France
Prior art keywords
cavities
filling
liquid
group
selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1873500A
Other languages
English (en)
Other versions
FR3091006A1 (fr
Inventor
Emmanuel Ollier
Fabrice Emieux
Frédéric Roux
Ulrich Soupremanien
Sylvia Scaringella
Tiphaine Dupont
Clémence Tallet
Abdelhay Aboulaich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aledia
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Aledia
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Aledia, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR1873500A priority Critical patent/FR3091006B1/fr
Priority to PCT/FR2019/052849 priority patent/WO2020128182A1/fr
Priority to EP19835709.7A priority patent/EP3881362A1/fr
Priority to CN201980088429.1A priority patent/CN113302752A/zh
Priority to KR1020217019037A priority patent/KR20210105902A/ko
Priority to US17/415,444 priority patent/US20220029048A1/en
Publication of FR3091006A1 publication Critical patent/FR3091006A1/fr
Application granted granted Critical
Publication of FR3091006B1 publication Critical patent/FR3091006B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/0004Devices characterised by their operation
    • H01L33/002Devices characterised by their operation having heterojunctions or graded gap
    • H01L33/0025Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/0004Devices characterised by their operation
    • H01L33/0041Devices characterised by their operation characterised by field-effect operation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H01L33/06Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/08Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/16Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
    • H01L33/18Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • H01L33/42Transparent materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/505Wavelength conversion elements characterised by the shape, e.g. plate or foil
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0041Processes relating to semiconductor body packages relating to wavelength conversion elements

Abstract

L’invention concerne un procédé de remplissage sélectif, par un liquide de remplissage (15), d’une première cavité (11), parmi des cavités (10) débouchant chacune au niveau d’une face avant (21), d’un substrat, chacune des cavités, le procédé comprenant les étapes :a) une étape de traitement destinée à modifier l’énergie de surface de la première surface interne (121) de la première cavité (11) ou l’énergie de surface des secondes surfaces internes (122), des autres cavités, de sorte que la première surface (121) présente une première énergie de surface et les secondes surfaces une seconde énergie de surface ;b) une étape comprenant une séquence d’étalement du liquide de remplissage (15) ;la première et la seconde énergie étant ajustées de sorte que la première et les secondes surfaces exercent sur ledit liquide (15), respectivement, un effet attractif et un effet répulsif. Figure pour l’abrégé : figure 2d.
FR1873500A 2018-12-20 2018-12-20 Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites Active FR3091006B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1873500A FR3091006B1 (fr) 2018-12-20 2018-12-20 Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites
PCT/FR2019/052849 WO2020128182A1 (fr) 2018-12-20 2019-11-29 Procede de remplissage selectif, par un liquide de remplissage, d'un groupe de cavites parmi une pluralite de cavites
EP19835709.7A EP3881362A1 (fr) 2018-12-20 2019-11-29 Procede de remplissage selectif, par un liquide de remplissage, d'un groupe de cavites parmi une pluralite de cavites
CN201980088429.1A CN113302752A (zh) 2018-12-20 2019-11-29 利用填充液体从多个腔中选择性地填充一组腔的方法
KR1020217019037A KR20210105902A (ko) 2018-12-20 2019-11-29 복수의 공동들 중 일 군의 공동들을 충전 액체로 선택적으로 충전하기 위한 방법
US17/415,444 US20220029048A1 (en) 2018-12-20 2019-11-29 Method for selectively filling, with a filling liquid, a group of cavities from among a plurality of cavities

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1873500A FR3091006B1 (fr) 2018-12-20 2018-12-20 Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites

Publications (2)

Publication Number Publication Date
FR3091006A1 FR3091006A1 (fr) 2020-06-26
FR3091006B1 true FR3091006B1 (fr) 2021-01-15

Family

ID=66542417

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1873500A Active FR3091006B1 (fr) 2018-12-20 2018-12-20 Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites

Country Status (6)

Country Link
US (1) US20220029048A1 (fr)
EP (1) EP3881362A1 (fr)
KR (1) KR20210105902A (fr)
CN (1) CN113302752A (fr)
FR (1) FR3091006B1 (fr)
WO (1) WO2020128182A1 (fr)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2430547A (en) * 2005-09-20 2007-03-28 Seiko Epson Corp A method of producing a substrate having areas of different hydrophilicity and/or oleophilicity on the same surface
KR100904588B1 (ko) * 2007-07-05 2009-06-25 삼성전자주식회사 코어/쉘 형태의 나노와이어를 제조하는 방법, 그에 의해제조된 나노와이어 및 이를 포함하는 나노와이어 소자
KR101077424B1 (ko) * 2010-07-23 2011-10-26 삼성전기주식회사 터치패널 및 그 제조방법
CN103562754B (zh) * 2011-05-31 2015-08-19 夏普株式会社 彩色滤光片基板的制造方法、显示装置的制造方法、彩色滤光片基板以及显示装置
KR101335921B1 (ko) * 2011-10-06 2013-12-03 삼성전자주식회사 발광 다이오드 패키지 및 그의 제조방법
KR101957701B1 (ko) * 2012-11-14 2019-03-14 삼성전자주식회사 발광소자 패키지 및 그 제조방법
FR3012676A1 (fr) 2013-10-25 2015-05-01 Commissariat Energie Atomique Diode electroluminescente a puits quantiques separes par des couches barrieres d'ingan a compositions d'indium variables
KR102360957B1 (ko) * 2015-03-27 2022-02-11 삼성디스플레이 주식회사 발광 다이오드 패키지
CN104932136B (zh) * 2015-07-01 2018-01-26 合肥鑫晟光电科技有限公司 彩膜基板及其制作方法、显示面板和显示装置
CN105204104B (zh) * 2015-10-30 2018-05-25 京东方科技集团股份有限公司 滤光片及其制作方法、显示基板及显示装置
FR3046021B1 (fr) 2015-12-17 2017-12-22 Commissariat Energie Atomique Dispositif composite d'absorption thermique et methode d'obtention
FR3053530B1 (fr) * 2016-06-30 2018-07-27 Aledia Dispositif optoelectronique a pixels a contraste et luminance ameliores
KR102291493B1 (ko) * 2016-08-11 2021-08-20 삼성디스플레이 주식회사 컬러 필터 및 이를 포함하는 표시 장치
US20180341055A1 (en) * 2017-05-23 2018-11-29 Intematix Corporation Color Liquid Crystal Displays and Display Backlights
JP2019023579A (ja) * 2017-07-24 2019-02-14 コニカミノルタ株式会社 シンチレータ

Also Published As

Publication number Publication date
WO2020128182A1 (fr) 2020-06-25
EP3881362A1 (fr) 2021-09-22
US20220029048A1 (en) 2022-01-27
FR3091006A1 (fr) 2020-06-26
KR20210105902A (ko) 2021-08-27
CN113302752A (zh) 2021-08-24

Similar Documents

Publication Publication Date Title
US20180247424A1 (en) Single-Frequency Time-of-Flight Depth Computation using Stereoscopic Disambiguation
WO2017112396A8 (fr) Système et procédé pour produire un assemblage de tranches 3d ayant des puces réputées bonnes
WO2018183972A3 (fr) Systèmes et procédés d'utilisation de données liées au comportement des impuretés et des protéines cibles pour concevoir des processus en aval
EP3154078A3 (fr) Structure de boîtier sur tranche de sortance
CN109478765B8 (zh) 激光刻面的钝化及用于执行激光刻面的钝化的***
EP3614267A3 (fr) Traitement de flux récupérable
FR3091006B1 (fr) Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites
Binnie et al. Experiments on the flow of water from a reservoir through an open horizontal channel II. The formation of hydraulic jumps
FR3050161B1 (fr) Dispositif de suivi de trajectoire d’un vehicule
CN101885222A (zh) 射出成型装置
MX2023002849A (es) Envase de plastico y metodo para determinar una propiedad de un envase de plastico.
FR3046682B1 (fr) Procede de fabrication d'un ecran muni de microstructures retroreflechissantes
Grassberger Morphological transitions in supercritical generalized percolation and moving interfaces in media with frozen randomness
FR3014961A1 (fr) Procede de commande pour minimiser la consommation d'energie electrique d'un equipement de pompage
FR3056014B1 (fr) Procede pour creer une isolation optique entre des pixels d'une matrice de sources lumineuses semi-conductrices
FR3104747B1 (fr) Procédé de codage d’un hologramme numérique, procédé de codage d’un groupe d’hologrammes numériques et dispositif de codage associé
FR3121236B1 (fr) Guide optique et procede de fabrication correspondant
FR3028882B1 (fr) Procede de realisation d'un revetement abradable multicouches avec structure tubulaire integree, et revetement abradable obtenu par un tel procede
Voloshin et al. Long-time correlations in the diffusive motion of liquid argon atoms
FR3094250B1 (fr) Procédé de fabrication additive d’une pièce d’équipement
FR3105569B1 (fr) Procédé de collage de puces à un substrat par collage direct
FR3097786B1 (fr) Procede de percage d'une aube de turbomachine en fonction de la geometrie interne de l'aube et aube associee
FR3102756B1 (fr) Recherche interactive de pannes dans un aéronef
EP4328386A3 (fr) Structure flottante et procédé d'assemblage d'une telle structure
CA3066636C (fr) Production d'interactions electrodynamiques quantiques (qed) a l'aide d'un miroir de transmission parabolique

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20200626

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6