DE69702490D1 - Photohärtbare Harzzusammensetzung - Google Patents

Photohärtbare Harzzusammensetzung

Info

Publication number
DE69702490D1
DE69702490D1 DE69702490T DE69702490T DE69702490D1 DE 69702490 D1 DE69702490 D1 DE 69702490D1 DE 69702490 T DE69702490 T DE 69702490T DE 69702490 T DE69702490 T DE 69702490T DE 69702490 D1 DE69702490 D1 DE 69702490D1
Authority
DE
Germany
Prior art keywords
photo
resin composition
curable resin
curable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69702490T
Other languages
English (en)
Other versions
DE69702490T2 (de
Inventor
Tsuyoshi Watanabe
Tetsuya Yamamura
Akira Takeuchi
Takashi Ukachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
Japan Fine Coatings Co Ltd
Japan Synthetic Rubber Co Ltd
DSM NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Fine Coatings Co Ltd, Japan Synthetic Rubber Co Ltd, DSM NV filed Critical Japan Fine Coatings Co Ltd
Publication of DE69702490D1 publication Critical patent/DE69702490D1/de
Application granted granted Critical
Publication of DE69702490T2 publication Critical patent/DE69702490T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
DE69702490T 1996-12-10 1997-12-09 Photohärtbare Harzzusammensetzung Expired - Lifetime DE69702490T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32930396A JP3626302B2 (ja) 1996-12-10 1996-12-10 光硬化性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69702490D1 true DE69702490D1 (de) 2000-08-17
DE69702490T2 DE69702490T2 (de) 2001-03-15

Family

ID=18219959

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69702490T Expired - Lifetime DE69702490T2 (de) 1996-12-10 1997-12-09 Photohärtbare Harzzusammensetzung

Country Status (4)

Country Link
US (1) US6096796A (de)
EP (1) EP0848292B1 (de)
JP (1) JP3626302B2 (de)
DE (1) DE69702490T2 (de)

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EP0831127B1 (de) * 1995-05-12 2003-09-03 Asahi Denka Kogyo Kabushiki Kaisha Stereolithographisches verfahren und kunststoffharz dazu
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
EP0938026B1 (de) * 1998-02-18 2009-05-27 DSM IP Assets B.V. Fotohärtbare flüssige Harzzusammensetzung
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US6287748B1 (en) 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
US20060154175A9 (en) * 1998-07-10 2006-07-13 Lawton John A Solid imaging compositions for preparing polypropylene-like articles
WO2000059972A1 (en) * 1999-04-05 2000-10-12 Dsm N.V. Resin composition for photofabrication of three dimensional objects
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
KR20010080093A (ko) * 1999-08-12 2001-08-22 사토 아키오 실링제용광경화형수지조성물 및 실링방법.
GB9921779D0 (en) * 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
US7300619B2 (en) * 2000-03-13 2007-11-27 Objet Geometries Ltd. Compositions and methods for use in three dimensional model printing
US8481241B2 (en) * 2000-03-13 2013-07-09 Stratasys Ltd. Compositions and methods for use in three dimensional model printing
US20030207959A1 (en) * 2000-03-13 2003-11-06 Eduardo Napadensky Compositions and methods for use in three dimensional model printing
AU7466201A (en) * 2000-06-09 2001-12-17 Dsm N.V. Resin composition and three-dimensional object
EP1336131A1 (de) * 2000-11-10 2003-08-20 Durand Technology Limited Optische aufzeichnungsmaterialien
US20020123134A1 (en) * 2000-12-26 2002-09-05 Mingxian Huang Active and biocompatible platforms prepared by polymerization of surface coating films
US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
JP2005529200A (ja) * 2002-05-03 2005-09-29 ディーエスエム アイピー アセッツ ビー．ブイ． 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
JP2004356362A (ja) * 2003-05-29 2004-12-16 Dainippon Screen Mfg Co Ltd プローブカード製造用基板、検査装置、３次元造形装置および３次元造形方法
US7232850B2 (en) 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
JP2005126550A (ja) * 2003-10-23 2005-05-19 Konica Minolta Medical & Graphic Inc 活性光線硬化型インクジェットインク組成物、それを用いた画像形成方法及びインクジェット記録装置
KR20060108660A (ko) * 2003-11-06 2006-10-18 디에스엠 아이피 어셋츠 비.브이. 경화성 조성물 및 이를 사용하는 급속 조형법
US20050165127A1 (en) * 2003-12-31 2005-07-28 Dsm Desotech, Inc. Solid imaging compositions for preparing polyethylene-like articles
JP4544612B2 (ja) * 2004-02-04 2010-09-15 Ｄｉｃ株式会社 変性エポキシ樹脂、および変性エポキシ樹脂の製造方法
EP1727663B1 (de) * 2004-03-22 2011-10-05 Huntsman Advanced Materials (Switzerland) GmbH Photohärtbare zusammensetzungen
US7449280B2 (en) * 2004-05-26 2008-11-11 Microchem Corp. Photoimageable coating composition and composite article thereof
US20070267134A1 (en) * 2004-09-03 2007-11-22 Konarski Mark M Photoinitiated Cationic Epoxy Compositions
JP4578223B2 (ja) * 2004-12-14 2010-11-10 ダイセル化学工業株式会社 光学的立体造形用光硬化性樹脂組成物
JP4926505B2 (ja) * 2006-03-13 2012-05-09 株式会社ダイセル 光学的立体造形用樹脂組成物
JP4969137B2 (ja) * 2006-04-17 2012-07-04 シーメット株式会社 光学的立体造形用樹脂組成物
JP4135119B2 (ja) * 2006-09-29 2008-08-20 Ｄｉｃ株式会社 多分岐ポリエーテルポリオール含有のカチオン重合性樹脂組成物、それを含む接着剤、ならびにそれを用いた積層体及び偏光板
JP5302022B2 (ja) * 2009-01-28 2013-10-02 シーメット株式会社 光学的立体造形用樹脂組成物
JP5278239B2 (ja) * 2009-08-10 2013-09-04 Ｊｓｒ株式会社 電気接続部材および電気接続部材の製造方法
WO2012081393A1 (ja) * 2010-12-14 2012-06-21 株式会社ダイセル 硬化性組成物、及び硬化樹脂
JP2014185214A (ja) * 2013-03-22 2014-10-02 Dic Corp 活性エネルギー線硬化型スクリーンインキ組成物
DE102015200315B4 (de) * 2015-01-13 2018-05-30 Altana Ag Elektroisolierlack für OLED-Leuchtelemente sowie dessen Verwendung
JP6578660B2 (ja) * 2015-01-22 2019-09-25 富士ゼロックス株式会社 三次元造形用支持材、三次元造形用組成物セット、および三次元造形装置、三次元造形物の製造方法
US20180046076A1 (en) * 2015-03-23 2018-02-15 Dow Global Technologies Llc Photocurable Compositions for Three-Dimensional Printing
EP3418313B1 (de) * 2016-02-15 2020-09-02 Okamoto Chemical Industry Co., Ltd Zusammensetzung für optisches dreidimensionales formen

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US4197174A (en) * 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
JPS568428A (en) * 1979-06-19 1981-01-28 Ciba Geigy Ag Photopolymerizing and thermopolymerizing composition
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US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
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Also Published As

Publication number Publication date
JPH10168106A (ja) 1998-06-23
EP0848292B1 (de) 2000-07-12
JP3626302B2 (ja) 2005-03-09
DE69702490T2 (de) 2001-03-15
US6096796A (en) 2000-08-01
EP0848292A1 (de) 1998-06-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DSM IP ASSETS B.V., HEERLEN, NL

Owner name: JSR CORP., TOKIO/TOKYO, JP

Owner name: JAPAN FINE COATINGS CO., LTD., TOKIO/TOKYO, JP