ES2194218T3 - Alquilsulfoniloximas para fotoresists de linea i de alta resolucion, de alta sensibilidad. - Google Patents
Alquilsulfoniloximas para fotoresists de linea i de alta resolucion, de alta sensibilidad.Info
- Publication number
- ES2194218T3 ES2194218T3 ES97942870T ES97942870T ES2194218T3 ES 2194218 T3 ES2194218 T3 ES 2194218T3 ES 97942870 T ES97942870 T ES 97942870T ES 97942870 T ES97942870 T ES 97942870T ES 2194218 T3 ES2194218 T3 ES 2194218T3
- Authority
- ES
- Spain
- Prior art keywords
- c4alkyl
- high resolution
- group
- photoresists
- unsubstituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
- C07C309/66—Methanesulfonates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/24—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Photoreceptors In Electrophotography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Steroid Compounds (AREA)
Abstract
LA PRESENTE INVENCION DESCRIBE EL USO DE LOS COMPUESTOS DE SULFONATO ALKILO OXIME QUE CORRESPONDE A LA FORMULA (1) DONDE RREPRESENTA EL NAFTILO (2) O (3). R0 REPRESENTA O UN GRUPO R1 -X, O SEA R2 , MIENTRAS QUE X REPRESENTA UN ENLACE DIRECTO, UN ATOMO DE OXIGENO O UN ATOMO DE AZUFRE. R1 REPRESENTA EL HIDROGENO, ALKILO C1-C4 O UN GRUPO FENIL QUE OCASIONALMENTE PUEDE SUSTITUIRSE MEDIANTE UN SUSTITUYENTE EN EL GRUPO QUE COMPRENDE EL CLORO, EL BROMO, EL ALKILO C1-C4 Y ALQUILOXI C1-C4 . R2 REPRESENTA EL OXIGENO O EL ALKILO C1-C4 , MIENTRAS QUE R3 REPRESENTA UN ALKILO C1-C12 DE CADENA DERECHA O RETICULADA QUE PUEDE, A VECES SUSTITUIRSE PORUNO O VARIOS ATOMOS HALOGENOS. ESTOS COMPUESTOS SE UTILIZAN EN CALIDAD DE GENERADORDE ACIDO FOTOSENSIBLE EN UNA FOTORESINA QUIMICAMENTE AMPLIFICADA. ESTA FOTORESINA, QUE PUEDE DESARROLLARSE EN UN MEDIO ALCALINO ES SENSIBLE A LAS RADIACIONES QUE TENGAN UNA LONGITUD DE ONDA DE 340 A 390 NANOMETROS. ESTA INVENCION SE REFIERE TAMBIEN A FOTORESINAS NEGATIVA Y POSITIVA QUE ESTAN COMPUESTAS DE ESTA MANERA Y QUE CORRESPONDEN A LA GAMA DE LONGITUDES DE ONDA ANTES MENCIONADAS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH214796 | 1996-09-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2194218T3 true ES2194218T3 (es) | 2003-11-16 |
Family
ID=4226975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES97942870T Expired - Lifetime ES2194218T3 (es) | 1996-09-02 | 1997-08-22 | Alquilsulfoniloximas para fotoresists de linea i de alta resolucion, de alta sensibilidad. |
Country Status (14)
Country | Link |
---|---|
EP (1) | EP0925529B1 (es) |
JP (1) | JP3875271B2 (es) |
KR (1) | KR100686473B1 (es) |
CN (1) | CN1133901C (es) |
AT (1) | ATE237830T1 (es) |
AU (1) | AU726458B2 (es) |
BR (1) | BR9713311A (es) |
CA (1) | CA2263254A1 (es) |
DE (1) | DE69721019T2 (es) |
ES (1) | ES2194218T3 (es) |
ID (1) | ID17338A (es) |
MY (1) | MY118505A (es) |
TW (1) | TW497011B (es) |
WO (1) | WO1998010335A1 (es) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW550439B (en) * | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
DK199901098A (da) * | 1998-08-18 | 2000-02-19 | Ciba Sc Holding Ag | Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse |
TW575792B (en) * | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
WO2000014602A1 (en) * | 1998-09-04 | 2000-03-16 | Polaroid Corporation | Process for forming a color filter |
US6485886B1 (en) | 1998-10-29 | 2002-11-26 | Ciba Specialty Chemicals Corporation | Oxime derivatives and the use thereof as latent acids |
AU4102100A (en) * | 1999-03-03 | 2000-09-21 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use thereof as photoinitiators |
US6576394B1 (en) | 2000-06-16 | 2003-06-10 | Clariant Finance (Bvi) Limited | Negative-acting chemically amplified photoresist composition |
US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
TW589514B (en) * | 2001-09-13 | 2004-06-01 | Matsushita Electric Ind Co Ltd | Pattern formation material and pattern formation method |
EP1472576B1 (en) * | 2002-02-06 | 2013-04-24 | Basf Se | Sulfonate derivatives and the use therof as latent acids |
JP4924813B2 (ja) * | 2004-10-29 | 2012-04-25 | 日産化学工業株式会社 | 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター |
CN101506734B (zh) * | 2006-08-24 | 2012-04-11 | 西巴控股有限公司 | Uv量指示剂 |
GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
CN101638374A (zh) * | 2008-07-28 | 2010-02-03 | 住友化学株式会社 | 肟类化合物及包含该化合物的抗蚀剂组合物 |
US20120043480A1 (en) | 2009-03-30 | 2012-02-23 | Basf Se | Uv-dose indicator films |
JP6605820B2 (ja) * | 2015-03-11 | 2019-11-13 | 株式会社Adeka | オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物 |
US20200209749A1 (en) * | 2018-12-27 | 2020-07-02 | Sumitomo Chemical Company, Limited | Resist composition and method for producing resist pattern |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4123255A (en) * | 1977-01-03 | 1978-10-31 | Chevron Research Company | O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes |
US4540598A (en) * | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
GB8608528D0 (en) * | 1986-04-08 | 1986-05-14 | Ciba Geigy Ag | Production of positive images |
KR900005226A (ko) * | 1988-09-29 | 1990-04-13 | 윌리엄 비이 해리스 | 감광성 조성물 및 양화 상과 음화 상의 생성방법 |
US5019488A (en) * | 1988-09-29 | 1991-05-28 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
EP0571330B1 (de) * | 1992-05-22 | 1999-04-07 | Ciba SC Holding AG | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
JP3456808B2 (ja) * | 1995-09-29 | 2003-10-14 | 東京応化工業株式会社 | ホトレジスト組成物 |
JP3587413B2 (ja) * | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
JP3665166B2 (ja) * | 1996-07-24 | 2005-06-29 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
-
1997
- 1997-08-22 BR BR9713311-6A patent/BR9713311A/pt unknown
- 1997-08-22 KR KR1019997001646A patent/KR100686473B1/ko not_active IP Right Cessation
- 1997-08-22 JP JP51105898A patent/JP3875271B2/ja not_active Expired - Lifetime
- 1997-08-22 AT AT97942870T patent/ATE237830T1/de not_active IP Right Cessation
- 1997-08-22 AU AU44552/97A patent/AU726458B2/en not_active Ceased
- 1997-08-22 CA CA002263254A patent/CA2263254A1/en not_active Abandoned
- 1997-08-22 CN CNB971975574A patent/CN1133901C/zh not_active Expired - Lifetime
- 1997-08-22 EP EP97942870A patent/EP0925529B1/en not_active Expired - Lifetime
- 1997-08-22 WO PCT/EP1997/004566 patent/WO1998010335A1/en not_active Application Discontinuation
- 1997-08-22 DE DE69721019T patent/DE69721019T2/de not_active Expired - Lifetime
- 1997-08-22 ES ES97942870T patent/ES2194218T3/es not_active Expired - Lifetime
- 1997-08-29 ID IDP973037A patent/ID17338A/id unknown
- 1997-08-30 MY MYPI97004036A patent/MY118505A/en unknown
- 1997-09-02 TW TW086112586A patent/TW497011B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100686473B1 (ko) | 2007-02-26 |
EP0925529A1 (en) | 1999-06-30 |
DE69721019D1 (de) | 2003-05-22 |
DE69721019T2 (de) | 2003-12-24 |
CA2263254A1 (en) | 1998-03-12 |
AU4455297A (en) | 1998-03-26 |
EP0925529B1 (en) | 2003-04-16 |
KR20000068387A (ko) | 2000-11-25 |
CN1228851A (zh) | 1999-09-15 |
JP2000517067A (ja) | 2000-12-19 |
ID17338A (id) | 1997-12-18 |
WO1998010335A1 (en) | 1998-03-12 |
BR9713311A (pt) | 2000-02-01 |
TW497011B (en) | 2002-08-01 |
MY118505A (en) | 2004-11-30 |
JP3875271B2 (ja) | 2007-01-31 |
AU726458B2 (en) | 2000-11-09 |
CN1133901C (zh) | 2004-01-07 |
ATE237830T1 (de) | 2003-05-15 |
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