ES460405A1 - Un dispositivo de pulverizacion ionica. - Google Patents

Un dispositivo de pulverizacion ionica.

Info

Publication number
ES460405A1
ES460405A1 ES460405A ES460405A ES460405A1 ES 460405 A1 ES460405 A1 ES 460405A1 ES 460405 A ES460405 A ES 460405A ES 460405 A ES460405 A ES 460405A ES 460405 A1 ES460405 A1 ES 460405A1
Authority
ES
Spain
Prior art keywords
cathode
sputtering device
electron
electron traps
atomise
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES460405A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of ES460405A1 publication Critical patent/ES460405A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Un dispositivo de pulverización iónica que incluye, en una ampolla, un cátodo que comprende en su superficie el material a pulverizar, un dispositivo de imán para generar uno o más campos magnéticos mediante los cuales se determina al menos una trampa de electrones para la superficie y un ánodo, caracterizado porque la trampa de electrones puede ser desplazada a lo largo de la superficie.
ES460405A 1976-07-07 1977-07-05 Un dispositivo de pulverizacion ionica. Expired ES460405A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7607473A NL7607473A (nl) 1976-07-07 1976-07-07 Verstuifinrichting en werkwijze voor het ver- stuiven met een dergelijke inrichting.

Publications (1)

Publication Number Publication Date
ES460405A1 true ES460405A1 (es) 1978-05-01

Family

ID=19826537

Family Applications (1)

Application Number Title Priority Date Filing Date
ES460405A Expired ES460405A1 (es) 1976-07-07 1977-07-05 Un dispositivo de pulverizacion ionica.

Country Status (14)

Country Link
JP (2) JPS536282A (es)
AT (1) AT352493B (es)
AU (1) AU506847B2 (es)
BR (1) BR7704375A (es)
CA (1) CA1081656A (es)
CH (1) CH618289A5 (es)
DE (1) DE2729286A1 (es)
ES (1) ES460405A1 (es)
FR (1) FR2358020A1 (es)
GB (1) GB1587566A (es)
IT (1) IT1076083B (es)
NL (1) NL7607473A (es)
SE (1) SE7707729L (es)
ZA (1) ZA773538B (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2423065A1 (fr) * 1978-04-12 1979-11-09 Battelle Memorial Institute Procede de fabrication d'electrodes pour piles a combustible, dispositif pour la mise en oeuvre du procede et electrodes resultant de ce procede
GB2028377B (en) * 1978-08-21 1982-12-08 Vac Tec Syst Magnetically-enhanced sputtering device
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method
JPS584923Y2 (ja) * 1979-04-20 1983-01-27 株式会社 徳田製作所 横型スパッタリング装置
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS59116375A (ja) * 1982-11-26 1984-07-05 Kawasaki Heavy Ind Ltd スパッタリング装置
DE3316548C2 (de) * 1983-03-25 1985-01-17 Flachglas AG, 8510 Fürth Verfahren zur Beschichtung eines transparenten Substrates
JPS59179782A (ja) * 1983-03-31 1984-10-12 Kawasaki Heavy Ind Ltd スパツタリング装置の電極部構造
DE3406953C2 (de) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Verfahren zum Erwärmen von Heizgut in einem Vakuumrezipienten
JPS59169352U (ja) * 1983-04-25 1984-11-13 川崎重工業株式会社 スパツタリング装置の電極部構造
CH659346A5 (de) * 1983-05-10 1987-01-15 Balzers Hochvakuum Vorrichtung zum behandeln der innenwand eines rohres.
CH668565A5 (de) * 1986-06-23 1989-01-13 Balzers Hochvakuum Verfahren und anordnung zum zerstaeuben eines materials mittels hochfrequenz.
AT392291B (de) * 1987-09-01 1991-02-25 Miba Gleitlager Ag Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens
DE4018914C1 (es) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
DE4022708A1 (de) * 1990-07-17 1992-04-02 Balzers Hochvakuum Aetz- oder beschichtungsanlagen
DE4042417C2 (de) * 1990-07-17 1993-11-25 Balzers Hochvakuum Ätz- oder Beschichtungsanlage sowie Verfahren zu ihrem Zünden oder intermittierenden Betreiben
DE4107505A1 (de) * 1991-03-08 1992-09-10 Leybold Ag Verfahren zum betrieb einer sputteranlage und vorrichtung zur durchfuehrung des verfahrens
WO1995032517A1 (fr) * 1994-05-24 1995-11-30 Rossiisko-Shveitsarskoe Aktsionernoe Obschestvo Zakrytogo Tipa 'nova' Procede de production d'une decharge electrique et son dispositif de mise en ×uvre
DE19623359A1 (de) * 1995-08-17 1997-02-20 Leybold Ag Vorrichtung zum Beschichten eines Substrats
DE19652633A1 (de) * 1996-09-13 1998-03-19 Euromat Gmbh Verfahren und Vorrichtung zum Innenbeschichten metallischer Bauteile
DE19727647A1 (de) * 1997-06-12 1998-12-17 Leybold Ag Vorrichtung zum Beschichten eines Substratkörpers mittels Kathodenzerstäubung
JP5781408B2 (ja) * 2011-09-07 2015-09-24 株式会社アルバック マグネトロンスパッタカソード
US20150114828A1 (en) * 2013-10-31 2015-04-30 General Electric Company Systems and method of coating an interior surface of an object
US9111734B2 (en) 2013-10-31 2015-08-18 General Electric Company Systems and method of coating an interior surface of an object
JP2022178656A (ja) * 2021-05-20 2022-12-02 大学共同利用機関法人 高エネルギー加速器研究機構 非蒸発型ゲッタコーティング装置、非蒸発型ゲッタコーティング容器・配管の製造方法、非蒸発型ゲッタコーティング容器・配管

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884793A (en) * 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
JPS516017B2 (es) * 1972-09-08 1976-02-24
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus

Also Published As

Publication number Publication date
GB1587566A (en) 1981-04-08
BR7704375A (pt) 1978-05-16
AU2668877A (en) 1979-01-04
JPS536282A (en) 1978-01-20
FR2358020A1 (fr) 1978-02-03
DE2729286C2 (es) 1988-05-11
ATA482777A (de) 1979-02-15
CH618289A5 (en) 1980-07-15
IT1076083B (it) 1985-04-22
NL7607473A (nl) 1978-01-10
AU506847B2 (en) 1980-01-24
JPS6028689Y2 (ja) 1985-08-30
JPS5947654U (ja) 1984-03-29
CA1081656A (en) 1980-07-15
FR2358020B1 (es) 1982-11-12
DE2729286A1 (de) 1978-01-12
SE7707729L (sv) 1978-01-08
ZA773538B (en) 1979-01-31
AT352493B (de) 1979-09-25

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