DE69800018T2 - Halbleiterlaser-Lichtquelle mit abstimmbarer Wellenlänge - Google Patents

Halbleiterlaser-Lichtquelle mit abstimmbarer Wellenlänge

Info

Publication number
DE69800018T2
DE69800018T2 DE69800018T DE69800018T DE69800018T2 DE 69800018 T2 DE69800018 T2 DE 69800018T2 DE 69800018 T DE69800018 T DE 69800018T DE 69800018 T DE69800018 T DE 69800018T DE 69800018 T2 DE69800018 T2 DE 69800018T2
Authority
DE
Germany
Prior art keywords
light source
laser light
semiconductor laser
tunable wavelength
tunable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69800018T
Other languages
English (en)
Other versions
DE69800018D1 (de
Inventor
Madoka C O Ando Electri Hamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ando Electric Co Ltd
Original Assignee
Ando Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ando Electric Co Ltd filed Critical Ando Electric Co Ltd
Publication of DE69800018D1 publication Critical patent/DE69800018D1/de
Application granted granted Critical
Publication of DE69800018T2 publication Critical patent/DE69800018T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14—External cavity lasers
    • H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068—Stabilisation of laser output parameters
    • H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
    • H01S5/0687—Stabilising the frequency of the laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
DE69800018T 1997-03-24 1998-03-13 Halbleiterlaser-Lichtquelle mit abstimmbarer Wellenlänge Expired - Fee Related DE69800018T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07008397A JP3385898B2 (ja) 1997-03-24 1997-03-24 可変波長半導体レーザ光源

Publications (2)

Publication Number Publication Date
DE69800018D1 DE69800018D1 (de) 1999-10-07
DE69800018T2 true DE69800018T2 (de) 2000-05-04

Family

ID=13421302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69800018T Expired - Fee Related DE69800018T2 (de) 1997-03-24 1998-03-13 Halbleiterlaser-Lichtquelle mit abstimmbarer Wellenlänge

Country Status (4)

Country Link
US (1) US5970076A (de)
EP (1) EP0867989B1 (de)
JP (1) JP3385898B2 (de)
DE (1) DE69800018T2 (de)

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US6373868B1 (en) * 1993-05-28 2002-04-16 Tong Zhang Single-mode operation and frequency conversions for diode-pumped solid-state lasers
JPH11103124A (ja) * 1997-09-26 1999-04-13 Ando Electric Co Ltd 外部共振器型光源
US6120190A (en) * 1997-11-26 2000-09-19 Lasertron, Inc. Spatially variable bandpass filter monitoring and feedback control of laser wavelength especially in wavelength division multiplexing communication systems
US7006541B2 (en) 1998-06-01 2006-02-28 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US6160832A (en) 1998-06-01 2000-12-12 Lambda Physik Gmbh Method and apparatus for wavelength calibration
US6580517B2 (en) 2000-03-01 2003-06-17 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
CA2362311A1 (en) * 1999-03-01 2000-09-08 Regents Of The University Of California A tunable laser source with an integrated wavelength monitor and method of operating same
WO2001011392A2 (en) * 1999-08-10 2001-02-15 Coretek, Inc. Optical fiber wavelength reference device
CA2381665A1 (en) * 1999-08-10 2001-02-15 Coretek, Inc. Double etalon optical wavelength reference device
ATE357759T1 (de) * 1999-08-13 2007-04-15 California Inst Of Techn Frequenzverriegelungs vorrichtung in einer faser.
US6667804B1 (en) 1999-10-12 2003-12-23 Lambda Physik Ag Temperature compensation method for wavemeters
US6744792B1 (en) * 1999-10-26 2004-06-01 Nortel Networks, Ltd. Wavelength stabilization of tunable lasers by current modulation
EP1182436A1 (de) 2000-01-31 2002-02-27 Mitsubishi Denki Kabushiki Kaisha WELLENLäNGENMONITOR, VERFAHREN ZU SEINER JUSTIERUNG, STABILISIERTE LICHTQUELLE UND KOMMUNIKATIONSSYSTEM UNTER VERWENDUNG VON STABILISIERTEN LICHTQUELLEN
US6597462B2 (en) 2000-03-01 2003-07-22 Lambda Physik Ag Laser wavelength and bandwidth monitor
JP2001284711A (ja) 2000-03-31 2001-10-12 Hitachi Ltd 光伝送装置及びこれを用いた光システム
US6807205B1 (en) 2000-07-14 2004-10-19 Lambda Physik Ag Precise monitor etalon calibration technique
DE60001139T2 (de) * 2000-08-16 2003-09-11 Agilent Technologies Inc Wellenlängenmesser mit grober und feiner Messanlage
US6724788B1 (en) * 2000-09-06 2004-04-20 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Method and device for generating radiation with stabilized frequency
US6747741B1 (en) 2000-10-12 2004-06-08 Lambda Physik Ag Multiple-pass interferometric device
WO2002075935A2 (en) * 2001-03-15 2002-09-26 Iolon, Inc. Apparatus for frequency tuning and locking and method for operating same
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US6717964B2 (en) * 2001-07-02 2004-04-06 E20 Communications, Inc. Method and apparatus for wavelength tuning of optically pumped vertical cavity surface emitting lasers
US20030118268A1 (en) * 2001-12-21 2003-06-26 Christopher Wimperis System and method for producing optical circuits
US7146064B2 (en) * 2001-12-21 2006-12-05 Gsi Group Corporation System and method for producing optical circuits
JP2003234527A (ja) * 2002-02-06 2003-08-22 Acterna R & D Kk 波長可変光源装置
US6847662B2 (en) * 2002-03-25 2005-01-25 Fujitsu Limited Wavelength-selectable laser capable of high-speed frequency control
WO2003088436A1 (fr) * 2002-04-15 2003-10-23 Mitsubishi Denki Kabushiki Kaisha Appareil de controle de longueur d'onde
JP3766347B2 (ja) * 2002-05-16 2006-04-12 東芝電子エンジニアリング株式会社 光送信用デバイス
WO2004068660A1 (ja) * 2003-01-28 2004-08-12 Fujitsu Limited 波長ロック装置および波長ロック方法
US6952267B2 (en) * 2003-07-07 2005-10-04 Cymer, Inc. Method and apparatus for measuring bandwidth of a laser output
US7256893B2 (en) * 2003-06-26 2007-08-14 Cymer, Inc. Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser
US7304748B2 (en) * 2003-06-26 2007-12-04 Cymer, Inc. Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7193228B2 (en) 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
TWI240794B (en) * 2004-03-02 2005-10-01 Ind Tech Res Inst Wavelength meter
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
JP2006086429A (ja) * 2004-09-17 2006-03-30 Yokogawa Electric Corp 波長可変光源
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7327471B2 (en) * 2005-02-25 2008-02-05 Lockheed Martin Coherent Technologies, Inc. Apparatus and method for stabilizing lasers using dual etalons
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
WO2007007848A1 (ja) * 2005-07-13 2007-01-18 Nec Corporation 外部共振器型波長可変レーザ及びその実装方法
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
JP4557907B2 (ja) * 2006-02-16 2010-10-06 アンリツ株式会社 Ｍｅｍｓ波長掃引光源の波長校正装置及び方法
US7583711B2 (en) * 2006-03-17 2009-09-01 Lockheed Martin Coherent Technologies, Inc. Apparatus and method for stabilizing the frequency of lasers
US7440170B2 (en) * 2006-06-23 2008-10-21 Lucent Technologies Inc. Method and apparatus for monitoring optical signal-to-noise ratio
EP2936071B1 (de) * 2012-12-20 2018-04-25 FAZ Technology Limited System und verfahren zur kompensation von frequenzverzerrungen und polarisierungsinduzierten effekten in optischen systemen
CN110501141A (zh) * 2019-08-21 2019-11-26 中国科学院合肥物质科学研究院 利用频率梳光源测fp的透过率曲线的装置及方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2520153B2 (ja) * 1988-07-01 1996-07-31 国際電信電話株式会社 半導体レ―ザ光源制御装置
JP2631553B2 (ja) * 1989-05-22 1997-07-16 株式会社小松製作所 レーザの波長制御装置
JPH06112583A (ja) * 1992-09-25 1994-04-22 Ando Electric Co Ltd 外部共振器型半導体レーザ光源
JPH0799359A (ja) * 1993-09-27 1995-04-11 Ando Electric Co Ltd 外部共振器型周波数可変半導体レーザ光源

Also Published As

Publication number Publication date
EP0867989B1 (de) 1999-09-01
EP0867989A1 (de) 1998-09-30
DE69800018D1 (de) 1999-10-07
US5970076A (en) 1999-10-19
JPH10270800A (ja) 1998-10-09
JP3385898B2 (ja) 2003-03-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee