DE69841947D1 - Verfahren zur Herstellung einer Linse - Google Patents
Verfahren zur Herstellung einer LinseInfo
- Publication number
- DE69841947D1 DE69841947D1 DE69841947T DE69841947T DE69841947D1 DE 69841947 D1 DE69841947 D1 DE 69841947D1 DE 69841947 T DE69841947 T DE 69841947T DE 69841947 T DE69841947 T DE 69841947T DE 69841947 D1 DE69841947 D1 DE 69841947D1
- Authority
- DE
- Germany
- Prior art keywords
- lens
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/006—Printing plates or foils; Materials therefor made entirely of inorganic materials other than natural stone or metals, e.g. ceramics, carbide materials, ferroelectric materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00365—Production of microlenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21484597 | 1997-08-08 | ||
JP30029597 | 1997-10-31 | ||
JP31304197 | 1997-11-14 | ||
JP10036998 | 1998-03-27 | ||
JP8595598 | 1998-03-31 | ||
JP8629398 | 1998-03-31 | ||
JP16539298A JP3384544B2 (ja) | 1997-08-08 | 1998-06-12 | パターン形成体およびパターン形成方法 |
JP16731698A JP3920461B2 (ja) | 1998-06-15 | 1998-06-15 | レンズおよびその製造方法 |
JP18337098A JP3343811B2 (ja) | 1997-10-31 | 1998-06-15 | カラーフィルタの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69841947D1 true DE69841947D1 (de) | 2010-11-25 |
Family
ID=27577233
Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69841945T Expired - Lifetime DE69841945D1 (de) | 1997-08-08 | 1998-08-10 | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
DE69841948T Expired - Lifetime DE69841948D1 (de) | 1997-08-08 | 1998-08-10 | Lithographieplatte und Verfahren zu derer Herstellung |
DE69841238T Expired - Lifetime DE69841238D1 (de) | 1997-08-08 | 1998-08-10 | Objekt zur erzeugung von mustern, methode zur erzeugung von mustern, sowie deren anwendungen |
DE69841944T Expired - Lifetime DE69841944D1 (de) | 1997-08-08 | 1998-08-10 | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
DE69841946T Expired - Lifetime DE69841946D1 (de) | 1997-08-08 | 1998-08-10 | Struktur zur Musterbildung, Verfahren zur Musterbildung, und deren Anwendung |
DE69841947T Expired - Lifetime DE69841947D1 (de) | 1997-08-08 | 1998-08-10 | Verfahren zur Herstellung einer Linse |
Family Applications Before (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69841945T Expired - Lifetime DE69841945D1 (de) | 1997-08-08 | 1998-08-10 | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
DE69841948T Expired - Lifetime DE69841948D1 (de) | 1997-08-08 | 1998-08-10 | Lithographieplatte und Verfahren zu derer Herstellung |
DE69841238T Expired - Lifetime DE69841238D1 (de) | 1997-08-08 | 1998-08-10 | Objekt zur erzeugung von mustern, methode zur erzeugung von mustern, sowie deren anwendungen |
DE69841944T Expired - Lifetime DE69841944D1 (de) | 1997-08-08 | 1998-08-10 | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
DE69841946T Expired - Lifetime DE69841946D1 (de) | 1997-08-08 | 1998-08-10 | Struktur zur Musterbildung, Verfahren zur Musterbildung, und deren Anwendung |
Country Status (4)
Country | Link |
---|---|
US (11) | US6294313B1 (de) |
EP (7) | EP1376224B1 (de) |
DE (6) | DE69841945D1 (de) |
WO (1) | WO1999008158A1 (de) |
Families Citing this family (175)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69841945D1 (de) | 1997-08-08 | 2010-11-25 | Dainippon Printing Co Ltd | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
EP0903224B1 (de) * | 1997-09-12 | 2007-11-14 | FUJIFILM Corporation | Strahlungsempfindlicher Flachdruckplattenvorläufer und Flachdruckplatte |
CZ296102B6 (cs) * | 1998-10-10 | 2006-01-11 | Heidelberger Druckmaschinen Ag | Zpusob zmeny smácivosti tiskarské formy a tiskarská forma |
WO2000033977A1 (fr) * | 1998-12-07 | 2000-06-15 | Tao Inc. | Liquide d'enduit comprenant un colorant organique pour film d'enduit contenant un photocatalyseur |
JP3529306B2 (ja) | 1998-12-09 | 2004-05-24 | 大日本印刷株式会社 | カラーフィルタおよびその製造方法 |
US6815125B1 (en) * | 1999-06-30 | 2004-11-09 | Dai Nippon Printing Co., Ltd. | Color filter and process for producing the same |
WO2000046037A1 (fr) * | 1999-02-05 | 2000-08-10 | Mitsubishi Heavy Industries, Ltd. | Materiau de plaque d'impression et ses procedes de fabrication et de regeneration |
JP2000272265A (ja) * | 1999-03-29 | 2000-10-03 | Kodak Polychrome Graphics Japan Ltd | 直描型平版印刷版原版およびそれを用いた印刷刷版作製方法 |
JP2001110801A (ja) * | 1999-10-05 | 2001-04-20 | Takeshi Yao | パターン形成方法、並びに電子素子、光学素子及び回路基板 |
JP3237668B2 (ja) * | 1999-11-12 | 2001-12-10 | 富士ゼロックス株式会社 | 光触媒を用いるtft一体型のカラーフィルターの製造方法、カラーフィルター、および液晶表示装置 |
JP3237667B2 (ja) * | 1999-11-12 | 2001-12-10 | 富士ゼロックス株式会社 | 光触媒を用いた新規な着膜方法およびこの方法を使用するカラーフィルターの製造方法、それに使用する電解液、ならびに製造装置 |
CN1221401C (zh) * | 2000-01-19 | 2005-10-05 | 富士胶片株式会社 | 平版印版支承体的电解处理装置和电解处理方法 |
KR20010085420A (ko) * | 2000-02-23 | 2001-09-07 | 기타지마 요시토시 | 전계발광소자와 그 제조방법 |
WO2002001280A2 (en) * | 2000-06-23 | 2002-01-03 | The University Of Akron | Electrically tunable microlens array containing liquid crystals |
JP2002040230A (ja) * | 2000-07-31 | 2002-02-06 | Dainippon Printing Co Ltd | カラーフィルタおよびその製造法 |
JP2002040231A (ja) * | 2000-07-31 | 2002-02-06 | Dainippon Printing Co Ltd | カラーフィルタおよびその製造方法 |
US7183023B2 (en) * | 2003-04-07 | 2007-02-27 | Dai Nippon Printing Co., Ltd. | Method for manufacturing color filter |
US6561644B2 (en) * | 2000-12-20 | 2003-05-13 | Eastman Kodak Company | Ink jet printing process |
KR20030004376A (ko) | 2001-03-01 | 2003-01-14 | 니혼 이타가라스 가부시키가이샤 | 광학소자의 제조방법 |
JP4117720B2 (ja) * | 2001-03-22 | 2008-07-16 | 株式会社リコー | 記録体 |
KR100877708B1 (ko) | 2001-03-29 | 2009-01-07 | 다이니폰 인사츠 가부시키가이샤 | 패턴 형성체의 제조 방법 및 그것에 사용하는 포토마스크 |
US7070903B2 (en) * | 2001-04-27 | 2006-07-04 | Mitsubishi Heavy Industries, Ltd. | Coating formulation for printing plate precursor, printing plate precursor, printing press, fabrication process of printing plate, and regeneration process of printing plate |
KR100535733B1 (ko) * | 2001-06-13 | 2005-12-09 | 가부시키가이샤 구라레 | 렌즈 시트의 제조방법 |
EP1271243A3 (de) * | 2001-06-19 | 2003-10-15 | Fuji Photo Film Co., Ltd. | Bilderzeugungsmaterial, Farbfilteroriginalschablone und Farbfilter |
EP1282175A3 (de) * | 2001-08-03 | 2007-03-14 | FUJIFILM Corporation | Muster aus leitendem Material und Verfahren zur dessen Herstellung |
US7435515B2 (en) * | 2001-09-12 | 2008-10-14 | Dai Nippon Printing Co., Ltd. | Process for production of pattern-forming body |
US7074358B2 (en) * | 2001-12-13 | 2006-07-11 | Alexander Sergeievich Gybin | Polymer casting method and apparatus |
GB0129968D0 (en) * | 2001-12-14 | 2002-02-06 | Nel Technologies Ltd | Flexible heater |
JP2003231372A (ja) * | 2002-02-12 | 2003-08-19 | Mitsubishi Heavy Ind Ltd | 印刷用版材及び印刷用版材の再生再使用方法並びに印刷機 |
US20030215723A1 (en) * | 2002-04-19 | 2003-11-20 | Bearinger Jane P. | Methods and apparatus for selective, oxidative patterning of a surface |
US6938546B2 (en) * | 2002-04-26 | 2005-09-06 | Mitsubishi Heavy Industries, Ltd. | Printing press, layered formation and making method thereof, and printing plate and making method thereof |
JP4217868B2 (ja) * | 2002-05-07 | 2009-02-04 | 大日本印刷株式会社 | エレクトロルミネッセント素子およびその製造方法 |
US7390597B2 (en) * | 2002-06-13 | 2008-06-24 | Dai Nippon Printing Co., Ltd. | Method for manufacturing color filter |
JP4307017B2 (ja) * | 2002-06-13 | 2009-08-05 | 大日本印刷株式会社 | 基板の洗浄方法 |
JP4217032B2 (ja) * | 2002-06-17 | 2009-01-28 | オリンパス株式会社 | 光学素子 |
AU2003244100A1 (en) * | 2002-06-21 | 2004-01-06 | Teijin Chemicals, Ltd. | Acrylic resin composition, organosiloxane resin composition and laminates made by using them |
US7749684B2 (en) * | 2002-08-28 | 2010-07-06 | Dai Nippon Printing Co., Ltd. | Method for manufacturing conductive pattern forming body |
TWI256732B (en) * | 2002-08-30 | 2006-06-11 | Sharp Kk | Thin film transistor, liquid crystal display apparatus, manufacturing method of thin film transistor, and manufacturing method of liquid crystal display apparatus |
JP3719431B2 (ja) * | 2002-09-25 | 2005-11-24 | セイコーエプソン株式会社 | 光学部品およびその製造方法、表示装置および撮像素子 |
AU2003289017A1 (en) * | 2002-12-10 | 2004-06-30 | Nippon Sheet Glass Co., Ltd. | Article having functional coating film thereon, method for manufacture thereof, and applying material for forming functional coating film |
DE50313232D1 (de) * | 2002-12-19 | 2010-12-16 | Heidelberger Druckmasch Ag | Verfahren zum Ändern der Benetzungseigenschaften einer Druckform |
US7152530B2 (en) * | 2002-12-19 | 2006-12-26 | Heidelberger Druckmaschinen Ag | Printing form and method for modifying its wetting properties |
TWI265762B (en) * | 2003-01-14 | 2006-11-01 | Sharp Kk | Wiring material, wiring substrate and manufacturing method thereof, display panel, fine particle thin film material, substrate including thin film layer and manufacturing method thereof |
JP4332360B2 (ja) * | 2003-02-28 | 2009-09-16 | 大日本印刷株式会社 | 濡れ性パターン形成用塗工液およびパターン形成体の製造方法 |
TWI269886B (en) * | 2003-03-20 | 2007-01-01 | Hamamatsu Photonics Kk | Microscope and specimen observation method |
JP4289924B2 (ja) * | 2003-04-07 | 2009-07-01 | 大日本印刷株式会社 | パターン形成体 |
WO2004097915A1 (ja) * | 2003-04-25 | 2004-11-11 | Semiconductor Energy Laboratory Co., Ltd. | 液滴吐出装置、パターンの形成方法、および半導体装置の製造方法 |
TWI223308B (en) * | 2003-05-08 | 2004-11-01 | Ind Tech Res Inst | Manufacturing process of carbon nanotube field emission transistor |
JP4201182B2 (ja) * | 2003-05-20 | 2008-12-24 | 大日本印刷株式会社 | 細胞培養基材およびその製造方法 |
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GB0312551D0 (en) * | 2003-06-02 | 2003-07-09 | Nel Technologies Ltd | Functional electro-conductive garments |
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DE10325768A1 (de) * | 2003-06-05 | 2004-12-23 | Chemetall Gmbh | Beschichtungssystem für Glasoberflächen, Verfahren zu dessen Herstellung und dessen Anwendung |
KR100529371B1 (ko) * | 2003-07-29 | 2005-11-21 | 주식회사 엘지화학 | 촉매전구체 수지조성물 및 이를 이용한 투광성 전자파차폐재 제조방법 |
JPWO2005022660A1 (ja) * | 2003-08-29 | 2006-10-26 | 松下電器産業株式会社 | 有機半導体膜、それを用いた電子デバイス、およびそれらの製造方法 |
US7328370B2 (en) * | 2003-09-12 | 2008-02-05 | Rockwell Automation Technologies, Inc. | Safety controller with simplified interface |
CA2541513C (en) * | 2003-10-17 | 2011-02-01 | Dai Nippon Printing Co., Ltd. | Method for preparing artificial cell tissue and substrate therefor |
WO2005043215A1 (ja) * | 2003-10-31 | 2005-05-12 | Hamamatsu Photonics K.K. | 試料観察方法及び顕微鏡、並びにこれに用いる固浸レンズ及び光学密着液 |
CN100510922C (zh) * | 2003-11-14 | 2009-07-08 | 株式会社半导体能源研究所 | 液晶显示装置及其制造方法、以及包含其的电视接收机 |
WO2005048221A1 (en) * | 2003-11-14 | 2005-05-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device and method for fabricating the same |
JP4554913B2 (ja) * | 2003-11-14 | 2010-09-29 | 大日本印刷株式会社 | パターニング用基板および細胞培養基板 |
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-
1998
- 1998-08-10 DE DE69841945T patent/DE69841945D1/de not_active Expired - Lifetime
- 1998-08-10 EP EP03021172A patent/EP1376224B1/de not_active Expired - Lifetime
- 1998-08-10 DE DE69841948T patent/DE69841948D1/de not_active Expired - Lifetime
- 1998-08-10 EP EP03021174A patent/EP1376226B1/de not_active Expired - Lifetime
- 1998-08-10 EP EP03021175A patent/EP1376227A1/de not_active Ceased
- 1998-08-10 EP EP98936714A patent/EP0932081B1/de not_active Expired - Lifetime
- 1998-08-10 EP EP03021177A patent/EP1376229B1/de not_active Expired - Lifetime
- 1998-08-10 EP EP03021176A patent/EP1376228B1/de not_active Expired - Lifetime
- 1998-08-10 EP EP03021173A patent/EP1376225B1/de not_active Expired - Lifetime
- 1998-08-10 DE DE69841238T patent/DE69841238D1/de not_active Expired - Lifetime
- 1998-08-10 DE DE69841944T patent/DE69841944D1/de not_active Expired - Lifetime
- 1998-08-10 DE DE69841946T patent/DE69841946D1/de not_active Expired - Lifetime
- 1998-08-10 DE DE69841947T patent/DE69841947D1/de not_active Expired - Lifetime
- 1998-08-10 WO PCT/JP1998/003547 patent/WO1999008158A1/ja active Application Filing
- 1998-10-08 US US09/284,161 patent/US6294313B1/en not_active Expired - Lifetime
-
2001
- 2001-06-15 US US09/882,409 patent/US7575845B2/en not_active Expired - Fee Related
-
2007
- 2007-10-05 US US11/867,820 patent/US7943275B2/en not_active Expired - Fee Related
- 2007-10-05 US US11/867,799 patent/US20080070156A1/en not_active Abandoned
- 2007-10-05 US US11/867,791 patent/US20080085478A1/en not_active Abandoned
- 2007-10-05 US US11/867,831 patent/US8815130B2/en not_active Expired - Fee Related
- 2007-10-05 US US11/867,842 patent/US7965446B2/en not_active Expired - Fee Related
- 2007-10-05 US US11/867,781 patent/US8785108B2/en not_active Expired - Fee Related
-
2008
- 2008-05-19 US US12/122,833 patent/US8268546B2/en not_active Expired - Fee Related
-
2009
- 2009-05-27 US US12/472,585 patent/US7998662B2/en not_active Expired - Fee Related
-
2010
- 2010-01-06 US US12/652,843 patent/US20100112311A1/en not_active Abandoned
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