FR3091006B1 - Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites - Google Patents
Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites Download PDFInfo
- Publication number
- FR3091006B1 FR3091006B1 FR1873500A FR1873500A FR3091006B1 FR 3091006 B1 FR3091006 B1 FR 3091006B1 FR 1873500 A FR1873500 A FR 1873500A FR 1873500 A FR1873500 A FR 1873500A FR 3091006 B1 FR3091006 B1 FR 3091006B1
- Authority
- FR
- France
- Prior art keywords
- cavities
- filling
- liquid
- group
- selective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000007788 liquid Substances 0.000 title abstract 4
- 238000005429 filling process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/002—Devices characterised by their operation having heterojunctions or graded gap
- H01L33/0025—Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/0041—Devices characterised by their operation characterised by field-effect operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/08—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
- H01L33/18—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/505—Wavelength conversion elements characterised by the shape, e.g. plate or foil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
Abstract
L’invention concerne un procédé de remplissage sélectif, par un liquide de remplissage (15), d’une première cavité (11), parmi des cavités (10) débouchant chacune au niveau d’une face avant (21), d’un substrat, chacune des cavités, le procédé comprenant les étapes :a) une étape de traitement destinée à modifier l’énergie de surface de la première surface interne (121) de la première cavité (11) ou l’énergie de surface des secondes surfaces internes (122), des autres cavités, de sorte que la première surface (121) présente une première énergie de surface et les secondes surfaces une seconde énergie de surface ;b) une étape comprenant une séquence d’étalement du liquide de remplissage (15) ;la première et la seconde énergie étant ajustées de sorte que la première et les secondes surfaces exercent sur ledit liquide (15), respectivement, un effet attractif et un effet répulsif. Figure pour l’abrégé : figure 2d.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1873500A FR3091006B1 (fr) | 2018-12-20 | 2018-12-20 | Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites |
PCT/FR2019/052849 WO2020128182A1 (fr) | 2018-12-20 | 2019-11-29 | Procede de remplissage selectif, par un liquide de remplissage, d'un groupe de cavites parmi une pluralite de cavites |
EP19835709.7A EP3881362A1 (fr) | 2018-12-20 | 2019-11-29 | Procede de remplissage selectif, par un liquide de remplissage, d'un groupe de cavites parmi une pluralite de cavites |
CN201980088429.1A CN113302752A (zh) | 2018-12-20 | 2019-11-29 | 利用填充液体从多个腔中选择性地填充一组腔的方法 |
KR1020217019037A KR20210105902A (ko) | 2018-12-20 | 2019-11-29 | 복수의 공동들 중 일 군의 공동들을 충전 액체로 선택적으로 충전하기 위한 방법 |
US17/415,444 US20220029048A1 (en) | 2018-12-20 | 2019-11-29 | Method for selectively filling, with a filling liquid, a group of cavities from among a plurality of cavities |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1873500A FR3091006B1 (fr) | 2018-12-20 | 2018-12-20 | Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3091006A1 FR3091006A1 (fr) | 2020-06-26 |
FR3091006B1 true FR3091006B1 (fr) | 2021-01-15 |
Family
ID=66542417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1873500A Active FR3091006B1 (fr) | 2018-12-20 | 2018-12-20 | Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites |
Country Status (6)
Country | Link |
---|---|
US (1) | US20220029048A1 (fr) |
EP (1) | EP3881362A1 (fr) |
KR (1) | KR20210105902A (fr) |
CN (1) | CN113302752A (fr) |
FR (1) | FR3091006B1 (fr) |
WO (1) | WO2020128182A1 (fr) |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2430547A (en) * | 2005-09-20 | 2007-03-28 | Seiko Epson Corp | A method of producing a substrate having areas of different hydrophilicity and/or oleophilicity on the same surface |
KR100904588B1 (ko) * | 2007-07-05 | 2009-06-25 | 삼성전자주식회사 | 코어/쉘 형태의 나노와이어를 제조하는 방법, 그에 의해제조된 나노와이어 및 이를 포함하는 나노와이어 소자 |
KR101077424B1 (ko) * | 2010-07-23 | 2011-10-26 | 삼성전기주식회사 | 터치패널 및 그 제조방법 |
CN103562754B (zh) * | 2011-05-31 | 2015-08-19 | 夏普株式会社 | 彩色滤光片基板的制造方法、显示装置的制造方法、彩色滤光片基板以及显示装置 |
KR101335921B1 (ko) * | 2011-10-06 | 2013-12-03 | 삼성전자주식회사 | 발광 다이오드 패키지 및 그의 제조방법 |
KR101957701B1 (ko) * | 2012-11-14 | 2019-03-14 | 삼성전자주식회사 | 발광소자 패키지 및 그 제조방법 |
FR3012676A1 (fr) | 2013-10-25 | 2015-05-01 | Commissariat Energie Atomique | Diode electroluminescente a puits quantiques separes par des couches barrieres d'ingan a compositions d'indium variables |
KR102360957B1 (ko) * | 2015-03-27 | 2022-02-11 | 삼성디스플레이 주식회사 | 발광 다이오드 패키지 |
CN104932136B (zh) * | 2015-07-01 | 2018-01-26 | 合肥鑫晟光电科技有限公司 | 彩膜基板及其制作方法、显示面板和显示装置 |
CN105204104B (zh) * | 2015-10-30 | 2018-05-25 | 京东方科技集团股份有限公司 | 滤光片及其制作方法、显示基板及显示装置 |
FR3046021B1 (fr) | 2015-12-17 | 2017-12-22 | Commissariat Energie Atomique | Dispositif composite d'absorption thermique et methode d'obtention |
FR3053530B1 (fr) * | 2016-06-30 | 2018-07-27 | Aledia | Dispositif optoelectronique a pixels a contraste et luminance ameliores |
KR102291493B1 (ko) * | 2016-08-11 | 2021-08-20 | 삼성디스플레이 주식회사 | 컬러 필터 및 이를 포함하는 표시 장치 |
US20180341055A1 (en) * | 2017-05-23 | 2018-11-29 | Intematix Corporation | Color Liquid Crystal Displays and Display Backlights |
JP2019023579A (ja) * | 2017-07-24 | 2019-02-14 | コニカミノルタ株式会社 | シンチレータ |
-
2018
- 2018-12-20 FR FR1873500A patent/FR3091006B1/fr active Active
-
2019
- 2019-11-29 CN CN201980088429.1A patent/CN113302752A/zh active Pending
- 2019-11-29 KR KR1020217019037A patent/KR20210105902A/ko unknown
- 2019-11-29 US US17/415,444 patent/US20220029048A1/en active Pending
- 2019-11-29 EP EP19835709.7A patent/EP3881362A1/fr active Pending
- 2019-11-29 WO PCT/FR2019/052849 patent/WO2020128182A1/fr unknown
Also Published As
Publication number | Publication date |
---|---|
WO2020128182A1 (fr) | 2020-06-25 |
EP3881362A1 (fr) | 2021-09-22 |
US20220029048A1 (en) | 2022-01-27 |
FR3091006A1 (fr) | 2020-06-26 |
KR20210105902A (ko) | 2021-08-27 |
CN113302752A (zh) | 2021-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20180247424A1 (en) | Single-Frequency Time-of-Flight Depth Computation using Stereoscopic Disambiguation | |
WO2017112396A8 (fr) | Système et procédé pour produire un assemblage de tranches 3d ayant des puces réputées bonnes | |
WO2018183972A3 (fr) | Systèmes et procédés d'utilisation de données liées au comportement des impuretés et des protéines cibles pour concevoir des processus en aval | |
EP3154078A3 (fr) | Structure de boîtier sur tranche de sortance | |
CN109478765B8 (zh) | 激光刻面的钝化及用于执行激光刻面的钝化的*** | |
EP3614267A3 (fr) | Traitement de flux récupérable | |
FR3091006B1 (fr) | Procede de remplissage selectif, par un liquide de remplissage, d’un groupe de cavites parmi une pluralite de cavites | |
Binnie et al. | Experiments on the flow of water from a reservoir through an open horizontal channel II. The formation of hydraulic jumps | |
FR3050161B1 (fr) | Dispositif de suivi de trajectoire d’un vehicule | |
CN101885222A (zh) | 射出成型装置 | |
MX2023002849A (es) | Envase de plastico y metodo para determinar una propiedad de un envase de plastico. | |
FR3046682B1 (fr) | Procede de fabrication d'un ecran muni de microstructures retroreflechissantes | |
Grassberger | Morphological transitions in supercritical generalized percolation and moving interfaces in media with frozen randomness | |
FR3014961A1 (fr) | Procede de commande pour minimiser la consommation d'energie electrique d'un equipement de pompage | |
FR3056014B1 (fr) | Procede pour creer une isolation optique entre des pixels d'une matrice de sources lumineuses semi-conductrices | |
FR3104747B1 (fr) | Procédé de codage d’un hologramme numérique, procédé de codage d’un groupe d’hologrammes numériques et dispositif de codage associé | |
FR3121236B1 (fr) | Guide optique et procede de fabrication correspondant | |
FR3028882B1 (fr) | Procede de realisation d'un revetement abradable multicouches avec structure tubulaire integree, et revetement abradable obtenu par un tel procede | |
Voloshin et al. | Long-time correlations in the diffusive motion of liquid argon atoms | |
FR3094250B1 (fr) | Procédé de fabrication additive d’une pièce d’équipement | |
FR3105569B1 (fr) | Procédé de collage de puces à un substrat par collage direct | |
FR3097786B1 (fr) | Procede de percage d'une aube de turbomachine en fonction de la geometrie interne de l'aube et aube associee | |
FR3102756B1 (fr) | Recherche interactive de pannes dans un aéronef | |
EP4328386A3 (fr) | Structure flottante et procédé d'assemblage d'une telle structure | |
CA3066636C (fr) | Production d'interactions electrodynamiques quantiques (qed) a l'aide d'un miroir de transmission parabolique |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 2 |
|
PLSC | Publication of the preliminary search report |
Effective date: 20200626 |
|
PLFP | Fee payment |
Year of fee payment: 3 |
|
PLFP | Fee payment |
Year of fee payment: 4 |
|
PLFP | Fee payment |
Year of fee payment: 5 |
|
PLFP | Fee payment |
Year of fee payment: 6 |