DK164875A - - Google Patents

Info

Publication number
DK164875A
DK164875A DK164875A DK164875A DK164875A DK 164875 A DK164875 A DK 164875A DK 164875 A DK164875 A DK 164875A DK 164875 A DK164875 A DK 164875A DK 164875 A DK164875 A DK 164875A
Authority
DK
Denmark
Application number
DK164875A
Other languages
Danish (da)
Inventor
F Imaizumi
I Nagaoka
M Kurokawa
K Komatsu
Y Takimoto
H Kusuda
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4411674A external-priority patent/JPS50141321A/ja
Priority claimed from JP2868875A external-priority patent/JPS51104903A/ja
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of DK164875A publication Critical patent/DK164875A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DK164875A 1974-04-18 1975-04-17 DK164875A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4411674A JPS50141321A (de) 1974-04-18 1974-04-18
JP2868875A JPS51104903A (en) 1975-03-11 1975-03-11 Kankoseizairyo oyobi insatsuyogenpan

Publications (1)

Publication Number Publication Date
DK164875A true DK164875A (de) 1975-10-19

Family

ID=26366829

Family Applications (1)

Application Number Title Priority Date Filing Date
DK164875A DK164875A (de) 1974-04-18 1975-04-17

Country Status (6)

Country Link
US (1) US4023973A (de)
AU (1) AU476446B2 (de)
CA (1) CA1054840A (de)
DE (1) DE2517034C3 (de)
DK (1) DK164875A (de)
GB (1) GB1508315A (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4167415A (en) * 1975-07-11 1979-09-11 Kansai Paint Co., Ltd. Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound
US4144153A (en) * 1975-10-03 1979-03-13 Takiron Co., Ltd. Radiation process for producing 1,2-polybutadiene foamed products
US4192684A (en) * 1976-01-24 1980-03-11 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions containing hydrogenated 1,2-polybutadiene
CA1105758A (en) * 1976-05-06 1981-07-28 Yoshihiro Hosaka PHOTOSENSITIVE COMPOSITIONS CONTAINING A COPOLYMER DERIVED FROM A CONJUGATED DIOLEFIN AND AN .alpha. .beta. ETHYLENICALLY UNSATURATED CARBOXYLIC ACID OR ANHYDRIDE
JPS5994B2 (ja) * 1976-09-14 1984-01-05 富士写真フイルム株式会社 感光性組成物
DE2720560A1 (de) * 1977-05-07 1978-11-09 Basf Ag Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
US4330612A (en) * 1979-01-23 1982-05-18 Japan Synthetic Rubber Co., Ltd. Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer
US4292150A (en) * 1979-06-26 1981-09-29 Uniroyal, Inc. Iodine treated elastomeric article
US4265986A (en) * 1979-11-21 1981-05-05 Uniroyal, Inc. Photopolymerizable composition containing chlorosulfonated polyethylene
JPS56141321A (en) * 1980-04-08 1981-11-05 Mitsubishi Gas Chem Co Inc Photosetting resin composition
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
GB2108986B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable composition for producing screen printing stencils
DE3468542D1 (en) * 1983-11-03 1988-02-11 Basf Ag Photopolymerisable registration material for the preparation of printing forms and process for the production of printing forms with this materials
JP2962739B2 (ja) * 1988-07-30 1999-10-12 日本石油化学株式会社 光硬化塗膜の形成方法
CA1321671C (en) * 1989-05-11 1993-08-24 Paul J. Shustack Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5536529A (en) * 1989-05-11 1996-07-16 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5407784A (en) * 1990-04-26 1995-04-18 W. R. Grace & Co.-Conn. Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers
US5268257A (en) * 1990-08-01 1993-12-07 W. R. Grace & Co.-Conn. Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
US5290663A (en) * 1991-03-01 1994-03-01 W. R. Grace & Co.-Conn. Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates
US5462835A (en) * 1991-09-16 1995-10-31 P T Sub Inc. Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles
JPH0659453A (ja) * 1992-08-07 1994-03-04 Nippon Oil Co Ltd ポジ型感光性樹脂組成物
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
US5362806A (en) * 1993-01-07 1994-11-08 W. R. Grace & Co.-Conn. Toughened photocurable polymer composition for processible flexographic printing plates
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
JP3510393B2 (ja) 1994-08-10 2004-03-29 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー 光硬化性エラストマー組成物から得られるフレキソグラフ印刷プレート
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6066436A (en) * 1996-09-09 2000-05-23 Polyfibron Technologies, Inc. Aqueous developable photosensitive polyurethane-methacrylate
JP5019800B2 (ja) * 2006-06-16 2012-09-05 富士フイルム株式会社 インクジェット記録用インク組成物

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
US2980534A (en) * 1956-12-17 1961-04-18 Monsanto Chemicals Photographic compositions and photographic elements
BE595534A (de) * 1959-10-02
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers
DE1447593A1 (de) * 1964-12-24 1969-04-30 Agfa Gevaert Ag Lichtvernetzbare Schichten
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
DE1597614B2 (de) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt Lichtempfindliche kopiermasse
US3840449A (en) * 1968-12-13 1974-10-08 Bridgestone Tire Co Ltd Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization
US3948667A (en) * 1971-06-21 1976-04-06 Japan Synthetic Rubber Company Limited Photosensitive compositions
US3905820A (en) * 1972-01-27 1975-09-16 Hoechst Ag Light sensitive copolymers, a process for their manufacture and copying compositions containing them
JPS5529106B2 (de) * 1972-12-14 1980-08-01
US3933746A (en) * 1973-06-14 1976-01-20 Ball Corporation Photopolymerizable polymers having anhydride-containing groups
US3888670A (en) * 1973-11-02 1975-06-10 Xerox Corp Imaging method

Also Published As

Publication number Publication date
GB1508315A (en) 1978-04-19
AU8015675A (en) 1976-09-23
AU476446B2 (en) 1976-09-23
US4023973A (en) 1977-05-17
CA1054840A (en) 1979-05-22
DE2517034B2 (de) 1979-05-17
DE2517034C3 (de) 1980-01-31
DE2517034A1 (de) 1975-11-20

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Legal Events

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PBP Patent lapsed