DE69702490D1 - Photohärtbare Harzzusammensetzung - Google Patents
Photohärtbare HarzzusammensetzungInfo
- Publication number
- DE69702490D1 DE69702490D1 DE69702490T DE69702490T DE69702490D1 DE 69702490 D1 DE69702490 D1 DE 69702490D1 DE 69702490 T DE69702490 T DE 69702490T DE 69702490 T DE69702490 T DE 69702490T DE 69702490 D1 DE69702490 D1 DE 69702490D1
- Authority
- DE
- Germany
- Prior art keywords
- photo
- resin composition
- curable resin
- curable
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32930396A JP3626302B2 (ja) | 1996-12-10 | 1996-12-10 | 光硬化性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69702490D1 true DE69702490D1 (de) | 2000-08-17 |
DE69702490T2 DE69702490T2 (de) | 2001-03-15 |
Family
ID=18219959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69702490T Expired - Lifetime DE69702490T2 (de) | 1996-12-10 | 1997-12-09 | Photohärtbare Harzzusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US6096796A (de) |
EP (1) | EP0848292B1 (de) |
JP (1) | JP3626302B2 (de) |
DE (1) | DE69702490T2 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0831127B1 (de) * | 1995-05-12 | 2003-09-03 | Asahi Denka Kogyo Kabushiki Kaisha | Stereolithographisches verfahren und kunststoffharz dazu |
JP3765896B2 (ja) | 1996-12-13 | 2006-04-12 | Jsr株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
EP0938026B1 (de) * | 1998-02-18 | 2009-05-27 | DSM IP Assets B.V. | Fotohärtbare flüssige Harzzusammensetzung |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
US6379866B2 (en) * | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
WO2000059972A1 (en) * | 1999-04-05 | 2000-10-12 | Dsm N.V. | Resin composition for photofabrication of three dimensional objects |
JP4350832B2 (ja) * | 1999-04-19 | 2009-10-21 | Jsr株式会社 | 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物 |
KR20010080093A (ko) * | 1999-08-12 | 2001-08-22 | 사토 아키오 | 실링제용광경화형수지조성물 및 실링방법. |
GB9921779D0 (en) * | 1999-09-16 | 1999-11-17 | Ciba Sc Holding Ag | UV-Curable compositions |
US7300619B2 (en) * | 2000-03-13 | 2007-11-27 | Objet Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
US8481241B2 (en) * | 2000-03-13 | 2013-07-09 | Stratasys Ltd. | Compositions and methods for use in three dimensional model printing |
US20030207959A1 (en) * | 2000-03-13 | 2003-11-06 | Eduardo Napadensky | Compositions and methods for use in three dimensional model printing |
AU7466201A (en) * | 2000-06-09 | 2001-12-17 | Dsm N.V. | Resin composition and three-dimensional object |
EP1336131A1 (de) * | 2000-11-10 | 2003-08-20 | Durand Technology Limited | Optische aufzeichnungsmaterialien |
US20020123134A1 (en) * | 2000-12-26 | 2002-09-05 | Mingxian Huang | Active and biocompatible platforms prepared by polymerization of surface coating films |
US20030198824A1 (en) * | 2002-04-19 | 2003-10-23 | Fong John W. | Photocurable compositions containing reactive polysiloxane particles |
JP2005529200A (ja) * | 2002-05-03 | 2005-09-29 | ディーエスエム アイピー アセッツ ビー.ブイ. | 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法 |
JP2004356362A (ja) * | 2003-05-29 | 2004-12-16 | Dainippon Screen Mfg Co Ltd | プローブカード製造用基板、検査装置、3次元造形装置および3次元造形方法 |
US7232850B2 (en) | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
JP2005126550A (ja) * | 2003-10-23 | 2005-05-19 | Konica Minolta Medical & Graphic Inc | 活性光線硬化型インクジェットインク組成物、それを用いた画像形成方法及びインクジェット記録装置 |
KR20060108660A (ko) * | 2003-11-06 | 2006-10-18 | 디에스엠 아이피 어셋츠 비.브이. | 경화성 조성물 및 이를 사용하는 급속 조형법 |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
JP4544612B2 (ja) * | 2004-02-04 | 2010-09-15 | Dic株式会社 | 変性エポキシ樹脂、および変性エポキシ樹脂の製造方法 |
EP1727663B1 (de) * | 2004-03-22 | 2011-10-05 | Huntsman Advanced Materials (Switzerland) GmbH | Photohärtbare zusammensetzungen |
US7449280B2 (en) * | 2004-05-26 | 2008-11-11 | Microchem Corp. | Photoimageable coating composition and composite article thereof |
US20070267134A1 (en) * | 2004-09-03 | 2007-11-22 | Konarski Mark M | Photoinitiated Cationic Epoxy Compositions |
JP4578223B2 (ja) * | 2004-12-14 | 2010-11-10 | ダイセル化学工業株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
JP4926505B2 (ja) * | 2006-03-13 | 2012-05-09 | 株式会社ダイセル | 光学的立体造形用樹脂組成物 |
JP4969137B2 (ja) * | 2006-04-17 | 2012-07-04 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
JP4135119B2 (ja) * | 2006-09-29 | 2008-08-20 | Dic株式会社 | 多分岐ポリエーテルポリオール含有のカチオン重合性樹脂組成物、それを含む接着剤、ならびにそれを用いた積層体及び偏光板 |
JP5302022B2 (ja) * | 2009-01-28 | 2013-10-02 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
JP5278239B2 (ja) * | 2009-08-10 | 2013-09-04 | Jsr株式会社 | 電気接続部材および電気接続部材の製造方法 |
WO2012081393A1 (ja) * | 2010-12-14 | 2012-06-21 | 株式会社ダイセル | 硬化性組成物、及び硬化樹脂 |
JP2014185214A (ja) * | 2013-03-22 | 2014-10-02 | Dic Corp | 活性エネルギー線硬化型スクリーンインキ組成物 |
DE102015200315B4 (de) * | 2015-01-13 | 2018-05-30 | Altana Ag | Elektroisolierlack für OLED-Leuchtelemente sowie dessen Verwendung |
JP6578660B2 (ja) * | 2015-01-22 | 2019-09-25 | 富士ゼロックス株式会社 | 三次元造形用支持材、三次元造形用組成物セット、および三次元造形装置、三次元造形物の製造方法 |
US20180046076A1 (en) * | 2015-03-23 | 2018-02-15 | Dow Global Technologies Llc | Photocurable Compositions for Three-Dimensional Printing |
EP3418313B1 (de) * | 2016-02-15 | 2020-09-02 | Okamoto Chemical Industry Co., Ltd | Zusammensetzung für optisches dreidimensionales formen |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4917040A (de) * | 1972-06-10 | 1974-02-15 | ||
AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
GB1512982A (en) * | 1974-05-02 | 1978-06-01 | Gen Electric | Salts |
GB1516512A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Chalcogenium salts |
GB1516352A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Halonium salts |
US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
US4139655A (en) * | 1978-05-09 | 1979-02-13 | W. R. Grace & Co. | Photocurable epoxy compositions containing thiopyrylium salts |
US4197174A (en) * | 1979-03-14 | 1980-04-08 | American Can Company | Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6 |
JPS568428A (en) * | 1979-06-19 | 1981-01-28 | Ciba Geigy Ag | Photopolymerizing and thermopolymerizing composition |
JPH0245641B2 (ja) * | 1980-03-07 | 1990-10-11 | Ciba Geigy | Hikarijugoseisoseibutsuoyobisonojugoho |
US4383025A (en) * | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
US4387216A (en) * | 1981-05-06 | 1983-06-07 | Ciba-Geigy Corporation | Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants |
DE3323084A1 (de) * | 1983-06-27 | 1985-01-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von formstoffen |
DE3323122A1 (de) * | 1983-06-27 | 1985-05-23 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von reaktionsharzformstoffen |
JPS60247515A (ja) * | 1984-05-23 | 1985-12-07 | Oosakafu | 光学的造形法 |
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
JPS62101408A (ja) * | 1985-10-29 | 1987-05-11 | Osaka Pref Gov | 光学的造形法 |
JPS6337034A (ja) * | 1986-07-28 | 1988-02-17 | Mitsubishi Electric Corp | 半導体装置の分離供給装置 |
CA1305823C (en) * | 1986-08-29 | 1992-07-28 | Union Carbide Corporation | Photocurable blends of cyclic ethers and cycloaliphatic epoxides |
JPS63176337A (ja) * | 1987-01-14 | 1988-07-20 | Kirin Brewery Co Ltd | 液体含浸粒状泡硝子 |
JPS63229381A (ja) * | 1987-03-18 | 1988-09-26 | Hitachi Ltd | 半導体制御素子内の分担電流計測法 |
JP2525216B2 (ja) * | 1988-01-27 | 1996-08-14 | ディーエスエム・エヌヴィ | 光学的立体造形用樹脂組成物 |
US5434196A (en) * | 1988-02-19 | 1995-07-18 | Asahi Denka Kogyo K.K. | Resin composition for optical molding |
JPH0826121B2 (ja) * | 1988-02-19 | 1996-03-13 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
JP2590215B2 (ja) * | 1988-07-15 | 1997-03-12 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
JPH07103218B2 (ja) * | 1988-09-13 | 1995-11-08 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
JPH02208305A (ja) * | 1989-02-07 | 1990-08-17 | Mitsui Eng & Shipbuild Co Ltd | 光硬化性組成物 |
FI902943A0 (fi) * | 1989-07-19 | 1990-06-12 | Siemens Ag | I hetta haerdbara reaktionshartsblandningar. |
DE59007932D1 (de) * | 1989-10-18 | 1995-01-19 | Ciba Geigy Ag | Heisshärtbare Gemische. |
DE59010008D1 (de) * | 1989-10-27 | 1996-02-08 | Ciba Geigy Ag | Photoempfindliches Gemisch |
JPH05204119A (ja) * | 1990-11-01 | 1993-08-13 | Seiko Epson Corp | 画像形成装置 |
DK0508951T3 (da) * | 1991-04-08 | 1996-09-09 | Ciba Geigy Ag | Varmehærdelige blandinger |
TW269017B (de) * | 1992-12-21 | 1996-01-21 | Ciba Geigy Ag | |
TW259797B (de) * | 1992-12-23 | 1995-10-11 | Ciba Geigy | |
US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
JP3626275B2 (ja) * | 1996-04-09 | 2005-03-02 | Jsr株式会社 | 光硬化性樹脂組成物 |
JP3844824B2 (ja) * | 1996-11-26 | 2006-11-15 | 株式会社Adeka | エネルギー線硬化性エポキシ樹脂組成物、光学的立体造形用樹脂組成物及び光学的立体造形方法 |
-
1996
- 1996-12-10 JP JP32930396A patent/JP3626302B2/ja not_active Expired - Lifetime
-
1997
- 1997-12-09 EP EP97203869A patent/EP0848292B1/de not_active Expired - Lifetime
- 1997-12-09 DE DE69702490T patent/DE69702490T2/de not_active Expired - Lifetime
- 1997-12-10 US US08/988,237 patent/US6096796A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH10168106A (ja) | 1998-06-23 |
EP0848292B1 (de) | 2000-07-12 |
JP3626302B2 (ja) | 2005-03-09 |
DE69702490T2 (de) | 2001-03-15 |
US6096796A (en) | 2000-08-01 |
EP0848292A1 (de) | 1998-06-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: DSM IP ASSETS B.V., HEERLEN, NL Owner name: JSR CORP., TOKIO/TOKYO, JP Owner name: JAPAN FINE COATINGS CO., LTD., TOKIO/TOKYO, JP |