Classifications

• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
  • C23C14/46—Sputtering by ion beam produced by an external ion source
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
  • C03C17/225—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
  • C03C17/366—Low-emissivity or solar control coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/0641—Nitrides
  • C23C14/0647—Boron nitride
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/067—Borides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/28—Other inorganic materials
  • C03C2217/281—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/28—Other inorganic materials
  • C03C2217/283—Borides, phosphides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
  • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Definitions

• the present invention relates to a thin-film deposition method with anti-scratch or surface-strengthening functionality associated with a substrate, in particular glass. It relates more particularly to the deposition processes intended to be integrated within the installation for the deposition of layers operating under vacuum on architectural glass for example (but not only), these installations having an industrial size (substrate whose dimension perpendicular to the direction displacement is greater than 1, 5 m, or even 2 m).
• substrates coated with a stack of layers providing different functionalities (solar control, low-emissive, electromagnetic shielding, heating, hydrophilic, hydrophobic, photocatalytic), layers modifying the level of reflection in the visible (antireflection layers or mirror in the visible range or solar infrared) incorporating an active system (electrochromic, electroluminescent, photovoltaic, piezoelectric, diffusing, absorbing).
• This improvement of the scratch resistance may consist of a treatment of at least one of the faces of the substrate in contact with the environment or coated with a layer or it may consist of a treatment of a substrate previously covered with one or more thin layers providing a different functionality (as for example one of that previously mentioned). Typically, this is called an "overcoat" type reinforcing layer in that it is very thin and chronologically finishes the deposition sequence of all the layers.
• the anti-scratch-resistant layers are produced from conventional methods of deposition of thin layers of the magnetron sputtering or plasma type, the thin layers that can be DLC-based for Diamond Like Carbon (see patent EP 1 177 156) or based on a mixed antimony oxide , zinc, and tin (Sn x Zn y SbzOw) (reference may be made to patent application EP 1 042 247). It is particularly economical to use a method of deposition of the technologically compatible mechanical reinforcement layer with the stack deposition method. These deposition techniques are entirely satisfactory for this type of layer but they each have their disadvantages to which the present invention proposes to provide a solution.
• the DLC layer which is obtained by a plasma deposition technique has a significant absorption rate in the visible, which is detrimental to the production of vision layer glazing (brown tint in transmission deemed unsightly and limitation of the amount of light transmitted through the glazing) strongly limits the use of such a layer within a stack operating in the visible.
• the magnetoinposited antimony, zinc and tin oxide-based layer it has better scratch resistance properties than those "Overcoats" known from the prior art but which can be further improved by boron nitride layer deposition.
• the boron nitride layers may have interesting mechanical properties when they are crystallized in particular phases:
• the boron nitride-based layers have the unusual consensus of having mechanical properties as previously described together with good transparency in the visible (E g ⁇ 4 to 6 eV) and a refractive index (1, 6 at 2.2 according to the crystallographic phase) compatible with the materials deposited in an otherwise thin layer.
• the hexagonal and cubic structural varieties have a high chemical inertia especially with respect to the oxidation at high temperature.
• the graphic variety is resistant eg up to 1200 0 C and particularly up to 700 0 C, forming usual temperature treatments, bending and tempering flat glass.
• the usable targets are electrically insulating (boron, amorphous boron nitride, hexagonal boron nitride), which requires the use of a RF radio frequency polarization (for example
• the magnetron sputtering can not be used homogeneously on cathodes longer than 2 meters (for the deposition on substrates of similar specific size ) that if the sinusoidal or pulsed polarization for example is clocked at a frequency whose corresponding wavelength is very large in front of the length of the cathode.
• PECVD Pulsma Enhanced Chemical Vapor Deposition
• qq At or qq nm sufficient sharpness
• the present invention therefore aims to overcome the disadvantages of magnetron sputtering deposition processes by proposing a compatible deposition process that allows the boron-based thin layer deposition.
• the process for vacuum deposition of at least one boron-based thin layer on a substrate is characterized in that: - at least one species of chemically inactive or active spray with regard to boron is selected ,
• At least one linear ion source positioned within a plant having an industrial size, generates a collimated beam of ions comprising predominantly said spraying species,
• said beam is directed towards at least one target based on boron
• the linear ion source generates a collimated beam of energy ions between 0.2 and 10 keV, preferably between 1 and 5 keV, in particular close to 1.5 keV,
• the system is put under pressure in a range comprised between 10 ⁇ 5 and 8, 10 3 torr,
• the ion beam and the target form an angle ⁇ of between 90 ° and 30 °, preferably between 60 ° and 45 °; the material to be sprayed is deposited using at least said linear ion deposition source; simultaneously or successively on two different surface portions of a substrate,
• the material sprayed is deposited using at least one linear ion deposition source on at least one portion of the substrate at least partially covered by at least one other layer;
• an additional species is introduced in addition to said spraying species, said additional species being chemically active with respect to said pulverized material,
• the additional species is obtained from an injection of gas incorporating said additional species, for example in the vicinity of the substrate, the additional species which is injected comprises nitrogen, argon, used alone or in mixture with, if appropriate, a minor fraction of a CH 4 and / or H 2 hydrocarbon a target comprising a material chosen from the family of amorphous boron, crystallized boron in cubic form, crystallized boron in hexagonal form, aluminum, silicon, amorphous boron nitride, boron nitride crystallized under hexagonal form, crystallized boron nitride in cubic form, silicon nitride, aluminum nitride, a nitride mixed with at least one of these materials, this material being used alone or as a mixture,
• the target is polarized so as to adjust the energy of the spraying species
• the polarized target is fixed on a magnetron cathode
• an ion neutralization device is positioned nearby, possibly consisting of a magnetron cathode disposed in the vicinity or an electron injector (thermo-emitter in the form of a filament, for example)
• a second ion source whose ion beam is focused on the substrate is used.
• a substrate in particular a glass substrate, at least one surface portion of which is coated with a stack of thin layers comprising at least one layer based on a material chosen from the family.
• a source of ionic deposition in an industrial size enclosure.
• a substrate bearing the reference numeral 6 travels in the enclosure and in particular this substrate is coated with a pulverized material 8 resulting from the spraying by a collimated ion beam 6 on a target 1.
• the ion source is provided with a cathode 3,4, an anode 5 and magnets 2 to confine the ion beam.
• the method which is the subject of the invention, it consists in inserting within a line, of industrial size (typically a line width of approximately 3.5 m), for the deposition of thin layers on a substrate, at least one linear ionic deposition source (refer to the single figure).
• industrial size is understood to mean a production line whose size is adapted firstly to operate continuously and secondly to treat substrates with one of the characteristic dimensions, for example the width perpendicular to the flow direction of the substrate, is at least 1.5 m.
• ion deposition source means a complete system integrating a linear ion source and a device incorporating a target and a target holder.
• This source of linear ionic deposition is positioned within a treatment chamber whose operating pressure can be easily lowered below 0.1 mTorr (approximately 133 10 ⁇ 4 Pa), practically from 1.10 5 to 5.1O 3 torr.
• This working pressure may be generally between 2 to 50 times less than the lowest working pressure for a magnetron sputtering line, but the linear ion deposition device may also operate at the deposition pressure of the conventional magnetron process.
• a ion source as shown in the single figure, and using the following deposition conditions: - target of 40.0 cm in hBN, at a deposition pressure of 0.75 mtorr, with flow rates of 10 sccm gases of Ar and 2 sccm of N2, the source having a power of 70 W, the hBN material is sprayed onto a bare substrate (glass sold by the applicant under the trade mark Planilux, this glass having a thickness of 2 mm), and the stack of Example 1 is obtained
• Example 1 Glass (2mm) / hBN (10 nm)
• Example 2 Let the stack shown below in Example 2 and corresponding a standard low emissivity type stack of the applicant company.
• Example 2 Glass / Si 3 N 4 / ZnO / NiCr Ag / ZnO / Si 3 N 4
• Example 3 From deposition conditions similar to Example 1, the deposition of an hBN layer on the stack of Example 2 is carried out in order to obtain the stacking structure of Example 3.
• Example 3 Glass / Si 3 N 4 / ZnO / NiCr / Ag / ZnO / Si 3 N 4 / hBN (4 nm)
• the layer of hBN is lubricating (the coefficient of friction is substantially divided by 2 between reference example and Example 1 on the one hand, and the value obtained for Example 2 and Example 3 on the other hand.
• the coefficient of friction is measured by the alternating linear tribometry technique.
• the contact is of the pion / plane type with a running speed of between 10 ⁇ m.s 1 and 10 mm. s 1 (preferably of the order of 1 mm.s 1 ) and a normal force applied between 0, 1N and 2ON (preferentially 3N).
• the measurement is obtained under air at room temperature.
• At least one linear ion deposition source is used, the operating principle of which is as follows:
• the linear ion source very schematically includes an anode, a cathode, a magnetic device, a gas introduction source. Examples of this type of source are described in particular in RU2030807, US6002208, or WO02 / 093987.
• the anode is brought to a positive potential by a continuous supply, the potential difference between the anode and the cathode causes the ionization of a gas injected nearby.
• the injected gas may be a mixture of oxygen-based gas, argon, nitrogen, helium, a noble gas, such as neon, for example, or a mixture of these gases.
• the gas plasma is then subjected to a magnetic field (generated by permanent or non-permanent magnets), which makes it possible to accelerate and focus the ion beam.
• the ions are thus collimated and accelerated towards the outside of the source in the direction of at least one target, possibly polarized, which one wants to pulverize the material, and their intensity is in particular a function of the geometry of the source, the gas flow, of their nature, and the tension applied to the anode.
• the operating parameters of the ion deposition source are adapted so that the energy and acceleration transmitted to the collimated ions are sufficient to spray, because of their mass, their spraying cross section, aggregates of material of the target material.
• the respective orientation of the source of ions (or ion sources) and the target is such that the ion beam (the ion beams) ejected from the source comes to spray the target at one or more angles means determined in advance (between 90 ° and 30 °, preferably between 60 and 45 °).
• the vapor of atomized atoms must be able to reach a moving substrate whose width is at least 1 meter (1.5 m being a critical size from which an installation can be described as industrial).
• the target may be integrated within a magnetron sputtering device. In the vicinity of the substrate, it is possible to inject, possibly by means of a gas injection device, a second species in the form of a gas or a plasma, which is chemically active with respect to the material sprayed or bombarded from of the target.
• a linear ion source with collimated ions can be introduced within a traditional treatment chamber (magnetron sputtering) that can work in a sputter up (sputter up) and / or sputter down (sputter down) mode.
• the ion source is introduced in place of a sputter-up cathode in order to achieve a multi-functional stack by sputter down on the front face of the glass and, at the end of the deposition process, an anti-scratch layer on the face behind the glass (similar to the deposit of Example 1), this rear face being the face to be exposed weathering). It is also possible, simultaneously with the method described here to deposit a "overcoat" (overcoating) based on boron at the end of the stack deposited on the front face by sputter-down (Example 3 in particular). The anti-scratch character of mechanical reinforcement of the layer results from the lubricating properties of said layer.
• the linear ionic deposition source with an ion neutralization device (electron source thermo emitter in the form of a filament, for example) in order to prevent the target from charging and arcs appear in the deposition chamber.
• This device may consist of a plasma, for example from a magnetron cathode operating nearby.
• the substrates on the surface of which the thin layers mentioned above are intended to be deposited are preferably transparent, flat or curved, made of glass or plastic (PMMA, PC, etc.).
• the method according to the invention makes it possible to develop in a chamber of industrial size, a substrate, in particular glass, comprising on at least one of its faces a stack of thin layers comprising at least one layer deposited (either on a bare surface of the substrate or on a stack of thin layers previously deposited on the substrate) by said method and whose scratch resistance has been improved compared to a protective layer deposited by magnetron sputtering.
• the method that is the subject of the invention makes it possible to deposit a lubricant-functional layer on at least a bare surface of a glass-function-based substrate or on a stack of diverse functionality already deposited on at least one portion of substrate.
• a first type of substrate in particular glass, is coated on at least a surface portion of a stack of thin layers comprising an alternation of n functional layers A with reflective properties in the infrared and / or in the solar radiation, based in particular of silver, and (n + 1) coatings B with n> 1, said coatings B comprising a layer or a superposition of layers of dielectric material based in particular on silicon nitride or a mixture of silicon and silicon.
• each functional layer A is disposed between two coatings B, the stack also comprising at least one metal layer C in the visible, in particular based on titanium, nickel chromium, zirconium, optionally nitrided or oxidized, located above and / or below the functional layer, the terminal layer of the stack being then covered by a layer with anti-scratch functionality.
• a second type of substrate in particular glass, is coated on at least a portion of surface of an antireflection coating or mirror in the visible range or solar infrared, made of a stack (A) of thin layers of materials dielectric alternately high and low refractive indices, the end layer of the stack then being covered by a layer with anti-scratch functionality.
• These substrates thus coated form glazing for applications in the automotive industry including a roof-car, a side window, a windshield, a rear window, a mirror, or a single or double glazing for the building , including interior or exterior glazing for the building, a display, a curvable store counter, a table-type object glazing, a computer anti-glare screen, glass furniture, a spandrel, an anti-fouling system.

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• Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Engineering & Computer Science (AREA)
• Materials Engineering (AREA)
• Organic Chemistry (AREA)
• Life Sciences & Earth Sciences (AREA)
• General Chemical & Material Sciences (AREA)
• Geochemistry & Mineralogy (AREA)
• Mechanical Engineering (AREA)
• Metallurgy (AREA)
• Physical Vapour Deposition (AREA)
• Surface Treatment Of Glass (AREA)

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• 2005
  • 2005-08-01 FR FR0552404A patent/FR2889202B1/fr not_active Expired - Fee Related
• 2006
  • 2006-07-26 RU RU2008107990/02A patent/RU2008107990A/ru not_active Application Discontinuation
  • 2006-07-26 CN CNA2006800283146A patent/CN101233259A/zh active Pending
  • 2006-07-26 JP JP2008524554A patent/JP2009503268A/ja active Pending
  • 2006-07-26 US US11/997,323 patent/US20090017314A1/en not_active Abandoned
  • 2006-07-26 KR KR1020087002540A patent/KR20080032132A/ko not_active Application Discontinuation
  • 2006-07-26 WO PCT/FR2006/050750 patent/WO2007015023A2/fr active Application Filing
  • 2006-07-26 EP EP06794501A patent/EP1913170A2/fr not_active Withdrawn

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