FR2593346B1 - Substrat de cablage utilisant une ceramique comme isolant - Google Patents

Substrat de cablage utilisant une ceramique comme isolant

Info

Publication number
FR2593346B1
FR2593346B1 FR878700396A FR8700396A FR2593346B1 FR 2593346 B1 FR2593346 B1 FR 2593346B1 FR 878700396 A FR878700396 A FR 878700396A FR 8700396 A FR8700396 A FR 8700396A FR 2593346 B1 FR2593346 B1 FR 2593346B1
Authority
FR
France
Prior art keywords
ceramic
insulation
wiring substrate
wiring
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR878700396A
Other languages
English (en)
Other versions
FR2593346A1 (fr
Inventor
Jun Inasaka
Shin-Ichi Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61006358A external-priority patent/JPS62165350A/ja
Priority claimed from JP2593486A external-priority patent/JPS62185351A/ja
Application filed by NEC Corp filed Critical NEC Corp
Publication of FR2593346A1 publication Critical patent/FR2593346A1/fr
Application granted granted Critical
Publication of FR2593346B1 publication Critical patent/FR2593346B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4664Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
    • H05K3/4667Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders characterized by using an inorganic intermediate insulating layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49883Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials the conductive materials containing organic materials or pastes, e.g. for thick films
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5383Multilayer substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Conductive Materials (AREA)
FR878700396A 1986-01-17 1987-01-15 Substrat de cablage utilisant une ceramique comme isolant Expired - Fee Related FR2593346B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61006358A JPS62165350A (ja) 1986-01-17 1986-01-17 多層配線基板
JP2593486A JPS62185351A (ja) 1986-02-10 1986-02-10 多層配線基板

Publications (2)

Publication Number Publication Date
FR2593346A1 FR2593346A1 (fr) 1987-07-24
FR2593346B1 true FR2593346B1 (fr) 1990-05-25

Family

ID=26340472

Family Applications (1)

Application Number Title Priority Date Filing Date
FR878700396A Expired - Fee Related FR2593346B1 (fr) 1986-01-17 1987-01-15 Substrat de cablage utilisant une ceramique comme isolant

Country Status (2)

Country Link
US (1) US4827083A (fr)
FR (1) FR2593346B1 (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4967314A (en) * 1988-03-28 1990-10-30 Prime Computer Inc. Circuit board construction
US5117069A (en) * 1988-03-28 1992-05-26 Prime Computer, Inc. Circuit board fabrication
FR2640457B1 (fr) * 1988-12-09 1991-01-25 Thomson Csf Dispositif de raccordement de composants et module fonctionnel l'utilisant
FI113937B (fi) * 1989-02-21 2004-06-30 Tatsuta Electric Wire & Gable Painettu piirilevy ja menetelmä sen valmistamiseksi
JPH0797705B2 (ja) * 1989-07-17 1995-10-18 日本電気株式会社 多層セラミツク基板
CA2059020C (fr) * 1991-01-09 1998-08-18 Kohji Kimbara Tableau de connexions multicouche en polyimide et methode de production
JP3063549B2 (ja) * 1994-11-25 2000-07-12 株式会社村田製作所 導電性ペースト
US5951918A (en) * 1995-02-08 1999-09-14 Hitachi Chemical Company, Ltd. Composite electroconductive powder, electroconductive paste, process for producing electroconductive paste, electric circuit and process for producing electric circuit
JP3019138B2 (ja) * 1995-03-30 2000-03-13 株式会社住友金属エレクトロデバイス 銀系導電性ペースト及びそれを用いた多層セラミック回路基板
US5744285A (en) * 1996-07-18 1998-04-28 E. I. Du Pont De Nemours And Company Composition and process for filling vias
US6117367A (en) * 1998-02-09 2000-09-12 International Business Machines Corporation Pastes for improved substrate dimensional control
US6586682B2 (en) * 2000-02-23 2003-07-01 Kulicke & Soffa Holdings, Inc. Printed wiring board with controlled line impedance
JP4134878B2 (ja) * 2003-10-22 2008-08-20 株式会社デンソー 導体組成物および導体組成物を用いた実装基板ならびに実装構造
US8372734B2 (en) * 2004-02-19 2013-02-12 Nanosolar, Inc High-throughput printing of semiconductor precursor layer from chalcogenide nanoflake particles
US8623448B2 (en) * 2004-02-19 2014-01-07 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from chalcogenide microflake particles
US8329501B1 (en) 2004-02-19 2012-12-11 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic microflake particles
US20070163383A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of nanostructured semiconductor precursor layer
CN100578685C (zh) * 2005-05-30 2010-01-06 住友电气工业株式会社 导电性糊剂和使用它的多层印刷布线板
TWI481326B (zh) * 2011-11-24 2015-04-11 Showa Denko Kk A conductive pattern forming method, and a conductive pattern forming composition by light irradiation or microwave heating
US20140287158A1 (en) * 2013-03-21 2014-09-25 Intrinsiq Materials, Inc. Performance of conductive copper paste using copper flake
KR101935272B1 (ko) * 2013-10-31 2019-01-04 쇼와 덴코 가부시키가이샤 박막 인쇄용 도전성 조성물 및 박막 도전 패턴 형성 방법
CN106661360A (zh) * 2014-05-30 2017-05-10 电子墨水书写公司 用于滚珠笔的导电墨水和衬底上形成的导电迹线
JP2019060817A (ja) * 2017-09-28 2019-04-18 日本特殊陶業株式会社 電子部品検査装置用配線基板

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3030237A (en) * 1959-09-15 1962-04-17 North American Aviation Inc Conductive coating
US4098945A (en) * 1973-07-30 1978-07-04 Minnesota Mining And Manufacturing Company Soft conductive materials
US4001146A (en) * 1975-02-26 1977-01-04 E. I. Du Pont De Nemours And Company Novel silver compositions
US4419279A (en) * 1980-09-15 1983-12-06 Potters Industries, Inc. Conductive paste, electroconductive body and fabrication of same
GB2133623A (en) * 1982-12-20 1984-07-25 Engelhard Ind Ltd Ceramic multilayer electrical capacitors
US4663189A (en) * 1982-12-20 1987-05-05 Engelhard Corporation Ceramic multilayer electrical capacitors
JPS59146103A (ja) * 1983-02-09 1984-08-21 昭和電工株式会社 ドツテイングペ−スト
JPS60208886A (ja) * 1984-03-31 1985-10-21 株式会社東芝 電子部品の製造方法
US4581158A (en) * 1984-09-26 1986-04-08 W. R. Grace & Co. Conductive thermosetting compositions and process for using same

Also Published As

Publication number Publication date
FR2593346A1 (fr) 1987-07-24
US4827083A (en) 1989-05-02

Similar Documents

Publication Publication Date Title
FR2593346B1 (fr) Substrat de cablage utilisant une ceramique comme isolant
DE69730388D1 (de) Metall-Keramik-Substrate von hoher Zuverlässigkeit für Halbleiter
DE3778261D1 (de) Substrat mit mehrschichtiger verdrahtung.
BR8705325A (pt) Painel de isolamento
DE69632628D1 (de) Pulsoximetrie einer isolierten schicht
GB8725867D0 (en) Circuit substrate
DE3778293D1 (de) Glaskeramikmassen zur verwendung als dielektrische substrate.
FI872720A (fi) Neutrala metallendopeptidas-inhibitorer i skoetsel av hypertension.
DE3766196D1 (de) Wasserverduennbare beschichtungszusammensetzungen.
DE68917377T2 (de) Wasserabstossende Zusammensetzung für poröse Substrate.
DE3675565D1 (de) Substratstruktur fuer halbleiteranordnung.
DK215387D0 (da) Keramisk chromoxid belaegning
DE69122958T2 (de) Direktes verbinden von kupfer auf aluminiumnitridsubstrate
DK3787D0 (da) Fremgangsmaade til dimerisering af lavere a-olefiner
NO863334L (no) Fosfatfattig eller fosfatfri toeyvaskemiddelblanding.
DE3750153D1 (de) Beschichtungszusammensetzungen.
EP0233085A3 (en) Ceramic wiring substrate
DE69008953T2 (de) Schwärzbares Substrat.
FR2638893B1 (fr) Substrat electriquement isolant
DE3788432D1 (de) Glaskeramische dielektrische Zusammensetzungen.
BR8701763A (pt) Composicao de revestimento;e substrato
DE3789748T2 (de) Schaltung zur Bildung von Helligkeitssignalen.
DE3784192D1 (de) Schaltungssubstrat.
ATE66058T1 (de) Ueberzugsmittelzusammensetzungen.
FR2582181B1 (fr) Four de cuisson de substrat de circuit imprime

Legal Events

Date Code Title Description
ST Notification of lapse