FR2414796A1 - Dispositif semi-conducteur mis a heterojonction - Google Patents

Dispositif semi-conducteur mis a heterojonction

Info

Publication number
FR2414796A1
FR2414796A1 FR7900796A FR7900796A FR2414796A1 FR 2414796 A1 FR2414796 A1 FR 2414796A1 FR 7900796 A FR7900796 A FR 7900796A FR 7900796 A FR7900796 A FR 7900796A FR 2414796 A1 FR2414796 A1 FR 2414796A1
Authority
FR
France
Prior art keywords
layer
semiconductor
semiconductor device
insulator
heterojunction semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR7900796A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2414796A1 publication Critical patent/FR2414796A1/fr
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/432—Heterojunction gate for field effect devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/207—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds further characterised by the doping material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47—Schottky barrier electrodes
    • H01L29/475—Schottky barrier electrodes on AIII-BV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/495—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo
    • H01L29/4958—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo with a multiple layer structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/802—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with heterojunction gate, e.g. transistors with semiconductor layer acting as gate insulating layer, MIS-like transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/914—Doping
    • Y10S438/917—Deep level dopants, e.g. gold, chromium, iron or nickel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Film Transistor (AREA)

Abstract

L'invention concerne les dispositifs semi-conducteurs. Dans une structure métal-isolant-semi-conducteur 10, la couche d'isolant est constituée par une couche monocristalline semi-isolante 14, qui forme une hétérojonction à réseaux pratiquement appariés, 16, avec la couche de semi-conducteur sous-jacente 18-3. La couche 14 peut être une couche de AlGaAs dopée avec une impureté de niveau profond, tandis que le semi-conducteur peut être en GaAs. Application aux transistors à effet de champ.
FR7900796A 1978-01-13 1979-01-12 Dispositif semi-conducteur mis a heterojonction Pending FR2414796A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/869,369 US4160261A (en) 1978-01-13 1978-01-13 Mis heterojunction structures

Publications (1)

Publication Number Publication Date
FR2414796A1 true FR2414796A1 (fr) 1979-08-10

Family

ID=25353428

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7900796A Pending FR2414796A1 (fr) 1978-01-13 1979-01-12 Dispositif semi-conducteur mis a heterojonction

Country Status (10)

Country Link
US (1) US4160261A (fr)
JP (1) JPS54129886A (fr)
BE (1) BE873428A (fr)
CA (1) CA1125922A (fr)
DE (1) DE2901094A1 (fr)
FR (1) FR2414796A1 (fr)
GB (1) GB2013028B (fr)
IT (1) IT1111954B (fr)
NL (1) NL7900274A (fr)
SE (1) SE7900083L (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4291327A (en) * 1978-08-28 1981-09-22 Bell Telephone Laboratories, Incorporated MOS Devices
US4297783A (en) * 1979-01-30 1981-11-03 Bell Telephone Laboratories, Incorporated Method of fabricating GaAs devices utilizing a semi-insulating layer of AlGaAs in combination with an overlying masking layer
US4231050A (en) * 1979-01-30 1980-10-28 Bell Telephone Laboratories, Incorporated Reduction of surface recombination current in GaAs devices
FR2465317A2 (fr) * 1979-03-28 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
FR2469002A1 (fr) * 1979-10-26 1981-05-08 Thomson Csf Dispositif semiconducteur a effet de champ pour hautes frequences et transistor et dispositif a transfert de charges utilisant un tel semiconducteur
FR2489045A1 (fr) * 1980-08-20 1982-02-26 Thomson Csf Transistor a effet de champ gaas a memoire non volatile
FR2492167A1 (fr) * 1980-10-14 1982-04-16 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
GB2089119A (en) * 1980-12-10 1982-06-16 Philips Electronic Associated High voltage semiconductor devices
FR2497603A1 (fr) * 1981-01-06 1982-07-09 Thomson Csf Transistor a faible temps de commutation, de type normalement bloquant
US4605912A (en) * 1981-12-03 1986-08-12 General Electric Company Continuously variable phase shifting element comprised of interdigitated electrode MESFET
US4468851A (en) * 1981-12-14 1984-09-04 The United States Of America As Represented By The Secretary Of The Navy Process for making a heterojunction source-drain insulated gate field-effect transistors utilizing diffusion to form the lattice
US4482906A (en) * 1982-06-30 1984-11-13 International Business Machines Corporation Gallium aluminum arsenide integrated circuit structure using germanium
US4532695A (en) * 1982-07-02 1985-08-06 The United States Of America As Represented By The Secretary Of The Air Force Method of making self-aligned IGFET
US4672423A (en) * 1982-09-30 1987-06-09 International Business Machines Corporation Voltage controlled resonant transmission semiconductor device
GB2133928B (en) * 1982-12-04 1986-07-30 Plessey Co Plc Coatings for semiconductor devices
JPS59127839A (ja) * 1983-01-11 1984-07-23 Nec Corp ３―５族化合物半導体表面の不活性化法
US4578126A (en) * 1983-06-22 1986-03-25 Trw Inc. Liquid phase epitaxial growth process
US4568958A (en) * 1984-01-03 1986-02-04 General Electric Company Inversion-mode insulated-gate gallium arsenide field-effect transistors
GB2163002B (en) * 1984-08-08 1989-01-05 Japan Res Dev Corp Tunnel injection static induction transistor and its integrated circuit
JPS61100968A (ja) * 1984-10-22 1986-05-19 Seiko Epson Corp 電界効果型トランジスタ
JPS63144580A (ja) * 1986-12-09 1988-06-16 Nec Corp 電界効果トランジスタ
KR880010509A (ko) * 1987-02-11 1988-10-10 오레그 이. 앨버 전계효과 트랜지스터
US5196907A (en) * 1990-08-20 1993-03-23 Siemens Aktiengesellschaft Metal insulator semiconductor field effect transistor
JP3101321B2 (ja) * 1991-02-19 2000-10-23 富士通株式会社 酸素を含んだアイソレーション領域を有する半導体装置およびその製造方法
JP2616287B2 (ja) * 1991-07-08 1997-06-04 株式会社村田製作所 半導体装置
GB9116341D0 (en) * 1991-07-29 1991-09-11 Hitachi Europ Ltd Lt-gaas semiconductor device
DE69202554T2 (de) * 1991-12-25 1995-10-19 Nippon Electric Co Tunneltransistor und dessen Herstellungsverfahren.
TW319916B (fr) * 1995-06-05 1997-11-11 Hewlett Packard Co

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4062035A (en) * 1975-02-05 1977-12-06 Siemens Aktiengesellschaft Luminescent diode

Also Published As

Publication number Publication date
CA1125922A (fr) 1982-06-15
JPS54129886A (en) 1979-10-08
GB2013028A (en) 1979-08-01
IT1111954B (it) 1986-01-13
SE7900083L (sv) 1979-07-14
DE2901094A1 (de) 1979-07-19
IT7919260A0 (it) 1979-01-12
US4160261A (en) 1979-07-03
BE873428A (fr) 1979-05-02
GB2013028B (en) 1982-03-03
NL7900274A (nl) 1979-07-17

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