DE69841885D1 - Verfahren zur herstellung von kompositsolen, überzugkomposition und optischem element - Google Patents
Verfahren zur herstellung von kompositsolen, überzugkomposition und optischem elementInfo
- Publication number
- DE69841885D1 DE69841885D1 DE69841885T DE69841885T DE69841885D1 DE 69841885 D1 DE69841885 D1 DE 69841885D1 DE 69841885 T DE69841885 T DE 69841885T DE 69841885 T DE69841885 T DE 69841885T DE 69841885 D1 DE69841885 D1 DE 69841885D1
- Authority
- DE
- Germany
- Prior art keywords
- compositesol
- production
- optical element
- coating composition
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/003—Titanates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing, besides zirconium, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
- C01P2006/64—Optical properties, e.g. expressed in CIELAB-values b* (yellow-blue axis)
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04783297A JP4069330B2 (ja) | 1997-03-03 | 1997-03-03 | 酸化チタン−酸化スズ複合ゾルの製造方法 |
JP04783397A JP4129600B2 (ja) | 1997-03-03 | 1997-03-03 | コーティング組成物及び光学部材 |
JP4921597 | 1997-03-04 | ||
JP4921497 | 1997-03-04 | ||
JP05017297A JP4069331B2 (ja) | 1997-03-05 | 1997-03-05 | 酸化チタン−酸化セリウム−酸化スズ複合ゾルの製造方法 |
JP05017397A JP4088720B2 (ja) | 1997-03-05 | 1997-03-05 | コーティング組成物及び光学部材 |
PCT/JP1998/000768 WO1998039253A1 (fr) | 1997-03-03 | 1998-02-26 | Procede de production de sols de composites, de composition de revetement et d'elements optiques |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69841885D1 true DE69841885D1 (de) | 2010-10-21 |
Family
ID=27550291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69841885T Expired - Lifetime DE69841885D1 (de) | 1997-03-03 | 1998-02-26 | Verfahren zur herstellung von kompositsolen, überzugkomposition und optischem element |
Country Status (5)
Country | Link |
---|---|
US (1) | US6296943B1 (de) |
EP (1) | EP0992456B1 (de) |
AU (1) | AU6116098A (de) |
DE (1) | DE69841885D1 (de) |
WO (1) | WO1998039253A1 (de) |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2350841B (en) | 1999-06-08 | 2001-12-19 | Kansai Paint Co Ltd | Inorganic film-forming coating composition, preparation method therof and inorganic film-forming method |
US6733580B2 (en) | 1999-06-08 | 2004-05-11 | Kansei Paint Co., Ltd | Inorganic film-forming coating composition, preparation method thereof and inorganic film-forming method |
WO2001012737A1 (fr) * | 1999-08-16 | 2001-02-22 | Jsr Corporation | Composition de revetement et objet durci |
EP1077236B1 (de) * | 1999-08-16 | 2004-05-26 | Nissan Chemical Industries Ltd. | Modifiziertes Metalloxid Sol, Beschichtungszusammensetzung und Optisches Element |
FR2801299B1 (fr) * | 1999-11-23 | 2002-06-07 | Rhodia Terres Rares | Dispersion colloidale aqueuse a base d'au moins un compose d'un lanthanide et d'un complexant, procede de preparation et utilisation |
DE10006208A1 (de) * | 2000-02-11 | 2001-08-16 | Bayer Ag | IR-absorbierende Zusammensetzungen |
DE10022037A1 (de) * | 2000-05-05 | 2001-11-08 | Bayer Ag | IR-absorbierende Zusammensetzungen |
JP3526439B2 (ja) * | 2000-09-29 | 2004-05-17 | Hoya株式会社 | 眼鏡レンズ用コーティング組成物の製造方法 |
US7337088B2 (en) | 2001-05-23 | 2008-02-26 | Micron Technology, Inc. | Intelligent measurement modular semiconductor parametric test system |
US6844203B2 (en) | 2001-08-30 | 2005-01-18 | Micron Technology, Inc. | Gate oxides, and methods of forming |
US8026161B2 (en) | 2001-08-30 | 2011-09-27 | Micron Technology, Inc. | Highly reliable amorphous high-K gate oxide ZrO2 |
DE10158437A1 (de) * | 2001-11-29 | 2003-06-12 | Nano X Gmbh | Beschichtung zur dauerhaften Hydrophilierung von Oberflächen und deren Verwendung |
US7162386B2 (en) | 2002-04-25 | 2007-01-09 | Micron Technology, Inc. | Dynamically adaptable semiconductor parametric testing |
US7160577B2 (en) | 2002-05-02 | 2007-01-09 | Micron Technology, Inc. | Methods for atomic-layer deposition of aluminum oxides in integrated circuits |
US7205218B2 (en) | 2002-06-05 | 2007-04-17 | Micron Technology, Inc. | Method including forming gate dielectrics having multiple lanthanide oxide layers |
US6790791B2 (en) | 2002-08-15 | 2004-09-14 | Micron Technology, Inc. | Lanthanide doped TiOx dielectric films |
EP1557447A4 (de) * | 2002-10-29 | 2007-05-30 | Jsr Corp | Härtungszusammensetzung und antireflektiver mehrschicht körper unter deren verwendung |
US7563827B2 (en) * | 2002-12-03 | 2009-07-21 | Nissan Chemical Industries, Ltd. | Modified stannic oxide sol, stannic oxide-zirconium oxide composite sol, coating composition and optical element |
US7101813B2 (en) | 2002-12-04 | 2006-09-05 | Micron Technology Inc. | Atomic layer deposited Zr-Sn-Ti-O films |
US6958302B2 (en) | 2002-12-04 | 2005-10-25 | Micron Technology, Inc. | Atomic layer deposited Zr-Sn-Ti-O films using TiI4 |
US6972136B2 (en) * | 2003-05-23 | 2005-12-06 | Optima, Inc. | Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same |
JP2005082795A (ja) * | 2003-09-11 | 2005-03-31 | Shinwa Kako Kk | 固体基板への微粒子の表面コーティング法 |
US20050147641A1 (en) * | 2004-01-02 | 2005-07-07 | Qi Yu | Plastic water and beverage bottle and manufacturing process thereof |
US7476695B2 (en) * | 2004-03-16 | 2009-01-13 | Nissan Chemical Industries, Ltd. | Modified stannic oxide-zirconium oxide complex sol and method for preparing same |
KR100809758B1 (ko) * | 2004-06-29 | 2008-03-04 | 미쓰이 가가쿠 가부시키가이샤 | 주석 변성 루틸형 산화티탄 미립자 |
US7687409B2 (en) | 2005-03-29 | 2010-03-30 | Micron Technology, Inc. | Atomic layer deposited titanium silicon oxide films |
US7662729B2 (en) | 2005-04-28 | 2010-02-16 | Micron Technology, Inc. | Atomic layer deposition of a ruthenium layer to a lanthanide oxide dielectric layer |
US7927948B2 (en) | 2005-07-20 | 2011-04-19 | Micron Technology, Inc. | Devices with nanocrystals and methods of formation |
US20070099005A1 (en) * | 2005-10-31 | 2007-05-03 | Honeywell International Inc. | Thick crack-free silica film by colloidal silica incorporation |
JPWO2007052580A1 (ja) * | 2005-11-02 | 2009-04-30 | 三井化学株式会社 | 酸化物超微粒子を含有する樹脂組成物 |
US7744951B2 (en) | 2006-04-13 | 2010-06-29 | Guardian Industries Corp. | Coated glass substrate with infrared and ultraviolet blocking characteristics |
FR2913010B1 (fr) * | 2007-02-27 | 2009-12-25 | Centre Nat Rech Scient | Production d'hydrogene par dissociation de l'eau en presence de sno en utilisant le couple sno2/sno dans une suite de reactions thermochimiques |
WO2009044878A1 (ja) * | 2007-10-03 | 2009-04-09 | Nissan Chemical Industries, Ltd. | 変性金属酸化物複合ゾル、コーティング組成物及び光学部材 |
US20100239872A1 (en) * | 2007-10-03 | 2010-09-23 | Nissan Chemical Industries, Ltd. | Metal oxide composite sol, coating composition, and optical member |
WO2009077412A2 (en) * | 2007-12-14 | 2009-06-25 | Akzo Nobel N.V. | Aqueous slurry comprising inorganic oxygen-containing particulates |
US20090163656A1 (en) * | 2007-12-21 | 2009-06-25 | Envont Llc | Hybrid vehicle systems |
US20090163647A1 (en) * | 2007-12-21 | 2009-06-25 | Envont Llc | Hybrid metal oxides |
US20090162560A1 (en) * | 2007-12-21 | 2009-06-25 | Envont L.L.C. | Hybrid vehicle systems |
JP5812987B2 (ja) * | 2009-05-20 | 2015-11-17 | 田中貴金属工業株式会社 | リーンバーンエンジン用触媒 |
CN107474799B (zh) | 2010-03-12 | 2020-12-29 | 昭和电工材料株式会社 | 悬浮液、研磨液套剂、研磨液以及使用它们的基板的研磨方法 |
US8479009B2 (en) * | 2010-09-17 | 2013-07-02 | International Business Machines Corporation | Wearable time-bracketed video authentication |
CN103409108B (zh) | 2010-11-22 | 2015-04-22 | 日立化成株式会社 | 悬浮液、研磨液套剂、研磨液、基板的研磨方法及基板 |
CN103500706A (zh) | 2010-11-22 | 2014-01-08 | 日立化成株式会社 | 悬浮液、研磨液套剂、研磨液、基板的研磨方法及基板 |
CN103717535B (zh) * | 2011-06-03 | 2016-02-10 | 日产化学工业株式会社 | 含有二氧化硅-二氧化锡复合氧化物被覆二氧化钛的金属氧化物粒子 |
HUE037459T2 (hu) | 2011-12-02 | 2018-08-28 | Nissan Chemical Ind Ltd | Eljárás rutil-típusú titán-dioxid szol elõállítására |
CN104024914B (zh) | 2011-12-28 | 2017-04-12 | 株式会社尼康 | 目镜镜头、配备有其的取景器光学***和光学设备,和用于制造目镜镜头的方法 |
SG10201606827RA (en) | 2012-02-21 | 2016-10-28 | Hitachi Chemical Co Ltd | Polishing agent, polishing agent set, and substrate polishing method |
WO2013125445A1 (ja) | 2012-02-21 | 2013-08-29 | 日立化成株式会社 | 研磨剤、研磨剤セット及び基体の研磨方法 |
WO2013175854A1 (ja) | 2012-05-22 | 2013-11-28 | 日立化成株式会社 | スラリー、研磨液セット、研磨液、基体の研磨方法及び基体 |
WO2013175856A1 (ja) * | 2012-05-22 | 2013-11-28 | 日立化成株式会社 | スラリー、研磨液セット、研磨液、基体の研磨方法及び基体 |
US10557059B2 (en) | 2012-05-22 | 2020-02-11 | Hitachi Chemical Company, Ltd. | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate |
KR20210068434A (ko) * | 2018-09-27 | 2021-06-09 | 닛산 가가쿠 가부시키가이샤 | 무기산화물입자를 포함하는 아크릴계 코팅 조성물 |
US10723915B2 (en) | 2018-11-26 | 2020-07-28 | Itoh Optical Industrial Co., Ltd. | Hard coating composition |
CN110064577A (zh) * | 2019-05-29 | 2019-07-30 | 石家庄志卫防爆工具有限公司 | 带纳米耐磨涂层的铝青铜防爆工具制备方法 |
CN116218293B (zh) * | 2023-05-05 | 2023-07-07 | 山东新广恒节能科技有限公司 | 一种高耐候外墙涂料 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5754901B2 (de) | 1974-11-06 | 1982-11-20 | ||
US4155704A (en) | 1976-06-17 | 1979-05-22 | Gosudarstvenny Vsesojusny Nauchno-Issledovatelsky Institut Tsementnoi Promyshlennosti Niitsement | Apparatus for feeding a mixture of steam, gas and air into a rotary kiln under the layer of the material processed |
US4151154A (en) * | 1976-09-29 | 1979-04-24 | Union Carbide Corporation | Silicon treated surfaces |
JPS5379695A (en) | 1976-12-22 | 1978-07-14 | Naigai Steel Works | Packing machine |
JPS5817527B2 (ja) | 1978-07-17 | 1983-04-07 | 株式会社保谷レンズ | 高屈折率レンズ用共重合体及びそれよりなるレンズ |
JPS5814449B2 (ja) | 1980-05-27 | 1983-03-19 | 株式会社トクヤマ | 高屈折率ガラスの製造方法 |
JPS59133211A (ja) | 1983-01-21 | 1984-07-31 | Toray Ind Inc | 高屈折率プラスチツクレンズ用樹脂 |
JPS60199016A (ja) | 1984-03-23 | 1985-10-08 | Mitsui Toatsu Chem Inc | チオカルバミン酸s―アルキルエステル系レンズ用樹脂の製造方法 |
JPS60221702A (ja) | 1985-01-23 | 1985-11-06 | Toray Ind Inc | 透明被覆層を有する成形体 |
JPS6322157A (ja) | 1986-07-14 | 1988-01-29 | Toyo Seikan Kaisha Ltd | スパゲッティの缶詰 |
JPH07113095B2 (ja) | 1987-05-07 | 1995-12-06 | セイコーエプソン株式会社 | 酸化チタンを含有する塗料 |
JPH01301517A (ja) * | 1988-05-30 | 1989-12-05 | Catalysts & Chem Ind Co Ltd | 酸化チタン・酸化セリウム複合系ゾルが配合された化粧料 |
JPH02151801A (ja) | 1988-12-05 | 1990-06-11 | Fujitsu Ltd | 光学部品及びそれを使用した光磁気ディスク用2ビーム型光ヘッド |
JP2577465B2 (ja) | 1988-12-28 | 1997-01-29 | 触媒化成工業株式会社 | 酸化チタン・酸化鉄複合系ゾルの製造方法およびそのゾルを配合した化粧料 |
JP2783417B2 (ja) * | 1989-03-30 | 1998-08-06 | 触媒化成工業株式会社 | ルチル型酸化チタンゾルの製造法 |
DE3921790A1 (de) * | 1989-07-03 | 1991-01-17 | Voith Gmbh J M | Hydrostatische verdraengermaschine |
JPH0529363A (ja) | 1991-07-22 | 1993-02-05 | Sony Corp | 配線基板 |
JP2844405B2 (ja) * | 1992-02-17 | 1999-01-06 | 信越化学工業株式会社 | 疎水性酸化チタン微粒子の製造方法 |
JPH06107498A (ja) * | 1992-09-24 | 1994-04-19 | Kyocera Corp | TiO2−SnO2膜の製法およびTiO2−SnO2膜被覆部材 |
US5501732A (en) * | 1994-02-28 | 1996-03-26 | E. I. Du Pont De Nemours And Company | Process for preparing silanized TiO2 pigments using a media mill |
JPH095501A (ja) * | 1995-06-15 | 1997-01-10 | Nikon Corp | 反射防止性プラスチックレンズ |
US5973068A (en) * | 1996-11-07 | 1999-10-26 | Shin-Etsu Chemical Co., Ltd. | Silicone resin-containing emulsion composition, method for making same, and article having a cured film of same |
-
1998
- 1998-02-26 AU AU61160/98A patent/AU6116098A/en not_active Abandoned
- 1998-02-26 DE DE69841885T patent/DE69841885D1/de not_active Expired - Lifetime
- 1998-02-26 US US09/380,403 patent/US6296943B1/en not_active Expired - Lifetime
- 1998-02-26 EP EP19980905647 patent/EP0992456B1/de not_active Expired - Lifetime
- 1998-02-26 WO PCT/JP1998/000768 patent/WO1998039253A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1998039253A1 (fr) | 1998-09-11 |
AU6116098A (en) | 1998-09-22 |
EP0992456B1 (de) | 2010-09-08 |
EP0992456A1 (de) | 2000-04-12 |
EP0992456A4 (de) | 2005-04-13 |
US6296943B1 (en) | 2001-10-02 |
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